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    • 1. 发明申请
    • Apparatus and method for implementing flexible page layout
    • 实现灵活页面布局的装置和方法
    • US20070106935A1
    • 2007-05-10
    • US11580209
    • 2006-10-12
    • Yi SuJianjun LiuYongsheng GuoZhixiong Zhang
    • Yi SuJianjun LiuYongsheng GuoZhixiong Zhang
    • G06F17/00
    • G06F17/248G06F16/9577G06F17/212
    • An apparatus and a method for implementing a flexible page layout. The apparatus includes: a page presentation unit, for providing at least one presentation mode of the page layout; a page control unit connected with the page presentation unit, for selecting resources supported by the user terminal, loading the resources to the page presentation unit, and generating a display page for providing to the user. The method includes: providing at least one presentation mode of the page layout; selecting resources supported by the user terminal, loading the resources according to the at least one presentation mode, and generating a display page. According to the invention, page layout diversification may be realized and various types of contents may be loaded in a page flexibly.
    • 一种用于实现灵活页面布局的设备和方法。 该装置包括:页面呈现单元,用于提供页面布局的至少一个呈现模式; 与页面呈现单元连接的页面控制单元,用于选择用户终端支持的资源,将资源加载到页面呈现单元,以及生成用于提供给用户的显示页面。 该方法包括:提供页面布局的至少一个呈现模式; 选择由用户终端支持的资源,根据至少一个呈现模式加载资源,以及生成显示页面。 根据本发明,可以实现页面布局多样化,并且可以灵活地在页面中加载各种类型的内容。
    • 4. 发明申请
    • APPROACH TO INTEGRATE SCHOTTKY IN MOSFET
    • 在MOSFET中整合肖特基的方法
    • US20140151790A1
    • 2014-06-05
    • US13873017
    • 2013-04-29
    • Sik LuiYi SuDaniel NgAnup Bhalla
    • Sik LuiYi SuDaniel NgAnup Bhalla
    • H01L29/78H01L29/66
    • H01L29/7806H01L27/0629H01L29/0619H01L29/0623H01L29/1095H01L29/41766H01L29/66734H01L29/7813H01L29/872H01L29/8725
    • An integrated structure combines field effect transistors and a Schottky diode. Trenches formed into a substrate composition extend along a depth of the substrate composition forming mesas therebetween. Each trench is filled with conductive material separated from the trench walls by dielectric material forming a gate region. Two first conductivity type body regions inside each mesa form wells partly into the depth of the substrate composition. An exposed portion of the substrate composition separates the body regions. Second conductivity type source regions inside each body region are adjacent to and on opposite sides of each well. Schottky barrier metal inside each well forms Schottky junctions at interfaces with exposed vertical sidewalls of the exposed portion of the substrate composition separating the body regions.
    • 集成结构结合了场效应晶体管和肖特基二极管。 形成衬底组合物的沟槽沿其中形成台面的衬底组合物的深度延伸。 每个沟槽填充有导电材料,该导电材料通过形成栅极区域的电介质材料与沟槽壁分离。 每个台面形状内部的两个第一导电类型体区部分地沉积到基底组合物的深度中。 衬底组合物的暴露部分分离身体区域。 每个身体区域内的第二导电类型源区域与每个孔的相邻侧和相邻侧相邻。 每个孔内的肖特基势垒金属在分离体区的基底组合物的暴露部分的暴露的垂直侧壁的界面处形成肖特基结。
    • 7. 发明授权
    • Approach to integrate Schottky in MOSFET
    • 将肖特基集成在MOSFET中的方法
    • US08431470B2
    • 2013-04-30
    • US13079675
    • 2011-04-04
    • Sik LuiYi SuDaniel NgAnup Bhalla
    • Sik LuiYi SuDaniel NgAnup Bhalla
    • H01L21/28H01L21/02
    • H01L29/7806H01L27/0629H01L29/0619H01L29/0623H01L29/1095H01L29/41766H01L29/66734H01L29/7813H01L29/872H01L29/8725
    • An integrated structure combines field effect transistors and a Schottky diode. Trenches formed into a substrate composition extend along a depth of the substrate composition forming mesas therebetween. Each trench is filled with conductive material separated from the trench walls by dielectric material forming a gate region. Two first conductivity type body regions inside each mesa form wells partly into the depth of the substrate composition. An exposed portion of the substrate composition separates the body regions. Second conductivity type source regions inside each body region are adjacent to and on opposite sides of each well. Schottky barrier metal inside each well forms Schottky junctions at interfaces with exposed vertical sidewalls of the exposed portion of the substrate composition separating the body regions.
    • 集成结构结合了场效应晶体管和肖特基二极管。 形成衬底组合物的沟槽沿其中形成台面的衬底组合物的深度延伸。 每个沟槽填充有导电材料,该导电材料通过形成栅极区域的电介质材料与沟槽壁分离。 每个台面形状内部的两个第一导电类型体区部分地沉积到基底组合物的深度中。 衬底组合物的暴露部分分离身体区域。 每个身体区域内的第二导电类型源区域与每个孔的相邻侧和相邻侧相邻。 每个孔内的肖特基势垒金属在分离体区的基底组合物的暴露部分的暴露的垂直侧壁的界面处形成肖特基结。