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    • 2. 发明授权
    • Solid-state image sensor
    • 固态图像传感器
    • US06521925B1
    • 2003-02-18
    • US09537745
    • 2000-03-30
    • Akiko MoriHisanori IharaTetsuya YamaguchiHiroaki IshiwataHidetoshi Nozaki
    • Akiko MoriHisanori IharaTetsuya YamaguchiHiroaki IshiwataHidetoshi Nozaki
    • H01L31062
    • H01L29/0847H01L27/14603H01L27/14609H01L27/14643H01L27/14654H01L31/0352
    • A solid-state image sensor comprises a photodiode which is provided in a p-type substrate or a p-type well and composed of a first n-type region for storing photoelectrically converted signal charges, a gate electrode provided above the substrate or well so as to be adjacent to one end of the photodiode, and a n-type drain provided at the surface of the substrate or well opposite to the photodiode, with the gate electrode interviewing therebetween. There is provided a second n-type region which is formed so as to be in contact with the upper part of the first n-type region on the gate electrode side and one end of which is formed to self-align with one end of the gate electrode to be part of the photodiode. This construction prevents the short-channel effect of the signal read transistor section and reduces or eradicates the left-over signal charges stored in the photodiode, thereby reducing noise and improving the sensitivity of the sensor.
    • 固态图像传感器包括设置在p型衬底或p型阱中并由用于存储光电转换的信号电荷的第一n型区域,设置在衬底或阱上方的栅电极组成的光电二极管, 与光电二极管的一端相邻,以及设置在基板的表面或与光电二极管相对的阱的n型漏极,门电极与其间进行访问。 提供了第二n型区域,其形成为与栅极电极侧上的第一n型区域的上部接触,并且其一端形成为与第一n型区域的一端自对准 栅电极成为光电二极管的一部分。 这种结构防止信号读取晶体管部分的短沟道效应,并且减少或消除存储在光电二极管中的剩余信号电荷,从而降低噪声并提高传感器的灵敏度。
    • 9. 发明授权
    • Solid state image sensor
    • 固态图像传感器
    • US6072206A
    • 2000-06-06
    • US272339
    • 1999-03-19
    • Hirofumi YamashitaIkuko InoueTetsuya YamaguchiHisanori IharaHidetoshi Nozaki
    • Hirofumi YamashitaIkuko InoueTetsuya YamaguchiHisanori IharaHidetoshi Nozaki
    • H01L27/146H01L31/0352H04N5/335H04N5/361H04N5/369H04N5/374H04N5/3745H01L31/062H01L31/113
    • H01L27/14609H01L27/14643H01L31/03529Y02E10/50
    • The present invention provides a solid state image sensor constructed in such a manner that, even if the impurity concentration of the wells of a transistors is increased, the junction leakage current does not increase, and thus, the picture quality of the reproduced picture is not deteriorated. On a p-type substrate, there are formed a first p-type well for a photoelectric conversion portion comprising a photodiode, and a second p-type well for a signal scanning circuit portion. In the surface portions of the first and second p-type wells, a first and a second n-type diffused layers are formed, respectively. The drain of a reset transistor and the drain of an amplifying transistor which constitute the second n-type diffused layer are connected to a power supply line. Further, the source of an address transistor which is an n-type diffused layer is connected to a vertical signal line. The gates of the amplifying transistor and the address transistor are formed between second n-type diffused layers disposed at predetermined intervals on the surface of the second p-type well.
    • 本发明提供了一种固态图像传感器,其构造方式是,即使晶体管的阱的杂质浓度增加,结漏电流也不增加,因此再现图像的图像质量不是 恶化 在p型衬底上形成有用于光电转换部分的第一p型阱以及用于信号扫描电路部分的第二p型阱。 在第一和第二p型阱的表面部分分别形成第一和第二n型扩散层。 构成第二n型扩散层的复位晶体管的漏极和放大晶体管的漏极连接到电源线。 此外,作为n型扩散层的地址晶体管的源极连接到垂直信号线。 放大晶体管和地址晶体管的栅极形成在第二p型阱的表面上以预定间隔设置的第二n型扩散层之间。