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1. 发明授权

US06881369B2 Microelectroforming mold using a preformed metal as the substrate and the fabrication method of the same 失效
标题翻译：使用预成型金属作为基板的微电成型模具及其制造方法
公开(公告)号：US06881369B2
公开(公告)日：2005-04-19
申请号：US10124312
申请日：2002-04-18
申请人： Yuh-Wen Lee , Liang-Yu Yao , Chao-Chiun Liang , Jeng-En Juang , Ching-Yi Wu
发明人： Yuh-Wen Lee , Liang-Yu Yao , Chao-Chiun Liang , Jeng-En Juang , Ching-Yi Wu
IPC分类号： B28B7/36 , B29C33/38 , B29C33/44 , G03F7/00 , H01L21/302 , H01L21/461
CPC分类号： G03F7/00
摘要： The invention discloses a microelectroforming mold using a preformed metal as the substrate and its fabrication method. Using a preformed metal as the substrate can avoid deformation of the microelectroforming mold due to residual stress in the electroforming metal. The fabrication method disclosed herein includes the steps of: forming a layer of bonding material on a surface of the preformed metal substrate after machining; forming a high aspect ratio photoresist microstructure on surfaces of the metal substrate and the bonding material; putting an electroforming material into the gaps of the photoresist microstructure to form an electroforming metal microstructure; and using a thermal process to bond the metal substrate and the metal micro structure by the bonding material and simultaneously bum off the photoresist microstructure to form a micro-electroforming mold. The invention shortens the electroforming time to be one third of the prior art, elongating the number of times the micro-electroforming mold can be used by a factor of more than three.
摘要翻译：本发明公开了一种使用预成型金属作为基板的微电气模具及其制造方法。使用预成型金属作为基板可以避免微电铸模具由于电铸金属中的残余应力而发生变形。本文公开的制造方法包括以下步骤：在加工后在预成型金属基板的表面上形成接合材料层; 在金属基板和接合材料的表面上形成高纵横比的光致抗蚀剂微结构; 将电铸材料放入光致抗蚀剂微结构的间隙中以形成电铸金属微观结构; 并且使用热处理通过接合材料粘合金属基板和金属微结构，并同时冲击光致抗蚀剂微结构以形成微电铸模具。本发明将电铸时间缩短到现有技术的三分之一，将微电铸模具的使用次数延长三倍以上。

2. 发明申请

US20060264058A1 Liquid-based gravity-driven etching-stop technique for controlling structure dimension 有权
标题翻译：液体重力驱动蚀刻停止技术，用于控制结构尺寸
公开(公告)号：US20060264058A1
公开(公告)日：2006-11-23
申请号：US11242866
申请日：2005-10-05
申请人： Wei-Chin Lin , Hui-Ling Chang , Ching-Hsiang Tsai , Chao-Chiun Liang , Gen-Wen Hsieh , Yuh-Wen Lee
发明人： Wei-Chin Lin , Hui-Ling Chang , Ching-Hsiang Tsai , Chao-Chiun Liang , Gen-Wen Hsieh , Yuh-Wen Lee
IPC分类号： H01L21/302
CPC分类号： H01L21/02052 , B81B2201/12 , B81C1/00626 , B81C2201/0142 , G01Q60/38
摘要： A liquid-based gravity-driven etching-stop technique for controlling structure dimension is provided, where opposite etching trenches in cooperation with an etching-stop solution are used for controlling the dimension of a microstructure on the wafer level. In an embodiment, opposite trenches surrounding the microstructure are respectively etched on sides of the wafer, and the trench depth on the side of the wafer, on which the microstructure is, is equal to the design dimension of the microstructure. Contrarily, it is unnecessary to define the trench depth on the back-side of the chip. In the final step of the fabrication process, when the device is etched, such that the trenches on the sides communicate with each other to separate the microstructure from the whole wafer automatically and thereby shift from the etchant into the etching-stop solution to stop etching.
摘要翻译：提供了一种用于控制结构尺寸的液体重力驱动蚀刻停止技术，其中与蚀刻停止溶液配合的相反蚀刻沟槽用于控制晶片级上的微结构的尺寸。在一个实施例中，围绕微结构的相对的沟槽分别蚀刻在晶片的侧面上，并且在其上的晶片侧面上的沟槽深度等于微结构的设计尺寸。相反，不需要在芯片的背面限定沟槽深度。在制造过程的最后步骤中，当器件被蚀刻时，使得侧面上的沟槽彼此连通以自动地将微结构与全部晶片分离，从而从蚀刻剂移动到蚀刻停止溶液中以停止蚀刻。

3. 发明授权

US07435355B2 Liquid-based gravity-driven etching-stop technique for controlling structure dimension 有权
标题翻译：液体重力驱动蚀刻停止技术，用于控制结构尺寸
公开(公告)号：US07435355B2
公开(公告)日：2008-10-14
申请号：US11242866
申请日：2005-10-05
申请人： Wei-Chin Lin , Hui-Ling Chang , Ching-Hsiang Tsai , Chao-Chiun Liang , Gen-Wen Hsieh , Yuh-Wen Lee
发明人： Wei-Chin Lin , Hui-Ling Chang , Ching-Hsiang Tsai , Chao-Chiun Liang , Gen-Wen Hsieh , Yuh-Wen Lee
IPC分类号： B44C1/22 , H01L21/302
CPC分类号： H01L21/02052 , B81B2201/12 , B81C1/00626 , B81C2201/0142 , G01Q60/38
摘要： A liquid-based gravity-driven etching-stop technique for controlling structure dimension is provided, where opposite etching trenches in cooperation with an etching-stop solution are used for controlling the dimension of a microstructure on the wafer level. In an embodiment, opposite trenches surrounding the microstructure are respectively etched on sides of the wafer, and the trench depth on the side of the wafer, on which the microstructure is, is equal to the design dimension of the microstructure. Contrarily, it is unnecessary to define the trench depth on the back-side of the chip. In the final step of the fabrication process, when the device is etched, such that the trenches on the sides communicate with each other to separate the microstructure from the whole wafer automatically and thereby shift from the etchant into the etching-stop solution to stop etching.
摘要翻译：提供了一种用于控制结构尺寸的液体重力驱动蚀刻停止技术，其中与蚀刻停止溶液配合的相反蚀刻沟槽用于控制晶片级上的微结构的尺寸。在一个实施例中，围绕微结构的相对的沟槽分别蚀刻在晶片的侧面上，并且在其上的晶片侧面上的沟槽深度等于微结构的设计尺寸。相反，不需要在芯片的背面限定沟槽深度。在制造过程的最后步骤中，当器件被蚀刻时，使得侧面上的沟槽彼此连通以自动地将微结构与全部晶片分离，从而从蚀刻剂移动到蚀刻停止溶液中以停止蚀刻。

4. 发明申请

US20070153668A1 Data storage device utilizing carbon nanotubes and method for operating 审中-公开
标题翻译：利用碳纳米管的数据存储装置及其操作方法
公开(公告)号：US20070153668A1
公开(公告)日：2007-07-05
申请号：US11602471
申请日：2006-11-20
申请人： Yuh-Wen Lee , Ching-Hsing Tsai , Ching-Yi Wu
发明人： Yuh-Wen Lee , Ching-Hsing Tsai , Ching-Yi Wu
IPC分类号： G11B9/00
CPC分类号： G11B9/10 , B82Y10/00 , G01Q80/00 , G11B9/04 , G11B9/1409 , G11B9/1427
摘要： The present invention provides a data storage device that includes a medium capable of recording information, a movable arm above the medium, a carbon nanotube, a driving electrode and a focusing electrode between the driving electrode and the medium. The movable arm has a conductive micro-tip above a first area of the medium and capable of accessing the information recorded in the medium. The carbon nanotube extends from the conductive micro-tip toward a direction of the medium. The driving electrode is between the conductive micro-tip and the medium, providing an opening between the conductive micro-tip and the medium, and is capable of driving electrons from the carbon nanotube toward the direction of the medium. Further, the focusing electrode is between the driving electrode and the medium, providing an opening between the conductive micro-tip and the medium, and is capable of focusing electrons passing through the focusing electrode opening.
摘要翻译：本发明提供了一种数据存储装置，其包括能够记录信息的介质，介质上方的可移动臂，碳纳米管，驱动电极和在驱动电极和介质之间的聚焦电极。可移动臂在介质的第一区域上方具有导电微尖端并且能够访问记录在介质中的信息。碳纳米管从导电微尖端向培养基的方向延伸。驱动电极在导电微尖端和介质之间，在导电微尖端和介质之间提供开口，并且能够从碳纳米管向介质的方向驱动电子。此外，聚焦电极在驱动电极和介质之间，在导电微尖端和介质之间提供开口，并且能够聚焦通过聚焦电极开口的电子。

5. 发明申请

US20130092520A1 TOUCH DEVICE AND FABRICATION METHOD THEREOF 有权
标题翻译：触摸装置及其制造方法
公开(公告)号：US20130092520A1
公开(公告)日：2013-04-18
申请号：US13450486
申请日：2012-04-19
申请人： Yuh-Wen Lee , Hsiang-Lung Hsia , Yanjun Xie , Feng Chen , Fengming Lin , Xianbin Xu , Keming Ruan
发明人： Yuh-Wen Lee , Hsiang-Lung Hsia , Yanjun Xie , Feng Chen , Fengming Lin , Xianbin Xu , Keming Ruan
IPC分类号： H03K17/975 , G03F7/20 , B05D5/12
CPC分类号： G06F3/044 , G06F3/0412 , G06F2203/04103
摘要： The present disclosure relates to a touch technology, and more particularly to a touch device and a fabrication method thereof. The touch device comprises a sensing area and a peripheral area. The touch device further comprises a sensing electrode layer, a shading layer, a signal transmission line layer, and a conductive layer. The sensing electrode layer extends from the sensing area to the peripheral area. The shading layer is disposed on the peripheral area to overlay the sensing electrode layer and has a through hole to expose a portion of the sensing electrode layer. The signal transmission line layer is disposed on the shading layer and does not cover the through hole. The conductive layer fills the through hole and electrically connects the sensing electrode layer. In addition, a fabrication method of a touch device is also provided.
摘要翻译：本公开涉及触摸技术，更具体地涉及触摸装置及其制造方法。触摸装置包括感测区域和周边区域。触摸装置还包括感测电极层，遮光层，信号传输线层和导电层。感测电极层从感测区域延伸到周边区域。遮光层设置在外围区域上以覆盖感测电极层，并且具有通孔以暴露感测电极层的一部分。信号传输线层设置在遮光层上，不覆盖通孔。导电层填充通孔并电连接感测电极层。另外，还提供了一种触摸装置的制造方法。

6. 发明授权

US5976636A Magnetic apparatus for arc ion plating 失效
标题翻译：用于电弧离子电镀的磁性设备
公开(公告)号：US5976636A
公开(公告)日：1999-11-02
申请号：US45103
申请日：1998-03-19
申请人： Ming-Sheng Leu , Wei-Cheng Lih , Yuh-Wen Lee , Shau-Yi Chen , Wei-Jieh Chang , Shinn-Cherng Huang , Mau-Shen Liou
发明人： Ming-Sheng Leu , Wei-Cheng Lih , Yuh-Wen Lee , Shau-Yi Chen , Wei-Jieh Chang , Shinn-Cherng Huang , Mau-Shen Liou
IPC分类号： C23C14/32 , H05H1/50 , C23C14/14 , C23C14/00
CPC分类号： C23C14/325 , H05H1/50
摘要： An electric arc ion plating apparatus to coat a metal material on an object includes: (a) an vacuum chamber; (b) an electric arc bombardment chamber in the vacuum chamber, comprising an anode, a cathode target, and an arc triggering electrode to generate metal particles when a voltage is applied on the anode and the cathode, and on the arc triggering electrode; and (c) a magnetic coil having a longitudinal axis. The magnetic coil emanates from the electric arc bombardment chamber and encloses at least a part of the electric bombardment chamber. The magnetic coil contains a constant-diameter section enclosing and immediately emanating from the electric arc bombardment chamber to guide the metal particles away from the cathode and toward the object, and a varying-diameter section away from the electric arc bombardment chamber to provide optimum distribution of the metal particles before they reach the object surface. The varying-diameter section can be a diverging section for effectively coating relatively large objects, or a converging section for efficiently coating a relatively small object.
摘要翻译：用于在物体上涂覆金属材料的电弧离子镀装置包括：（a）真空室; （b）真空室中的电弧轰击室，当在阳极和阴极上施加电压时，包括阳极，阴极靶和电弧触发电极以产生金属颗粒;以及电弧触发电极; 和（c）具有纵向轴线的电磁线圈。电磁线圈从电弧轰击室发出并且包围电轰击室的至少一部分。磁性线圈包含恒定直径部分，其包围并立即从电弧轰击室发出，以引导金属颗粒远离阴极并朝向物体，以及远离电弧轰击室的变化直径部分以提供最佳分布的金属颗粒在它们到达物体表面之前。变径部分可以是用于有效地涂覆较大物体的发散部分或用于有效地涂覆较小物体的会聚部分。

7. 发明授权

US09116587B2 Touch panel and a manufacturing method thereof 有权
标题翻译：触摸面板及其制造方法
公开(公告)号：US09116587B2
公开(公告)日：2015-08-25
申请号：US13726553
申请日：2012-12-25
申请人： Yuh-Wen Lee , Hsiang-Lung Hsia , Kun-Rung Lin , Minghua Ye , Xianbin Xu , Tsung-Ke Chiu , Huilin Ye , Jing Yu
发明人： Yuh-Wen Lee , Hsiang-Lung Hsia , Kun-Rung Lin , Minghua Ye , Xianbin Xu , Tsung-Ke Chiu , Huilin Ye , Jing Yu
IPC分类号： G06F3/044
CPC分类号： G06F3/044 , G06F3/041 , G06F2203/04103 , G06F2203/04111
摘要： The present disclosure provides a method for manufacturing a touch panel, wherein the method comprises: forming a touch sensing layer on a visible region and a non-visible region of a cover substrate, wherein the non-visible region is located at periphery of the visible region forming a first opaque insulating layer on the touch sensing layer in the non-visible region; forming a wiring layer on the first opaque insulating layer: and forming a conductive layer to electrically connect the wiring layer and the touch sensing layer. Moreover, the present disclosure also provides a touch panel. Accordingly, the touch sensing accuracy is maintained, and the production rate is improved.
摘要翻译：本公开提供了一种用于制造触摸面板的方法，其中所述方法包括：在覆盖基板的可见区域和不可见区域上形成触摸感测层，其中所述不可见区域位于所述可见区域的外围区域，形成在不可见区域的触摸感测层上的第一不透明绝缘层; 在所述第一不透明绝缘层上形成布线层;以及形成导电层以电连接所述布线层和所述触摸感测层。此外，本公开还提供了触摸面板。因此，保持了触摸感测精度，并提高了生产率。

8. 发明申请

US20140168099A1 TOUCH PANEL AND A MANUFACTURING METHOD THEREOF 有权
标题翻译：触控面板及其制造方法
公开(公告)号：US20140168099A1
公开(公告)日：2014-06-19
申请号：US13717667
申请日：2012-12-17
申请人： Yuh-Wen Lee , Xianbin Xu , Keming Ruan , Qiong Yuan
发明人： Yuh-Wen Lee , Xianbin Xu , Keming Ruan , Qiong Yuan
IPC分类号： G06F1/16
CPC分类号： G06F1/1643 , G06F3/03547 , G06F3/044
摘要： A touch panel and a method of manufacturing the same are provided. The touch panel comprises: a cover substrate comprising a visible area and a non-visible area, wherein the non-visible area is located in a peripheral area of the visible area; an electrode layer formed on the visible area and the non-visible area of the cover substrate; a conductive masking layer formed on the non-visible area and disposed on a part of the electrode layer that is located on the non-visible area; and a plurality of connecting wires formed on the conductive masking layer and electrically connected to the electrode layer through uniaxial conduction of the conductive masking layer. The present disclosure comprises a method of manufacturing the touch panel. Accordingly, product yield is increased and touch sensing precision is maintained.
摘要翻译：提供了触摸面板及其制造方法。触摸面板包括：覆盖基板，包括可见区域和不可见区域，其中不可见区域位于可见区域的周边区域中; 形成在所述覆盖基板的可见区域和不可见区域上的电极层; 导电掩模层，其形成在所述不可见区域上并且设置在位于所述不可见区域上的所述电极层的一部分上; 以及形成在导电掩模层上并通过导电掩模层的单轴导电电连接到电极层的多个连接线。本公开包括制造触摸面板的方法。因此，产品产量增加并且保持了触摸感测精度。

9. 发明申请

US20130106739A1 TOUCH DEVICE AND FABRICATION METHOD THEREOF 有权
标题翻译：触摸装置及其制造方法
公开(公告)号：US20130106739A1
公开(公告)日：2013-05-02
申请号：US13550625
申请日：2012-07-17
申请人： Yuh-Wen Lee , Keming Ruan , Xianbin Xu , Fengming Lin
发明人： Yuh-Wen Lee , Keming Ruan , Xianbin Xu , Fengming Lin
IPC分类号： G06F3/041 , B23P11/00
CPC分类号： G06F3/044 , G06F2203/04103 , Y10T29/49826
摘要： The embodiments of the present disclosure provide a touch device having a sensing area and a peripheral area around the peripheral area. The touch device comprises a sensing electrode layer, a shading layer, and a signal transmission line, wherein the shading layer is disposed on the peripheral area and the sensing electrode layer. The shading layer has a hollow part and wholly overlays the peripheral area. The signal transmission line is disposed on the shading layer and filled in the hollow part. The signal transmission line is electrically connected to the sensing electrode layer through the shading layer beneath the hollow part. In addition, a fabrication method of the touch device is also provided.
摘要翻译：本公开的实施例提供了具有感测区域和围绕周边区域的周边区域的触摸设备。触摸装置包括感测电极层，遮光层和信号传输线，其中遮光层设置在外围区域和感测电极层上。遮光层具有中空部分并且完全覆盖周边区域。信号传输线设置在遮光层上并填充在中空部分中。信号传输线通过中空部分下方的遮光层与感测电极层电连接。此外，还提供了一种触摸装置的制造方法。

10. 发明申请

US20140130548A1 METHOD OF MANUFACTURING A TOUCH PANEL 审中-公开
标题翻译：制造面板的方法
公开(公告)号：US20140130548A1
公开(公告)日：2014-05-15
申请号：US13672711
申请日：2012-11-09
申请人： Yuh-Wen Lee , Yea-Wan Chen
发明人： Yuh-Wen Lee , Yea-Wan Chen
IPC分类号： C03C21/00 , C03C15/00 , C03B21/02
CPC分类号： C03C15/00 , B23K26/00 , B23K26/38 , B23K26/40 , B23K2101/40 , B23K2103/50 , B27B1/00 , C03B23/02 , C03B23/03 , C03C21/00
摘要： The present disclosure relates to a method of manufacturing a touch panel, and more particularly, to a manufacturing method capable of strengthening the strength of the touch panel. The method comprises: sinking and then strengthening a glass substrate, and then conducting a manufacturing process of placing a sensing electrode array. Finally, the glass substrate is cut and produced into several touch panels, each having strengthening properties.
摘要翻译：本公开涉及一种制造触摸面板的方法，更具体地，涉及一种能够增强触摸面板的强度的制造方法。该方法包括：将玻璃基板下沉，然后加固，然后进行放置感测电极阵列的制造过程。最后，将玻璃基板切割并制成多个具有强化性能的触摸面板。

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