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1. 发明授权

US08710464B2 Specimen preparation device, and control method in specimen preparation device 失效
标题翻译：样品制备装置及样品制备装置的控制方法
公开(公告)号：US08710464B2
公开(公告)日：2014-04-29
申请号：US13203807
申请日：2009-10-23
申请人： Yuichi Madokoro , Tsuyoshi Onishi , Megumi Aizawa , Yukio Yoshizawa
发明人： Yuichi Madokoro , Tsuyoshi Onishi , Megumi Aizawa , Yukio Yoshizawa
IPC分类号： G21K5/08
CPC分类号： G01N1/286
摘要： Separation and the like of an excised specimen from a specimen are automatically performed. Marks for improving image recognition accuracy are provided in a region that becomes an excised specimen in a specimen and a region other than said region, or in a transfer means for transferring the excised specimen and a specimen holder capable of holding the excised specimen, and the relative movement of the excised specimen and the specimen, and the like are recognized with high accuracy by image recognition. In the sampling of a minute specimen using a focused ion beam, the detection of an end point of processing for separation of the excised specimen from the specimen, and the like are automatically performed. Thus, for example, unmanned specimen excision becomes possible, and preparation of a lot of specimens becomes possible.
摘要翻译：自动进行切片样品与试样的分离等。在成为试样和除了所述区域以外的区域的切除试样的区域中，或者在用于转移切除的试样的转移装置和能够保持切除的试样的试样保持器的区域中提供用于提高图像识别精度的标记，通过图像识别以高精度识别切除的样本和样本的相对运动等。在使用聚焦离子束对分钟标本的取样中，自动执行用于将切出的样品与试样分离的处理终点的检测等。因此，例如，无人标本切除成为可能，并且可以制备大量标本。

2. 发明授权

US08629394B2 Charged particle beam device and method for correcting position with respect to charged particle beam 失效
标题翻译：带电粒子束装置和相对于带电粒子束校正位置的方法
公开(公告)号：US08629394B2
公开(公告)日：2014-01-14
申请号：US13202498
申请日：2009-10-23
申请人： Yuichi Madokoro , Megumi Aizawa , Yukio Yoshizawa
发明人： Yuichi Madokoro , Megumi Aizawa , Yukio Yoshizawa
IPC分类号： G01N31/00 , G01N33/00
CPC分类号： H01J37/28 , H01J37/153 , H01J37/3005 , H01J37/3045 , H01J37/3056 , H01J2237/15 , H01J2237/1536 , H01J2237/20207 , H01J2237/221 , H01J2237/30483 , H01J2237/31745
摘要： An object of the present invention is to eliminate a distortion in an image even if there is an angular difference between the deflection direction of the charged particle beam and the tilt axis of a specimen, and to accurately observe and process the specimen. When the deflection direction of the charged particle beam is not parallel to the tilt axis of the specimen, the deflection rotation angle to the observation direction of the charged particle beam is determined, and the deflection pattern is changed. Thereby the distortion in the image is corrected. The deflection pattern is changed to a parallelogram. A distortion-free image is obtained even if the specimen is tilted, and the specimen can be observed and processed with high accuracy. This allows automatically recognizing the position correction mark to perform observation and processing after correcting the positional relation.
摘要翻译：本发明的目的是消除图像中的变形，即使在带电粒子束的偏转方向与试样的倾斜轴之间存在角度差，也能够精确地观察和处理试样。当带电粒子束的偏转方向与试样的倾斜轴不平行时，确定与带电粒子束的观察方向的偏转旋转角度，改变偏转图案。从而校正图像中的失真。偏转图案变为平行四边形。即使样品倾斜，也能获得无变形的图像，能够高精度地观察和加工样品。这允许在校正位置关系之后自动识别位置校正标记以执行观察和处理。

3. 发明申请

US20110309245A1 SPECIMEN PREPARATION DEVICE, AND CONTROL METHOD IN SPECIMEN PREPARATION DEVICE 失效
标题翻译：样品制备装置，以及样品制备装置中的控制方法
公开(公告)号：US20110309245A1
公开(公告)日：2011-12-22
申请号：US13203807
申请日：2009-10-23
申请人： Yuichi Madokoro , Tsuyoshi Onishi , Megumi Aizawa , Yukio Yoshizawa
发明人： Yuichi Madokoro , Tsuyoshi Onishi , Megumi Aizawa , Yukio Yoshizawa
IPC分类号： G21K5/10 , G01N23/02
CPC分类号： G01N1/286
摘要： Separation and the like of an excised specimen from a specimen are automatically performed. Marks for improving image recognition accuracy are provided in a region that becomes an excised specimen in a specimen and a region other than said region, or in a transfer means for transferring the excised specimen and a specimen holder capable of holding the excised specimen, and the relative movement of the excised specimen and the specimen, and the like are recognized with high accuracy by image recognition. In the sampling of a minute specimen using a focused ion beam, the detection of an end point of processing for separation of the excised specimen from the specimen, and the like are automatically performed. Thus, for example, unmanned specimen excision becomes possible, and preparation of a lot of specimens becomes possible.
摘要翻译：自动进行切片样品与试样的分离等。在成为试样和除了所述区域以外的区域的切除试样的区域中，或者在用于转移切除的试样的转移装置和能够保持切除的试样的试样保持器的区域中提供用于提高图像识别精度的标记，通过图像识别以高精度识别切除的样本和样本的相对运动等。在使用聚焦离子束对分钟标本的取样中，自动执行用于将切出的样品与试样分离的处理终点的检测等。因此，例如，无人标本切除成为可能，并且可以制备大量标本。

4. 发明申请

US20110297826A1 CHARGED PARTICLE BEAM DEVICE AND METHOD FOR CORRECTING POSITION WITH RESPECT TO CHARGED PARTICLE BEAM 失效
标题翻译：充电颗粒光束装置和相对于充电颗粒光束校正位置的方法
公开(公告)号：US20110297826A1
公开(公告)日：2011-12-08
申请号：US13202498
申请日：2009-10-23
申请人： Yuichi Madokoro , Megumi Aizawa , Yukio Yoshizawa
发明人： Yuichi Madokoro , Megumi Aizawa , Yukio Yoshizawa
IPC分类号： H01J37/26
CPC分类号： H01J37/28 , H01J37/153 , H01J37/3005 , H01J37/3045 , H01J37/3056 , H01J2237/15 , H01J2237/1536 , H01J2237/20207 , H01J2237/221 , H01J2237/30483 , H01J2237/31745
摘要： An object of the present invention is to eliminate a distortion in an image even if there is an angular difference between the deflection direction of the charged particle beam and the tilt axis of a specimen, and to accurately observe and process the specimen. When the deflection direction of the charged particle beam is not parallel to the tilt axis of the specimen, the deflection rotation angle to the observation direction of the charged particle beam is determined, and the deflection pattern is changed. Thereby the distortion in the image is corrected. The deflection pattern is changed to a parallelogram. A distortion-free image is obtained even if the specimen is tilted, and the specimen can be observed and processed with high accuracy. This allows automatically recognizing the position correction mark to perform observation and processing after correcting the positional relation.
摘要翻译：本发明的目的是消除图像中的变形，即使在带电粒子束的偏转方向与试样的倾斜轴之间存在角度差，也能够精确地观察和处理试样。当带电粒子束的偏转方向与试样的倾斜轴不平行时，确定与带电粒子束的观察方向的偏转旋转角度，改变偏转图案。从而校正图像中的失真。偏转图案变为平行四边形。即使样品倾斜，也能获得无变形的图像，能够高精度地观察和加工样品。这允许在校正位置关系之后自动识别位置校正标记以执行观察和处理。

5. 发明申请

US20080203299A1 Charged Particle Beam Apparatus 审中-公开
标题翻译：带电粒子束装置
公开(公告)号：US20080203299A1
公开(公告)日：2008-08-28
申请号：US12037459
申请日：2008-02-26
申请人： Toshiaki Kozuma , Yukio Yoshizawa , Megumi Aizawa
发明人： Toshiaki Kozuma , Yukio Yoshizawa , Megumi Aizawa
IPC分类号： G01N23/225 , G21K5/10
CPC分类号： G01N23/225 , H01J37/3045 , H01J37/3056 , H01J2237/024 , H01J2237/221 , H01J2237/31745
摘要： It is an object of this invention to improve contact precision and probe operability. This invention controls sample stage movement and probe movement on an observation image using a single coordinate system, thereby allowing positioning using a sample stage stop error as a probe control movement amount. This invention also figures out the position of the tip of a probe using the observation image and stores the coordinates of the probe at a reference position on the image. This invention facilitates precise probe contact operation to a sample position of the order of microns.
摘要翻译：本发明的目的是提高接触精度和探针可操作性。本发明使用单个坐标系控制观察图像上的样品台移动和探针移动，从而允许使用样品台停止误差定位作为探针控制移动量。本发明还使用观察图像了解探针的尖端的位置，并将探针的坐标存储在图像上的参考位置。本发明有助于精确的探针接触操作到微米量级的样品位置。

6. 发明授权

US08912487B2 Charged particle beam device, position specification method used for charged particle beam device, and program 有权
标题翻译：带电粒子束装置，用于带电粒子束装置的位置指定方法和程序
公开(公告)号：US08912487B2
公开(公告)日：2014-12-16
申请号：US13503074
申请日：2010-10-06
申请人： Kunio Sakamoto , Megumi Aizawa , Satoshi Tomimatsu , Isamu Sekihara
发明人： Kunio Sakamoto , Megumi Aizawa , Satoshi Tomimatsu , Isamu Sekihara
IPC分类号： H01J37/304 , H01J37/305 , G01N23/22 , H01J37/302
CPC分类号： H01J37/3056 , G01N23/2208 , H01J37/302 , H01J37/3045 , H01J2237/3174 , H01J2237/31749
摘要： Observation using an FIB image is enabled without causing any damage to a designated region. To this end, an ion beam scanning-prohibited region is set in a sample by using an image acquired by a charged particle beam other than an ion beam, or an image prepared as external data as a peripheral image including the designated region of a sample. Thereafter, the image used to set the ion beam scanning-prohibited region is exactly superimposed on an FIB image acquired for regions except the ion beam scanning-prohibited region, thereby forming an image including the ion beam scanning-prohibited region on which ion beam scanning has not been performed.
摘要翻译：使用FIB图像进行观察，而不会对指定区域造成任何损害。为此，通过使用由离子束以外的带电粒子束获取的图像或作为外部数据准备的图像作为包含样本的指定区域的周边图像，在样本中设定离子束扫描禁止区域。此后，将用于设定离子束扫描禁止区域的图像精确地叠加在除了离子束扫描禁止区域之外的区域获取的FIB图像上，从而形成包括离子束扫描禁止区域的图像，其中离子束扫描禁止区域尚未执行

7. 发明申请

US20120211652A1 Charged Particle Beam Device, Position Specification Method Used for Charged Particle Beam Device, and Program 有权
标题翻译：带电粒子束装置，用于带电粒子束装置的位置规范方法和程序
公开(公告)号：US20120211652A1
公开(公告)日：2012-08-23
申请号：US13503074
申请日：2010-10-06
申请人： Kunio Sakamoto , Megumi Aizawa , Satoshi Tomimatsu , Isamu Sekihara
发明人： Kunio Sakamoto , Megumi Aizawa , Satoshi Tomimatsu , Isamu Sekihara
IPC分类号： H01J37/26
CPC分类号： H01J37/3056 , G01N23/2208 , H01J37/302 , H01J37/3045 , H01J2237/3174 , H01J2237/31749
摘要： Observation using an FIB image is enabled without causing any damage to a designated region. To this end, an ion beam scanning-prohibited region is set in a sample by using an image acquired by a charged particle beam other than an ion beam, or an image prepared as external data as a peripheral image including the designated region of a sample. Thereafter, the image used to set the ion beam scanning-prohibited region is exactly superimposed on an FIB image acquired for regions except the ion beam scanning-prohibited region, thereby forming an image including the ion beam scanning-prohibited region on which ion beam scanning has not been performed.
摘要翻译：使用FIB图像进行观察，而不会对指定区域造成任何损害。为此，通过使用由离子束以外的带电粒子束获取的图像或作为外部数据准备的图像作为包含样本的指定区域的周边图像，在样本中设定离子束扫描禁止区域。此后，将用于设定离子束扫描禁止区域的图像精确地叠加在除了离子束扫描禁止区域之外的区域获取的FIB图像上，从而形成包括离子束扫描禁止区域的图像，其中离子束扫描禁止区域尚未执行

8. 发明授权

US06521890B2 Focused ion beam machining method and focused ion beam machining apparatus 有权
标题翻译：聚焦离子束加工方法和聚焦离子束加工装置
公开(公告)号：US06521890B2
公开(公告)日：2003-02-18
申请号：US09346204
申请日：1999-07-01
申请人： Tohru Ishitani , Tsuyoshi Ohnishi , Megumi Aizawa , Hiroji Iwata
发明人： Tohru Ishitani , Tsuyoshi Ohnishi , Megumi Aizawa , Hiroji Iwata
IPC分类号： H01J37304
CPC分类号： H01J37/3045 , G01N23/04 , H01J2237/30438 , H01J2237/3045 , H01J2237/3174 , H01J2237/31749
摘要： When SIM image data D[n] of a mark is compared with reference SIM image data in calculating a displacement of machining position in the nth time, image data D[n−1] just before the nth time is employed as the reference image data and a position displacement of the image is obtained from matching processing of the two kinds of image data of D[n] and D[n−1] to calculate a displacement of machining position.
摘要翻译：当在第n次计算加工位置的位移时，将标记的SIM图像数据D [n]与参考SIM图像数据进行比较，则将第n次之前的图像数据D [n-1]用作参考图像数据并且通过对D [n]和D [n-1]的两种图像数据的匹配处理获得图像的位置位移，以计算加工位置的位移。

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