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1. 发明申请

US20080107372A1 Optical Control Device Having Light Modulation Film 失效
标题翻译：具有光调制膜的光控制装置
公开(公告)号：US20080107372A1
公开(公告)日：2008-05-08
申请号：US11795781
申请日：2006-01-19
申请人： Yoshikazu Fujimori , Tsuyoshi Fujii
发明人： Yoshikazu Fujimori , Tsuyoshi Fujii
IPC分类号： G02F1/035
CPC分类号： G02F1/21 , G02F1/055 , G02F2001/213 , G02F2203/12
摘要： A reflection-type light control apparatus featuring the improved light utilization efficiency is provided.A light control apparatus is provided with a plurality of pixels arranged two-dimensionally on a substrate. A first reflection layer is formed on the substrate. A light modulating film is provided on the top surface of the first reflection layer. As material for this light modulating film, electro-optical material, such as PLZT, whose refractive index changes according to an electric field applied is selected. A transparent electrode is provided on the top surface of the light modulating film. A second reflection layer is formed on the top surface of the transparent electrode. This second reflection layer is formed of a dielectric multilayer film, which is a stack of alternating first dielectric film and second dielectric film having different refractive indices. The first reflection layer, the light modulating film and the second reflection layer constitute a resonator. The transparent electrode and the first reflection layer form a pair of electrodes, and control the reflectance of a light control apparatus by varying the electric field applied to the light modulating film.
摘要翻译：提供了具有改进的光利用效率的反射型光控制装置。光控制装置具有在基板上二维排列的多个像素。在基板上形成第一反射层。光调制膜设置在第一反射层的顶表面上。作为该光调制膜的材料，选择其折射率根据施加的电场而变化的PLZT等电光材料。透明电极设置在光调制膜的顶表面上。在透明电极的顶表面上形成第二反射层。该第二反射层由电介质多层膜形成，其为具有不同折射率的交替的第一电介质膜和第二电介质膜的叠层。第一反射层，光调制膜和第二反射层构成谐振器。透明电极和第一反射层形成一对电极，并且通过改变施加到光调制膜的电场来控制光控制装置的反射率。

2. 发明授权

US07894115B2 Light control apparatus having light modulating film 失效
标题翻译：具有光调制膜的光控制装置
公开(公告)号：US07894115B2
公开(公告)日：2011-02-22
申请号：US11795781
申请日：2006-01-19
申请人： Yoshikazu Fujimori , Tsuyoshi Fujii
发明人： Yoshikazu Fujimori , Tsuyoshi Fujii
IPC分类号： G02F1/03
CPC分类号： G02F1/21 , G02F1/055 , G02F2001/213 , G02F2203/12
摘要： A light control apparatus may include a substrate, a first reflection layer provided on the substrate, a light modulating film provided on the first reflection layer, a second reflection layer provided on the light modulating film, and a pair of electrodes which applies an electric field to the light modulating film. The light modulating film ma have a refractive index controlled by the electric field.
摘要翻译：光控制装置可以包括基板，设置在基板上的第一反射层，设置在第一反射层上的光调制膜，设置在光调制膜上的第二反射层，以及施加电场的一对电极到光调制膜。光调制膜具有由电场控制的折射率。

3. 发明授权

US08154786B2 Light control device, semiconductor wafer, and light control system 有权
标题翻译：光控装置，半导体晶圆和光控系统
公开(公告)号：US08154786B2
公开(公告)日：2012-04-10
申请号：US12743929
申请日：2008-11-20
申请人： Yoshikazu Fujimori , Tsuyoshi Fujii
发明人： Yoshikazu Fujimori , Tsuyoshi Fujii
IPC分类号： G02F1/03
CPC分类号： G02F1/05 , G02F1/0136 , G02F2201/124
摘要： A light control device includes: a single crystal substrate (10); an electro-optic thin film (20) which is provided on the single crystal substrate (10) and has an electro-optic effect; and a plurality of electrodes (30, 40) which are provided along a crystal axis of the electro-optic thin film and apply an electrical field along the crystal axis of the electro-optic thin film (20).
摘要翻译：光控制装置包括：单晶基板（10）; 设置在单晶基板（10）上并具有电光效应的电光薄膜（20）以及沿着电光薄膜的晶轴设置并沿着电光薄膜（20）的晶轴施加电场的多个电极（30,40）。

4. 发明授权

US08144384B2 Light controller 失效
标题翻译：灯控制器
公开(公告)号：US08144384B2
公开(公告)日：2012-03-27
申请号：US12734951
申请日：2008-12-04
申请人： Yoshikazu Fujimori , Tatsuya Suzuki , Tsuyoshi Fujii , Satoru Tanaka
发明人： Yoshikazu Fujimori , Tatsuya Suzuki , Tsuyoshi Fujii , Satoru Tanaka
IPC分类号： G02B26/00
CPC分类号： G02F1/05 , G02F1/0311 , G02F1/0516 , G02F2203/12 , G03H2210/22 , G03H2223/13 , G03H2225/55 , G11B7/0065 , G11B7/128
摘要： To provide a light controller allowing for an enhanced positional precision in assembly of a spatial light modulator and a random phase mask, and to provide a light controller adapted to prevent positional deviations between a spatial light modulator and a random phase mask against impacts or vibrations, allowing for an enhanced operational integrity, a light controller includes a substrate, a light modulation unit disposed on the substrate and configured for modulation of light, and a random phase mask stacked on the light modulation unit on an optical axis of the light modulation unit.
摘要翻译：为了提供光控制器，其允许在空间光调制器和随机相位掩模的组装中提高位置精度，并且提供适于防止空间光调制器与随机相位掩模之间的位置偏差抵抗冲击或振动的光控制器，允许增强的操作完整性，光控制器包括衬底，设置在衬底上并被配置用于调制光的调光单元和在光调制单元的光轴上堆叠在光调制单元上的随机相位掩模。

5. 发明申请

US20110043890A1 LIGHT CONTROLLER 失效
标题翻译：灯控制器
公开(公告)号：US20110043890A1
公开(公告)日：2011-02-24
申请号：US12734951
申请日：2008-12-04
申请人： Yoshikazu Fujimori , Tatsuya Suzuki , Tsuyoshi Fujii , Satoru Tanaka
发明人： Yoshikazu Fujimori , Tatsuya Suzuki , Tsuyoshi Fujii , Satoru Tanaka
IPC分类号： G02B26/00
CPC分类号： G02F1/05 , G02F1/0311 , G02F1/0516 , G02F2203/12 , G03H2210/22 , G03H2223/13 , G03H2225/55 , G11B7/0065 , G11B7/128
摘要： To provide a light controller allowing for an enhanced positional precision in assembly of a spatial light modulator and a random phase mask, and to provide a light controller adapted to prevent positional deviations between a spatial light modulator and a random phase mask against impacts or vibrations, allowing for an enhanced operational integrity, a light controller includes a substrate, a light modulation unit disposed on the substrate and configured for modulation of light, and a random phase mask stacked on the light modulation unit on an optical axis of the light modulation unit.
摘要翻译：为了提供光控制器，其允许在空间光调制器和随机相位掩模的组装中提高位置精度，并且提供适于防止空间光调制器与随机相位掩模之间的位置偏差抵抗冲击或振动的光控制器，允许增强的操作完整性，光控制器包括衬底，设置在衬底上并被配置用于调制光的调光单元和在光调制单元的光轴上堆叠在光调制单元上的随机相位掩模。

6. 发明申请

US20100245970A1 LIGHT CONTROL DEVICE, SEMICONDUCTOR WAFER, AND LIGHT CONTROL SYSTEM 有权
标题翻译：灯控制装置，半导体波束和灯控制系统
公开(公告)号：US20100245970A1
公开(公告)日：2010-09-30
申请号：US12743929
申请日：2008-11-20
申请人： Yoshikazu Fujimori , Tsuyoshi Fujii
发明人： Yoshikazu Fujimori , Tsuyoshi Fujii
IPC分类号： G02F1/03 , H01L29/04
CPC分类号： G02F1/05 , G02F1/0136 , G02F2201/124
摘要： A light control device includes: a single crystal substrate (10); an electro-optic thin film (20) which is provided on the single crystal substrate (10) and has an electro-optic effect; and a plurality of electrodes (30, 40) which are provided along a crystal axis of the electro-optic thin film and apply an electrical field along the crystal axis of the electro-optic thin film (20).
摘要翻译：光控制装置包括：单晶基板（10）; 设置在单晶基板（10）上并具有电光效应的电光薄膜（20）以及沿着电光薄膜的晶轴设置并沿着电光薄膜（20）的晶轴施加电场的多个电极（30,40）。

7. 发明授权

US09093196B2 Conductive particles and method of preparing the same 有权
标题翻译：导电颗粒及其制备方法
公开(公告)号：US09093196B2
公开(公告)日：2015-07-28
申请号：US11863379
申请日：2007-09-28
申请人： Toshifumi Hashiba , Kazutoshi Hayakawa , Satomi Kudo , Kohei Moriyama , Tsuyoshi Fujii
发明人： Toshifumi Hashiba , Kazutoshi Hayakawa , Satomi Kudo , Kohei Moriyama , Tsuyoshi Fujii
IPC分类号： H01B1/00 , H01B1/20 , C08J3/12 , H01B1/12 , H05K3/32
CPC分类号： H01B1/20 , C08J3/12 , C08J3/126 , C08J2333/20 , H01B1/128 , H05K3/321 , H05K3/323 , H05K2201/0221 , H05K2201/0233 , Y10T428/2998
摘要： Conductive particles each includes a polymer base particle and a conductive layer coating the polymer base particle. Let the compressive elastic deformation characteristic KX of one conductive particle when the displacement of particle diameter of the conductive particles is X % be defined by the following formula: KX=(3/√2)·(SX−3/2)·(R−1/2)·FX. FX is the load (N) necessary for X % displacement of the conductive particles. SX is the compressive deformation amount (mm) upon X % displacement of the conductive particles. R is the particle radius (mm) of the conductive particles. The compressive elastic deformation characteristic K50 when the displacement of particle diameter of the conductive particles is 50% is 100 to 50000 N/mm2 at 20° C., and the recovery factor of particle diameter of the conductive particles when the displacement of particle diameter of the conductive particles is 50% is not less than 30% at 20° C.
摘要翻译：导电粒子各自包含聚合物基体颗粒和涂覆聚合物基础颗粒的导电层。使导电粒子的粒径的位移为X％时的一个导电性粒子的压缩弹性变形特性KX由下式定义：KX =（3 /√2）·（SX-3/2）·（R -1/2）·FX。 FX是导电颗粒的X％位移所需的载荷（N）。 SX是导电颗粒的X％位移时的压缩变形量（mm）。 R是导电粒子的粒子半径（mm）。导电粒子的粒径为50％时的压缩弹性变形特性K50在20℃为100〜50000N / mm 2，当导电粒子的粒径移动时的导电粒子的粒径的回收率导电颗粒在20℃下为50％不小于30％

8. 发明授权

US5377732A Wood joining structure and method thereof 失效
标题翻译：木材接合结构及其方法
公开(公告)号：US5377732A
公开(公告)日：1995-01-03
申请号：US126127
申请日：1993-09-23
申请人： Tsuyoshi Fujii , Atsushi Miyatake
发明人： Tsuyoshi Fujii , Atsushi Miyatake
IPC分类号： B27M3/00 , E04B1/26 , F16B5/00 , F16B12/04 , B27F1/00
CPC分类号： B27M3/002 , B27M3/0066 , E04B1/2604 , F16B12/04 , F16B5/00 , A47B2230/0059 , Y10T403/553
摘要： A technique is provided for joining wood members. A plurality of slits are formed on the end portions of wood pieces desired to be joined, and the end portions are abutted with corresponding slits in alignment to form a common surface. Each of the abutted wood end portions is fixed by temporary fixing means to a desired joining state. Thereafter, an adhesive agent is applied into the interior surfaces of the slits. Connecting plates, e.g., made of a reinforced plastic material coated with the adhesive agent, are inserted into the aligned slits. The adhesive agent is then hardened.
摘要翻译：提供了一种用于连接木材构件的技术。在待接合的木片的端部上形成多个狭缝，并且端部与相应的狭缝对准以形成共同的表面。每个邻接的木端部通过临时固定装置固定到期望的接合状态。此后，将粘合剂施加到狭缝的内表面中。连接板例如由涂覆有粘合剂的增强塑料材料制成，被插入对准的狭缝中。然后将粘合剂硬化。

9. 发明申请

US20050252947A1 Method and apparatus for manufacturing body structure block 审中-公开
标题翻译：用于制造车体结构块的方法和装置
公开(公告)号：US20050252947A1
公开(公告)日：2005-11-17
申请号：US10901974
申请日：2004-07-30
申请人： Tsuyoshi Fujii , Kazushige Fukuyori
发明人： Tsuyoshi Fujii , Kazushige Fukuyori
IPC分类号： B23K20/12 , B23K37/04 , B23K103/10 , B23P21/00 , B23Q1/03 , B23Q1/76 , B23Q3/02 , B61D17/00 , B62D65/02
CPC分类号： B23K20/122 , B23K20/1245 , B23K37/04 , B23K37/0426 , B23K2101/045 , Y10T29/49622
摘要： The invention provides a method and apparatus for efficiently manufacturing a body structure block by welding long extruded hollow shape members. A plurality of support beds 10 are arranged along the longitudinal direction of the long works W. Each support bed 10 is composed of six supporting units 30 capable of being moved along the width direction of the body structure block, and clamp units 40 and 50 disposed at left and right ends thereof. The supporting units 30 support the butted portions (joints) of seven works W. Both ends of the work W are clamped by the clamp units 40 and 50. The support units 30 and the clamp units 40 and 50 are equipped with expansion devices 34, through which the heights for supporting the works W mounted thereon are adjusted. Adjacent supporting units are coupled via a coupling unit 60, and the inclination angle of each supporting unit 30 can be controlled by the expansion of the coupling unit 60. Thus, the heights and inclination angles of supporting units 30 supporting the works W can be controlled, facilitating manufacture of the body structure block.
摘要翻译：本发明提供一种通过焊接长挤压中空形状构件来有效地制造车身结构块的方法和装置。沿长件W的长度方向布置有多个支撑床10.每个支撑床10由能够沿主体结构块的宽度方向移动的六个支撑单元30构成，并且夹持单元40和50设置在其左端和右端。支撑单元30支撑七个工件W的对接部分（接头）。工件W的两端由夹紧单元40和50夹紧。支撑单元30和夹紧单元40和50配备有膨胀装置34，调整用于支撑安装在其上的作品W的高度。相邻的支撑单元通过联接单元60联接，并且可以通过联接单元60的膨胀来控制每个支撑单元30的倾斜角度。因此，可以控制支撑工件W的支撑单元30的高度和倾斜角度，促进身体结构块的制造。

10. 发明授权

US06319109B1 Disk-shaped grindstone 失效
标题翻译：盘状磨石
公开(公告)号：US06319109B1
公开(公告)日：2001-11-20
申请号：US09582704
申请日：2000-06-30
申请人： Tsuyoshi Fujii , Takeshi Nonogawa , Kenji Itoh
发明人： Tsuyoshi Fujii , Takeshi Nonogawa , Kenji Itoh
IPC分类号： C22C2100
CPC分类号： B24D3/08 , B24D5/06 , B24D5/14 , B24D5/16 , B24D18/0009
摘要： A disk-shaped grindstone including a base disk and an abrasive layer which is bonded to the base disk. The base disk is provided by a rapidly-solidified aluminum alloy whose major component is Si, wherein the rapidly-solidified aluminum alloy includes 15 wt %-40 wt % of the Si, 0.5 wt %-6 wt % of Cu, 0.2 wt %-3 wt % of Mg, and the balance consisting principally of aluminum. The ratio of a tensile strength of the base disk to a specific gravity of the base disk (tensile strength/specific gravity) is not smaller than 90. The ratio of a fatigue strength of the base disk to the specific gravity of the base disk (fatigue strength/specific gravity) is not smaller than 30.
摘要翻译：一种盘形磨石，其包括基盘和研磨层，该研磨层与基盘接合。基盘由主要组分为Si的快速固化的铝合金提供，其中快速固化的铝合金包括15重量％的Si的重量百分比为-40重量％，Cu为0.5重量％-6重量％，Cu为0.2重量％ -3重量％的Mg，余量主要由铝构成。基盘的拉伸强度与基盘的比重（拉伸强度/比重）的比率不小于90.基盘的疲劳强度与基盘的比重的比（疲劳强度/比重）不小于30。

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