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1. 发明授权

US5952150A Radiation sensitive resin composition 失效
标题翻译：辐射敏感树脂组合物
公开(公告)号：US5952150A
公开(公告)日：1999-09-14
申请号：US892200
申请日：1997-07-14
申请人： Yoshihisa Ohta , Yong Wang , Takayoshi Tanabe , Shin-ichiro Iwanaga
发明人： Yoshihisa Ohta , Yong Wang , Takayoshi Tanabe , Shin-ichiro Iwanaga
IPC分类号： G03F7/004 , G03F7/038 , G03F7/039 , G03C1/492
CPC分类号： G03F7/038 , G03F7/0045 , G03F7/039 , Y10S430/122 , Y10S430/128
摘要： A positive-tone or negative-tone radiation sensitive resin composition which allows easy preparation of a resist, exhibits superior storage stability, high sensitivity, and high resolution capability, and is capable of producing excellent resist patterns. The positive-tone type composition comprises (A) a disulfonylmethane derivative in which the main chain with two sulfonyl groups bonded forms a three to eleven member cyclic carbon structure and (B) (a) a resin protected by an acid decomposable group or (b) an alkali-soluble resin and an alkali-solubility control agent. The negative-tone type composition comprises the component (A), (C) an alkali-soluble resin, and (D) a cross-linking agent.
摘要翻译：可以容易地制备抗蚀剂的正色调或负色度辐射敏感性树脂组合物，显示出优异的储存稳定性，高灵敏度和高分辨能力，并且能够产生优异的抗蚀剂图案。正调型组合物包含（A）二磺酰基甲烷衍生物，其中具有两个磺酰基键合的主链形成三至十一个环状碳结构，（B）（a）由酸可分解基团保护的树脂或（b ）碱溶性树脂和碱溶性控制剂。负色型组合物包含组分（A），（C）碱溶性树脂和（D）交联剂。

2. 发明授权

US6120972A Radiation-sensitive resin composition 有权
标题翻译：辐射敏感树脂组合物
公开(公告)号：US6120972A
公开(公告)日：2000-09-19
申请号：US136051
申请日：1998-08-18
申请人： Shin-ichiro Iwanaga , Eiichi Kobayashi , Takayoshi Tanabe , Kazuo Kawaguchi
发明人： Shin-ichiro Iwanaga , Eiichi Kobayashi , Takayoshi Tanabe , Kazuo Kawaguchi
IPC分类号： G03F7/004 , G03F7/039
CPC分类号： G03F7/0045 , G03F7/039
摘要： A radiation-sensitive resin composition comprising (A) a copolymer which comprises (a) a repeating unit (I) formed by cleavage of a carbon--carbon double bond of a monomer having one polymerizable carbon--carbon double bond and (b) a repeating unit (II) formed by cleavage of a carbon--carbon double bond of a monomer having two or more polymerizable carbon--carbon double bonds and at least one divalent group decomposed by an acid of the following formulas (1) or (2), ##STR1## wherein R.sup.1, R.sup.2, R.sup.3 and R.sup.4 are an alkyl group having 1-5 carbon atoms or an aryl group having 6-14 carbon atoms individually, said monomer having a structure in which each carbon--carbon double bond combines via said divalent group, and (B) a photoacid generator. The radiation-sensitive resin composition exhibits excellent sensitivity and resolution, fewer effect from the swing curves, excellent pattern profile, and superior heat resistance, high sensitivity to ultraviolet rays, far ultraviolet rays, X-rays, and various types of radiation such as charged particle rays, and is useful as a chemically amplified positive tone resist used in the manufacture of integrated circuit devices.
摘要翻译：一种辐射敏感性树脂组合物，其包含（A）共聚物，其包含（a）通过裂解具有一个可聚合碳 - 碳双键的单体的碳 - 碳双键形成的重复单元（I）和（b）重复通过裂解具有两个或多个可聚合碳 - 碳双键的单体的碳 - 碳双键形成的单元（II）和由下式（1）或（2）的酸分解的至少一个二价基团，其中 R1，R2，R3和R4分别是具有1-5个碳原子的烷基或具有6-14个碳原子的芳基，所述单体具有其中每个碳 - 碳双键通过所述二价基团结合的结构和（ B）光致酸发生器。辐射敏感性树脂组合物表现出优异的灵敏度和分辨率，较少的挥发曲线影响，优异的图案轮廓和优异的耐热性，对紫外线，远紫外线，X射线以及各种类型的辐射如带电的高灵敏度粒子射线，并且可用作用于制造集成电路器件的化学放大正色调抗蚀剂。

3. 发明授权

US06235446B1 Radiation sensitive resin composition 有权
标题翻译：辐射敏感树脂组合物
公开(公告)号：US06235446B1
公开(公告)日：2001-05-22
申请号：US09134163
申请日：1998-08-14
申请人： Toshiaki Ikemura , Eiichi Kobayashi , Takayoshi Tanabe , Shin-ichiro Iwanaga
发明人： Toshiaki Ikemura , Eiichi Kobayashi , Takayoshi Tanabe , Shin-ichiro Iwanaga
IPC分类号： G03F7004
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/106 , Y10S430/111
摘要： A radiation sensitive resin composition comprising (A) a copolymer possessing recurring units of the formulas (1), (2), and (3), which turns alkali soluble in the presence of acid and (B) a photosensitive acid generator. Because the composition can resolve line-and-space patterns, isolated patterns, and contact hole patterns with satisfactory appearance and high resolution, it is useful as a chemically amplified positive resist for use in the manufacture of semiconductor devices.
摘要翻译：一种辐射敏感性树脂组合物，其包含（A）具有式（1），（2）和（3）的重复单元的共聚物，其在酸的存在下使碱溶解，并且（B）感光酸产生剂。因为该组合物可以分辨线和空间图案，隔离图案和具有令人满意的外观和高分辨率的接触孔图案，因此它可用作用于制造半导体器件的化学放大型正性抗蚀剂。

4. 发明授权

US5994022A Radiation sensitive resin composition 失效
标题翻译：辐射敏感树脂组合物
公开(公告)号：US5994022A
公开(公告)日：1999-11-30
申请号：US965432
申请日：1997-11-06
申请人： Takayoshi Tanabe , Eiichi Kobayashi , Makoto Shimizu , Shin-ichiro Iwanaga
发明人： Takayoshi Tanabe , Eiichi Kobayashi , Makoto Shimizu , Shin-ichiro Iwanaga
IPC分类号： G03F7/004 , G03F7/039 , H01L21/027
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/106 , Y10S430/109 , Y10S430/111 , Y10S430/121
摘要： A radiation sensitive resin composition useful as a chemically amplified positive tone resist is provided. The composition comprises (A) a copolymer which becomes soluble in an alkali developing solution by the action of an acid, the copolymer containing a recurring unit (I) having a structure which is decomposed by the action of an acid and increases the solubility in an alkaline developing solution and a recurring unit(II) obtained from a compound having at least two (meth)acryloyl groups in the molecule by the cleavage of the carbon-carbon double bond, and (B) a photoacid generator which produces an acid on being irradiated by a radiation. The composition exhibits high resolution, superb capability of producing superior pattern forms, and excellent resistance to PED, and high process stability, is affected by a standing wave only to a minimum extent, and possessed prominent heat resistance.
摘要翻译：提供了可用作化学放大正性抗蚀剂的辐射敏感性树脂组合物。该组合物包含（A）通过酸作用而变得可溶于碱性显影液的共聚物，该共聚物含有具有通过酸作用分解的结构的重复单元（I），并增加其在碱性显影液和通过裂解碳 - 碳双键从分子中具有至少两个（甲基）丙烯酰基的化合物获得的重复单元（II），和（B）产生酸的光致酸产生剂用辐射照射。该组合物表现出高分辨率，优异的图案形式的出色能力和优异的耐PED性，并且工艺稳定性高，仅受驻波的影响最小，具有显着的耐热性。

5. 发明授权

US6136500A Radiation sensitive resin composition 有权
标题翻译：辐射敏感树脂组合物
公开(公告)号：US6136500A
公开(公告)日：2000-10-24
申请号：US135855
申请日：1998-08-18
申请人： Eiichi Kobayashi , Makoto Shimizu , Takayoshi Tanabe , Shin-ichiro Iwanaga
发明人： Eiichi Kobayashi , Makoto Shimizu , Takayoshi Tanabe , Shin-ichiro Iwanaga
IPC分类号： G03F7/004 , G03F7/038 , G03F7/039
CPC分类号： G03F7/004 , Y10S430/115 , Y10S430/122
摘要： Positive as well as negative radiation sensitive resin compositions that, in addition to being capable of providing excellent resolution and pattern profile, are particularly excellent in avoiding the problems of "nano-edge roughness" or "coating surface roughness". The positive type radiation sensitive resin composition comprises (A) (a) an acid-decomposable group-containing resin, or (b) an alkali-soluble resin and an alkali dissolution controller, and (B) a photoacid generator comprising "a compound that upon exposure to radiation generates a carboxylic acid having a boiling point of 150.degree. C. or higher", and "a compound that upon exposure to radiation generates an acid other than a carboxylic acid". The negative type radiation sensitive resin composition comprises (C) an alkali-soluble resin, (D) a cross-linking agent, and the component (B) as described above.
摘要翻译：除了能够提供优异的分辨率和图案轮廓之外，正面和负面的辐射敏感性树脂组合物在避免“纳米边缘粗糙度”或“涂层表面粗糙度”的问题方面特别优异。正型辐射敏感性树脂组合物包含（A）（a）含酸可分解基团的树脂，或（b）碱溶性树脂和碱溶解控制剂，和（B）光酸产生剂，其包含“ 暴露于辐射后会产生沸点为150℃以上的羧酸“，”暴露于辐射后的化合物会产生羧酸以外的酸“。负型辐射敏感性树脂组合物包含（C）碱溶性树脂，（D）交联剂和如上所述的组分（B）。

6. 发明申请

US20110144271A1 RADIOACTIVE RAY-CURABLE LIQUID RESIN COMPOSITION FOR USE IN OPTICAL STEREOLITHOGRAPHY, AND OPTICALLY SHAPED ARTICLE PRODUCED BY CURING THE COMPOSITION 审中-公开
标题翻译：放射性光固化液体树脂组合物，用于光学立体成像，以及通过固化而成的光学形状制品
公开(公告)号：US20110144271A1
公开(公告)日：2011-06-16
申请号：US11917632
申请日：2006-06-16
申请人： Katsuyuki Takase , Takayoshi Tanabe , Noriyasu Shinohara
发明人： Katsuyuki Takase , Takayoshi Tanabe , Noriyasu Shinohara
IPC分类号： C08K5/47 , C08K5/372 , C08K5/13 , C08K5/51
CPC分类号： C08L63/00 , B33Y70/00 , C08G59/687
摘要： The present invention aims to provide a radiation-curing liquid resin composition for optical tridimensional modeling having good storage stability. The suitable radiation-curing liquid resin composition for optical tridimensional modeling of the present invention includes a compound represented by the below general formula (1), a compound having phenolic hydroxyl group, a cationic polymerizable compound, a radical polymerization initiator, a radical polymerizable compound, one or more sulfur compound selected from the group consisting of 2-mercaptobenzothiazole, 2-(4-morpholinodithiobenzothiazole, diisopropylxantogendisulfide and diphenyldisulfide, a polyether polyol compound.
摘要翻译：本发明旨在提供一种具有良好的储存稳定性的用于光学三维建模的辐射固化液体树脂组合物。本发明的适用于光学三维建模的辐射固化液体树脂组合物包括由下列通式（1）表示的化合物，具有酚羟基的化合物，阳离子可聚合化合物，自由基聚合引发剂，可自由基聚合的化合物，一种或多种选自2-巯基苯并噻唑，2-（4-吗啉代二硫代苯并噻唑，二异丙基十三硫代二硫化物和二苯基二硫醚）的硫化合物，聚醚多元醇化合物。

7. 发明授权

US07553060B2 Backlight device and liquid crystal display 有权
标题翻译：背光装置和液晶显示器
公开(公告)号：US07553060B2
公开(公告)日：2009-06-30
申请号：US11573591
申请日：2005-06-22
申请人： Takayoshi Tanabe
发明人： Takayoshi Tanabe
IPC分类号： F21V7/04
CPC分类号： G02B6/0068 , G02B6/0021 , G02B6/0028 , G02B6/0046
摘要： A backlight apparatus of a sidelight type includes a light guide plate having an incident face on a lateral face and a light source unit having a plurality of substrates. The plurality of the substrates are respectively disposed on the incident face side of the light guide plate such that each of substrate faces of the substrates is parallel with a light exit face of the light guide plate, and the substrates are adjacent to one another in a thickness direction of the light guide plate. A plurality of light emitting devices that emit light along the substrate faces are mounted in columns on each of the substrate faces of the plurality of the substrates such that emitting directions of the light emitting devices are directed to the incident face.
摘要翻译：背光源的背光装置包括具有在侧面上的入射面的导光板和具有多个基板的光源单元。多个基板分别设置在导光板的入射面侧，使得基板的每个基板面与导光板的光出射面平行，并且基板彼此相邻地邻接导光板的厚度方向。沿着衬底面发射光的多个发光器件以多个衬底的每个衬底面上的列安装成使得发光器件的发射方向指向入射面。

8. 发明申请

US20070155882A1 Curable liquid composition, cured film, and antistatic laminate 审中-公开
标题翻译：可固化液体组合物，固化膜和抗静电层压板
公开(公告)号：US20070155882A1
公开(公告)日：2007-07-05
申请号：US10552510
申请日：2004-04-05
申请人： Yoshikazu Yamaguchi , Shingo Itai , Jiro Ueda , Takayoshi Tanabe , John Southwell
发明人： Yoshikazu Yamaguchi , Shingo Itai , Jiro Ueda , Takayoshi Tanabe , John Southwell
IPC分类号： C08G73/10 , C08K3/22
CPC分类号： C09D5/006 , C08F290/068 , C08K3/22 , C08K9/06 , C09D5/24 , C09D7/62 , C09D11/101
摘要： To provide a curable liquid composition excelling in storage stability and curability and capable of forming a coat (film) which excels in antistatic properties, hardness, scratch resistance, and transparency on the surface of various substrates, a cured film of the composition, and an antistatic laminate. A curable liquid composition comprising (A) particles including an oxide of at least one element selected from the group consisting of indium, antimony, zinc, and tin as a major component, (B) a compound having at least two polymerizable unsaturated groups in the molecule, (C) a solvent in which solubility of the component (B) is less than 10 wt %, and (D) a solvent in which solubility of the component (B) is 10 wt % or more, the components (A) and (B) being uniformly dispersed or dissolved in the composition.
摘要翻译：为了提供优异的储存稳定性和固化性的可固化液体组合物，并且能够形成在各种基材的表面上的抗静电性，硬度，耐刮擦性和透明性优异的涂层（膜），该组合物的固化膜和抗静电层压板一种可固化液体组合物，其包含（A）包含选自由铟，锑，锌和锡组成的组中的至少一种元素的氧化物的主要成分的颗粒，（B）具有至少两个可聚合不饱和基团的化合物分子，（C）成分（B）的溶解度小于10重量％的溶剂，（D）成分（B）的溶解度为10重量％以上的成分（A）和（B）均匀地分散或溶解在组合物中。

9. 发明申请

US20070066703A1 Radiation-curable resin composition, cured film of the composition, and laminate 审中-公开
标题翻译：可辐射固化树脂组合物，组合物的固化膜和层压体
公开(公告)号：US20070066703A1
公开(公告)日：2007-03-22
申请号：US10564816
申请日：2004-07-23
申请人： Noriyasu Shinohara , Hiroyuki Mano , Takayoshi Tanabe , John Southwell , Christopher Tronche
发明人： Noriyasu Shinohara , Hiroyuki Mano , Takayoshi Tanabe , John Southwell , Christopher Tronche
IPC分类号： C03C25/10
CPC分类号： C09K3/10 , B32B27/08 , C08J5/04 , C08J2323/12 , C08K5/09 , C09C1/00 , C09C1/3063 , C09C1/3072 , C09C3/08 , C09C3/10 , C08L71/02
摘要： The present invention relates to a radiation-curable resin composition which produces a cured film having low surface resistivity and high transparency, a cured film of the composition, and a laminate including a layer of the cured film. The laminate of the present invention is suitably used as a hard coat material for preventing scratches or stains on a plastic optical part, touch panel, film-type liquid crystal element, plastic container, or flooring material, wall material, or artificial marble as an architectural interior finish; adhesive and sealing material for various substrates; vehicle for printing ink; or the like.
摘要翻译：本发明涉及产生具有低表面电阻率和高透明度的固化膜的辐射固化树脂组合物，该组合物的固化膜和包含该固化膜层的层压体。本发明的层压体适合用作防止塑料光学部件，触摸屏，薄膜型液晶元件，塑料容器或地板材料，壁材料或人造大理石上的划痕或污渍的硬涂层材料建筑内饰; 各种基材的粘合剂和密封材料; 印刷油墨车辆; 或类似物。

10. 发明申请

US20070043138A1 Resin composition for photofabrication of three dimensional objects 审中-公开
标题翻译：用于三维物体光固化的树脂组合物
公开(公告)号：US20070043138A1
公开(公告)日：2007-02-22
申请号：US11357420
申请日：2006-02-21
申请人： Tetsuya Yamamura , Yukitoshi Kato , Takayoshi Tanabe , Takashi Ukachi
发明人： Tetsuya Yamamura , Yukitoshi Kato , Takayoshi Tanabe , Takashi Ukachi
IPC分类号： C08G65/18
CPC分类号： C08F255/00 , C08F257/02 , C08F279/02 , C08F287/00 , C08G59/00 , C08G59/24 , C08G59/68 , C08G65/10 , C08G65/18 , C08L51/006 , C08L51/04 , C08L51/06 , C08L71/02 , G03F7/0037 , G03F7/027 , G03F7/038 , C08L2666/02
摘要： Photocurable resin composition for photofabrication of three-dimensional objects comprising (A) 5-80 parts by weight of an oxetane compound, (B) 5-80 parts by weight of an epoxy compound, (C) 0, 1 10 parts by weight of a photoacid generator, (D) 1-35 parts by weight of elastomer particles with an average particle diameter of 10-700 nm, (E) 0-35 parts by weight of a polyol compound, (F) 0-45 parts by weight of an ethylenically unsaturated monomer, and (G) 0-10 parts by weight of a radical photopolymerization initiator.
摘要翻译：包含（A）5-80重量份的氧杂环丁烷化合物的（B）5-80重量份的环氧化合物，（C）0-110重量份的环氧化合物，（D）1-35重量份平均粒径为10-700nm的弹性体颗粒，（E）0-35重量份多元醇化合物，（F）0-45重量份的烯键式不饱和单体，和（G）0-10重量份的基团光聚合引发剂。

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