专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US5962083A Methods of depositing films on polymer substrates 失效
标题翻译：在聚合物基材上沉积膜的方法
公开(公告)号：US5962083A
公开(公告)日：1999-10-05
申请号：US664959
申请日：1996-06-13
申请人： Yoshinori Hatanaka , Yoichiro Nakanishi , Sunil Wickramanayaka , Keiichiro Sano , Masaya Nomura , Shigekazu Hayashi
发明人： Yoshinori Hatanaka , Yoichiro Nakanishi , Sunil Wickramanayaka , Keiichiro Sano , Masaya Nomura , Shigekazu Hayashi
IPC分类号： C08J7/00 , C08J7/06 , C08J7/18 , C23C16/40 , C23C16/511 , H01J37/32 , H05H1/18
CPC分类号： H01J37/32192 , C23C16/402 , C23C16/511 , H01J37/32678
摘要： A method of depositing a thin film on a polymer substrate by plasma CVD comprises applying a magnetic field to a plasma generating chamber by activating a magnetic coil placed in the circumference of the plasma generating chamber, the plasma generating chamber having an inlet; introducing a microwave into the plasma generating chamber; introducing an upstream gas into the plasma generating chamber wherein an ECR plasma is generated; vaporizing a feed gas wherein a supply gas is generated and carries the ECR plasma; passing said ECR plasma through a mesh provided between the inlet and a polymer substrate located downstream of the inlet; and depositing a film on the surface of the polymer substrate.
摘要翻译：通过等离子体CVD在聚合物基板上沉积薄膜的方法包括通过激活置于等离子体发生室周围的电磁线圈将等离子体产生室施加磁场，等离子体产生室具有入口; 将微波引入等离子体发生室; 将上游气体引入等离子体发生室，其中产生ECR等离子体; 蒸发进料气体，其中产生供应气体并携带ECR等离子体; 使所述ECR等离子体通过提供在入口和位于入口下游的聚合物基底之间的网格; 以及在所述聚合物基材的表面上沉积膜。

2. 发明授权

US06372304B1 Method and apparatus for forming SiC thin film on high polymer base material by plasma CVD 失效
标题翻译：通过等离子体CVD在高聚物基材上形成SiC薄膜的方法和装置
公开(公告)号：US06372304B1
公开(公告)日：2002-04-16
申请号：US08888954
申请日：1997-07-07
申请人： Keiichiro Sano , Masaya Nomura , Hiroaki Tamamaki , Yoshinori Hatanaka
发明人： Keiichiro Sano , Masaya Nomura , Hiroaki Tamamaki , Yoshinori Hatanaka
IPC分类号： C23C1632
CPC分类号： C23C16/325 , C23C16/511
摘要： A high quality transparent SiC thin film can be deposited on the surface of a plastic material at low temperature utilizing Electron Cyclotron Resonance (ECR) Plasma CVD techniques, thereby enhancing surfacial hardness without spoiling designability. A magnetic field is applied to a plasma generating chamber by means of a surrounding magnetic coil. Microwaves are then introduced into the plasma generating chamber. Further, an upstream gas is introduced into the plasma generating chamber. ECR plasma is thus generated. A downstream gas is then supplied to the chamber from an inlet. Furthermore, the ECR plasma is passed through a mesh placed between the inlet and a polymer base material or between the plasma generating chamber and the inlet. Accordingly, a SiC film is deposited on a surface of a polymer base material.
摘要翻译：使用电子回旋共振（ECR）等离子体CVD技术，可以在低温下在塑料材料的表面上沉积高质量的透明SiC薄膜，从而提高表面硬度，而不破坏可设计性。通过周围的电磁线圈将磁场施加到等离子体发生室。然后将微波引入等离子体发生室。此外，上游气体被引入到等离子体产生室中。从而产生ECR等离子体。然后从入口将下游气体供应到室。此外，ECR等离子体通过放置在入口和聚合物基材之间或者等离子体产生室和入口之间的网。因此，在聚合物基材的表面上沉积SiC膜。

3. 发明授权

US5536577A Magnetic recording medium comprising a protective layer and a lubricant layer which contains a host multidentate ligand and a guest reversibly trapped lubricant 失效
标题翻译：磁记录介质包括保护层和含有主体多齿配体的润滑剂层和客体可逆地捕获的润滑剂
公开(公告)号：US5536577A
公开(公告)日：1996-07-16
申请号：US313909
申请日：1994-09-28
申请人： Hideki Murayama , Keiichiro Sano , Kazuhiko Sawada , Fumiaki Yokoyama , Haruhiko Ikeuchi , Yutaka Teranishi
发明人： Hideki Murayama , Keiichiro Sano , Kazuhiko Sawada , Fumiaki Yokoyama , Haruhiko Ikeuchi , Yutaka Teranishi
IPC分类号： B05D1/18 , C10M105/24 , C10M105/60 , C10M105/64 , C10M105/68 , C10M105/70 , C10M107/38 , C10M111/00 , G11B5/725 , G11B5/00
CPC分类号： B82Y30/00 , B05D1/185 , B82Y40/00 , C10M105/24 , C10M105/60 , C10M105/64 , C10M105/68 , C10M105/70 , C10M107/38 , G11B5/725 , C10M2207/021 , C10M2207/044 , C10M2207/125 , C10M2207/129 , C10M2213/00 , C10M2213/04 , C10M2213/06 , C10M2215/08 , C10M2215/082 , C10M2215/22 , C10M2215/221 , C10M2215/225 , C10M2215/226 , C10M2215/28 , C10M2215/30 , C10M2219/042 , C10M2219/044 , C10M2223/04 , C10M2223/042 , C10M2223/047 , C10N2210/01 , C10N2240/20 , C10N2240/201 , C10N2240/202 , C10N2240/203 , C10N2240/204 , C10N2240/205 , Y10S428/90 , Y10S428/91 , Y10T428/30 , Y10T428/31504 , Y10T428/31536
摘要： The lubricant layer according to the present invention is used in a thin film magnetic recording medium in which a solid surface sliding at a high speed is required to retain its lubricating performance and abrasion resistance for a long period of time, comprising a host-guest complex composed of a lubricant molecule as a guest molecule and a multidentate ligand as a host compound to form the complex with the guest molecule.
摘要翻译：根据本发明的润滑剂层用于其中需要高速滑动的固体表面以保持其长时间的润滑性能和耐磨性的薄膜磁记录介质，其包含主体 - 客体络合物由作为客体分子的润滑剂分子和作为主体化合物的多齿配体形成与客体分子的络合物。

4. 发明授权

US5830577A Surface having a coating of a host multidentate ligand and a reversibly trapped lubricant 失效
标题翻译：具有主体多齿配体和可逆捕获的润滑剂的涂层的表面
公开(公告)号：US5830577A
公开(公告)日：1998-11-03
申请号：US669810
申请日：1996-06-27
申请人： Hideki Murayama , Keiichiro Sano , Kazuhiko Sawada , Fumiaki Yokoyama , Haruhiko Ikeuchi , Yutaka Teranishi
发明人： Hideki Murayama , Keiichiro Sano , Kazuhiko Sawada , Fumiaki Yokoyama , Haruhiko Ikeuchi , Yutaka Teranishi
IPC分类号： B05D1/18 , C10M105/24 , C10M105/60 , C10M105/64 , C10M105/68 , C10M105/70 , C10M107/38 , C10M111/00 , G11B5/725
CPC分类号： B82Y30/00 , B05D1/185 , B82Y40/00 , C10M105/24 , C10M105/60 , C10M105/64 , C10M105/68 , C10M105/70 , C10M107/38 , G11B5/725 , C10M2207/021 , C10M2207/044 , C10M2207/125 , C10M2207/129 , C10M2213/00 , C10M2213/04 , C10M2213/06 , C10M2215/08 , C10M2215/082 , C10M2215/22 , C10M2215/221 , C10M2215/225 , C10M2215/226 , C10M2215/28 , C10M2215/30 , C10M2219/042 , C10M2219/044 , C10M2223/04 , C10M2223/042 , C10M2223/047 , C10N2210/01 , C10N2240/20 , C10N2240/201 , C10N2240/202 , C10N2240/203 , C10N2240/204 , C10N2240/205 , Y10S428/90 , Y10S428/91 , Y10T428/30 , Y10T428/31504 , Y10T428/31536
摘要： The lubricant layer according to the present invention is used in a thin film magnetic recording medium in which a solid surface sliding at a high speed is required to retain its lubricating performance and abrasion resistance for a long period of time, comprising a host-guest complex composed of a lubricant molecule as a guest molecule and a multidentate ligand as a host compound to form the complex with the guest molecule.
摘要翻译：根据本发明的润滑剂层用于其中需要高速滑动的固体表面以保持其长时间的润滑性能和耐磨性的薄膜磁记录介质，其包含主体 - 客体络合物由作为客体分子的润滑剂分子和作为主体化合物的多齿配体形成与客体分子的络合物。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式