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    • 3. 发明授权
    • Semiconductor laser device
    • 半导体激光器件
    • US08077753B2
    • 2011-12-13
    • US12594098
    • 2009-02-09
    • Shingo KameyamaYoshiki Murayama
    • Shingo KameyamaYoshiki Murayama
    • H01S5/00
    • H01S5/34333B82Y20/00H01S5/028H01S5/0287H01S5/2009H01S5/22H01S5/3063
    • A semiconductor laser device capable of improving the reliability of the laser device is obtained. This semiconductor laser device (1000) includes a semiconductor element layer (20) having a light emitting layer (25), a first cavity facet (1) formed on an end portion on a light emitting side of a region of the semiconductor element layer including the light emitting layer, a first insulating film (40) in which a first nitride film (41), a first intermediate film including a first oxide film (42) and a second nitride film (43) are formed on the first cavity facet in this order from the side of the first cavity facet and a second insulating film (51), formed on the first insulating film, including a second oxide film (51).
    • 获得能够提高激光装置的可靠性的半导体激光装置。 该半导体激光器件(1000)包括具有发光层(25)的半导体元件层(20),形成在半导体元件层的区域的发光侧的端部的第一空腔面(1) 发光层,第一绝缘膜(40),其中第一氮化物膜(41),包括第一氧化膜(42)和第二氮化物膜(43)的第一中间膜形成在第一空腔面上 从第一腔面的一侧开始并且形成在第一绝缘膜上的包括第二氧化膜的第二绝缘膜(51)。
    • 5. 发明申请
    • SEMICONDUCTOR LASER DEVICE
    • 半导体激光器件
    • US20100118908A1
    • 2010-05-13
    • US12594098
    • 2009-02-09
    • Shingo KameyamaYoshiki Murayama
    • Shingo KameyamaYoshiki Murayama
    • H01S5/323
    • H01S5/34333B82Y20/00H01S5/028H01S5/0287H01S5/2009H01S5/22H01S5/3063
    • A semiconductor laser device capable of improving the reliability of the laser device is obtained. This semiconductor laser device (1000) includes a semiconductor element layer (20) having a light emitting layer (25), a first cavity facet (1) formed on an end portion on a light emitting side of a region of the semiconductor element layer including the light emitting layer, a first insulating film (40) in which a first nitride film (41), a first intermediate film including a first oxide film (42) and a second nitride film (43) are formed on the first cavity facet in this order from the side of the first cavity facet and a second insulating film (51), formed on the first insulating film, including a second oxide film (51).
    • 获得能够提高激光装置的可靠性的半导体激光装置。 该半导体激光器件(1000)包括具有发光层(25)的半导体元件层(20),形成在半导体元件层的区域的发光侧的端部的第一空腔面(1) 发光层,第一绝缘膜(40),其中第一氮化物膜(41),包括第一氧化膜(42)和第二氮化物膜(43)的第一中间膜形成在第一空腔面上 从第一腔面的一侧开始并且形成在第一绝缘膜上的包括第二氧化膜的第二绝缘膜(51)。