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1. 发明授权

US06767641B1 Method for sealing fine groove with siliceous material and substrate having siliceous coating formed thereon 有权
标题翻译：用硅质材料密封细槽的方法和在其上形成有硅质涂层的基材
公开(公告)号：US06767641B1
公开(公告)日：2004-07-27
申请号：US10258285
申请日：2002-10-23
申请人： Yasuo Shimizu , Yuuji Tashiro , Tomoko Aoki
发明人： Yasuo Shimizu , Yuuji Tashiro , Tomoko Aoki
IPC分类号： B32B900
CPC分类号： C23C18/122 , C23C18/1212 , H01L21/02126 , H01L21/02222 , H01L21/02282 , H01L21/02337 , H01L21/3122 , H01L21/3125 , H01L21/76229 , H01L21/76232 , Y10T428/24273 , Y10T428/24298 , Y10T428/24942
摘要： A method for sealing a fine groove with a siliceous material, characterized as comprising applying a solution of a perhydropolysilazane having a weight average molecular weight in the range of 3,000 to 20,000 in terms of polystyrene to a substrate having at least one groove having a width of 0.2 &mgr;m or less at its deepest portion and having a ratio of the corresponding depth to the width of 2 or more, to thereby fill and seal the groove with the perhydropolysilazane, and then heating the perhydropolysilazane in an atmosphere containing water vapor to thereby convert the perhydropolysilazane to a siliceous material.
摘要翻译：一种用硅质材料密封微细凹槽的方法，其特征在于包括以聚苯乙烯换算重均分子量在3,000至20,000范围内的全氢聚硅氮烷溶液至具有至少一个宽度为其最深部分为0.2μm或更小，并且具有相应的深度与宽度的比值为2或更大，从而用全氢硅氮烷填充和密封凹槽，然后在含水蒸汽的气氛中加热全氢聚硅氮烷，从而将全氢硅氮烷至硅质材料。

2. 发明授权

US06746714B2 Porous silica coating with low dielectric constant, semiconductor device and coating composition 有权
标题翻译：具有低介电常数的多孔二氧化硅涂层，半导体器件和涂层组成
公开(公告)号：US06746714B2
公开(公告)日：2004-06-08
申请号：US10370588
申请日：2003-02-24
申请人： Tomoko Aoki , Yasuo Shimizu
发明人： Tomoko Aoki , Yasuo Shimizu
IPC分类号： B05D302
CPC分类号： H01L21/31695 , C09D183/16 , H01L21/02164 , H01L21/02203 , H01L21/02222 , H01L21/02282 , H01L21/02337 , H01L21/3125 , C08L2666/04
摘要： A coating composition having an aluminum-containing polysilazane and a polyacrylate or polymethacrylate ester in an organic solvent and methods of producing the same.
摘要翻译：一种在有机溶剂中具有含铝聚硅氮烷和聚丙烯酸酯或聚甲基丙烯酸酯的涂料组合物及其制备方法。

3. 发明授权

US06310168B1 Aminated polysilazane and process for the preparation thereof 有权
标题翻译：氨基化聚硅氮烷及其制备方法
公开(公告)号：US06310168B1
公开(公告)日：2001-10-30
申请号：US09485174
申请日：2000-02-07
申请人： Yasuo Shimizu , Tomoko Aoki , Osamu Funayama
发明人： Yasuo Shimizu , Tomoko Aoki , Osamu Funayama
IPC分类号： C08G7762
CPC分类号： C08G77/62 , C08G77/54
摘要： An amine residue-containing polysilazane having a number average molecular weight of 100-100,000 and having a molecular chain containing a silazane structure represented by the general formula (I) shown below and/or a silazane structure represented by the general formula (II) shown below: wherein R1 and R2 each stand for hydrogen, a hydrocarbyl group or a hydrocarbyl group-containing silyl group, A and A2 each stand for a divalent hydrocarbyl group, B stands for an N-hydrocarbyl group-substituted amine residue or a cyclic amine residue, B2 stands for a divalent linear amine residue or a divalent cyclic amine residue and p, r and q are each 0 or 1. The above polysilazane may be obtained by reacting a polysilazane with a mono- and/or dihydroxyl compound having an amine residue in an inert organic solvent containing no active hydrogen.
摘要翻译：具有数均分子量为100〜1000000，含有下述通式（I）所示的硅氮烷结构的分子链和/或由通式（II）表示的硅氮烷结构的含胺残基的聚硅氮烷其中R1和R2各自表示氢，烃基或含烃基的甲硅烷基，A和A2各自表示二价烃基，B表示N-烃基取代的胺残基或环状胺残基，B2表示二价线性胺残基或二价环状胺残基，p，r和q各自为0或1.上述聚硅氮烷可以通过使聚硅氮烷与具有胺的单和/或二羟基化合物残余物在不含活性氢的惰性有机溶剂中。

4. 发明授权

US5436398A Polymetalosilazane, process of producing same, silicon nitride based ceramic, and process of preparing same 失效
标题翻译：聚甲硅氮烷，其制备方法，氮化硅基陶瓷及其制备方法
公开(公告)号：US5436398A
公开(公告)日：1995-07-25
申请号：US223866
申请日：1994-04-06
申请人： Yasuo Shimizu , Hirohiko Nakahara , Tomoko Aoki , Osamu Funayama , Takeshi Isoda
发明人： Yasuo Shimizu , Hirohiko Nakahara , Tomoko Aoki , Osamu Funayama , Takeshi Isoda
IPC分类号： C04B35/589 , C08G77/48 , C08G77/62 , C08G79/00 , D01F9/10 , C08L83/04
CPC分类号： D01F9/10 , C04B35/589 , C08G77/62 , C08G79/00
摘要： A preceramic polymetalosilazane substantially free of Si-O groups is produced by reacting a polysilazane with a metal alkoxide in the presence of an alkylsilazane or alkylsilane. The preceramic polymer gives a high strength and heat resistant ceramic body which remains amorphous when calcined at 1,600.degree. C. for 10 hours in the atmosphere of nitrogen.
摘要翻译：通过在烷基硅氮烷或烷基硅烷的存在下使聚硅氮烷与金属醇盐反应来制备基本上不含Si-O基的预陶瓷聚金属硅氮烷。陶瓷聚合物提供了一种高强度和耐热的陶瓷体，当在氮气气氛中在1600℃下煅烧10小时时，其保持无定形。

5. 发明授权

US5459114A Method for producing ceramic products 失效
标题翻译：陶瓷制品的制造方法
公开(公告)号：US5459114A
公开(公告)日：1995-10-17
申请号：US256807
申请日：1994-07-25
申请人： Hiroshi Kaya , Kiyoshi Sato , Hiroki Morozumi , Atushi Tezuka , Tomoko Aoki , Hirohiko Nakahara , Tadashi Suzuki , Takeshi Isoda
发明人： Hiroshi Kaya , Kiyoshi Sato , Hiroki Morozumi , Atushi Tezuka , Tomoko Aoki , Hirohiko Nakahara , Tadashi Suzuki , Takeshi Isoda
IPC分类号： C04B35/589 , C04B35/80 , C04B41/45 , C04B41/50 , C04B41/52 , C04B41/81 , C04B41/87 , C04B41/89 , C04B35/58
CPC分类号： C04B41/009 , C04B35/589 , C04B35/80 , C04B35/806 , C04B41/4554 , C04B41/5053 , C04B41/52 , C04B41/81 , C04B41/87 , C04B41/89
摘要： Repetition of a process of impregnating a metal fiber or ceramic fiber preform or porous ceramic with (3) a mixture of polysilazane-type polymers with a number average molecular weight of 200-3000 and a viscosity adjusted to 100 Pa.s or lower at the impregnation temperature, prepared by mixing (1) one or more types of polysilazane-type polymers with a number average molecular weight of 200-3000 and a viscosity of less than 1 Pa.s at the impregnation temperature with (2) one or more types of polysilazane-type polymers with a number average molecular weight of 200-100,000 and having a viscosity of 1 Pa.s or higher or solid at the impregnation temperature, which are selected from polysilazanes whose main repeating unit is --[(SiH.sub.2).sub.n (NH).sub.r ]-- (where n and r are 1, 2 or 3), and copolymers, modified polymers and crosslinked polymers based thereon, and performing crosslinking curing and then firing, is performed for its conversion into a ceramic. The above polysilazane may be, for example, an inorganic polysilazane, an inorganic polysiloxazane, a polyorgano(hydro)silazane, a modified polysilazane or a polymetallosilazane. By performing the CVD coating before or after said process of impregnation, curing and firing, delamination of the fibers may be minimized.
摘要翻译： PCT No.PCT / JP93 / 01730 Sec。 371日期：1994年7月25日 102（e）日期1994年7月25日PCT提交1993年11月26日PCT公布。公开号WO94 / 12448 日期：1994年6月9日。重复使用（3）数均分子量为200-3000的聚硅氮烷型聚合物和粘度调节至100的混合物浸渍金属纤维或陶瓷纤维预制体或多孔陶瓷的方法通过在浸渍温度下混合（1）数均分子量为200-3000和粘度小于1Pa.s的一种或多种聚硅氮烷型聚合物制备的浸渍温度下的Pa.s或更低，（2）一种或多种数均分子量为200-100,000，粘度为1Pa·s或更高的聚硅氮烷型聚合物或浸渍温度下的固体，其选自聚硅氮烷，其主要重复单元为 - [（SiH2）n（NH）r] - （其中n和r为1,2或3），并且基于其进行交联固化，然后进行烧结的共聚物，改性聚合物和交联聚合物进行转化为陶瓷。上述聚硅氮烷可以是例如无机聚硅氮烷，无机聚硅氮烷，聚有机（氢）硅氮烷，改性聚硅氮烷或聚金属硅氮烷。通过在所述浸渍，固化和焙烧过程之前或之后进行CVD涂层，可以使纤维的分层最小化。

6. 发明授权

US5248803A Silane compound and processes for the preparation thereof 失效
标题翻译：硅烷化合物及其制备方法
公开(公告)号：US5248803A
公开(公告)日：1993-09-28
申请号：US960585
申请日：1992-10-13
申请人： Tomoko Aoki , Kunihiko Imanishi , Ryuji Sato , Satoshi Ueki , Yoshiharu Okumura , Tadanao Kohara
发明人： Tomoko Aoki , Kunihiko Imanishi , Ryuji Sato , Satoshi Ueki , Yoshiharu Okumura , Tadanao Kohara
IPC分类号： C07F7/18
CPC分类号： C07F7/1836 , C07F7/188
摘要： Novel silane compound, alkoxy cyclopentyl dimethoxysilane, is prepared by reacting cyclopentyl trihalosilane with ROH and then with methanol, or by reacting cyclopentyl trimethoxysilane with ROH, wherein alkyl in the alkoxy or R in ROH stands for an organic group selected from the group consisting of sec-butyl, tert-amyl, cyclopentyl, oxa-3-cyclopentyl, cyclohexyl and 2-isopropyl-5-methyl cyclohexyl groups. The silane compounds are useful as a catalytic component for olefin polymerization and as a silane coupling agent.

7. 发明申请

US20060246303A1 Coating composition and low dielectric siliceous material produced by using same 有权
标题翻译：涂料组合物和使用相同的低介电硅质材料
公开(公告)号：US20060246303A1
公开(公告)日：2006-11-02
申请号：US10565429
申请日：2004-08-08
申请人： Tomoko Aoki , Hiroyuki Aoki
发明人： Tomoko Aoki , Hiroyuki Aoki
IPC分类号： C08G77/26 , B05D3/02 , B32B9/00
CPC分类号： C09D183/16 , C08K5/541 , H01L21/02126 , H01L21/02203 , H01L21/3125 , Y10T428/31663
摘要： The present invention provides a coating composition, which can simply produce a porous siliceous film having excellent mechanical strength and, at the same time, possessing a stable very low level of dielectric and good chemical resistance to various chemicals, and to provide a process for producing a siliceous material using the same. The coating composition according to the present invention comprises a polyalkylsilazane compound, an acetoxysilane compound, an organic solvent, and, if necessary, a pore forming material. The present invention also provides a siliceous material produced by firing the coating composition and a process for producing the same.
摘要翻译：本发明提供一种涂料组合物，其可以简单地制造具有优异的机械强度的多孔硅质膜，同时具有稳定的非常低的电介质水平和对各种化学品的良好的耐化学性，并且提供一种生产使用它的硅质材料。根据本发明的涂料组合物包含聚烷基硅氮烷化合物，乙酰氧基硅烷化合物，有机溶剂以及必要时的成孔材料。本发明还提供了通过烧制涂料组合物制备的硅质材料及其制备方法。

8. 发明申请

US20060217487A1 Phosphorus-containing silazane composition, phosphorus-containing siliceous film, phosphorus-containing siliceous filler, method for producing phosphorus-containing siliceous film, and semiconductor device 有权
标题翻译：含磷硅氮烷组合物，含磷硅质膜，含磷硅质填料，含磷硅质膜的制造方法以及半导体装置
公开(公告)号：US20060217487A1
公开(公告)日：2006-09-28
申请号：US10564336
申请日：2004-07-07
申请人： Tomoko Aoki , Hiroyuki Aoki
发明人： Tomoko Aoki , Hiroyuki Aoki
IPC分类号： C08L83/16 , C08K5/49
CPC分类号： H01L21/76837 , C08K5/49 , C08L83/16 , C09D183/16 , H01L21/314
摘要： An objective of the present invention is to provide a phosphorous-containing siliceous material having a specific permittivity of not more than 3.5. The phosphorus-containing silazane composition according to the present invention is characterized by comprising a polyalkylsilazane and at least one phosphorus compound in an organic solvent. A phosphorus-containing siliceous film may be formed by coating the composition onto a substrate to form a film which is then prebaked at a temperature of 50 to 300° C. and is then baked in an inert atmosphere at a temperature of 300 to 700° C. The phosphorus compound according to the present invention is preferably a pentavalent phosphoric ester or phosphazene compound.
摘要翻译：本发明的目的是提供具有不大于3.5的比介电常数的含磷硅质材料。根据本发明的含磷硅氮烷组合物的特征在于在有机溶剂中包含聚烷基硅氮烷和至少一种磷化合物。可以通过将组合物涂布在基材上形成含磷的硅质膜，以形成膜，然后在50至300℃的温度下预烘烤，然后在惰性气氛中在300至700℃的温度下烘烤 C.本发明的磷化合物优选为五价磷酸酯或磷腈化合物。

9. 发明授权

US5142082A Silane compound and processes for the preparation thereof 失效
标题翻译：硅烷化合物及其制备方法
公开(公告)号：US5142082A
公开(公告)日：1992-08-25
申请号：US787234
申请日：1991-11-04
申请人： Ryuji Sato , Satoshi Ueki , Tomoko Aoki , Yoshiharu Okumura
发明人： Ryuji Sato , Satoshi Ueki , Tomoko Aoki , Yoshiharu Okumura
IPC分类号： C07F7/18
CPC分类号： C07F7/1868 , C07F7/1836
摘要： Novel silane compounds, tert.-butoxy cyclopentyl dimethoxysilane and isopropoxy cyclopentyl dimethoxysilane, are prepared by reacting cyclopentyl trihalosilane with ROH (where R stands for tert.-butyl or isopropyl group) and then with methanol, or by reacting cyclopentyl trimethoxysilane with ROH. The silane compounds are useful as a catlaytic component for olefin polymerization and as a silane coupling agent.

10. 发明授权

US07754003B2 Coating composition and low dielectric siliceous material produced by using same 有权
标题翻译：涂料组合物和使用相同的低介电硅质材料
公开(公告)号：US07754003B2
公开(公告)日：2010-07-13
申请号：US10565429
申请日：2004-08-04
申请人： Tomoko Aoki , Hiroyuki Aoki
发明人： Tomoko Aoki , Hiroyuki Aoki
IPC分类号： C09D183/00 , B32B9/00
CPC分类号： C09D183/16 , C08K5/541 , H01L21/02126 , H01L21/02203 , H01L21/3125 , Y10T428/31663
摘要： The present invention provides a coating composition, which can simply produce a porous siliceous film having excellent mechanical strength and, at the same time, possessing a stable very low level of dielectric and good chemical resistance to various chemicals, and to provide a process for producing a siliceous material using the same. The coating composition according to the present invention comprises a polyalkylsilazane compound, an acetoxysilane compound, an organic solvent, and, if necessary, a pore forming material. The present invention also provides a siliceous material produced by firing the coating composition and a process for producing the same.
摘要翻译：本发明提供一种涂料组合物，其可以简单地制造具有优异的机械强度的多孔硅质膜，同时具有稳定的非常低的电介质水平和对各种化学品的良好的耐化学性，并且提供一种生产使用它的硅质材料。根据本发明的涂料组合物包含聚烷基硅氮烷化合物，乙酰氧基硅烷化合物，有机溶剂以及必要时的成孔材料。本发明还提供了通过烧制涂料组合物制备的硅质材料及其制备方法。

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