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    • 1. 发明授权
    • Magnetic recording medium and method of manufacturing
    • 磁记录介质及其制造方法
    • US09028704B2
    • 2015-05-12
    • US13659749
    • 2012-10-24
    • Kazutaka TakizawaAkira WatanabeKaori KimuraTakeshi IwasakiAkihiko Takeo
    • Kazutaka TakizawaAkira WatanabeKaori KimuraTakeshi IwasakiAkihiko Takeo
    • B44C1/22G11B5/31
    • G11B5/3163G11B5/3116G11B5/82G11B5/855
    • A manufacturing method of a magnetic recording medium includes follows: forming a magnetic recording layer on a substrate; forming an under layer and a metal release layer that forms an alloy with the under layer on the magnetic recording layer in this order and forming an alloyed release layer by alloying the under layer and the metal release layer; forming a mask layer on the alloyed release layer; forming a resist layer on the mask layer; providing a protrusion-recess pattern by patterning the resist layer; transferring the protrusion-recess pattern to the mask layer; transferring the protrusion-recess pattern to the alloyed release layer; transferring the protrusion-recess pattern to the magnetic recording layer; dissolving the alloyed release layer by using a stripping solution and removing a layer formed on the alloyed release layer from an upper side of the magnetic recording layer.
    • 磁记录介质的制造方法如下:在基板上形成磁记录层; 形成下层和金属剥离层,其与磁性记录层上的下层依次形成合金,并通过使底层和金属剥离层合金化而形成合金剥离层; 在合金剥离层上形成掩模层; 在掩模层上形成抗蚀剂层; 通过图案化抗蚀剂层提供突起 - 凹陷图案; 将突起凹部图案转印到掩模层; 将所述突起凹部图案转印到所述合金剥离层; 将突起凹部图案转印到磁记录层; 通过使用剥离溶液溶解合金剥离层,并从磁记录层的上侧除去在合金剥离层上形成的层。
    • 8. 发明授权
    • Method of manufacturing magnetic recording medium
    • 磁记录介质的制造方法
    • US08057689B2
    • 2011-11-15
    • US12705490
    • 2010-02-12
    • Yousuke IsowakiKaori KimuraYoshiyuki KamataMasatoshi Sakurai
    • Yousuke IsowakiKaori KimuraYoshiyuki KamataMasatoshi Sakurai
    • B44C1/22
    • G11B5/865B82Y10/00G11B5/743G11B5/746G11B5/855
    • According to one embodiment, a method of manufacturing a magnetic recording medium includes forming a first hard mask, a second hard mask and a resist on a magnetic recording layer, imprinting a stamper to the resist to transfer patterns of protrusions and recesses to the resist, removing residues remaining in the recesses of the patterned resist by means of a first etching gas, etching the second hard mask by means of the first etching gas using the patterned resist as a mask to transfer the patterns to the second hard mask, etching the first hard mask by means of a second etching gas different from the first etching gas using the second hard mask as a mask to transfer the patterns to the first hard mask, and performing ion beam etching in order to deactivate the magnetic recording layer exposed in the recesses and to remove the second hard mask.
    • 根据一个实施例,一种制造磁记录介质的方法包括在磁记录层上形成第一硬掩模,第二硬掩模和抗蚀剂,将压模压印到抗蚀剂上,以将凹凸图案转印到抗蚀剂上, 通过第一蚀刻气体去除残留在图案化抗蚀剂的凹部中的残留物,利用第一蚀刻气体,使用图案化抗蚀剂作为掩模蚀刻第二硬掩模,以将图案转移到第二硬掩模,蚀刻第一 通过不同于使用第二硬掩模的第一蚀刻气体作为掩模的第二蚀刻气体将硬掩模转印到第一硬掩模,并且执行离子束蚀刻以使暴露在凹部中的磁记录层失活 并移除第二个硬掩模。