专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US06767322B1 Endoscope device 有权
标题翻译：内窥镜装置
公开(公告)号：US06767322B1
公开(公告)日：2004-07-27
申请号：US09588704
申请日：2000-06-06
申请人： Yasuyuki Futatsugi , Masakazu Higuma , Yosuke Yoshimoto , Ichiro Nakamura , Takao Yamaguchi , Takeaki Nakamura , Takahiro Kishi , Yasuhito Kura , Jun Hiroya
发明人： Yasuyuki Futatsugi , Masakazu Higuma , Yosuke Yoshimoto , Ichiro Nakamura , Takao Yamaguchi , Takeaki Nakamura , Takahiro Kishi , Yasuhito Kura , Jun Hiroya
IPC分类号： A61F105
CPC分类号： G02B7/008 , A61B1/00096 , A61B1/00188 , G02B23/243 , G02B23/2461
摘要： A cover glass frame as a second frame body mounting thereto a cover glass is fitted onto an objective lens frame, which is a first frame body mounting thereto a tip end lens and an objective lens as optical members, in a manner to be movable in a direction of optical axis, and is fixed after having been adjusted in position in the direction of optical axis. The objective lens frame and the cover glass frame thus fitted and fixed are fitted into and joined to a cylindrical member to constitute an imaging unit, which is then arranged in a tip end portion of an insertion part of an endoscope. Thereby, focus adjustment can be performed on the optical members, which are assembled into the imaging unit, and a tip end side portion of the insertion part of the endoscope can be made small in outer diameter to prevent entry of vapor into the imaging unit even when autoclave sterilization is carried out.
摘要翻译：将作为安装在其上的玻璃罩的第二框体的玻璃框架安装在物镜框架上，该物镜框架以可移动的方式安装在作为光学构件的顶端透镜和物镜上的第一框架体光轴的方向，并且在沿光轴方向调整位置之后被固定。这样安装和固定的物镜框架和盖玻璃框架装配到圆柱形构件中并连接到圆柱形构件上，以构成成像单元，该成像单元然后被布置在内窥镜的插入部分的末端部分中。由此，可以对组装到摄像单元中的光学构件进行聚焦调节，并且可以使内窥镜的插入部的前端侧部分的外径小，以防止蒸气进入成像单元甚至当进行高压灭菌时。

2. 再颁专利

USRE43281E1 Endoscope capable of being autoclaved 有权
标题翻译：内窥镜能够高压灭菌
公开(公告)号：USRE43281E1
公开(公告)日：2012-03-27
申请号：US11108104
申请日：2005-04-15
申请人： Masakazu Higuma , Yasuyuki Futatsugi , Takeaki Nakamura , Yosuke Yoshimoto , Takahiro Kishi , Yasuhito Kura , Yutaka Tatsuno , Takao Yamaguchi , Susumu Aono , Ichiro Nakamura , Jun Hiroya , Hidetoshi Saito , Kazutaka Nakatsuchi
发明人： Masakazu Higuma , Yasuyuki Futatsugi , Takeaki Nakamura , Yosuke Yoshimoto , Takahiro Kishi , Yasuhito Kura , Yutaka Tatsuno , Takao Yamaguchi , Susumu Aono , Ichiro Nakamura , Jun Hiroya , Hidetoshi Saito , Kazutaka Nakatsuchi
IPC分类号： A61B1/005
摘要： An endoscope capable of being autoclaved in accordance with the present invention includes an insertion unit, an internal endoscope space, and contents. The insertion unit has a soft member, which is made of a soft polymeric material, as at least part of a casing thereof. The internal endoscope space includes the internal space of the insertion unit that is formed at a first sealing level at which the internal space is sealed in a watertight manner relative to an outside. The contents include at least one hermetically sealed unit composed of a plurality of airtight partition members and formed at a second sealing level higher than the first sealing level by joining the meeting portions of the airtight partition members using an airtight joining material. All or part of the airtight partition members is stowed in the internal endoscope space. Even when high-pressure high-temperature steam permeates through the soft member of the insertion unit which is made of a polymeric material, and invades into the internal endoscope space formed at the first sealing level, the high-pressure high-temperature steam will be hindered from invading into the hermetically sealed unit included in the contents and formed at the second sealing level.
摘要翻译：根据本发明的能够进行高压灭菌的内窥镜包括插入单元，内部内窥镜空间和内容物。插入单元具有作为其壳体的至少一部分的由柔性聚合物材料制成的软构件。内窥镜空间包括插入单元的内部空间，该内部空间形成在第一密封水平处，其中内部空间相对于外部以防水的方式被密封。内容物包括至少一个密封单元，由多个气密分隔构件组成，并且通过使用气密接合材料连接密封分隔构件的会合部分，形成在比第一密封水平高的第二密封水平。全部或部分气密分隔部件收纳在内窥镜空间内。即使当高压高温蒸汽穿过由聚合材料制成的插入单元的软构件并且侵入形成在第一密封水平的内窥镜空间时，高压高温蒸汽将妨碍入侵包含在内容物中的密封单元并形成在第二密封水平。

3. 发明授权

US06547721B1 Endoscope capable of being autoclaved 有权
标题翻译：内窥镜能够高压灭菌
公开(公告)号：US06547721B1
公开(公告)日：2003-04-15
申请号：US09370659
申请日：1999-08-06
申请人： Masakazu Higuma , Yasuyuki Futatsugi , Takeaki Nakamura , Yosuke Yoshimoto , Takahiro Kishi , Yasuhito Kura , Yutaka Tatsuno , Takao Yamaguchi , Susumu Aono , Ichiro Nakamura , Jun Hiroya , Hidetoshi Saito , Kazutaka Nakatsuchi
发明人： Masakazu Higuma , Yasuyuki Futatsugi , Takeaki Nakamura , Yosuke Yoshimoto , Takahiro Kishi , Yasuhito Kura , Yutaka Tatsuno , Takao Yamaguchi , Susumu Aono , Ichiro Nakamura , Jun Hiroya , Hidetoshi Saito , Kazutaka Nakatsuchi
IPC分类号： A61B1005
CPC分类号： A61B1/121 , A61B1/00075 , A61B1/00096 , A61B1/0011 , A61B1/051 , A61L2/07 , G02B23/2476 , G02B23/2492
摘要： An endoscope capable of being autoclaved in accordance with the present invention includes an insertion unit, an internal endoscope space, and contents. The insertion unit has a soft member, which is made of a soft polymeric material, as at least part of a casing thereof. The internal endoscope space includes the internal space of the insertion unit that is formed at a first sealing level at which the internal space is sealed in a watertight manner relative to an outside. The contents include at least one hermetically sealed unit composed of a plurality of airtight partition members and formed at a second sealing level higher than the first sealing level by joining the meeting portions of the airtight partition members using an airtight joining material. All or part of the airtight partition members is stowed in the internal endoscope space. Even when high-pressure high-temperature steam permeates through the soft member of the insertion unit which is made of a polymeric material, and invades into the internal endoscope space formed at the first sealing level, the high-pressure high-temperature steam will be hindered from invading into the hermetically sealed unit included in the contents and formed at the second sealing level.
摘要翻译：根据本发明的能够进行高压灭菌的内窥镜包括插入单元，内部内窥镜空间和内容物。插入单元具有作为其壳体的至少一部分的由柔性聚合物材料制成的软构件。内窥镜空间包括插入单元的内部空间，该内部空间形成在第一密封水平处，其中内部空间相对于外部以防水的方式被密封。内容物包括至少一个密封单元，由多个气密分隔构件组成，并且通过使用气密接合材料连接密封分隔构件的会合部分，形成在比第一密封水平高的第二密封水平。全部或部分气密分隔部件收纳在内窥镜空间内。即使当高压高温蒸汽穿过由聚合材料制成的插入单元的软构件并且侵入形成在第一密封水平的内窥镜空间时，高压高温蒸汽将妨碍入侵包含在内容物中的密封单元并形成在第二密封水平。

4. 发明授权

US06716161B2 Endoscope suitable for autoclave sterilization 失效
标题翻译：内窥镜适用于高压灭菌
公开(公告)号：US06716161B2
公开(公告)日：2004-04-06
申请号：US10097463
申请日：2002-03-13
申请人： Masakazu Higuma , Yasuyuki Futatsugi , Ichiro Nakamura , Yosuke Yoshimoto , Hidetoshi Saito , Susumu Aono , Takao Yamaguchi , Yutaka Tatsuno , Takahiro Kishi , Yasuhito Kura , Kazutaka Nakatsuchi , Takeaki Nakamura
发明人： Masakazu Higuma , Yasuyuki Futatsugi , Ichiro Nakamura , Yosuke Yoshimoto , Hidetoshi Saito , Susumu Aono , Takao Yamaguchi , Yutaka Tatsuno , Takahiro Kishi , Yasuhito Kura , Kazutaka Nakatsuchi , Takeaki Nakamura
IPC分类号： A61B104
CPC分类号： A61B1/00188 , A61B1/00195 , A61B1/121 , A61L2/07 , G02B23/2423 , G02B23/2453 , G02B23/26
摘要： An endoscope suitable for autoclave sterilization includes an insertion section having an objective lens section disposed at the extreme end thereof for focusing a subject image and an eyepiece section located on the base end side of the inserting section and including at least an eyepiece lens. an image guide fiber is disposed in the bundle for transmitting the subject image in an observation section focused by the objective lens section. An eyepiece lens unit is disposed in the eyepiece section, the eyepiece lens unit causing the eyepiece lens to confront the base end structure whose hermetic seal level is higher than the watertight seal level of the shell of the endoscope. A focus position changing means is disposed to the eyepiece lens unit to change the focus position of the eyepiece lens. The eyepiece section is so constructed and/or assembled that the autoclave sterilization process does not cause water vapor or the like to adversely affect the operability of the eyepiece section.
摘要翻译：适用于高压灭菌器的内窥镜包括：插入部，其具有设置在其前端的物镜部分，用于聚焦被摄体图像;以及目镜部分，位于插入部分的基端侧，并且至少包括目镜。图像引导光纤布置在用于在由物镜部分聚焦的观察部分中传送被摄体图像的束中。目镜透镜单元设置在目镜部分中，目镜透镜单元使目镜透镜面对密封水平高于内窥镜壳体的防水密封水平的基端结构。焦点位置改变装置设置在目镜透镜单元上以改变目镜透镜的对焦位置。目镜部分是如此构造和/或组装，使得高压灭菌器灭菌过程不会引起水蒸气等不利地影响目镜部分的可操作性。

5. 发明申请

US20050000553A1 High temperature and pressure steam sterilization container for endoscope, and endoscope cleaning and sterilizing device 审中-公开
标题翻译：高温高压蒸汽灭菌容器内窥镜，内窥镜清洗消毒装置
公开(公告)号：US20050000553A1
公开(公告)日：2005-01-06
申请号：US10900929
申请日：2004-07-28
申请人： Toshiaki Noguchi , Hiroki Moriyama , Ryu Oshima , Shoichi Amano , Kota Ishibiki , Koji Morishita , Yasuyuki Futatsugi , Hitoshi Hasegawa , Mikihiko Nakagawa , Yosuke Yoshimoto , Yoshio Tashiro , Masakazu Higuma
发明人： Toshiaki Noguchi , Hiroki Moriyama , Ryu Oshima , Shoichi Amano , Kota Ishibiki , Koji Morishita , Yasuyuki Futatsugi , Hitoshi Hasegawa , Mikihiko Nakagawa , Yosuke Yoshimoto , Yoshio Tashiro , Masakazu Higuma
IPC分类号： A61L2/24 , A61B1/00 , A61B1/12 , A61B19/00 , A61L2/06 , A61L2/07 , A61L2/18 , A61L2/26 , B08B3/00 , G02B23/24
CPC分类号： A61L2/24 , A61B1/00144 , A61B1/123 , A61B1/125 , A61B2090/701 , A61L2/07 , A61L2/18 , A61L2/26 , A61L2202/122 , A61L2202/17 , A61L2202/24
摘要： A high temperature and pressure steam sterilization container for an endoscope, which contains the endoscope to perform a high temperature and pressure steam sterilization, is contained in a cleaner so that cleaning is possible in a state in which the endoscope is stored.
摘要翻译：一种用于内窥镜的高温高压蒸汽消毒容器，其包含用于进行高温高压蒸汽灭菌的内窥镜，被包含在清洁器中，使得能够在内窥镜被存储的状态下进行清洁。

6. 发明授权

US06547722B1 Endoscope having resistance to high-temperature and high-pressure steam 有权
标题翻译：内窥镜耐高温高压蒸汽
公开(公告)号：US06547722B1
公开(公告)日：2003-04-15
申请号：US09613370
申请日：2000-07-10
申请人： Masakazu Higuma , Yasuyuki Futatsugi , Susumu Aono
发明人： Masakazu Higuma , Yasuyuki Futatsugi , Susumu Aono
IPC分类号： A61B104
CPC分类号： A61B1/00096 , A61B1/00101 , A61B1/0011 , A61B1/05
摘要： An endoscope having resistance to high-temperature and high-pressure steam including an optical unit having at least one optical member; and optical unit supporting frame for supporting the optical unit so that its position can be adjusted in the direction of the optical axis; and a hermetic optical covering member joined to the optical unit supporting frame and having an optical window for covering at least an end portion of the optical unit when it is joined.
摘要翻译：一种具有耐高温和高压蒸汽的内窥镜，包括具有至少一个光学构件的光学单元; 以及用于支撑光学单元的光学单元支撑框架，使得其位置可以在光轴的方向上调节; 以及连接到光学单元支撑框架并且具有用于在光学单元接合时至少覆盖光学单元的端部的光学窗口的密封性光学覆盖部件。

7. 发明申请

US20090199967A1 MOUNTING STAGE AND PLASMA PROCESSING APPARATUS 审中-公开
标题翻译：安装阶段和等离子体加工设备
公开(公告)号：US20090199967A1
公开(公告)日：2009-08-13
申请号：US12365385
申请日：2009-02-04
申请人： Shinji Himori , Yasuharu Sasaki , Masakazu Higuma
发明人： Shinji Himori , Yasuharu Sasaki , Masakazu Higuma
IPC分类号： C23F1/08
CPC分类号： H01L21/6833 , H01J37/20 , H01J37/32091 , H01J2237/0209 , H02N13/00
摘要： A mounting stage for a plasma processing apparatus that can prevent degradation of an insulating film in a semiconductor device on a substrate. A conductor member is connected to a radio-frequency power source for producing plasma. A dielectric layer is buried in a central portion of an upper surface of the conductor member. An electrostatic chuck is mounted on the dielectric layer. The electrostatic chuck has an electrode film that satisfies the following condition: δ/z≧85 where δ=(ρv/(μπf))1/2 where z is the thickness of the electrode film, δ is the skin depth of the electrode film with respect to radio-frequency electrical power supplied from the radio-frequency power source, f is the frequency of the radio-frequency electrical power, π is the ratio of a circumference of a circle to its diameter, μ is the magnetic permeability of the electrode film, and ρv is the specific resistance of the electrode film.
摘要翻译：一种等离子体处理装置的安装平台，其能够防止基板上的半导体装置中的绝缘膜的劣化。导体构件连接到用于产生等离子体的射频电源。电介质层埋在导体部件的上表面的中心部分。静电卡盘安装在电介质层上。静电吸盘具有满足以下条件的电极膜：<？in-line-formula description =“In-line formula”end =“lead”？> delta / z> = 85 <？in-line-formula description = “直线公式”end =“tail”？>其中delta =（rhov /（mupif））1/2其中z是电极膜的厚度，delta是电极膜相对于放射线的厚度， f是射频电力的频率，pi是圆周长与其直径的比率，μ是电极膜的导磁率，rhov 是电极膜的电阻率。

8. 发明申请

US20080280536A1 SURFACE TREATMENT METHOD 有权
标题翻译：表面处理方法
公开(公告)号：US20080280536A1
公开(公告)日：2008-11-13
申请号：US11687879
申请日：2007-03-19
申请人： Yasuharu Sasaki , Masakazu Higuma , Tadashi Aoto , Eiichiro Kikuchi
发明人： Yasuharu Sasaki , Masakazu Higuma , Tadashi Aoto , Eiichiro Kikuchi
IPC分类号： B24B1/00
CPC分类号： B24B1/00 , B24B21/04
摘要： A surface treatment method that enables a surface of an electrostatic chuck to be smoothed, so as to improve the efficiency of heat transfer between the surface of the electrostatic chuck and a substrate. The electrostatic chuck is provided in an upper portion of a susceptor provided in a chamber of a substrate processing apparatus. In the surface treatment of the electrostatic chuck, a sprayed coating film is formed on the surface of the electrostatic chuck, next the surface of the electrostatic chuck is ground by bringing into contact therewith a grindstone, then the surface of the electrostatic chuck is ground flat by bringing into contact therewith a lapping plate onto a surface of which is sprayed a suspension, and then the surface of the electrostatic chuck is ground smooth by bringing into contact therewith a tape of a tape lapping apparatus.
摘要翻译：能够平滑静电卡盘的表面的表面处理方法，以提高静电卡盘的表面与基板之间的热传递效率。静电吸盘设置在设置在基板处理装置的室中的基座的上部。在静电卡盘的表面处理中，在静电卡盘的表面上形成喷涂膜，然后通过与磨石接触来研磨静电卡盘的表面，然后将静电卡盘的表面磨平通过与其接触的研磨板在其表面上喷涂悬浮液，然后通过与胶带研磨装置的带接触，将静电卡盘的表面研磨成平滑的。

9. 发明授权

US09214376B2 Substrate mounting stage and surface treatment method therefor 有权
标题翻译：基板安装台及其表面处理方法
公开(公告)号：US09214376B2
公开(公告)日：2015-12-15
申请号：US12028904
申请日：2008-02-11
申请人： Masakazu Higuma , Yasuharu Sasaki , Tadashi Aoto , Eiichiro Kikuchi
发明人： Masakazu Higuma , Yasuharu Sasaki , Tadashi Aoto , Eiichiro Kikuchi
IPC分类号： C23C16/50 , C23C16/00 , C23F1/00 , H01L21/306 , H01L21/687 , C23C16/458 , H01L21/673 , H01J37/20
CPC分类号： H01L21/68757 , C23C16/4581 , H01J37/20 , H01L21/67366 , H01L21/6875
摘要： A substrate mounting stage that prevents poor attraction of substrates so as to improve the operating rate of a substrate processing apparatus. The substrate mounting stage is disposed in the substrate processing apparatus and has a substrate mounting surface on which a substrate is mounted. The arithmetic average roughness (Ra) of the substrate mounting surface is not less than a first predetermined value, and the initial wear height (Rpk) of the substrate mounting surface is not more than a second predetermined value.
摘要翻译：一种基板安装台，其防止基板的吸引力降低，从而提高基板处理装置的运转速度。基板安装台设置在基板处理装置中，并且具有安装有基板的基板安装面。基板安装面的算术平均粗糙度（Ra）不小于第一预定值，并且基板安装面的初始磨损高度（Rpk）不大于第二预定值。

10. 发明申请

US20110192540A1 TABLE FOR PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING APPARATUS 审中-公开
标题翻译：等离子体处理装置和等离子体处理装置的表
公开(公告)号：US20110192540A1
公开(公告)日：2011-08-11
申请号：US13032360
申请日：2011-02-22
申请人： Masakazu Higuma , Shinji Himori , Shoichiro Matsuyama , Atsushi Matsuura
发明人： Masakazu Higuma , Shinji Himori , Shoichiro Matsuyama , Atsushi Matsuura
IPC分类号： H01L21/3065 , C23C16/50
CPC分类号： H01L21/6831 , H01J37/32532 , H01J2237/2001
摘要： An object of the present invention is to suppress damage of an electrostatic chuck, by controlling stress exerted on each part of a table, which includes an electrically conductive material, i.e., an electrode for generating plasma, a dielectric layer for enhancing the in-plane uniformity of a plasma process, and an electrostatic chuck. The table for a plasma processing apparatus includes an electrically conductive member connected with a high frequency power source and adapted for plasma generation, for drawing ions present in the plasma, or for both thereof; a dielectric layer provided on a top face of the electrically conductive member, having a central portion and a peripheral portion that are different in thickness relative to each other, and adapted for providing uniformity of high frequency electric field intensity in a plane over the substrate to be processed; and an electrode film for an electrostatic chuck, provided in the dielectric layer and adapted for electrostatically chucking the substrate onto a top face of the dielectric layer. With such configuration, the stress exerted on the electrostatic chuck due to temperature change can be controlled.
摘要翻译：本发明的一个目的是通过控制施加在桌子的每个部分上的应力来抑制静电卡盘的损坏，包括导电材料即用于产生等离子体的电极，用于增强平面内的电介质层等离子体工艺的均匀性和静电卡盘。用于等离子体处理装置的工作台包括与高频电源连接并适于等离子体产生的导电构件，用于吸收存在于等离子体中的离子，或者用于两者; 设置在所述导电构件的顶面上的电介质层，具有相对于彼此不同厚度的中心部分和周边部分，并且适于提供在所述基板上的平面中的高频电场强度的均匀性，被处理和用于静电卡盘的电极膜，设置在电介质层中并适用于将电极静电夹持在电介质层的顶面上。通过这样的结构，可以控制由于温度变化而施加在静电卡盘上的应力。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式