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    • 9. 发明授权
    • Method and system for providing a magnetic recording transducer using a line hard mask and a wet-etchable mask
    • 用于使用线硬掩模和湿蚀刻掩模提供磁记录换能器的方法和系统
    • US08790524B1
    • 2014-07-29
    • US12880484
    • 2010-09-13
    • Guanghong LuoDanning YangMing Jiang
    • Guanghong LuoDanning YangMing Jiang
    • G11B5/127G11B5/31G11B5/11
    • G11B5/3116G11B5/112G11B5/3163G11B5/3903G11B5/3932
    • A method and system for fabricating a magnetic transducer is described. The transducer has device and field regions, and a magnetoresistive stack. Hard mask layer and wet-etchable layers are provided on the magnetoresistive stack and hard mask layer, respectively. A hard mask and a wet-etchable mask are formed from the hard mask and the wet-etchable layers, respectively. The hard and wet-etchable masks each includes a sensor portion and a line frame. The sensor portion covers part of the magnetoresistive stack corresponding to a magnetoresistive structure. The line frame covers a part of the magnetoresistive stack in the device region. The magnetoresistive structure is defined in a track width direction. Hard bias material(s) are then provided. Part of the hard bias material(s) is adjacent to the magnetoresistive structure in the track width direction. The wet-etchable sensor portion and line frame, and hard bias material(s) thereon, are removed.
    • 描述了用于制造磁换能器的方法和系统。 传感器具有器件和场区域以及磁阻堆叠。 硬掩模层和湿蚀刻层分别设置在磁阻堆叠和硬掩模层上。 分别由硬掩模和湿蚀刻层形成硬掩模和湿蚀刻掩模。 硬和湿可蚀刻掩模各自包括传感器部分和线框架。 传感器部分覆盖对应于磁阻结构的磁阻堆叠的一部分。 线框架覆盖设备区域中的磁阻堆叠的一部分。 磁阻结构被定义在磁道宽度方向上。 然后提供硬偏置材料。 硬偏置材料的一部分在磁道宽度方向上与磁阻结构相邻。 湿式可蚀刻传感器部分和线框架以及其上的硬偏移材料被去除。
    • 10. 发明授权
    • Process for fabricating a magnetic pole and shields
    • 制造磁极和屏蔽的工艺
    • US08578594B2
    • 2013-11-12
    • US13154191
    • 2011-06-06
    • Ming JiangRonghui ZhouGuanghong LuoMasahiro OsugiDanning Yang
    • Ming JiangRonghui ZhouGuanghong LuoMasahiro OsugiDanning Yang
    • G11B5/127H04R31/00
    • G11B5/1278G11B5/3116G11B5/315G11B5/3163
    • A process for fabricating a magnetic recording transducer for use in a data storage system comprises providing a substrate, an underlayer and a first nonmagnetic intermediate layer deposited to a first thickness on and in contact with the underlayer, performing a first scanning polishing on a first section of the first intermediate layer to planarize the first section of the first intermediate layer to a second thickness, providing a main pole in the planarized first section of the first intermediate layer, providing a first pattern of photoresist on and in contact with the first section of the first intermediate layer, the pattern comprising an aperture to define a side shield trench, performing a wet etch to remove at least a portion of the first intermediate layer thereby exposing at least one of the plurality of main pole sides, and depositing side shield material in the side shield trench.
    • 一种用于制造用于数据存储系统的磁记录传感器的方法包括提供在底层上沉积到第一厚度并与底层接触的基底,底层和第一非磁性中间层,在第一部分上进行第一扫描抛光 将所述第一中间层的第一部分平坦化为第二厚度,在所述第一中间层的平坦化的第一部分中提供主极,在所述第一中间层的所述第一部分的第一部分上提供第一图案, 第一中间层,图案包括用于限定侧屏蔽沟槽的孔,执行湿蚀刻以去除第一中间层的至少一部分,从而暴露多个主极侧中的至少一个,以及沉积侧屏蔽材料 在侧盾沟。