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    • 3. 发明授权
    • Method for manufacturing metal microstructure
    • 制造金属微观结构的方法
    • US07105281B2
    • 2006-09-12
    • US10492918
    • 2002-10-25
    • Jun YoritaYoshihiro HirataTsuyoshi Haga
    • Jun YoritaYoshihiro HirataTsuyoshi Haga
    • G03F7/039
    • B81C99/0085B81C2201/032C25D1/003H01L21/4821H05K3/202H05K3/205
    • A method of manufacturing a metal microstructure by using a resin mold. In order to provide a method in which a mild manufacturing condition which causes less damage to the resin mold can be set and the high-precision metal microstructure can be mass-produced by uniform electroforming, the method of manufacturing the metal microstructure according to the present invention includes the steps of: fixing on a conductive substrate the resin mold having a vacant portion penetrating in the direction of thickness, by interposing a photosensitive polymer having a chemical composition changed by an electron beam, ultraviolet radiation or visible radiation so as to form a layered structure having the resin mold; exposing the layered structure having the resin mold to an electron beam, ultraviolet radiation or visible radiation; removing an exposed photosensitive polymer existing at the vacant portion of the resin mold; and filling with a metal the vacant portion of the layered structure having the resin mold by electroforming.
    • 通过使用树脂模具制造金属微结构的方法。 为了提供一种可以设定对树脂模具造成较小损害的温和制造条件并且通过均匀电铸可以大量生产高精度金属微结构的方法,根据本发明的金属组织的制造方法 本发明包括以下步骤:通过插入具有由电子束,紫外线或可见光辐照的化学组成改变的光敏聚合物,将具有穿透厚度方向的空白部分的树脂模具固定在导电基板上,以形成 具有树脂模具的层状结构; 将具有树脂模具的层状结构暴露于电子束,紫外线辐射或可见光辐射; 去除存在于树脂模具的空缺部分的曝光的光敏聚合物; 并通过电铸将金属填充到具有树脂模具的层状结构的空
      间部分。
    • 4. 发明授权
    • Method for manufacturing metal microstructure
    • 制造金属微观结构的方法
    • US07338753B2
    • 2008-03-04
    • US11503303
    • 2006-08-14
    • Jun YoritaYoshihiro HirataTsuyoshi Haga
    • Jun YoritaYoshihiro HirataTsuyoshi Haga
    • G03F7/039
    • B81C99/0085B81C2201/032C25D1/003H01L21/4821H05K3/202H05K3/205
    • A method of manufacturing a metal microstructure (1) by using a resin mold (13). In order to provide a method in which a mild manufacturing condition which causes less damage to the resin mold (13) can be set and the high-precision metal microstructure (1) can be mass-produced by uniform electroforming, the method of manufacturing the metal microstructure (1) according to the present invention includes the steps of: fixing on a conductive substrate (11) the resin mold (13) having a vacant portion penetrating in the direction of thickness, by interposing a photosensitive polymer (12) having a chemical composition changed by an electron beam, ultraviolet radiation or visible radiation so as to form a layered structure (2) having the resin mold (13); exposing the layered structure (2) having the resin mold (13) to an electron beam, ultraviolet radiation or visible radiation; removing an exposed photosensitive polymer (12c) existing at the vacant portion of the resin mold (13); and filling with a metal (14) the vacant portion of the layered structure (2) having the resin mold (13) by electroforming.
    • 一种通过使用树脂模具(13)制造金属微结构(1)的方法。 为了提供可以设定对树脂模具(13)造成较小损害的温和制造条件并且可以通过均匀电铸来大量生产高精度金属微结构(1)的方法,制造 根据本发明的金属微结构(1)包括以下步骤:通过插入具有一个或多个金属微结构(1)的光敏聚合物(12)将具有穿过厚度方向的空白部分的树脂模具(13)固定在导电基板(11)上, 化学成分由电子束,紫外线辐射或可见光辐射而变化,形成具有树脂模具(13)的层状结构(2)。 将具有树脂模具(13)的层状结构(2)暴露于电子束,紫外线或可见光; 去除存在于树脂模具(13)的空缺部分的暴露的光敏聚合物(12c); 并通过电铸将金属(14)填充到具有树脂模具(13)的层状结构(2)的空位部分上。
    • 5. 发明申请
    • Method for manufacturing metal microstructure
    • 制造金属微观结构的方法
    • US20060276044A1
    • 2006-12-07
    • US11503303
    • 2006-08-14
    • Jun YoritaYoshihiro HirataTsuyoshi Haga
    • Jun YoritaYoshihiro HirataTsuyoshi Haga
    • G03C5/00H01L21/302
    • B81C99/0085B81C2201/032C25D1/003H01L21/4821H05K3/202H05K3/205
    • A method of manufacturing a metal microstructure (1) by using a resin mold (13). In order to provide a method in which a mild manufacturing condition which causes less damage to the resin mold (13) can be set and the high-precision metal microstructure (1) can be mass-produced by uniform electroforming, the method of manufacturing the metal microstructure (1) according to the present invention includes the steps of: fixing on a conductive substrate (11) the resin mold (13) having a vacant portion penetrating in the direction of thickness, by interposing a photosensitive polymer (12) having a chemical composition changed by an electron beam, ultraviolet radiation or visible radiation so as to form a layered structure (2) having the resin mold (13); exposing the layered structure (2) having the resin mold (13) to an electron beam, ultraviolet radiation or visible radiation; removing an exposed photosensitive polymer (12c) existing at the vacant portion of the resin mold (13); and filling with a metal (14) the vacant portion of the layered structure (2) having the resin mold (13) by electroforming.
    • 一种通过使用树脂模具(13)制造金属微结构(1)的方法。 为了提供可以设定对树脂模具(13)造成较小损害的温和制造条件并且可以通过均匀电铸来大量生产高精度金属微结构(1)的方法,制造 根据本发明的金属微结构(1)包括以下步骤:通过插入具有一个或多个金属微结构(1)的光敏聚合物(12)将具有穿过厚度方向的空白部分的树脂模具(13)固定在导电基板(11)上, 化学成分由电子束,紫外线辐射或可见光辐射而变化,形成具有树脂模具(13)的层状结构(2)。 将具有树脂模具(13)的层状结构(2)暴露于电子束,紫外线或可见光; 去除存在于树脂模具(13)的空缺部分的曝光的光敏聚合物(12c); 并通过电铸将金属(14)填充到具有树脂模具(13)的层状结构(2)的空位部分上。
    • 9. 发明授权
    • Microconnector and method of manufacturing the same
    • 微型连接器及其制造方法
    • US6129559A
    • 2000-10-10
    • US788889
    • 1997-01-21
    • Yoshihiro HirataTsuyoshi Haga
    • Yoshihiro HirataTsuyoshi Haga
    • B81C1/00H01L23/48H01R13/62H05K3/40H01R1/00
    • H01R13/6205H01L24/72H01R12/57H01L2924/01005H01L2924/01006H01L2924/01013H01L2924/01024H01L2924/01025H01L2924/01029H01L2924/01033H01L2924/01038H01L2924/01047H01L2924/01073H01L2924/01074H01L2924/01078H01L2924/01079H05K3/4007H05K3/4092Y10T29/42
    • A microconnector provides a practically sufficient strength, and has an arrangement in which structures of electrode members and guiding members can be designed at least somewhat independently of each other for allowing a simple connecting operation. In a male connector, wiring layers are formed on a substrate, and male pin connector electrodes project from the wiring layers, whereby the electrodes are two-dimensionally arranged and enclosed with spacers. In a female connector, on the other hand, wiring layers are formed on a substrate, and female connector electrodes are formed on single ends of the wiring layers respectively. The female connector electrodes comprise holes for receiving the pin electrodes, and are arranged in correspondence to the pin electrodes. The female connector electrodes each having a spring characteristic and are enclosed with spacers. The male and female connectors are electrically connected with each other by superposing the substrates with each other while orienting electrode surfaces thereof to be opposed to each other. The pin electrodes and the female connector electrodes are naturally aligned and brought into engagement with each other due to attraction of magnetic layers formed on the male and female connectors respectively.
    • 微连接器提供实际上足够的强度,并且具有这样的布置,其中电极构件和引导构件的结构可以至少部分地彼此设计以允许简单的连接操作。 在阳连接器中,布线层形成在基板上,并且阳引脚连接电极从布线层突出,由此电极被二维布置并用隔离物包围。 另一方面,在阴连接器中,布线层形成在基板上,并且阴连接器电极分别形成在布线层的单个端部上。 阴连接器电极包括用于接收针电极的孔,并且与针电极相对应地布置。 阴连接器电极各自具有弹簧特性并且被间隔件包围。 阳连接器和母连接器通过将基板彼此叠置同时将其电极表面定向成彼此相对而彼此电连接。 引脚电极和阴连接器电极由于分别形成在阳连接器和阴连接器上的磁性层的吸引而自然对准并彼此接合。