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    • 9. 发明授权
    • Exposure system
    • 曝光系统
    • US5276725A
    • 1994-01-04
    • US996508
    • 1992-12-14
    • Eigo KawakamiMinoru YoshiiShunichi Uzawa
    • Eigo KawakamiMinoru YoshiiShunichi Uzawa
    • G03F7/20G21K5/00
    • G03F7/702
    • An exposure apparatus usable with a mask having a pattern and a wafer having a radiation-sensitive surface layer, for transferring with a radiation energy beam the pattern of the mask to the wafer, is disclosed. The apparatus includes a mask supporting member for supporting the mask; a wafer supporting member for supporting the wafer; a reflective member having a reflection surface and an indication pattern, the reflective member being supported by one of the mask supporting member and the wafer supporting member; an arrangement for projecting a beam, which is thinner than the radiation energy beam and which advances along or about the axis of the radiation energy beam, upon the reflective member; a device for observing a positional relationship between the indication pattern and a spot formed by projection of the thinner beam upon the reflective member; and a device for correcting a relationship between the indication pattern and the spot, on the basis of the observation.
    • 公开了一种可用于具有图案的掩模和具有辐射敏感表面层的晶片的曝光装置,用于将辐射能量束将掩模的图案转印到晶片。 该装置包括用于支撑面罩的面罩支撑构件; 用于支撑晶片的晶片支撑构件; 反射构件,其具有反射面和指示图案,所述反射构件由所述面罩支撑构件和所述晶片支撑构件中的一个支撑; 用于投射比辐射能量束更薄并且沿辐射能量束的轴线或围绕辐射能量束的轴线前进的光束的反射构件的布置; 用于观察指示图案与通过将较薄光束投射在反射构件上形成的光斑之间的位置关系的装置; 以及用于基于观察来校正指示图案与斑点之间的关系的装置。