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1. 发明授权

US6108490A Multizone illuminator for rapid thermal processing with improved spatial resolution 失效
标题翻译：用于快速热处理的多区域照明器，具有改进的空间分辨率
公开(公告)号：US6108490A
公开(公告)日：2000-08-22
申请号：US209313
申请日：1998-12-09
申请人： Yong Jin Lee , Mehrdad M. Moslehi , Xiangqun Chen
发明人： Yong Jin Lee , Mehrdad M. Moslehi , Xiangqun Chen
IPC分类号： C23C16/48 , C30B25/10 , C30B25/14 , C30B31/12 , H01L21/00 , A21B2/00
CPC分类号： H01L21/67248 , C23C16/481 , C30B25/105 , C30B25/14 , C30B31/12 , H01L21/67115
摘要： A system for rapid thermal processing of a substrate in a process chamber while measuring and controlling the temperature at the substrate to establish substantially uniform substrate temperature in real time. The system includes an essentially continuous spirally-configured multizone illuminator having a plurality of substantially concentric rings of heating lamps for directing optical power toward the substrate and a fluid cooled optical reflector facing the substrate frontside and having a relatively high optical reflectivity. The illuminator can also be offset from the geometric center of the substrate. The system can also include a plurality of contact devices to provide thermal conductivity from each, or some subset, of the plurality of heating lamps. The illumination system of the present invention provides improved spatial resolution and improved thermal properties at the heating lamps.
摘要翻译：一种用于在处理室中快速热处理衬底的系统，同时测量和控制衬底上的温度以实时实现基本上均匀的衬底温度。该系统包括基本上连续的螺旋配置的多区域照明器，其具有多个基本上同心的加热灯的环，用于将光焦度引导到衬底，以及面向衬底前侧的流体冷却的光反射体并具有相对高的光学反射率。照明器也可以偏离衬底的几何中心。该系统还可以包括多个接触装置，以从多个加热灯的每个或一些子集提供导热性。本发明的照明系统提供了在加热灯处的改进的空间分辨率和改进的热性能。

2. 发明授权

US6167195A Multizone illuminator for rapid thermal processing with improved spatial resolution 失效
公开(公告)号：US6167195A
公开(公告)日：2000-12-26
申请号：US518843
申请日：2000-03-03
申请人： Mehrdad M. Moslehi , Yong Jin Lee , Xiangqun Chen
发明人： Mehrdad M. Moslehi , Yong Jin Lee , Xiangqun Chen
IPC分类号： C23C16/48 , C30B25/10 , C30B25/14 , C30B31/12 , H01L21/00 , F26B3/30
CPC分类号： H01L21/67248 , C23C16/481 , C30B25/105 , C30B25/14 , C30B31/12 , H01L21/67115
摘要： A system for rapid thermal processing of a substrate in a process chamber while measuring and controlling the temperature at the substrate to establish substantially uniform substrate temperature in real time. The system includes an essentially continuous spirally-configured multizone illuminator having a plurality of substantially concentric rings of heating lamps for directing optical power toward the substrate and a fluid cooled optical reflector facing the substrate frontside and having a relatively high optical reflectivity. The illuminator can also be offset from the geometric center of the substrate. The system can also include a plurality of contact devices to provide thermal conductivity from each, or some subset, of the plurality of heating lamps. The illumination system of the present invention provides improved spatial resolution and improved thermal properties at the heating lamps.

3. 发明授权

US6106148A Apparatus including integral actuator with control for automated calibration of temperature sensors in rapid thermal processing equipment 失效
标题翻译：装置包括具有控制功能的集成执行器，用于快速热处理设备中温度传感器的自动校准
公开(公告)号：US6106148A
公开(公告)日：2000-08-22
申请号：US344419
申请日：1999-06-25
申请人： Mehrdad M. Moslehi , Yong Jin Lee
发明人： Mehrdad M. Moslehi , Yong Jin Lee
IPC分类号： G01J5/10 , G01J5/52 , G01K1/14 , G01K15/00 , F27D11/00 , H01L21/02
CPC分类号： G01K1/146 , G01J5/10 , G01J5/522 , G01K15/00
摘要： This invention presents an automatic calibration system and method for calibration of a substrate temperature sensor in a thermal processing equipment, such as a rapid thermal processing system. The calibration system includes a temperature-sensitive probe associated with the substrate temperature sensor to calibrate the substrate temperature sensor and an actuator to position the temperature-sensitive probe relative to the substrate during a calibration cycle. The actuator and temperature-sensitive probe of the automatic calibration system can be incorporated into the thermal processing equipment in order to maintain the thermal processing equipment cleanliness and integrity during a calibration cycle, and to allow rapid automated calibration. In the preferred embodiment of this invention, the temperature-sensitive probe and its actuator are implemented in the gas showerhead assembly of a rapid thermal processing system.
摘要翻译：本发明提出了一种用于在诸如快速热处理系统的热处理设备中校准衬底温度传感器的自动校准系统和方法。校准系统包括与衬底温度传感器相关联的温度敏感探针以校准衬底温度传感器，以及在校准周期期间相对于衬底定位温度敏感探针的致动器。自动校准系统的致动器和温度敏感探头可以并入热处理设备，以便在校准周期内保持热处理设备的清洁度和完整性，并允许快速自动校准。在本发明的优选实施例中，温度敏感探针及其致动器被实现在快速热处理系统的气体喷头组件中。

4. 发明授权

US5976261A Multi-zone gas injection apparatus and method for microelectronics manufacturing equipment 失效
标题翻译：多区气体注入装置及微电子制造设备的方法
公开(公告)号：US5976261A
公开(公告)日：1999-11-02
申请号：US678297
申请日：1996-07-11
申请人： Mehrdad M. Moslehi , Yong Jin Lee , Ahmad Kermani
发明人： Mehrdad M. Moslehi , Yong Jin Lee , Ahmad Kermani
IPC分类号： C23C16/44 , C23C16/455 , C23C16/00
CPC分类号： C23C16/45574 , C23C16/45565
摘要： A method and apparatus for multi-zone injection apparatus of multiple process gases onto a work piece during manufacture. The multi-zone injection apparatus uses a gas injection plate with multiple injection zones to deliver the multiple process gases into the chamber for deposition onto the work piece (for example, a silicon wafer). The gas showerhead separates the multiple process in a manner that avoids premixing the process gases, thereby minimizing gas-phase nucleation and particulate generation. The showerhead also allows real-time independent control over the gas flow rates in N channels to achieve deposition uniformity. Different gases can be configured in adjacent channels to provide M zones of multi-gas radial control.
摘要翻译：一种用于在制造期间多个工艺气体到工件上的多区域注入装置的方法和装置。多区域注射装置使用具有多个注射区域的气体注射板将多个工艺气体输送到室中以沉积到工件（例如，硅晶片）上。气体喷头以避免预混合工艺气体的方式分离多个工艺，从而最小化气相成核和产生颗粒。淋浴头还允许实时独立控制N个通道中的气体流量，以实现沉积均匀性。可以在相邻通道中配置不同的气体，以提供多气体径向控制的M区。

5. 发明授权

US5937142A Multi-zone illuminator for rapid thermal processing 失效
标题翻译：用于快速热处理的多区域照明器
公开(公告)号：US5937142A
公开(公告)日：1999-08-10
申请号：US678321
申请日：1996-07-11
申请人： Mehrdad M. Moslehi , Yong Jin Lee , Ahmad Kermani , William J. Messner
发明人： Mehrdad M. Moslehi , Yong Jin Lee , Ahmad Kermani , William J. Messner
IPC分类号： C23C16/48 , C30B25/10 , C30B25/14 , H01L21/00 , A21B2/00 , C23C16/00
CPC分类号： H01L21/67248 , C23C16/481 , C30B25/105 , C30B25/14 , H01L21/67115
摘要： A system for rapid thermal processing of a substrate in a process chamber while measuring and controlling the temperature at the substrate to establish substantially uniform substrate temperature in real time. The system includes an axisymmetrical multi-zone illuminator having a plurality of substantially concentric rings of heating lamps to direct optical power toward said substrate, a fluid cooled optical reflector facing the substrate frontside and having a relatively high optical reflectivity. The system also includes a multizone temperature measurement system having a plurality of pyrometry sensors coupled to said multi-zone illuminator, a system for real-time measurement and compensation of substrate emissivity and illuminator lamp light interference effects, and a multi-variable temperature controller for providing multi-zone real-time temperature control. The system also incorpotates a plurality of illuminator lamp power supplies.
摘要翻译：一种用于在处理室中快速热处理衬底的系统，同时测量和控制衬底上的温度以实时实现基本上均匀的衬底温度。该系统包括轴对称多区域照明器，其具有多个基本上同心的加热灯环，以将光焦度引导到所述衬底，面向衬底前侧并具有相对高的光学反射率的流体冷却的光学反射器。该系统还包括多区域温度测量系统，其具有耦合到所述多区域照明器的多个高温测量传感器，用于实时测量和补偿衬底发射率和照明器灯光干涉效应的系统，以及多变量温度控制器提供多区域实时温度控制。该系统还包括多个照明灯电源。

6. 发明授权

US06444103B1 Method and apparatus for thin film deposition using an active shutter 失效
标题翻译：使用主动快门进行薄膜沉积的方法和装置
公开(公告)号：US06444103B1
公开(公告)日：2002-09-03
申请号：US09662575
申请日：2000-09-15
申请人： Mehrdad M. Moslehi , Yong Jin Lee , Cecil J. Davis , Ajit P. Paranjpe
发明人： Mehrdad M. Moslehi , Yong Jin Lee , Cecil J. Davis , Ajit P. Paranjpe
IPC分类号： C23C1434
CPC分类号： H01J37/3447 , C23C14/3464 , C23C14/564
摘要： Material is deposited from an active shutter onto a substrate located in a processing chamber housing with a shutter target coupled to a shutter target assembly. A first target assembly located in the housing supports a target for physical-vapor deposition of a first material onto the substrate. A shutter is selectively moveable to extend into a closed or activated position and to retract into an open position. The shutter target assembly is coupled to the shutter such that when the shutter is in the closed position, the shutter target assembly is positioned to allow deposition of material from the shutter target onto the substrate. When the shutter is in the open position, the first target is positioned to deposit material onto the substrate. Alternating layers of materials may be deposited by the shutter target and first target by cycling the shutter between an open position and a closed position.
摘要翻译：材料从活动快门沉积到位于处理室壳体中的基板上，其中快门目标件联接到快门目标组件。位于壳体中的第一目标组件支撑用于将第一材料物理 - 气相沉积到衬底上的靶。快门选择性地可移动以延伸到关闭或启动位置并缩回到打开位置。快门目标组件联接到快门，使得当快门处于关闭位置时，快门目标组件被定位成允许材料从快门目标物体沉积到基板上。当快门处于打开位置时，第一目标定位成将材料沉积到基板上。通过在打开位置和关闭位置之间循环活门，可以通过快门目标和第一目标来沉积材料的交替层。

7. 发明授权

US06188044B1 High-performance energy transfer system and method for thermal processing applications 失效
标题翻译：高性能能量转移系统和热处理应用方法
公开(公告)号：US06188044B1
公开(公告)日：2001-02-13
申请号：US09067142
申请日：1998-04-27
申请人： Yong Jin Lee , Mehrdad M. Moslehi , Jalil Kamali , Sergey Belikov
发明人： Yong Jin Lee , Mehrdad M. Moslehi , Jalil Kamali , Sergey Belikov
IPC分类号： F27B514
CPC分类号： H01L21/67115 , C23C16/481
摘要： An apparatus and method supports thermal processing of a microelectronic device such as a semiconductor chip in a substrate by heating the substrate with secondary radiation from an energy transfer device 40, which has a first set of energy transfer regions comprised of an emissive and thermally conductive material, and a second set of thermally insulating regions comprised of a reduced emissivity and reduced thermal conductivity material or free space. A multi-zone radiant energy source 30 provides radiative energy to energy transfer device 40, with a process controller 36, preferably a multi-zone controller, altering the amount of energy provided by each heat zone associated with each emissive region of energy transfer device 40. Sensors detect the thermal energy level of each energy transfer region to allow controller 36 to adjust the secondary radiation emitted by each region in real time, resulting in a predetermined and controlled distribution of thermal energy on substrate 20. Energy transfer device 40 can have plural emissive and thermally conductive concentric rings separated from each other by reduced emissivity and reduced thermal conductivity regions such as free space gaps 42. Alternatively, a solid plate 54 having an emissive coating or emissive surface 52 can have reduced emissivity and reduced conductivity isolation regions such as trenches 56 for defining the multi-zone high-emissivity and high thermal conductivity energy transfer regions.
摘要翻译：一种装置和方法通过用来自能量转移装置40的二次辐射加热衬底来支持诸如半导体芯片之类的微电子器件的热处理，该能量转移装置具有由发射和导热材料组成的第一组能量转移区以及由减少的发射率和降低的热导率材料或自由空间组成的第二组热绝缘区域。多区域辐射能源30向能量传递装置40提供辐射能，其中过程控制器36，优选多区域控制器，改变与能量传递装置40的每个发射区域相关联的每个加热区域提供的能量的量传感器检测每个能量传递区域的热能级别，以允许控制器36实时地调整每个区域发射的次级辐射，从而导致基板20上预定和受控的热能分布。能量传递装置40可以具有多个发射和导热的同心环通过降低的发射率和降低的热导率区域（例如自由空间间隙42）彼此分离。或者，具有发射涂层或发射表面52的固体板54可以具有降低的发射率和降低的电导率隔离区域，例如用于定义多区高发射率和高导热性的沟槽56 ergy转移区域。

8. 发明授权

US6004029A Method for automated calibration of temperature sensors in rapid thermal processing equipment 失效
标题翻译：快速热处理设备中温度传感器的自动校准方法
公开(公告)号：US6004029A
公开(公告)日：1999-12-21
申请号：US680244
申请日：1996-07-10
申请人： Mehrdad M. Moslehi , Yong Jin Lee
发明人： Mehrdad M. Moslehi , Yong Jin Lee
IPC分类号： G01J5/10 , G01J5/52 , G01K1/14 , G01K15/00 , F27D11/00 , H01L21/02
CPC分类号： G01K1/146 , G01J5/10 , G01J5/522 , G01K15/00
摘要： This invention presents an automatic calibration system and method for calibration of a substrate temperature sensor in a thermal processing equipment, such as a rapid thermal processing system. The calibration system includes a temperature-sensitive probe associated with the substrate temperature sensor to calibrate the substrate temperature sensor and an actuator to position the temperature-sensitive probe relative to the substrate during a calibration cycle. The actuator and temperature-sensitive probe of the automatic calibration system can be incorporated into the thermal processing equipment in order to maintain the thermal processing equipment cleanliness and integrity during a calibration cycle, and to allow rapid automated calibration. In the preferred embodiment of this invention, the temperature-sensitive probe and its actuator are implemented in the gas showerhead assembly of a rapid thermal processing system.
摘要翻译：本发明提出了一种用于在诸如快速热处理系统的热处理设备中校准衬底温度传感器的自动校准系统和方法。校准系统包括与衬底温度传感器相关联的温度敏感探针以校准衬底温度传感器，以及在校准周期期间相对于衬底定位温度敏感探针的致动器。自动校准系统的致动器和温度敏感探头可以并入热处理设备，以便在校准周期内保持热处理设备的清洁度和完整性，并允许快速自动校准。在本发明的优选实施例中，温度敏感探针及其致动器被实现在快速热处理系统的气体喷头组件中。

9. 发明授权

US5871588A Programmable ultraclean electromagnetic substrate rotation apparatus and method for microelectronics manufacturing equipment 失效
标题翻译：用于微电子制造设备的可编程超声电磁基板旋转装置和方法
公开(公告)号：US5871588A
公开(公告)日：1999-02-16
申请号：US677980
申请日：1996-07-10
申请人： Mehrdad M. Moslehi , Yong Jin Lee
发明人： Mehrdad M. Moslehi , Yong Jin Lee
IPC分类号： C23C16/44 , C23C16/458 , H01L21/205 , H01L21/683 , H01L21/687 , H02K21/14 , C23C16/00
CPC分类号： H01L21/68792 , C23C16/4584
摘要： An apparatus and method for wafer rotation in microelectronics manufacturing equipment is presented. The present invention combines an external stator assembly having a plurality of electromagnetic actuator coils with an internal rotor assembly having a plurality of multipolar permanent magnets or ferromagnetic coupling tabs. The rotor assembly supports the semiconductor wafer or any other substrate inside the process chamber. The electromagnetic actuator coils of the stator assembly receive a plurality of multi-phase, controlled frequency electrical currents to create magnetic fields around the actuator coils that interact with the multipolar permanent magnets or ferromagnetic coupling tabs of the rotor assembly to provide the rotational force to rotate the rotor assembly and thus, rotate the semiconductor wafer or any other substrate within the process chamber.
摘要翻译：介绍了微电子制造设备中晶圆旋转的装置和方法。本发明将具有多个电磁致动器线圈的外部定子组件与具有多个多极永磁体或铁磁耦合片的内部转子组件组合。转子组件支撑半导体晶片或处理室内部的任何其它基板。定子组件的电磁致动器线圈接收多个多相控制频率电流，以产生围绕致动器线圈的磁场，该磁场与转子组件的多极永磁体或铁磁耦合接头相互作用以提供旋转力转子组件并因此使半导体晶片或处理室内的任何其它基板旋转。

10. 发明授权

US06753272B1 High-performance energy transfer method for thermal processing applications 失效
标题翻译：用于热处理应用的高性能能量传递方法
公开(公告)号：US06753272B1
公开(公告)日：2004-06-22
申请号：US09669039
申请日：2000-09-25
申请人： Yong Jin Lee , Mehrdad M. Moslehi , Jalil Kamali , Sergey Belikov
发明人： Yong Jin Lee , Mehrdad M. Moslehi , Jalil Kamali , Sergey Belikov
IPC分类号： H01L21324
CPC分类号： H01L21/67115 , C23C16/481
摘要： An apparatus and method supports thermal processing of a microelectronic device such as a semiconductor chip in a substrate by heating the substrate with secondary radiation from an energy transfer device 40, which has a first set of energy transfer regions comprised of an emissive and thermally conductive material, and a second set of thermally insulating regions comprised of a reduced emissivity and reduced thermal conductivity material or free space. A multi-zone-radiant energy source 30 provides radiative energy to energy transfer device 40, with a process controller 36, preferably a multi-zone controller, altering the amount of energy provided by each heat zone associated with each emissive region of energy transfer device 40. Sensors detect the thermal energy level of each energy transfer region to allow controller 36 to adjust the secondary radiation emitted by each region in real time, resulting in a predetermined and controlled distribution of thermal energy on substrate 20. Energy transfer device 40 can have plural emissive and thermally conductive concentric rings separated from each other by reduced emissivity and reduced thermal conductivity regions such as free space gaps 42. Alternatively, a solid plate 54 having an emissive coating or emissive surface 52 can have reduced emissivity and reduced conductivity isolation regions such as trenches 56 for defining the multi-zone high-emissivity and high thermal conductivity energy transfer regions.
摘要翻译：一种装置和方法通过用来自能量转移装置40的二次辐射加热衬底来支持诸如半导体芯片之类的微电子器件的热处理，该能量转移装置具有由发射和导热材料组成的第一组能量转移区以及由减少的发射率和降低的热导率材料或自由空间组成的第二组热绝缘区域。多区域辐射能量源30向能量传递装置40提供辐射能，其中过程控制器36，优选地，多区域控制器，改变与能量传递装置的每个发射区域相关联的每个加热区域提供的能量的量传感器检测每个能量转移区域的热能水平，以允许控制器36实时地调整由每个区域发射的次级辐射，从而导致基板20上预定和受控的热能分布。能量传递装置40可具有多个发射和导热的同心环通过降低的发射率和降低的热导率区域（例如自由空间间隙42）彼此分离。或者，具有发射涂层或发射表面52的固体板54可以具有降低的发射率和降低的电导率隔离区域，作为用于限定多区高发射率和高热导率的沟槽56 ergy转移区域。

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