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1. 发明授权

US5691088A Pellicle for protection of photolithographic mask 失效
标题翻译：用于保护光刻掩模的防护薄膜
公开(公告)号：US5691088A
公开(公告)日：1997-11-25
申请号：US949389
申请日：1992-09-22
申请人： Yoshihiro Kubota , Meguru Kashida , Yoshihiko Nagata , Hitoshi Noguchi , Yuichi Hamada , Kimitaka Kumagae
发明人： Yoshihiro Kubota , Meguru Kashida , Yoshihiko Nagata , Hitoshi Noguchi , Yuichi Hamada , Kimitaka Kumagae
IPC分类号： C08L83/04 , C08J7/04 , G03F1/62 , G03F7/075 , H01L21/027 , H01L21/30 , G03F9/00
CPC分类号： G03F1/62 , Y10T428/161 , Y10T428/28 , Y10T428/2852
摘要： Disclosed is a frame-supported pellicle for dust-proofing of a photolithographic photomask used for patteriwse light exposure in the manufacturing process of, for example, semiconductor devices, which comprises (a) a frame member, (b) a transparent polymeric film supported by the frame member and (c) a coating layer of a sticky adhesive on one surface of the polymeric film to capture any dust particles in the space between the photomask and the pellicle. The inventive pellicle is imparted with a greatly improved serviceable life with stability against ultraviolet irradiation relative to the adhesive coating layer which is formed from a specific organo-polysiloxane-based adhesive composition.
摘要翻译：公开了一种用于防止在例如半导体器件的制造过程中用于眩光曝光的光刻光掩模的框架支撑的防护薄膜，其包括（a）框架构件，（b）由框架构件和（c）在聚合物膜的一个表面上的粘性粘合剂的涂层以捕获光掩模和防护薄膜之间的空间中的任何灰尘颗粒。赋予本发明的防护薄膜相对于由特定的有机聚硅氧烷类粘合剂组合物形成的粘合剂涂层，具有大大改善的使用寿命，具有抗紫外线照射的稳定性。

2. 发明授权

US5597669A Frame-supported pellicle for photolithography 失效
标题翻译：用于光刻的框架支撑防护薄膜
公开(公告)号：US5597669A
公开(公告)日：1997-01-28
申请号：US524546
申请日：1995-09-07
申请人： Yuichi Hamada , Meguru Kashida , Yoshihiro Kubota
发明人： Yuichi Hamada , Meguru Kashida , Yoshihiro Kubota
IPC分类号： G03F1/62 , H01L21/027 , G03F9/00
CPC分类号： G03F1/62 , Y10T428/3154 , Y10T428/31544
摘要： Proposed is a frame-supported pellicle for dustproof protection of a photomask in the photolithographic patterning work for the manufacture of fine electronic devices having excellent mechanical properties and durability of the pellicle membrane against air blow and ultraviolet irradiation. The advantages of the inventive frame-supported pellicle is obtained by the use of, in place of conventional cellulose-based polymers and fluorocarbon-based resins, a norbornene-based plastic resin as the material of the pellicle membrane spread over and adhesively bonded to one end surface of a rigid frame in a slack-free fashion.
摘要翻译：提出了用于制造具有优异的机械性能和防护薄膜的空气吹扫和紫外线照射的耐久性的精细电子器件的光刻图案工作中的光掩模防尘保护的框架支撑防护薄膜。通过使用代替常规纤维素类聚合物和氟碳类树脂的降冰片烯系塑料树脂作为防护薄膜的材料，分散在其上并与其粘接，得到本发明的框架式防护薄膜组件的优点。刚性框架的端面以无松弛的方式。

3. 发明授权

US5378514A Frame-supported pellicle for photolithography 失效
标题翻译：用于光刻的框架支撑防护薄膜
公开(公告)号：US5378514A
公开(公告)日：1995-01-03
申请号：US103925
申请日：1993-08-06
申请人： Yuichi Hamada , Yoshihiko Nagata , Meguru Kashida , Yoshihiro Kubota
发明人： Yuichi Hamada , Yoshihiko Nagata , Meguru Kashida , Yoshihiro Kubota
IPC分类号： G03F1/62 , H01L21/027 , B32B3/00
CPC分类号： G03F1/62 , G03F1/64 , Y10S156/922 , Y10T156/11 , Y10T428/3154 , Y10T428/31544
摘要： Proposed is a novel frame-supported pellicle for dust-proof protection of a photomask used in the photolithographic patterning work in the manufacture of semiconductor devices and the like. The frame-supported pellicle of the invention consists of a pellicle membrane made from a specific fluorocarbon-containing polymer which is adhesively bonded in a slack-free fashion to a surface of a rigid pellicle frame by means of a hot-melt adhesive which is a fluorocarbon-containing polymer of the same type as or similar to the fluorocarbon-containing polymer of the membrane so that no problems are involved in the adhesive bonding relative to the compatibility between the adhesive and the membrane which otherwise is poorly susceptible to adhesive bonding.
摘要翻译：提出了一种用于半导体器件等的制造中的光刻图案工作中使用的光掩模的防尘保护用新颖的框架式防护薄膜。本发明的框架式防护薄膜组件由一种由特定含氟烃聚合物制成的防护薄膜组件，该防护薄膜组件通过热熔粘合剂以一种无松弛的方式与刚性防护薄膜框架的表面粘合，与含氟碳化物的聚合物相同或相似的含碳氟化合物的聚合物相对于粘合剂和膜之间的相容性而言，粘合剂粘合没有涉及问题，否则粘合剂与胶粘剂粘合性差。

4. 发明授权

US5723860A Frame-supported pellicle for photomask protection 失效
标题翻译：框架保护膜防护薄膜
公开(公告)号：US5723860A
公开(公告)日：1998-03-03
申请号：US673257
申请日：1996-06-28
申请人： Yuichi Hamada , Meguru Kashida
发明人： Yuichi Hamada , Meguru Kashida
IPC分类号： G02F1/1333 , G03F1/64 , H01L21/027 , H01J5/02
CPC分类号： G03F1/64 , Y10T428/249985
摘要： Proposed is an improvement in a frame-supported pellicle, which is a device for dust-proof protection of a photomask used in the photolithographic patterning works in the manufacture of fine electronic devices, consisting of a rigid pellicle frame, a highly transparent membrane of a plastic resin spread over and adhesively bonded to one end surface of the pellicle frame in a slack-free fashion and a layer of a pressure-sensitive adhesive formed on the other end surface of the pellicle frame to facilitate mounting of the frame-supported pellicle on the surface of a photomask and to secure the same at the correct position. The improvement comprises forming the layer of the pressure-sensitive adhesive on the end surface of the pellicle frame to have an outwardly convex surface, for example, in the form of a barrel vault instead of the flat surface in the prior art so that the troubles in the prior art due to occurrence of air gaps between the surface of the adhesive layer and the surface of the photomask unavoidable in mounting of the conventional frame-supported pellicle can be prevented to ensure completely air-tight sealing thereby. The adverse influence on the pellicle membrane due to the air-tightness of sealing by the pressure difference between the outer and inner surfaces can be overcome by providing a penetrating opening for air escape in the pellicle frame covered with a filter sheet.
摘要翻译：提出了框架支撑防护薄膜的改进，该防护薄膜组件是用于制造精细电子装置的光刻图案工艺中使用的光掩模的防尘保护装置，其由刚性防护薄膜框架，高透明度的膜塑料树脂铺展并以无松弛的方式粘附在防护薄膜组件框架的一个端面上，并且形成在防护膜框架的另一端表面上的压敏粘合剂层，以便将框架支撑的防护薄膜组件安装在光掩模的表面并将其固定在正确的位置。改进之处在于，在防护薄膜组件框架的端面上形成压敏粘合剂层以具有向外凸起的表面，例如以现有技术中的平坦表面为例，而不是平坦表面，从而使故障在现有技术中，由于在粘合剂层的表面与常规的框架支撑的防护薄膜组件的安装中不可避免的光掩模的表面之间的气隙的发生，可以防止由此发生完全不透气的密封。可以通过在被过滤片覆盖的防护薄膜组件框架中设置用于空气逸出的穿透开口来克服由于外表面和内表面之间的压力差导致的密封气密性对防护薄膜的不利影响。

5. 发明授权

US5693382A Frame-supported pellicle for dustproof protection of photomask in photolithography 失效
标题翻译：用于光刻中光掩模防尘保护的框架支撑防护薄膜
公开(公告)号：US5693382A
公开(公告)日：1997-12-02
申请号：US647140
申请日：1996-05-09
申请人： Yuichi Hamada , Satoshi Kawakami , Toru Shirasaki , Yoshihiko Nagata , Meguru Kashida , Yoshihiro Kubota
发明人： Yuichi Hamada , Satoshi Kawakami , Toru Shirasaki , Yoshihiko Nagata , Meguru Kashida , Yoshihiro Kubota
IPC分类号： C09J127/12 , G03F1/62 , G03F1/64 , G03F7/20 , H01L21/027 , A47G1/12
CPC分类号： G03F1/64 , G03F1/62 , Y10T428/3154 , Y10T428/31544
摘要： Disclosed is a frame-supported pellicle, which is an integral body consisting of a rigid frame and a transparent plastic film adhesively bonded to one end surface of the frame in a slack-free fashion, for dustproof protection of a photomask used in a photolithographic patterning work in the manufacture of fine electronic devices such as LSIs and liquid crystal display panels. The frame-supported pellicle is prepared by bonding the frame and plastic film with an adhesive having a glass transition temperature substantially lower than that of the polymeric resin forming the film and the adhesive bonding work is performed at a temperature higher than the glass transition temperature of the adhesive but lower than that of the polymeric resin of the film so that excellent adhesive bonding strength can be obtained between the frame and the resin film still without causing any adverse influences on the resin film such as distortion and crease formation.
摘要翻译：公开了一种框架支撑的防护薄膜，其是由刚性框架和透明塑料薄膜组成的整体，所述刚性框架和透明塑料薄膜以无松弛的方式粘合到所述框架的一个端面上，以防止光刻图案中使用的光掩模的防尘保护在制造诸如LSI和液晶显示面板的精细电子器件中工作。框架支撑的防护薄膜组件是用玻璃化转变温度基本上低于形成薄膜的聚合物树脂的玻璃化转变温度的粘合剂将框架和塑料薄膜粘合而制成的，并且粘合剂在高于玻璃化转变温度粘合剂但低于膜的聚合物树脂的粘合剂，从而在框架和树脂膜之间仍然可以获得优异的粘合强度，而不会对树脂膜造成任何不利影响，例如变形和折痕形成。

6. 发明授权

US5419972A Frame-supported pellicle for dustproof protection of photomask 失效
标题翻译：镜框防护薄膜，用于光掩模的防尘保护
公开(公告)号：US5419972A
公开(公告)日：1995-05-30
申请号：US287778
申请日：1994-08-09
申请人： Sakae Kawaguchi , Yuichi Hamada , Toru Shirasaki , Yoshihiko Nagata , Meguru Kashida , Yoshihiro Kubota
发明人： Sakae Kawaguchi , Yuichi Hamada , Toru Shirasaki , Yoshihiko Nagata , Meguru Kashida , Yoshihiro Kubota
IPC分类号： G03F1/64 , G03F7/20 , H01L21/027 , G03B27/58
CPC分类号： G03F1/64 , G03F7/70866 , Y10T428/12569 , Y10T428/12736 , Y10T428/12743 , Y10T428/1275 , Y10T428/12764
摘要： An improvement is proposed for a frame-supported pellicle for dustproof protection of a photomask, which consists of a rigid frame and a transparent plastic membrane adhesively bonded to one end surface of the frame in a slack-free fashion, used in the photolithographic patterning work for the manufacture of fine electronic parts and devices. The improvement is obtained by providing the whole surface of the pellicle frame made from an alluminum alloy with a metallic plating layer of nickel or chromium so as to completely solve the heretofore unavoidable problem by the dust particle deposition on the pellicle membrane during transportation and handling as a consequence of dust particle formation by contacting with the inner surface of the holder case by virtue of the extremely high smoothness of the metal-plated frame surface.
摘要翻译：提出了一种用于光掩模防尘保护的框架式防护薄膜组件的改进，该光掩模由刚性框架和透明塑料膜组成，该透明塑料膜以无松弛的方式粘合到框架的一个端面上，用于光刻图案工作用于制造精密电子零件和装置。通过提供由铝合金制成的防护薄膜组件的整个表面由镍或铬的金属镀层提供，从而完全解决了在运输和处理过程中防尘薄膜上的灰尘颗粒沉积在防尘薄膜上的不可避免的问题由于金属镀层的框架表面的平滑度极高，因此与保持器壳体的内表面接触而形成粉尘颗粒的结果。

7. 发明授权

US5370951A Frame-supported pellicle for protection of photolithographic mask 失效
标题翻译：框架支撑防护薄膜，用于保护光刻掩模
公开(公告)号：US5370951A
公开(公告)日：1994-12-06
申请号：US7525
申请日：1993-01-22
申请人： Yoshihiro Kubota , Meguru Kashida , Yuichi Hamada , Hirofumi Kishita , Shinichi Sato , Kouichi Yamaguchi
发明人： Yoshihiro Kubota , Meguru Kashida , Yuichi Hamada , Hirofumi Kishita , Shinichi Sato , Kouichi Yamaguchi
IPC分类号： C08L83/04 , C08K5/5435 , C09J183/14 , G03F1/62 , H01L21/027 , G03F9/00
CPC分类号： G03F1/64 , C09J183/14 , Y10T428/31544
摘要： An improvement is proposed in a frame-supported pellicle, i.e. a thin transparent film of a polymeric resin adhesively bonded to a frame member, used for dust-proof protection of a photomask in a photolithographic patterning work for the manufacture of electronic devices. The improvement comprises using, as the adhesive, an organopolysiloxane-based composition which comprises (a) a perfluoroalkyl-containing diorganopolysiloxane having at least two vinyl groups per molecule, (b) an organohydrogenpolysiloxane having at least one epoxy group and (c) a platinum catalyst for promoting the hydrosilation reaction between (a) and (b). As compared with conventional adhesives, a quite good adhesive bonding strength can be obtained with this adhesive even when the membrane is made from a fluorocarbon group-containing polymeric resin and the adhesive layer obtained therefrom is highly resistant against ultraviolet irradiation to ensure a long serviceable life of the pellicle.
摘要翻译：在用于电子设备的制造的光刻图案化工作中，在框架支撑的防护薄膜中提出了一种改进的粘合方式粘合到框架构件上的聚合物树脂透明薄膜，用于光掩模的防尘保护。该改进包括使用基于有机聚硅氧烷的组合物作为粘合剂，其包含（a）每分子具有至少两个乙烯基的含全氟烷基的二有机聚硅氧烷，（b）具有至少一个环氧基的有机氢聚硅氧烷和（c）铂促进（a）和（b）之间硅氢化反应的催化剂。与常规粘合剂相比，即使膜由含碳氟化合物基团的聚合物树脂制成并且由其获得的粘合剂层也能够高度耐紫外线照射，从而可以获得相当好的粘合强度，以确保长的使用寿命的防护薄膜。

8. 发明授权

US5327808A Method for the preparation of a frame-supported pellicle for photolithography 失效
标题翻译：用于制备用于光刻的框架支撑的防护薄膜的方法
公开(公告)号：US5327808A
公开(公告)日：1994-07-12
申请号：US63853
申请日：1993-05-18
申请人： Yoshihiko Nagata , Yuichi Hamada , Meguru Kashida , Yoshihiro Kubota
发明人： Yoshihiko Nagata , Yuichi Hamada , Meguru Kashida , Yoshihiro Kubota
IPC分类号： B26D3/08 , B26F3/08 , G03F1/62 , H01L21/00 , H01L21/027 , H01L21/30 , B26D7/10
CPC分类号： H01L21/67017 , B26D3/085 , B26F3/08 , G03F1/64 , Y10S83/914 , Y10T156/108 , Y10T83/02 , Y10T83/0414 , Y10T83/293
摘要： A process for the preparation of a frame-supported pellicle membrane used for dust-proof protection of a photomask in the photolithographic patterning work of, for example, semiconductor devices. An improvement is proposed for trimming of a pellicle membrane formed on a base plate and adhesively bonded to a pellicle frame to remove the extraneous portion of the membrane protruded out of the pellicle frame. Instead of the mechanical punching method for trimming, the trimming work according to the invention is performed by using a cutting device having a cutter element heated at a temperature higher than the melting point of the thermoplastic resin forming the membrane so that the membrane is trimmed by melting of the resin. Different from the conventional mechanical punching method, the trimming process of the invention is free from the problem of occurrence of dust particles deposited on the membrane to adversely affect the quality of the pattern reproduction.
摘要翻译：一种制备用于例如半导体器件的光刻图形工作中用于光掩模的防尘保护的框架支撑的防护薄膜的方法。针对形成在基板上的防护薄膜组件的修整进行了改进，并将其粘接到防护薄膜组件框架上以除去从防护薄膜组件框架突出的膜的外部部分。代替用于修剪的机械冲压方法，根据本发明的修剪工作是通过使用切割装置进行的，该切割装置具有在比形成膜的热塑性树脂的熔点高的温度下加热的切割元件，使得膜被修剪熔化树脂。与传统的机械冲压方法不同，本发明的修整过程没有沉积在膜上的灰尘颗粒的发生的问题，从而不利地影响图案再现的质量。

9. 发明授权

US5300348A Frame-supported pellicle for photolithography, comprising a fluorocarbon containing organopolysiloxane based adhesive 失效
标题翻译：用于光刻的框架支撑防护薄膜组件，包括含有氟聚合物的基于有机聚硅氧烷的粘合剂
公开(公告)号：US5300348A
公开(公告)日：1994-04-05
申请号：US959032
申请日：1992-10-08
申请人： Yoshihiro Kubota , Meguru Kashida , Yoshihiko Nagata , Hitoshi Noguchi , Yuichi Hamada , Shinichi Sato , Hiroshi Inomata
发明人： Yoshihiro Kubota , Meguru Kashida , Yoshihiko Nagata , Hitoshi Noguchi , Yuichi Hamada , Shinichi Sato , Hiroshi Inomata
IPC分类号： C09J183/14 , C08G77/48 , C08G77/50 , C08J5/12 , C08L83/02 , C08L83/04 , C08L83/05 , C08L83/14 , C09J183/00 , G03F1/62 , G03F7/075 , H01L21/027 , H01L21/30 , B32B9/60
CPC分类号： G03F1/64 , Y10T428/24793 , Y10T428/3154 , Y10T428/31663
摘要： An improvement is proposed in a frame-supported pellicle consisting of a frame member and a thin transparent polymer membrane adhesively bonded to the frame member used for dustproof covering of a photomask in a photolithograpic patterning work of electronic devices. The improvement comprises using a specific fluorocarbon group-containing organosiloxane-based polymeric composition as an adhesive for adhesively bonding the frame member and the polymer membrane. This adhesive is effective even when the polymeric membrane is formed from a fluorocarbon polymer which is hardly susceptible to adhesive bonding with conventional adhesives. In addition, the adhesive bonding by use of this specific adhesive is highly durable even under irradiation with ultraviolet light.
摘要翻译：在由电子设备的光刻图案化工作中的框架构件和薄透明聚合物膜组成的框架支撑防护薄膜组合物中，提出了粘合到用于光掩模的防尘覆盖物的框架构件的薄透明聚合物膜的改进。改进之处在于使用特定的含氟烃基的有机硅氧烷类聚合物组合物作为用于粘合框架构件和聚合物膜的粘合剂。即使聚合物膜由氟碳聚合物形成，该粘合剂也是有效的，该氟碳聚合物几乎不易受与常规粘合剂粘合的影响。此外，通过使用该特定粘合剂的粘合剂即使在用紫外线照射下也是非常耐用的。

10. 发明授权

US5616927A Frame-supported pellicle for dustproof protection of photomask 失效
标题翻译：镜框防护薄膜，用于光掩模的防尘保护
公开(公告)号：US5616927A
公开(公告)日：1997-04-01
申请号：US310879
申请日：1994-09-22
申请人： Yoshihiro Kubota , Satoshi Kawakami , Yuichi Hamada , Toru Shirasaki , Yoshihiko Nagata , Meguru Kashida
发明人： Yoshihiro Kubota , Satoshi Kawakami , Yuichi Hamada , Toru Shirasaki , Yoshihiko Nagata , Meguru Kashida
IPC分类号： G03F7/20 , G03F1/62 , H01L21/027 , G21K5/00
CPC分类号： G03F1/64
摘要： Proposed is an improved frame-supported pellicle, which is an integral body consisting of a rigid frame, a transparent plastic resin film adhesively bonded to one end surface of the frame in a slack-free fashion and a layer of a pressure-sensitive adhesive on the other end surface of the frame. The improvement consists in the use of a specific pressure-sensitive adhesive capable of being imparted with a greatly decreased bonding strength when it is heated at a temperature higher than a critical temperature or irradiated with UV light in a dose exceeding a critical dose so as to facilitate demounting of the frame-supported pellicle from a photomask on which the pellicle is mounted when it is to be replaced with a new pellicle without leaving any fragments of the adhesive adherent to the photomask surface.
摘要翻译：提出了一种改进的框架支撑防护薄膜，其是由刚性框架，以无松弛的方式粘合到框架的一个端面的透明塑料树脂膜和一层压敏粘合剂组成的整体，框架的另一端面。改进在于使用特定的压敏粘合剂，当其在高于临界温度的温度下加热或以超过临界剂量的UV光照射时，可以赋予极大降低的粘合强度，以便有助于将其从防护薄膜组件安装的光掩模上拆卸下来，当它被新的防护薄膜组件更换，而不会留下附着于光掩模表面的粘合剂的任何碎片。

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