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    • 2. 发明申请
    • NITRIDE-BASED SEMICONDUCTOR LASER ELEMENT AND OPTICAL APPARATUS
    • 基于氮化物的半导体激光元件和光学设备
    • US20120093186A1
    • 2012-04-19
    • US13273617
    • 2011-10-14
    • Yoshiki MURAYAMA
    • Yoshiki MURAYAMA
    • H01S5/02
    • H01S5/34333B82Y20/00H01S5/0287H01S5/4087
    • This nitride-based semiconductor laser element includes a semiconductor element layer made of a nitride-based semiconductor having an emitting-side cavity facet and a reflecting-side cavity facet, and a facet coating film formed on the emitting-side cavity facet. The facet coating film has a first dielectric film made of aluminum nitride formed in contact with the emitting-side cavity facet, a second dielectric film made of aluminum oxynitride formed on a side of the first dielectric film opposite to the emitting-side cavity facet, a third dielectric film made of aluminum oxide formed on a side of the second dielectric film opposite to the first dielectric film, a fourth dielectric film made of aluminum oxynitride formed on a side of the third dielectric film opposite to the second dielectric film, and a fifth dielectric film made of aluminum oxide formed on a side of the fourth dielectric film opposite to the third dielectric film.
    • 该氮化物系半导体激光元件包括由具有发光侧腔​​面和反射侧腔面的氮化物系半导体构成的半导体元件层,以及形成在发光侧腔面的小面涂膜。 所述小面涂膜具有由与发光侧腔面形成的氮化铝制成的第一电介质膜,在与所述发光侧腔面相对的所述第一电介质膜侧形成的由氧氮化铝构成的第二电介质膜, 在与第一电介质膜相反的第二电介质膜一侧形成的由氧化铝制成的第三电介质膜,形成在与第二电介质膜相反的第三电介质膜侧的由氧氮化铝制成的第四电介质膜, 形成在与第三电介质膜相反的第四电介质膜的一侧的由氧化铝制成的第五绝缘膜。