专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20110235212A1 METHOD OF MANUFACTURING MAGNETIC RECORDING MEDIUM 有权
标题翻译：制造磁记录介质的方法
公开(公告)号：US20110235212A1
公开(公告)日：2011-09-29
申请号：US13007395
申请日：2011-01-14
申请人： Masatoshi Sakurai , Kaori Kimura , Yousuke Isowaki , Akira Watanabe , Yoshiyuki Kamata
发明人： Masatoshi Sakurai , Kaori Kimura , Yousuke Isowaki , Akira Watanabe , Yoshiyuki Kamata
IPC分类号： G11B5/82 , C25F3/02
CPC分类号： G11B5/82 , B82Y10/00 , G11B5/743 , G11B5/855 , Y10T428/12465
摘要： According to one embodiment, a method of manufacturing a magnetic recording medium includes forming on a magnetic recording layer a first hard mask, a second hard mask, a third hard mask and a resist, imprinting the resist with a stamper, removing a residue left in the recesses of the patterned resist, etching the third hard mask by use of the patterned resist as a mask, etching the second hard mask by use of the third hard mask as a mask, etching the first hard mask by use of the second hard mask as a mask, forming a pattern of the magnetic recording layer with ion beam irradiation, and removing the first hard mask by use of a remover liquid with higher reactivity to the metal material of the first hard mask than to a constituent element of the magnetic recording layer.
摘要翻译：根据一个实施例，制造磁记录介质的方法包括在磁记录层上形成第一硬掩模，第二硬掩模，第三硬掩模和抗蚀剂，用压模压印抗蚀剂，除去留在图案化抗蚀剂的凹部，通过使用图案化的抗蚀剂作为掩模蚀刻第三硬掩模，通过使用第三硬掩模作为掩模蚀刻第二硬掩模，通过使用第二硬掩模蚀刻第一硬掩模作为掩模，通过离子束照射形成磁记录层的图案，并且通过使用对第一硬掩模的金属材料具有较高反应性的去除剂液体除去第一硬掩模，而不是磁记录的构成元件层。

2. 发明授权

US07993536B2 Method of manufacturing magnetic recording medium 有权
标题翻译：磁记录介质的制造方法
公开(公告)号：US07993536B2
公开(公告)日：2011-08-09
申请号：US12636610
申请日：2009-12-11
申请人： Yousuke Isowaki , Kaori Kimura , Yoshiyuki Kamata , Masatoshi Sakurai
发明人： Yousuke Isowaki , Kaori Kimura , Yoshiyuki Kamata , Masatoshi Sakurai
IPC分类号： B44C1/22
CPC分类号： G11B5/82 , B82Y10/00 , G11B5/743 , G11B5/746 , G11B5/855
摘要： According to one embodiment, a method of manufacturing a magnetic recording medium includes forming a first hard mask, a second hard mask and a resist film on a magnetic recording layer, imprinting a stamper on the resist film to transfer patterns of recesses and protrusions, removing residues remained in recess of the patterned resist film, etching the second hard mask using the patterned resist film as a mask to transfer patterns of recesses and protrusions, etching the first hard mask using the patterned second hard mask as a mask to transfer patterns of recesses and protrusions, and deactivating magnetism of the magnetic recording layer exposed in the recesses together with removing the second hard mask by ion-beam etching.
摘要翻译：根据一个实施例，制造磁记录介质的方法包括在磁记录层上形成第一硬掩模，第二硬掩模和抗蚀剂膜，在抗蚀剂膜上压印印模以转印凹凸图案，去除残留物保留在图案化抗蚀剂膜的凹部中，使用图案化的抗蚀剂膜作为掩模蚀刻第二硬掩模以转移凹凸和突起的图案，使用图案化的第二硬掩模作为掩模蚀刻第一硬掩模以转移凹槽的图案和突起，并且通过离子束蚀刻去除第二硬掩模，使暴露于凹部中的磁记录层的磁性失活。

3. 发明授权

US08333899B2 Method of manufacturing magnetic recording medium 有权
标题翻译：磁记录介质的制造方法
公开(公告)号：US08333899B2
公开(公告)日：2012-12-18
申请号：US13007395
申请日：2011-01-14
申请人： Masatoshi Sakurai , Kaori Kimura , Yousuke Isowaki , Akira Watanabe , Yoshiyuki Kamata
发明人： Masatoshi Sakurai , Kaori Kimura , Yousuke Isowaki , Akira Watanabe , Yoshiyuki Kamata
IPC分类号： B44C1/22
CPC分类号： G11B5/82 , B82Y10/00 , G11B5/743 , G11B5/855 , Y10T428/12465
摘要： According to one embodiment, a method of manufacturing a magnetic recording medium includes forming on a magnetic recording layer a first hard mask, a second hard mask, a third hard mask and a resist, imprinting the resist with a stamper, removing a residue left in the recesses of the patterned resist, etching the third hard mask by use of the patterned resist as a mask, etching the second hard mask by use of the third hard mask as a mask, etching the first hard mask by use of the second hard mask as a mask, forming a pattern of the magnetic recording layer with ion beam irradiation, and removing the first hard mask by use of a remover liquid with higher reactivity to the metal material of the first hard mask than to a constituent element of the magnetic recording layer.
摘要翻译：根据一个实施例，制造磁记录介质的方法包括在磁记录层上形成第一硬掩模，第二硬掩模，第三硬掩模和抗蚀剂，用压模压印抗蚀剂，除去留在图案化抗蚀剂的凹部，通过使用图案化的抗蚀剂作为掩模蚀刻第三硬掩模，通过使用第三硬掩模作为掩模蚀刻第二硬掩模，通过使用第二硬掩模蚀刻第一硬掩模作为掩模，通过离子束照射形成磁记录层的图案，并且通过使用对第一硬掩模的金属材料具有较高反应性的去除剂液体除去第一硬掩模，而不是磁记录的构成元件层。

4. 发明授权

US08206602B2 Method of manufacturing magnetic recording medium 有权
标题翻译：磁记录介质的制造方法
公开(公告)号：US08206602B2
公开(公告)日：2012-06-26
申请号：US12838349
申请日：2010-07-16
申请人： Kaori Kimura , Yousuke Isowaki , Yoshiyuki Kamata , Masatoshi Sakurai
发明人： Kaori Kimura , Yousuke Isowaki , Yoshiyuki Kamata , Masatoshi Sakurai
IPC分类号： B44C1/22
CPC分类号： G11B5/855 , C23F4/00 , G03F7/427
摘要： According to one embodiment, there is provided a method of manufacturing a magnetic recording medium, including forming a first hard mask including carbon as a main component, a second hard mask including a main component other than carbon and a resist on a magnetic recording layer, contacting a stamper to the resist to transfer patterns of protrusions and recesses to the resist, removing residues in the recesses of the patterned resist, etching the second hard mask, etching the first hard mask, patterning the magnetic recording layer, and removing the first hard mask, the method further including, between etching the first hard mask and removing the first hard mask, removing the second hard mask remaining on the protrusions of the first hard mask, and removing a contaminating layer on a surface of the first hard mask by a mixed gas of oxygen-based gas and a fluorine compound.
摘要翻译：根据一个实施例，提供了一种制造磁记录介质的方法，包括形成包括碳作为主要成分的第一硬掩模，包括除碳以外的主要成分的第二硬掩模和在磁记录层上的抗蚀剂，将压模接触抗蚀剂以将突起和凹陷的图案转移到抗蚀剂，去除图案化抗蚀剂的凹部中的残留物，蚀刻第二硬掩模，蚀刻第一硬掩模，图案化磁记录层，以及去除第一硬掩模，所述方法还包括在蚀刻所述第一硬掩模和去除所述第一硬掩模之间，去除残留在所述第一硬掩模的突起上的所述第二硬掩模，以及通过所述第一硬掩模的表面去除所述第一硬掩模的表面上的污染层氧基气体和氟化合物的混合气体。

5. 发明申请

US20110000880A1 METHOD OF MANUFACTURING MAGNETIC RECORDING MEDIUM AND MAGNETIC RECORDING MEDIUM 有权
标题翻译：制造磁记录介质和磁记录介质的方法
公开(公告)号：US20110000880A1
公开(公告)日：2011-01-06
申请号：US12882113
申请日：2010-09-14
申请人： Yoshiyuki Kamata , Kaori Kimura , Yousuke Isowaki , Masatoshi Sakurai
发明人： Yoshiyuki Kamata , Kaori Kimura , Yousuke Isowaki , Masatoshi Sakurai
IPC分类号： B29C59/02
CPC分类号： G11B5/855 , B82Y10/00 , G11B5/743
摘要： According to one embodiment, a method of manufacturing a magnetic recording medium includes forming a resist on a magnetic recording layer, imprinting a stamper to the resist to transfer patterns of protrusions and recesses, and partially etching the magnetic recording layer in areas not covered with patterns of the resist used as masks by ion beam etching using a mixed gas of He and N2 as well as modifying a remainder of the magnetic recording layer to leave behind a nonmagnetic layer having a reduced thickness.
摘要翻译：根据一个实施例，制造磁记录介质的方法包括在磁记录层上形成抗蚀剂，将压模压印到抗蚀剂上以转印突起和凹陷的图案，以及在不覆盖图案的区域中部分蚀刻磁记录层通过使用He和N2的混合气体的离子束蚀刻用作掩模的抗蚀剂以及修改磁记录层的剩余部分留下厚度减小的非磁性层。

6. 发明申请

US20100018947A1 METHOD OF MANUFACTURING MAGNETIC RECORDING MEDIUM 有权
标题翻译：制造磁记录介质的方法
公开(公告)号：US20100018947A1
公开(公告)日：2010-01-28
申请号：US12509261
申请日：2009-07-24
申请人： Kaori Kimura , Yousuke Isowaki , Yoshiyuki Kamata , Masatoshi Sakurai
发明人： Kaori Kimura , Yousuke Isowaki , Yoshiyuki Kamata , Masatoshi Sakurai
IPC分类号： G11B5/84
CPC分类号： G11B5/855 , G11B5/72
摘要： According to one embodiment, a method of manufacturing a magnetic recording medium includes forming a magnetic recording layer, an oxidation inhibiting layer, a hard mask layer includes carbon on a substrate, coating the hard mask layer with a resist, transferring patterns of protrusions and recesses to the resist by imprinting to form resist patterns, sequentially performing etching of the hard mask layer using the resist patterns as masks, etching of the oxidation inhibiting layer, and etching and/or magnetism deactivation of the magnetic recording layer to form patterns of the magnetic recording layer, and sequentially performing stripping of the resist patterns, stripping of the hard mask layer and stripping of the oxidation inhibiting layer, in which ion beam etching is used for stripping the oxidation inhibiting layer.
摘要翻译：根据一个实施例，制造磁记录介质的方法包括形成磁记录层，氧化抑制层，硬掩模层包括在基板上的碳，用抗蚀剂涂覆硬掩模层，转移凸起和凹槽的图案通过压印形成抗蚀剂以形成抗蚀剂图案，使用抗蚀剂图案作为掩模，蚀刻氧化抑制层顺序地进行硬掩模层的蚀刻，以及磁记录层的蚀刻和/或磁性失活以形成磁性图案记录层，顺序地进行剥离抗蚀剂图案，汽提硬掩模层和剥离氧化抑制层，其中使用离子束蚀刻来剥离氧化抑制层。

7. 发明申请

US20100018946A1 METHOD OF MANUFACTURING MAGNETIC RECORDING MEDIUM 有权
标题翻译：制造磁记录介质的方法
公开(公告)号：US20100018946A1
公开(公告)日：2010-01-28
申请号：US12508269
申请日：2009-07-23
申请人： Yousuke Isowaki , Kaori Kimura , Yoshiyuki Kamata , Masatoshi Sakurai
发明人： Yousuke Isowaki , Kaori Kimura , Yoshiyuki Kamata , Masatoshi Sakurai
IPC分类号： G11B3/70
CPC分类号： G11B5/865 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G11B5/743 , G11B5/82 , G11B5/855
摘要： According to one embodiment, a method of manufacturing a magnetic recording medium includes forming a hard mask and a resist on a magnetic recording layer, imprinting a stamper on the resist to transfer patterns of protrusions and recesses, removing resist residues left in the recesses of the patterned resist, etching the hard mask using the patterned resist as a mask to transfer the patterns of protrusions and recesses, stripping the resist, and performing ion beam etching to remove the remaining hard mask and to modify a surface of the magnetic recording layer uncovered with the remaining hard mask.
摘要翻译：根据一个实施例，一种制造磁记录介质的方法包括在磁记录层上形成硬掩模和抗蚀剂，在抗蚀剂上印刷压模以转移突起和凹槽的图案，去除留在凹槽中的抗蚀剂残留物使用图案化的抗蚀剂作为掩模蚀刻硬掩模，以转移突起和凹陷的图案，剥离抗蚀剂，并执行离子束蚀刻以去除剩余的硬掩模并修改未覆盖的磁记录层的表面剩下的硬面罩。

8. 发明授权

US08012361B2 Method of manufacturing magnetic recording medium 有权
标题翻译：磁记录介质的制造方法
公开(公告)号：US08012361B2
公开(公告)日：2011-09-06
申请号：US12705421
申请日：2010-02-12
申请人： Kaori Kimura , Yousuke Isowaki , Yoshiyuki Kamata , Masatoshi Sakurai
发明人： Kaori Kimura , Yousuke Isowaki , Yoshiyuki Kamata , Masatoshi Sakurai
IPC分类号： B44C1/22
CPC分类号： C23F4/00 , B82Y10/00 , G11B5/743 , G11B5/746 , G11B5/855 , G11B5/865
摘要： According to one embodiment, a method of manufacturing a magnetic recording medium includes forming a first hard mask, a second hard mask and a resist on a magnetic recording layer, imprinting a stamper to the resist to transfer patterns of protrusions and recesses to the resist, removing residues remaining in the recesses of the patterned resist, etching the second hard mask by using the patterned resist as a mask to transfer the patterns of protrusions and recesses to the second hard mask, etching the first hard mask by using the second hard mask as a mask to transfer the patterns of protrusions and recesses to the first hard mask, removing the second hard mask remaining on the protrusions of the first hard mask, and deactivating the magnetic recording layer exposed in the recesses by means of ion beam irradiation.
摘要翻译：根据一个实施例，一种制造磁记录介质的方法包括在磁记录层上形成第一硬掩模，第二硬掩模和抗蚀剂，将压模压印到抗蚀剂上，以将凹凸图案转印到抗蚀剂上，去除残留在图案化抗蚀剂的凹部中的残留物，通过使用图案化抗蚀剂作为掩模蚀刻第二硬掩模以将突起和凹陷的图案转移到第二硬掩模，通过使用第二硬掩模蚀刻第一硬掩模用于将突起和凹陷的图案转移到第一硬掩模的掩模，去除残留在第一硬掩模的突起上的第二硬掩模，以及通过离子束照射去除在凹部中暴露的磁记录层。

9. 发明授权

US08002997B2 Method of manufacturing magnetic recording medium and magnetic recording medium 有权
公开(公告)号：US08002997B2
公开(公告)日：2011-08-23
申请号：US12544606
申请日：2009-08-20
申请人： Yoshiyuki Kamata , Kaori Kimura , Yousuke Isowaki , Masatoshi Sakurai
发明人： Yoshiyuki Kamata , Kaori Kimura , Yousuke Isowaki , Masatoshi Sakurai
IPC分类号： B44C1/22
CPC分类号： G11B5/855 , B82Y10/00 , G11B5/743
摘要： According to one embodiment, a method of manufacturing a magnetic recording medium includes forming a resist on a magnetic recording layer, imprinting a stamper to the resist to transfer patterns of protrusions and recesses, and partially etching the magnetic recording layer in areas not covered with patterns of the resist used as masks by ion beam etching using a mixed gas of He and N2 as well as modifying a remainder of the magnetic recording layer to leave behind a nonmagnetic layer having a reduced thickness.

10. 发明申请

US20100214695A1 METHOD OF MANUFACTURING MAGNETIC RECORDING MEDIUM 有权
标题翻译：制造磁记录介质的方法
公开(公告)号：US20100214695A1
公开(公告)日：2010-08-26
申请号：US12705490
申请日：2010-02-12
申请人： Yousuke Isowaki , Kaori Kimura , Yoshiyuki Kamata , Masatoshi Sakurai
发明人： Yousuke Isowaki , Kaori Kimura , Yoshiyuki Kamata , Masatoshi Sakurai
IPC分类号： B44C1/22 , G11B5/82
CPC分类号： G11B5/865 , B82Y10/00 , G11B5/743 , G11B5/746 , G11B5/855
摘要： According to one embodiment, a method of manufacturing a magnetic recording medium includes forming a first hard mask, a second hard mask and a resist on a magnetic recording layer, imprinting a stamper to the resist to transfer patterns of protrusions and recesses to the resist, removing residues remaining in the recesses of the patterned resist by means of a first etching gas, etching the second hard mask by means of the first etching gas using the patterned resist as a mask to transfer the patterns to the second hard mask, etching the first hard mask by means of a second etching gas different from the first etching gas using the second hard mask as a mask to transfer the patterns to the first hard mask, and performing ion beam etching in order to deactivate the magnetic recording layer exposed in the recesses and to remove the second hard mask.
摘要翻译：根据一个实施例，一种制造磁记录介质的方法包括在磁记录层上形成第一硬掩模，第二硬掩模和抗蚀剂，将压模压印到抗蚀剂上，以将凹凸图案转印到抗蚀剂上，通过第一蚀刻气体去除残留在图案化抗蚀剂的凹部中的残留物，利用第一蚀刻气体，使用图案化抗蚀剂作为掩模蚀刻第二硬掩模，以将图案转移到第二硬掩模，蚀刻第一通过不同于使用第二硬掩模的第一蚀刻气体作为掩模的第二蚀刻气体将硬掩模转印到第一硬掩模，并且执行离子束蚀刻以使暴露在凹部中的磁记录层失活并移除第二个硬掩模。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式