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    • 2. 发明授权
    • Abrasive fluid compositions
    • 研磨液组成
    • US06569216B1
    • 2003-05-27
    • US09856713
    • 2001-05-25
    • Koji TairaShigeo FujiiYoshiaki OshimaKoichi Naito
    • Koji TairaShigeo FujiiYoshiaki OshimaKoichi Naito
    • C09G102
    • C09K3/1463C09G1/02C09K3/1409
    • A polishing composition comprising a chelating compound or a salt thereof; a partially esterified product and/or partially etherified product of a polyhydric alcohol compound; and water; a polishing composition comprising water, an abrasive, an intermediate alumina, and a chelating compound or a salt thereof, wherein the content of the intermediate alumina is from 1 to 50 parts by weight, based on 100 parts by weight of the abrasive; and a polishing composition comprising water, an abrasive, an intermediate alumina, a chelating compound or a salt thereof, and a partially esterified product and/or partially etherified product of a polyhydric alcohol compound, wherein the content of the intermediate alumina is from 1 to 50 parts by weight, based on 100 parts by weight of the abrasive. By using the polishing composition, the polishing rate can be increased, and the surface roughness can be lowered, without causing defects such as scratches and pits on the surface of an object to be polished.
    • 一种抛光组合物,其包含螯合化合物或其盐; 多元醇化合物的部分酯化产物和/或部分醚化产物; 和水; 抛光组合物,其包含水,研磨剂,中间体氧化铝和螯合化合物或其盐,其中基于100重量份的所述研磨剂,所述中间氧化铝的含量为1至50重量份; 以及包含水,研磨剂,中间体氧化铝,螯合化合物或其盐以及多元醇化合物的部分酯化产物和/或部分醚化产物的抛光组合物,其中中间体氧化铝的含量为1〜 50重量份,基于100重量份的研磨剂。 通过使用抛光组合物,可以提高抛光速率,并且可以降低表面粗糙度,而不会在被抛光物体的表面上产生划痕和凹痕等缺陷。