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1. 发明授权

US08956560B2 Method of manufacturing mold 有权
标题翻译：模具制造方法
公开(公告)号：US08956560B2
公开(公告)日：2015-02-17
申请号：US13423543
申请日：2012-03-19
申请人： Yasuaki Ootera , Yoshiyuki Kamata , Naoko Kihara , Yoshiaki Kawamonzen , Takeshi Okino , Ryosuke Yamamoto , Tomoyuki Maeda , Norikatsu Sasao , Akiko Yuzawa , Takuya Shimada , Hiroyuki Hieda
发明人： Yasuaki Ootera , Yoshiyuki Kamata , Naoko Kihara , Yoshiaki Kawamonzen , Takeshi Okino , Ryosuke Yamamoto , Tomoyuki Maeda , Norikatsu Sasao , Akiko Yuzawa , Takuya Shimada , Hiroyuki Hieda
IPC分类号： H01L21/00 , B29C33/38 , G11B5/855
CPC分类号： B29C33/3857 , G11B5/855
摘要： In one embodiment, a method of manufacturing a mold includes: forming a first layer having an affinity to a second polymer on a substrate having an affinity to a first polymer; forming first and second openings in the first layer; filling a resist in the second openings and hardening the resist to obtain a hardened resist; and forming a second layer containing a block copolymer and causing it to self-assemble.
摘要翻译：在一个实施方案中，制造模具的方法包括：在对第一聚合物具有亲和性的基材上形成对第二聚合物具有亲和性的第一层; 在第一层中形成第一和第二开口; 在第二开口中填充抗蚀剂并使抗蚀剂硬化以获得硬化抗蚀剂; 并形成含有嵌段共聚物并使其自组装的第二层。

2. 发明授权

US08916053B2 Pattern forming method 有权
标题翻译：图案形成方法
公开(公告)号：US08916053B2
公开(公告)日：2014-12-23
申请号：US13528348
申请日：2012-06-20
申请人： Yoshiaki Kawamonzen , Yasuaki Ootera , Akiko Yuzawa , Naoko Kihara , Yoshiyuki Kamata , Hiroyuki Hieda , Norikatsu Sasao , Ryosuke Yamamoto , Takeshi Okino , Tomoyuki Maeda , Takuya Shimada
发明人： Yoshiaki Kawamonzen , Yasuaki Ootera , Akiko Yuzawa , Naoko Kihara , Yoshiyuki Kamata , Hiroyuki Hieda , Norikatsu Sasao , Ryosuke Yamamoto , Takeshi Okino , Tomoyuki Maeda , Takuya Shimada
IPC分类号： C03C15/00 , C03C25/68 , C23F1/00 , B44C3/08 , B44C5/04 , B81C1/00 , B44C1/22 , H01L21/033 , G03F7/00 , B41M5/00
CPC分类号： B44C1/227 , B41M5/00 , B81C1/0046 , B81C2201/0153 , B82Y10/00 , B82Y40/00 , G03F7/0002 , H01L21/0337 , Y10T156/1041
摘要： A pattern forming method according to an embodiment includes: forming a pattern film on a first substrate, the pattern film having a concave-convex pattern, the pattern film being made of a material containing a first to-be-imprinted agent; forming a material film on a second substrate, the material film containing a second to-be-imprinted agent having a higher etching rate than an etching rate of the first to-be-imprinted agent; transferring the concave-convex pattern of the pattern film onto the material film by applying pressure between the first substrate and the second substrate, with the pattern film being positioned to face the material film, and by curing the second to-be-imprinted agent; detaching the first substrate from the pattern film; and removing the material film by etching, to leave the pattern film on the second substrate.
摘要翻译：根据实施例的图案形成方法包括：在第一基板上形成图案膜，所述图案膜具有凹凸图案，所述图案膜由包含第一待打印剂的材料制成; 在第二基板上形成材料膜，所述材料膜含有蚀刻速率高于第一待打印剂的蚀刻速率的第二待定印剂; 通过在第一基板和第二基板之间施加压力将图案膜的凹凸图案转印到材料膜上，图案膜定位成面对材料膜，并且通过固化第二待打印剂; 从图案膜分离第一衬底; 并通过蚀刻去除材料膜，以将图案膜留在第二基板上。

3. 发明授权

US08300340B2 Magnetic recording medium 有权
标题翻译：磁记录介质
公开(公告)号：US08300340B2
公开(公告)日：2012-10-30
申请号：US13039158
申请日：2011-03-02
申请人： Masatoshi Sakurai , Ryosuke Yamamoto , Naoko Kihara , Akiko Yuzawa , Yoshiyuki Kamata
发明人： Masatoshi Sakurai , Ryosuke Yamamoto , Naoko Kihara , Akiko Yuzawa , Yoshiyuki Kamata
IPC分类号： G11B5/09 , G11B21/02 , G11B5/82 , G11B5/64
CPC分类号： G11B5/59688 , B82Y10/00 , G11B5/743 , G11B5/855
摘要： According to one embodiment, a servo area of a magnetic recording medium includes magnetic dots arrayed at a period L0. The magnetic dots include a plurality of magnetic dot regions divided in the cross track direction. A width Wm in the down track direction of the mth magnetic dot region from the innermost circumference and a number Nm of dot rows in the down track direction of the mth region meet a relationship represented by L0{Nm√3/2−0.3}≦Wm≦L0{Nm√3/2+0.3} (1).
摘要翻译：根据一个实施例，磁记录介质的伺服区包括以周期L0排列的磁点。磁点包括沿交叉磁道方向分割的多个磁点区域。第m个区域的第m个磁性区域的向下轨道方向的宽度Wm和第m个区域的向下轨道方向的点行数为Nm满足L0 {Nm3 / 2-0.3}＆nlE ; Wm＆nlE; L0 {Nm√3/ 2 + 0.3}（1）。

4. 发明授权

US08105952B2 Method of forming a pattern 有权
标题翻译：形成图案的方法
公开(公告)号：US08105952B2
公开(公告)日：2012-01-31
申请号：US12222916
申请日：2008-08-19
申请人： Naoko Kihara , Hiroyuki Hieda , Yoshiyuki Kamata
发明人： Naoko Kihara , Hiroyuki Hieda , Yoshiyuki Kamata
IPC分类号： H01L21/302 , H01L21/461
CPC分类号： G11B5/82 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G11B5/855
摘要： A pattern forming method is provided, which includes forming, above a substrate, a layer of a diblock copolymer composition containing at least PS and PEO, subjecting the layer to phase separation to obtain a phase-separated layer, thereby forming an easy-to-etch region constituted by PS and having a cylindrical or lamellar configuration extending in a first direction, forming an imprinting resist layer on the phase-separated layer, subjecting the imprinting resist layer to imprinting to form, on the imprinting resist layer, an uneven pattern consisting of projections and recesses extending in a second direction intersecting with the first direction, selectively removing, from the imprinting resist layer, the recesses, thereby leaving only the projections and, at the same time, selectively removing the PS from the phase-separated layer to obtain an etching resistive pattern containing PEO, and etching the substrate using, as a mask, not only the projections but also the etching resistive pattern.
摘要翻译：提供了图案形成方法，其包括在基底上形成含有至少PS和PEO的二嵌段共聚物组合物层，使该层相分离以获得相分离层，由此形成易于蚀刻区域由PS构成并且具有在第一方向上延伸的圆柱形或层状结构，在相分离层上形成刻印抗蚀剂层，使压印抗蚀剂层压印以在压印抗蚀剂层上形成不均匀图案，该不均匀图案包括在与第一方向相交的第二方向上延伸的突起和凹部，从压印抗蚀剂层选择性地去除凹部，从而仅留下突起，并且同时从相分离层选择性地去除PS 获得含有PEO的蚀刻电阻图案，并且使用不仅突起而且还具有抗蚀刻性，作为掩模来蚀刻基板 ve模式。

5. 发明申请

US20090078673A1 Method of forming a pattern 有权
标题翻译：形成图案的方法
公开(公告)号：US20090078673A1
公开(公告)日：2009-03-26
申请号：US12222916
申请日：2008-08-19
申请人： Naoko Kihara , Hiroyuki Hieda , Yoshiyuki Kamata
发明人： Naoko Kihara , Hiroyuki Hieda , Yoshiyuki Kamata
IPC分类号： C25F3/14
CPC分类号： G11B5/82 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G11B5/855
摘要： A pattern forming method is provided, which includes forming, above a substrate, a layer of a diblock copolymer composition containing at least PS and PEO, subjecting the layer to phase separation to obtain a phase-separated layer, thereby forming an easy-to-etch region constituted by PS and having a cylindrical or lamellar configuration extending in a first direction, forming an imprinting resist layer on the phase-separated layer, subjecting the imprinting resist layer to imprinting to form, on the imprinting resist layer, an uneven pattern consisting of projections and recesses extending in a second direction intersecting with the first direction, selectively removing, from the imprinting resist layer, the recesses, thereby leaving only the projections and, at the same time, selectively removing the PS from the phase-separated layer to obtain an etching resistive pattern containing PEO, and etching the substrate using, as a mask, not only the projections but also the etching resistive pattern.
摘要翻译：提供了图案形成方法，其包括在基底上形成含有至少PS和PEO的二嵌段共聚物组合物层，使该层相分离以获得相分离层，由此形成易于蚀刻区域由PS构成并且具有在第一方向上延伸的圆柱形或层状结构，在相分离层上形成刻印抗蚀剂层，使压印抗蚀剂层压印以在压印抗蚀剂层上形成不均匀图案，该不均匀图案包括在与第一方向相交的第二方向上延伸的突起和凹部，从压印抗蚀剂层选择性地去除凹部，从而仅留下突起，并且同时从相分离层选择性地去除PS 获得含有PEO的蚀刻电阻图案，并且使用不仅突起而且还具有抗蚀刻性，作为掩模来蚀刻基板 ve模式。

6. 发明授权

US08896951B2 Magnetic disk and magnetic recording/reproducing apparatus 有权
标题翻译：磁盘和磁记录/再现装置
公开(公告)号：US08896951B2
公开(公告)日：2014-11-25
申请号：US13537859
申请日：2012-06-29
申请人： Takeshi Okino , Naoko Kihara , Yoshiyuki Kamata
发明人： Takeshi Okino , Naoko Kihara , Yoshiyuki Kamata
IPC分类号： G11B5/09 , G11B5/82 , G11B5/855 , G11B5/74
CPC分类号： G11B5/82 , G11B5/746 , G11B5/855
摘要： A magnetic disk according to an embodiment includes: a plurality of data regions each including a plurality of tracks, each of the tracks being arranged to extend in a circumferential direction; a servo region provided between the data regions, the servo region extending in a radial direction, the servo region including: a plurality of guide patterns each extending in the radial direction; and at least one line of dots arranged by post patterns in the radial direction at least on a side of one of adjacent guide patterns, the post patterns being arranged in the radial direction between the adjacent guide patterns.
摘要翻译：根据实施例的磁盘包括：多个数据区域，每个数据区域包括多个轨道，每个轨道布置成沿圆周方向延伸; 所述伺服区域设置在所述数据区域之间，所述伺服区域在径向方向上延伸，所述伺服区域包括：多个引导图案，每个引导图案沿径向方向延伸; 以及至少一排点，其至少在相邻引导图案之一的至少一侧的径向上由柱状图案排列，所述柱形图案沿径向布置在相邻的引导图案之间。

7. 发明授权

US07195827B2 Perpendicular magnetic recording medium 有权
标题翻译：垂直磁记录介质
公开(公告)号：US07195827B2
公开(公告)日：2007-03-27
申请号：US10722599
申请日：2003-11-28
申请人： Tomoyuki Maeda , Akira Kikitsu , Hiroyuki Hieda , Yoshiyuki Kamata
发明人： Tomoyuki Maeda , Akira Kikitsu , Hiroyuki Hieda , Yoshiyuki Kamata
IPC分类号： G11B5/66
CPC分类号： G11B5/732 , G11B5/65 , G11B5/7325
摘要： A perpendicular magnetic recording medium includes a substrate, an underlayer formed on the substrate, and containing at least one element selected from the group A consisting of Pt, Pd, Rh, Ag, Au, Ir and Fe, and at least one element or compound selected from the group B consisting of C, Ta, Mo, W, Nb, Zr, Hf, V, Mg, Al, Zn, Sn, In, Bi, Pb, Cd, SiO2, MgO, Al2O3, TaC, TiC, TaN, TiN, B2O3, ZrO2, In2O3 and SnO2, and a magnetic layer formed on the underlayer, containing at least one element selected from the group consisting of Fe, Co, and Ni, and at least one element selected from the group consisting of Pt, Pd, Au and Ir, and containing crystal grains having an L10 structure.
摘要翻译：垂直磁记录介质包括衬底，形成在衬底上的底层，并且包含选自由Pt，Pd，Rh，Ag，Au，Ir和Fe组成的组A中的至少一种元素，以及至少一种元素或化合物选自由C，Ta，Mo，W，Nb，Zr，Hf，V，Mg，Al，Zn，Sn，In，Bi，Pb，Cd，SiO 2，MgO组成的组B ，Al 2 O 3，TaC，TiC，TaN，TiN，B 2 O 3 3，ZrO _{2 3 3＆lt; 2＆gt;和在底层上形成的含有至少一个元素的磁性层选自Fe，Co和Ni中的至少一种元素，以及选自Pt，Pd，Au和Ir中的至少一种元素，并且含有具有L 1 O 3结构的晶粒。}

8. 发明申请

US20090161257A1 MAGNETIC RECORDING MEDIUM, METHOD OF MANUFACTURING THE SAME, AND MAGNETIC RECORDING APPARATUS 审中-公开
标题翻译：磁记录介质，其制造方法和磁记录装置
公开(公告)号：US20090161257A1
公开(公告)日：2009-06-25
申请号：US12400341
申请日：2009-03-09
申请人： Akiko Yuzawa , Masatoshi Sakurai , Yoshiyuki Kamata , Satoshi Shirotori , Kaori Kimura , Tsuyoshi Onitsuka
发明人： Akiko Yuzawa , Masatoshi Sakurai , Yoshiyuki Kamata , Satoshi Shirotori , Kaori Kimura , Tsuyoshi Onitsuka
IPC分类号： G11B5/60 , G11B5/33 , B44C1/22
CPC分类号： G11B5/855 , G11B5/65
摘要： According to one embodiment, a magnetic recording medium includes protruded magnetic patterns formed on a substrate, and a non-magnetic material filled in recesses between the magnetic patterns and made of a multi-element amorphous alloy containing Ni or Cu, and two or more metals selected from the group consisting of Ta, Nb, Ti, Zr, Hf, Cr, Mo and Ag.
摘要翻译：根据一个实施例，磁记录介质包括形成在基板上的突出的磁图案和填充在磁图案之间的凹部中的非磁性材料，并且由含有Ni或Cu的多元非晶合金和两种或更多种金属制成选自Ta，Nb，Ti，Zr，Hf，Cr，Mo和Ag组成的组。

9. 发明授权

US07635529B2 Substrate for magnetic recording media, magnetic recording media and magnetic recording apparatus 有权
标题翻译：磁记录介质基板，磁记录介质和磁记录装置
公开(公告)号：US07635529B2
公开(公告)日：2009-12-22
申请号：US11475862
申请日：2006-06-28
申请人： Katsuyuki Naito , Masatoshi Sakurai , Akira Kikitsu , Yoshiyuki Kamata , Naoko Kihara , Masahiro Oka
发明人： Katsuyuki Naito , Masatoshi Sakurai , Akira Kikitsu , Yoshiyuki Kamata , Naoko Kihara , Masahiro Oka
IPC分类号： G11B5/71 , G11B5/82
CPC分类号： G11B5/7315
摘要： According to one embodiment, a substrate for a magnetic recording media has circumferential protrusions corresponding to recording tracks and circumferential recesses corresponding to grooves between the recording tracks, in which the substrate satisfying at least one of conditions of (a) a surface of the recess has a surface energy smaller than that of the protrusion, (b) the surface of the recess is modified with a thermally decomposable or deformable substance, (c) the surface of the recess has surface roughness smaller than that of the protrusion, (d) crystal orientation is more disturbed on the surface of the recess than on the protrusion, (e) the surface of the recess is modified with a substance that causes reaction with a magnetic material or that diffuses into the magnetic material, and (f) the surface of the recess is modified with a substance soluble in a solvent or with a deformable substance.
摘要翻译：根据一个实施例，用于磁记录介质的基底具有对应于记录轨迹的周向突起和对应于记录轨道之间的凹槽的周向凹部，其中满足以下条件中的至少一个的基底：（a）凹部的表面具有表面能小于突起的表面能，（b）凹部的表面用可热分解或可变形的物质进行改性，（c）凹陷表面的表面粗糙度小于突起的表面粗糙度，（d）晶体在凹部的表面上比在突起上的取向更加干扰，（e）凹部的表面用引起与磁性材料反应或扩散到磁性材料中的物质进行改性，和（f）该凹部用可溶于溶剂或可变形物质的物质进行改性。

10. 发明申请

US20070065588A1 Method of forming patterns using imprint material 审中-公开
标题翻译：使用压印材料形成图案的方法
公开(公告)号：US20070065588A1
公开(公告)日：2007-03-22
申请号：US11520023
申请日：2006-09-13
申请人： Naoko Kihara , Yoshiyuki Kamata , Satoshi Shirotori , Katsuyuki Naito
发明人： Naoko Kihara , Yoshiyuki Kamata , Satoshi Shirotori , Katsuyuki Naito
IPC分类号： B05D3/12 , B05D3/02 , B29C71/02
CPC分类号： G11B5/855
摘要： A method of forming patterns includes coating a toroidal substrate having a center hole with an imprint material containing a precursor of a metal oxide film, selected from the group consisting of a metal alkoxide and a metal oxide, and an ether type nonionic surfactant containing fluorine or silicon, imprinting a stamper on the imprint material to transfer patterns of protrusions and recesses of the stamper to the imprint material, and removing organic components from the imprint material through plasma processing or heat treatment to form a metal oxide film having patterns of protrusions and recesses.
摘要翻译：形成图案的方法包括用具有中心孔的环形基板涂覆含有金属氧化物膜的前体的压印材料，所述金属氧化物膜的前体选自金属醇盐和金属氧化物，以及含有氟的醚型非离子表面活性剂硅，在压印材料上压印压模以将压模的突起和凹陷的图案转印到压印材料，以及通过等离子体处理或热处理从压印材料中去除有机组分以形成具有突起和凹陷图案的金属氧化物膜。

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