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1. 发明授权

US06846610B2 Positive photosensitive resin composition 有权
标题翻译：正型感光性树脂组合物
公开(公告)号：US06846610B2
公开(公告)日：2005-01-25
申请号：US10315182
申请日：2002-12-10
申请人： Yasumasa Kawabe , Kenichiro Sato , Toshiaki Aoai
发明人： Yasumasa Kawabe , Kenichiro Sato , Toshiaki Aoai
IPC分类号： G03F7/004 , G03F7/039 , G03C1/76
CPC分类号： G03F7/0045 , G03F7/039 , Y10S430/106 , Y10S430/108 , Y10S430/111
摘要： Provided is a positive photosensitive resin composition comprising (A) a polymer which has alicyclic hydrocarbon skeleton and decomposes under the action of an acid to be rendered soluble in alkali, (B) a compound which generates an acid upon irradiation with actinic rays, (C) a nitrogen-containing basic compound, (D) at least one of a fluorine-containing surfactant and a silicon-containing surfactant and (E) a solvent. The composition can exhibit better characteristics when the solvent (E) is a combination of specified solvents.
摘要翻译：本发明提供一种正型感光性树脂组合物，其含有（A）具有脂环式烃骨架的聚合物，在酸的作用下分解成碱溶性的聚合物，（B）在光化射线照射时产生酸的化合物，（C ）含氮碱性化合物，（D）含氟表面活性剂和含硅表面活性剂中的至少一种和（E）溶剂。当溶剂（E）是特定溶剂的组合时，组合物可以表现出更好的特性。

2. 发明授权

US06699635B1 Positive photosensitive composition 有权
标题翻译：正光敏组合物
公开(公告)号：US06699635B1
公开(公告)日：2004-03-02
申请号：US09471007
申请日：1999-12-23
申请人： Kunihiko Kodama , Kenichiro Sato , Toshiaki Aoai , Yasumasa Kawabe
发明人： Kunihiko Kodama , Kenichiro Sato , Toshiaki Aoai , Yasumasa Kawabe
IPC分类号： G03F7004
CPC分类号： G03F7/0048 , G03F7/0397 , Y10S430/106
摘要： A positive photosensitive composition suitable for resist pattern formation under exposure to far ultraviolet light of wavelengths of 250 nm or shorter, particularly 220 nm or shorther, comprising: (A) a resin comprising constitutional repeating units wherein particular ring structures are present and having groups capable of decomposing under the action of an acid to cause an increase of the solubility in an alkali developer, (B) a photo-acid generator capable of generating an acid upon irradiation with actinic rays or radiation, and (C) a fluorine-containing surfactant, a silicon-containing surfactant or a mixture thereof.
摘要翻译：适合于在暴露于波长为250nm或更短，特别是220nm或更短的远紫外光下的抗蚀剂图案形成的正性感光性组合物，其包含：（A）包含结构重复单元的树脂，其中存在特定的环结构并具有基团在酸的作用下分解，导致碱显影剂溶解度的增加，（B）能够在用光化学射线或辐射照射时产生酸的光酸发生剂，（C）含氟表面活性剂，含硅表面活性剂或其混合物。

3. 发明授权

US6159656A Positive photosensitive resin 失效
标题翻译：正感光性树脂
公开(公告)号：US6159656A
公开(公告)日：2000-12-12
申请号：US344141
申请日：1999-06-24
申请人： Yasumasa Kawabe , Kenichiro Sato , Toshiaki Aoai
发明人： Yasumasa Kawabe , Kenichiro Sato , Toshiaki Aoai
IPC分类号： G03F7/004 , G03F7/039 , G06F7/004 , G06F7/021
CPC分类号： G03F7/0045 , G03F7/0048 , G03F7/039 , Y10S430/106
摘要： The present invention provides a positive photosensitive resin composition which, when exposed to far ultraviolet rays, in particular, ArF excimer laser light, shows excellent performances especially with respect to the residual film ratio, resist profile, resolution, and dry-etching resistance and does not pose the problem of development defects. The positive photosensitive resin composition comprising:(A) a compound which generates an acid upon irradiation with actinic rays,(B) a polymer having specific structures represented by formula (Ia), (Ib), (Ic) or (Id) defined in the specification,(C) a nitrogen-containing basic compound, and(D) at least one of a fluorine type surfactant and a silicone type surfactant.
摘要翻译：本发明提供一种正型感光性树脂组合物，特别是在远紫外线照射ArF准分子激光时，表现出优异的性能，特别是在残留膜比，抗蚀剂轮廓，分辨率和耐干蚀刻性方面，特别是不构成发展缺陷的问题。正型感光性树脂组合物，其包含：（A）在光化射线照射时产生酸的化合物，（B）具有由式（Ia），（Ib），（Ic）或（Id）表示的特定结构的聚合物，（C）含氮碱性化合物和（D）氟型表面活性剂和硅氧烷型表面活性剂中的至少一种。

4. 发明授权

US5529881A Postive photoresist composition 失效
标题翻译：光刻胶组合物
公开(公告)号：US5529881A
公开(公告)日：1996-06-25
申请号：US404985
申请日：1995-03-16
申请人： Yasumasa Kawabe , Kenichiro Sato , Toshiaki Aoai , Kazuya Uenishi
发明人： Yasumasa Kawabe , Kenichiro Sato , Toshiaki Aoai , Kazuya Uenishi
IPC分类号： G03F7/022 , G03F7/039 , H01L21/027 , G03F7/023 , G03F7/30
CPC分类号： G03F7/022
摘要： A positive photoresist composition for super fine working is disclosed, which comprises (a) an alkali-soluble resin and (b) as a photosensitive compound the 1,2-naphthoquinonediazido-5-(and/or -4-)sulfonic acid ester of a polyhydroxy compound represented by formula (I) or (II), wherein in a high-speed liquid chromatography measured using a ultraviolet ray of 254 nm, the pattern of the diester component and the pattern of the complete ester component of said 1,2-naphthoquinonediazido-5-(and/or -4-)sulfonic acid of the polyhydroxy compound shown by formula (I) or (II) are at least 50% and less than 40%, respectively, of the whole pattern areas; ##STR1## wherein R.sub.1 to R.sub.11, which may be the same or different, each represents a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group, or a cycloalkyl group, with the proviso that at least one of R.sub.1 to R.sub.11 is a cycloalkyl group, and R.sub.12 to R.sub.22, which may be the same or different, each represents a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group, or a cycloalkyl group, with the proviso that at least one of R.sub.12 to R.sub.22 is a cycloalkyl group. The photoresist composition has a high resolving power and a less layer thickness reliance of the resolving power, and a wide development latitude, is reluctant to form a development residue, and further has a very excellent storage stability, and does not deposit the photosensitive material and does not form microgels with the passage of time.
摘要翻译：公开了一种用于超细加工的正性光致抗蚀剂组合物，其包含（a）碱溶性树脂和（b）作为光敏化合物的1,2-萘醌二叠氮基-5-（和/或-4-）磺酸酯由式（I）或（II）表示的多羟基化合物，其中在使用254nm的紫外线测量的高速液相色谱中，所述二酯组分的图案和所述1,2的完全酯组分的图案式（I）或（II）所示的多羟基化合物的萘醌二叠氮基-5-（和/或-4-）磺酸分别为整个图案区域的至少50％且小于40％; 1，其可以相同或不同，各自表示氢原子，卤素原子，烷基，烷氧基或环烷基，条件是R 1至R 11中的至少一个为环烷基，R 12至 R 22可以相同或不同，各自表示氢原子，卤素原子，烷基，烷氧基，o 环烷基，条件是R12至R22中的至少一个为环烷基。光致抗蚀剂组合物具有高的分辨能力和较小的层厚度的分辨能力依赖性，并且广泛的开发范围不愿形成显影残留物，并且还具有非常优异的储存稳定性，并且不沉积感光材料和随着时间的推移不会形成微凝胶。

5. 发明授权

US06806022B1 Positive photosensitive resin composition 有权
标题翻译：正型感光性树脂组合物
公开(公告)号：US06806022B1
公开(公告)日：2004-10-19
申请号：US09295329
申请日：1999-04-21
申请人： Yasumasa Kawabe , Kenichiro Sato , Toshiaki Aoai
发明人： Yasumasa Kawabe , Kenichiro Sato , Toshiaki Aoai
IPC分类号： G03C1492
CPC分类号： G03F7/0045 , G03F7/039 , Y10S430/106 , Y10S430/108 , Y10S430/111
摘要： Provided is a positive photosensitive resin composition comprising (A) a polymer which has alicyclic hydrocarbon skeletons and composes under the action of an acid to be rendered soluble in alkali, (B) a compound which generates an acid upon irradiation with actinic rays, (C) a nitrogen-containing basic compound, (D) at least one of a fluorine-containing surfactant and a silicon-containing surfactant and (E) a solvent. The composition can exhibit better characteristics when the solvent (E) is a combination of specified solvents.
摘要翻译：本发明提供一种正型感光性树脂组合物，其包含（A）具有脂环族烃骨架并在酸性作用下组成的聚合物，使其易溶于碱，（B）在光化射线照射时产生酸的化合物，（C ）含氮碱性化合物，（D）含氟表面活性剂和含硅表面活性剂中的至少一种和（E）溶剂。当溶剂（E）是特定溶剂的组合时，组合物可以表现出更好的特性。

6. 发明授权

US06596458B1 Positive-working photoresist composition 有权
标题翻译：正光刻胶组合物
公开(公告)号：US06596458B1
公开(公告)日：2003-07-22
申请号：US09563436
申请日：2000-05-03
申请人： Kenichiro Sato , Kunihiko Kodama , Toshiaki Aoai , Yasumasa Kawabe
发明人： Kenichiro Sato , Kunihiko Kodama , Toshiaki Aoai , Yasumasa Kawabe
IPC分类号： G03F7039
CPC分类号： G03F7/0397 , G03F7/0045 , Y10S430/111
摘要： Disclosed is a positive-working photoresist composition having reduced development defects, and excellent in resist pattern profiles and in the resolving power of contact holes, which comprises (i) a compound generating an acid by irradiation of active light or radiation, and (ii) a resin containing repeating units of at least one kind selected from the group consisting of (a) repeating units having alkali-soluble groups each protected with at least one group selected from the group consisting of groups containing alicyclic hydrocarbon structures represented by specific general formulas (pI) to (pVI), (b) repeating units represented by specific general formula (II) and (c) repeating units represented by specific general formulas (III-a) to (III-d), and decomposed by the action of an acid to increase the solubility of the resin into an alkali.
摘要翻译：公开了具有减少的显影缺陷，抗蚀剂图案轮廓和接触孔分辨能力优异的正性光致抗蚀剂组合物，其包括（i）通过活性光或辐射的照射产生酸的化合物，和（ii）含有重复单元的树脂，所述重复单元选自（a）具有碱溶性基团的重复单元，各自被至少一个选自由特定通式表示的脂环族烃结构的基团所选择的基团保护的基团 pI）至（pVI），（b）由特定通式（II）表示的重复单元和（c）由特定通式（III-a）至（III-d）表示的重复单元，并通过酸以增加树脂在碱中的溶解度。

7. 发明授权

US5609982A Positive-working photoresist composition 失效
标题翻译：正光刻胶组合物
公开(公告)号：US5609982A
公开(公告)日：1997-03-11
申请号：US357748
申请日：1994-12-16
申请人： Kenichiro Sato , Yasumasa Kawabe , Toshiaki Aoai , Shinji Sakaguchi
发明人： Kenichiro Sato , Yasumasa Kawabe , Toshiaki Aoai , Shinji Sakaguchi
IPC分类号： G03F7/022 , G03F7/023
CPC分类号： G03F7/022
摘要： The present invention provides a positive-working photoresist composition comprising an alkali-soluble resin and a 1,2-naphthoquinonediazide-5-(and/or -4-)sulfonic ester of a specific water-insoluble alkali-soluble low molecular compound, wherein the high-performance liquid chromatography of the ester with an ultraviolet ray at 254 nm shows that the patterns corresponding to the diester components and complete ester component of the ester each fall within the specific range and a positive-working photoresist composition comprising a water-insoluble alkali-soluble resin, a water-insoluble alkali-soluble low molecular compound, and an ionization-sensitive radioactive compound which comprises a mixture of a naphthoquinone-diazidesulfonic diester of a water-insoluble alkali-soluble low molecular compound having three phenolic hydroxyl groups as an ionization-sensitive radioactive compound (A) and a naphthoquinonediazidesulfonic diester of a water-insoluble alkali-soluble low molecular compound having four phenolic hydroxyl groups as an ionization-sensitive radioactive compound (B) in an amount of 30% or more by weight based on the total amount of the ionization-sensitive radioactive compound.
摘要翻译：本发明提供一种正性光致抗蚀剂组合物，其包含碱溶性树脂和特定的水不溶性碱溶性低分子化合物的1,2-萘醌二叠氮化物-5-（和/或-4-）磺酸酯，其中使用254nm紫外线的酯的高效液相色谱显示对应于酯的二酯组分和完全酯组分的图案分别落在特定范围内，并且包含非水溶性的正性光致抗蚀剂组合物碱溶性树脂，水不溶性碱溶性低分子化合物和电离敏感性放射性化合物，其包含具有三个酚羟基的水不溶性碱溶性低分子化合物的萘醌二叠氮烷磺酸二酯的混合物作为电离敏感的放射性化合物（A）和不溶于水的碱溶性低分子化合物的萘醌二叠氮化物二酯具有基于电离敏感性放射性化合物的总量为30重量％以上的量的四个酚羟基作为电离敏感性放射性化合物（B）的量。

8. 发明授权

US5523396A Process for synthesizing quinonediazide ester utilizing base catalyst 失效
标题翻译：使用碱催化剂合成醌二叠氮化物的方法
公开(公告)号：US5523396A
公开(公告)日：1996-06-04
申请号：US531861
申请日：1995-09-21
申请人： Kenichiro Sato , Yasumasa Kawabe , Toshiaki Aoai
发明人： Kenichiro Sato , Yasumasa Kawabe , Toshiaki Aoai
IPC分类号： B01J31/02 , C07C303/28 , C07C309/47 , C07C309/69 , C07C309/71 , C07C309/76 , G03F7/022 , H01L21/027 , G03F7/023
CPC分类号： C07C303/28 , G03F7/022 , C07C2101/14
摘要： A process for synthesizing a quinonediazide ester is disclosed in which the esterification reaction of a polyhydroxy compound with 1,2-naphthoquinonediazide-5-(and/or -4-)sulfonyl chloride is carried out in the presence of a base catalyst comprising a basic compound represented by formula (I) or (II): ##STR1## wherein R.sub.1 to R.sub.15 are defined in the disclosure. A positive working photoresist containing the ester is also disclosed. The process is capable of highly selectively yielding the desired photosensitive material containing specific unreacted hydroxyl group(s). The photoresist has high resolving power with reduced film thickness dependence of the resolving power, is less apt to leave a development residue, and has excellent storage stability for prolonged period of time.
摘要翻译：公开了一种用于合成醌二叠氮化物酯的方法，其中多羟基化合物与1,2-萘醌二叠氮化物-5-（和/或-4-）磺酰氯的酯化反应在含有碱式（I）或（II）表示的化合物：其中R 1至R 15在本公开内容中定义。还公开了含有酯的正性工作光致抗蚀剂。该方法能够高选择性地产生含有特定未反应羟基的所需光敏材料。光致抗蚀剂具有高的分辨能力，降低膜分离能力的依赖性，更不容易留下显影残留物，并且在长时间内具有优异的储存稳定性。

9. 发明授权

US5340688A Positive type photoresist composition 失效
标题翻译：正型光致抗蚀剂组合物
公开(公告)号：US5340688A
公开(公告)日：1994-08-23
申请号：US15578
申请日：1993-02-10
申请人： Yasumasa Kawabe , Toshiaki Aoai , Tadayoshi Kokubo
发明人： Yasumasa Kawabe , Toshiaki Aoai , Tadayoshi Kokubo
IPC分类号： G03F7/022 , H01L21/027 , G03F7/021 , G03F7/30
CPC分类号： G03F7/022
摘要： Disclosed is a novel positive type photoresist composition comprising a 1,2-naphthoquinonediazido-5-(and/or -4-)sulfonic ester of a member selected from the group consisting of the polyhydroxy compounds represented by the following formula (I), (II) or (III) and an alkali-soluble resin: ##STR1## wherein the variables of Formula I are defined in the specification; ##STR2## wherein the variables of Formula II are defined in the specification; ##STR3## wherein the variables of Formula III are defined in the specification.
摘要翻译：公开了一种新型的正型光致抗蚀剂组合物，其包含选自由下式（I）表示的多羟基化合物，（I），（I）表示的多羟基化合物的组分的1,2-萘醌二叠氮基-5-（和/或-4-）磺酸酯， II）或（III）和碱溶性树脂：其中式I的变量在说明书中定义; （II）其中式II的变量在说明书中定义; （III）其中式III的变量在本说明书中定义。

10. 发明授权

US5707776A Positive resin composition sensitive to ultraviolet rays 失效
标题翻译：对紫外线敏感的正性树脂组合物
公开(公告)号：US5707776A
公开(公告)日：1998-01-13
申请号：US438481
申请日：1995-05-10
申请人： Yasumasa Kawabe , Tsukasa Yamanaka , Toshiaki Aoai
发明人： Yasumasa Kawabe , Tsukasa Yamanaka , Toshiaki Aoai
IPC分类号： G03F7/004 , G03F7/023 , G03F7/039 , H01L21/027 , G03C1/73
CPC分类号： G03F7/0045 , G03F7/039 , Y10S430/106 , Y10S430/121 , Y10S430/122
摘要： Disclosed is a positive radiation-sensitive resist composition comprising polymer(s) of the following general formula (1) and a radiation-sensitive agent. ##STR1## Ra, Rb, Rc and Rd each are independently a hydrogen atom, a hydroxyl group, a halogen atom, an alkyl group, an alkoxy group, an alkenyl group, an aryl group, an aralkyl group, an alkoxycarbonyl group, an arylcarbonyl group, an acyloxy group, an acyl group, or a cycloalkyl group; k is an integer of from 1 to 30; (1+n) is an integer of from 1 to 100; m is an integer of from 1 to 50; p1, p2 and p3 each are an integer of from 1 to 3; q1 is an integer of from 1 to 4. The resist composition has high resolution to give resist patterns with good profiles and has high heat resistance and good storage stability.
摘要翻译：公开了包含以下通式（1）的聚合物和辐射敏感剂的正辐射敏感抗蚀剂组合物。（1）<图像> Ra，Rb，Rc和Rd分别独立地为氢原子，羟基，卤素原子，烷基，烷氧基，烯基，芳基，芳烷基烷氧基羰基，芳基羰基，酰氧基，酰基或环烷基; k为1〜30的整数，（1 + n）为1〜100的整数， m为1〜50的整数， p1，p2和p3各自为1〜3的整数; q1为1〜4的整数。抗蚀剂组合物具有高分辨率，得到具有良好外形的抗蚀剂图案，并且具有高耐热性和良好的储存稳定性。

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