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1. 发明授权

US10160093B2 Carrier head membrane roughness to control polishing rate 有权
公开(公告)号：US10160093B2
公开(公告)日：2018-12-25
申请号：US12631557
申请日：2009-12-04
申请人： Young J. Paik , Ashish Bhatnagar , Kadthala Ramaya Narendrnath
发明人： Young J. Paik , Ashish Bhatnagar , Kadthala Ramaya Narendrnath
IPC分类号： H01L21/321 , B24B41/06 , B24B7/20 , B24B37/30 , B24B37/32
摘要： An apparatus comprises a flexible membrane for use with a carrier head of a substrate chemical mechanical polishing apparatus. The membrane comprises an outer surface providing a substrate receiving surface, wherein the outer surface has a central portion and an edge portion surrounding the central portion, wherein the central portion has a first surface roughness and the edge portion has a second surface roughness, the first surface roughness being greater than the second surface roughness.

2. 发明授权

US08662957B2 Leak proof pad for CMP endpoint detection 有权
标题翻译：用于CMP终点检测的防漏垫
公开(公告)号：US08662957B2
公开(公告)日：2014-03-04
申请号：US12825276
申请日：2010-06-28
申请人： Young J. Paik , Christopher R. Mahon , Ashish Bhatnagar , Kadthala Ramaya Narendrnath
发明人： Young J. Paik , Christopher R. Mahon , Ashish Bhatnagar , Kadthala Ramaya Narendrnath
IPC分类号： B24B49/00
CPC分类号： B24B37/205 , B24B37/26 , B24B49/12
摘要： In one aspect, a polishing pad includes a homogeneous unitary polishing layer having a polishing surface, an opposed bottom surface, a recess in the polishing surface extending partially but not entirely through the polishing layer, and a solid light-transmissive window is secured in the recess. In another aspect, a polishing pad includes a polishing layer having a polishing surface, and the polishing surface includes a first region having a first plurality of grooves with a first depth extending partially but not entirely through the polishing layer and a second region surrounded by the first region and having a second plurality of grooves with a second depth extending partially but not entirely through the polishing layer, the second depth greater than the first depth.
摘要翻译：在一个方面，抛光垫包括具有研磨表面，相对的底表面，抛光表面中的部分但不完全延伸穿过抛光层的凹部的均匀单一抛光层，并且固体透光窗口固定在休息。在另一方面，抛光垫包括具有抛光表面的抛光层，并且抛光表面包括具有第一多个凹槽的第一区域，该第一区域具有部分但不完全延伸穿过该抛光层的第一深度和由该抛光层包围的第二区域第一区域并且具有第二多个凹槽，其具有部分但不完全延伸穿过抛光层的第二深度，第二深度大于第一深度。

3. 发明申请

US20100330879A1 LEAK PROOF PAD FOR CMP ENDPOINT DETECTION 有权
标题翻译：用于CMP端点检测的漏电防伪焊盘
公开(公告)号：US20100330879A1
公开(公告)日：2010-12-30
申请号：US12825276
申请日：2010-06-28
申请人： Young J. Paik , Christopher R. Mahon , Ashish Bhatnagar , Kadthala Ramaya Narendrnath
发明人： Young J. Paik , Christopher R. Mahon , Ashish Bhatnagar , Kadthala Ramaya Narendrnath
IPC分类号： B24D11/00 , B24B49/12
CPC分类号： B24B37/205 , B24B37/26 , B24B49/12
摘要： In one aspect, a polishing pad includes a homogeneous unitary polishing layer having a polishing surface, an opposed bottom surface, a recess in the polishing surface extending partially but not entirely through the polishing layer, and a solid light-transmissive window is secured in the recess. In another aspect, a polishing pad includes a polishing layer having a polishing surface, and the polishing surface includes a first region having a first plurality of grooves with a first depth extending partially but not entirely through the polishing layer and a second region surrounded by the first region and having a second plurality of grooves with a second depth extending partially but not entirely through the polishing layer, the second depth greater than the first depth.
摘要翻译：在一个方面，抛光垫包括具有研磨表面，相对的底表面，抛光表面中的部分但不完全延伸穿过抛光层的凹部的均匀单一抛光层，并且固体透光窗口固定在休息。在另一方面，抛光垫包括具有抛光表面的抛光层，并且抛光表面包括具有第一多个凹槽的第一区域，该第一区域具有部分但不完全延伸穿过该抛光层的第一深度和由该抛光层包围的第二区域第一区域并且具有第二多个凹槽，其具有部分但不完全延伸穿过抛光层的第二深度，第二深度大于第一深度。

4. 发明申请

US20100311311A1 Carrier Head Membrane 有权
标题翻译：载体膜
公开(公告)号：US20100311311A1
公开(公告)日：2010-12-09
申请号：US12631239
申请日：2009-12-04
申请人： Young J. Paik , Ashish Bhatnagar , Kadthala Ramaya Narendrnath
发明人： Young J. Paik , Ashish Bhatnagar , Kadthala Ramaya Narendrnath
IPC分类号： B24B1/00 , B24B41/06
CPC分类号： B24B37/30
摘要： A flexible membrane includes a horizontal central portion, a vertical portion coupled to the central portion, a thick rim portion coupled to the vertical portion, and an extension coupled to the thick rim portion. An outer surface of the horizontal central portion provides a mounting surface configured to receive a substrate. The thick rim portion has a thickness that is greater than a portion directly adjacent to the thick rim portion. The thick rim portion is between the extension and the vertical portion and a greatest dimension of the extension is less than the thickness of the thick rim portion.
摘要翻译：柔性膜包括水平中心部分，连接到中心部分的垂直部分，耦合到垂直部分的厚边缘部分，以及连接到厚边缘部分的延伸部分。水平中心部分的外表面提供了构造成接收基底的安装表面。厚边缘部分的厚度大于与厚边缘部分直接相邻的部分。厚边缘部分在延伸部分和垂直部分之间，并且延伸部分的最大尺寸小于厚边缘部分的厚度。

5. 发明授权

US08475231B2 Carrier head membrane 有权
标题翻译：载体膜
公开(公告)号：US08475231B2
公开(公告)日：2013-07-02
申请号：US12631239
申请日：2009-12-04
申请人： Young J. Paik , Ashish Bhatnagar , Kadthala Ramaya Narendrnath
发明人： Young J. Paik , Ashish Bhatnagar , Kadthala Ramaya Narendrnath
IPC分类号： B24B1/00 , B24B5/00
CPC分类号： B24B37/30
摘要： A flexible membrane includes a horizontal central portion, a vertical portion coupled to the central portion, a thick rim portion coupled to the vertical portion, and an extension coupled to the thick rim portion. An outer surface of the horizontal central portion provides a mounting surface configured to receive a substrate. The thick rim portion has a thickness that is greater than a portion directly adjacent to the thick rim portion. The thick rim portion is between the extension and the vertical portion and a greatest dimension of the extension is less than the thickness of the thick rim portion.
摘要翻译：柔性膜包括水平中心部分，连接到中心部分的垂直部分，耦合到垂直部分的厚边缘部分和连接到厚边缘部分的延伸部分。水平中心部分的外表面提供了构造成接收基底的安装表面。厚边缘部分的厚度大于与厚边缘部分直接相邻的部分。厚边缘部分在延伸部分和垂直部分之间，并且延伸部分的最大尺寸小于厚边缘部分的厚度。

6. 发明申请

US20100173566A1 Carrier Head Membrane Roughness to Control Polishing Rate 审中-公开
标题翻译：载体头膜粗糙度来控制抛光速率
公开(公告)号：US20100173566A1
公开(公告)日：2010-07-08
申请号：US12631557
申请日：2009-12-04
申请人： Young J. Paik , Ashish Bhatnagar , Kadthala Ramaya Narendrnath
发明人： Young J. Paik , Ashish Bhatnagar , Kadthala Ramaya Narendrnath
IPC分类号： B24B41/06 , B24B7/20
CPC分类号： B24B37/30 , B24B37/32 , H01L21/3212
摘要： An apparatus comprises a flexible membrane for use with a carrier head of a substrate chemical mechanical polishing apparatus. The membrane comprises an outer surface providing a substrate receiving surface, wherein the outer surface has a central portion and an edge portion surrounding the central portion, wherein the central portion has a first surface roughness and the edge portion has a second surface roughness, the first surface roughness being greater than the second surface roughness.
摘要翻译：一种装置包括用于与基板化学机械抛光装置的载体头一起使用的柔性膜。膜包括提供基板接收表面的外表面，其中外表面具有中心部分和围绕中心部分的边缘部分，其中中心部分具有第一表面粗糙度，并且边缘部分具有第二表面粗糙度，第一表面粗糙度大于第二表面粗糙度。

7. 发明申请

US20110105000A1 Chemical Mechanical Planarization Pad With Surface Characteristics 审中-公开
标题翻译：具有表面特性的化学机械平面化垫
公开(公告)号：US20110105000A1
公开(公告)日：2011-05-05
申请号：US12891612
申请日：2010-09-27
申请人： Yongqi Hu , Kadthala Ramaya Narendrnath , Ashish Bhatnagar
发明人： Yongqi Hu , Kadthala Ramaya Narendrnath , Ashish Bhatnagar
IPC分类号： B24B41/00 , B24D3/32 , B24D3/34
CPC分类号： B24B37/24 , B24D3/32 , B24D3/344 , B24D3/346
摘要： A polishing pad includes a polymer matrix and polyhedral oligomeric silsequioxane (“POSS”) molecules or soluble particles and a surfactant dispersed within the polymer matrix. A polishing pad can be formed by casting a liquid polymer on a conveyer belt having a casting surface with a set of projections and curing the liquid polymer on the conveyer belt such that a polymer matrix has a surface with a second set of projections complimentary to the first set of projections.
摘要翻译：抛光垫包括分散在聚合物基体内的聚合物基质和多面体低聚硅氧烷（“POSS”）分子或可溶性颗粒和表面活性剂。可以通过在具有铸造表面的输送带上浇铸具有一组突起的液体聚合物并将液体聚合物固化在输送带上的方法来形成抛光垫，使得聚合物基质具有与第二组突起互补的表面第一套预测。

8. 发明申请

US20090034148A1 Method of making an electrostatic chuck with reduced plasma penetration and arcing 有权
标题翻译：制造具有降低的等离子体穿透和电弧放电的静电卡盘的方法
公开(公告)号：US20090034148A1
公开(公告)日：2009-02-05
申请号：US11888327
申请日：2007-07-31
申请人： Dmitry Lubomirsky , Xinglong Chen , Sudhir Gondhalekar , Kadthala Ramaya Narendrnath , Muhammad Rasheed , Tony Kaushal
发明人： Dmitry Lubomirsky , Xinglong Chen , Sudhir Gondhalekar , Kadthala Ramaya Narendrnath , Muhammad Rasheed , Tony Kaushal
IPC分类号： H02N13/00
CPC分类号： H02N13/00 , H01L21/6833 , Y10T29/49117 , Y10T29/49885
摘要： A method of making an electrostatic chuck comprising positioning a plate into a channel in a body to form a plenum and inserting a dielectric component into an opening in the plate, where the dielectric component defines a portion of a passage from the plenum. Thereafter, depositing a dielectric layer covering at least a portion of the body and at least a portion of the plate to form a support surface. The dielectric layer is polished to a specified thickness. In one embodiment, the polishing process forms an opening through the dielectric layer to enable the dielectric component to define a passage between the support surface and the plenum. In another embodiment, at least a portion of the dielectric layer is porous proximate the dielectric component such that the porous dielectric layer and the dielectric component form a passage between the support surface and the plenum. In a further embodiment, a hole is formed through the dielectric layer and the hole in the dielectric layer and the dielectric component form a passage between the support surface and the plenum.
摘要翻译：一种制造静电卡盘的方法，包括将板定位在主体中的通道中以形成气室，并将电介质部件插入板中的开口中，其中介电部件限定了来自气室的通道的一部分。此后，沉积覆盖主体的至少一部分和板的至少一部分以形成支撑表面的电介质层。将电介质层抛光至规定的厚度。在一个实施例中，抛光工艺形成通过介电层的开口，以使得介质部件能够在支撑表面和集气室之间限定通道。在另一个实施例中，电介质层的至少一部分在绝缘元件附近是多孔的，使得多孔介电层和电介质元件在支撑表面和增压室之间形成通道。在另一实施例中，穿过电介质层形成孔，并且电介质层中的孔和电介质元件在支撑表面和气室之间形成通道。

9. 发明申请

US20090034147A1 Method and apparatus for providing an electrostatic chuck with reduced plasma penetration and arcing 有权
标题翻译：用于提供具有降低的等离子体穿透和电弧放电的静电卡盘的方法和装置
公开(公告)号：US20090034147A1
公开(公告)日：2009-02-05
申请号：US11888311
申请日：2007-07-31
申请人： Kadthala Ramaya Narendrnath , Xinglong Chen , Sudhir Gondhalekar , Dmitry Lubomirsky , Muhammad Rasheed , Tony Kaushal
发明人： Kadthala Ramaya Narendrnath , Xinglong Chen , Sudhir Gondhalekar , Dmitry Lubomirsky , Muhammad Rasheed , Tony Kaushal
IPC分类号： H01L21/683 , H01L21/67
CPC分类号： H01L21/6831 , H01L21/6833 , Y10T279/23
摘要： A method and apparatus for providing a fluid distribution element for an electrostatic chuck that reduces plasma formation and arcing within heat transfer fluid passages. One embodiment comprises a plate and a dielectric component, where the dielectric component is inserted into the plate. The plate is adapted to be positioned within a channel to define a plenum, wherein the dielectric component provides at least a portion of a fluid passage coupled to the plenum. A porous dielectric layer, formed upon the dielectric component, provides at least another portion of a fluid passage coupled to the plenum. In other embodiments, the fluid distribution element comprises various arrangements of components to define a fluid passage that does not provide a line-of-sight path from the support surface for a substrate to a plenum.
摘要翻译：一种用于提供用于静电卡盘的流体分配元件的方法和装置，其减少了传热流体通道内的等离子体形成和电弧。一个实施例包括板和电介质部件，其中介电部件插入板中。板适于被定位在通道内以限定通风室，其中介电部件提供耦合到集气室的流体通道的至少一部分。形成在电介质部件上的多孔介电层提供至少另一部分与气室相连的流体通道。在其他实施例中，流体分配元件包括各种组件的布置，以限定流体通道，该流体通道不提供从用于基底的支撑表面到气室的视线路径。

10. 发明授权

US09202736B2 Method for refurbishing an electrostatic chuck with reduced plasma penetration and arcing 有权
公开(公告)号：US09202736B2
公开(公告)日：2015-12-01
申请号：US11888341
申请日：2007-07-31
申请人： Kadthala Ramaya Narendrnath , Dmitry Lubomirsky , Xinglong Chen , Sudhir Gondhalekar , Muhammad Rasheed , Tony Kaushal
发明人： Kadthala Ramaya Narendrnath , Dmitry Lubomirsky , Xinglong Chen , Sudhir Gondhalekar , Muhammad Rasheed , Tony Kaushal
IPC分类号： B23P6/00 , H01L21/683 , H02N13/00
CPC分类号： H01L21/6833 , B23P6/00 , H02N13/00
摘要： A method for refurbishing at least a portion of an electrostatic chuck. The method comprises removing a first dielectric component from a fluid distribution element of the electrostatic chuck and replacing the first dielectric component with a second dielectric component.

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