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1. 发明授权

US08956560B2 Method of manufacturing mold 有权
标题翻译：模具制造方法
公开(公告)号：US08956560B2
公开(公告)日：2015-02-17
申请号：US13423543
申请日：2012-03-19
申请人： Yasuaki Ootera , Yoshiyuki Kamata , Naoko Kihara , Yoshiaki Kawamonzen , Takeshi Okino , Ryosuke Yamamoto , Tomoyuki Maeda , Norikatsu Sasao , Akiko Yuzawa , Takuya Shimada , Hiroyuki Hieda
发明人： Yasuaki Ootera , Yoshiyuki Kamata , Naoko Kihara , Yoshiaki Kawamonzen , Takeshi Okino , Ryosuke Yamamoto , Tomoyuki Maeda , Norikatsu Sasao , Akiko Yuzawa , Takuya Shimada , Hiroyuki Hieda
IPC分类号： H01L21/00 , B29C33/38 , G11B5/855
CPC分类号： B29C33/3857 , G11B5/855
摘要： In one embodiment, a method of manufacturing a mold includes: forming a first layer having an affinity to a second polymer on a substrate having an affinity to a first polymer; forming first and second openings in the first layer; filling a resist in the second openings and hardening the resist to obtain a hardened resist; and forming a second layer containing a block copolymer and causing it to self-assemble.
摘要翻译：在一个实施方案中，制造模具的方法包括：在对第一聚合物具有亲和性的基材上形成对第二聚合物具有亲和性的第一层; 在第一层中形成第一和第二开口; 在第二开口中填充抗蚀剂并使抗蚀剂硬化以获得硬化抗蚀剂; 并形成含有嵌段共聚物并使其自组装的第二层。

2. 发明授权

US08916053B2 Pattern forming method 有权
标题翻译：图案形成方法
公开(公告)号：US08916053B2
公开(公告)日：2014-12-23
申请号：US13528348
申请日：2012-06-20
申请人： Yoshiaki Kawamonzen , Yasuaki Ootera , Akiko Yuzawa , Naoko Kihara , Yoshiyuki Kamata , Hiroyuki Hieda , Norikatsu Sasao , Ryosuke Yamamoto , Takeshi Okino , Tomoyuki Maeda , Takuya Shimada
发明人： Yoshiaki Kawamonzen , Yasuaki Ootera , Akiko Yuzawa , Naoko Kihara , Yoshiyuki Kamata , Hiroyuki Hieda , Norikatsu Sasao , Ryosuke Yamamoto , Takeshi Okino , Tomoyuki Maeda , Takuya Shimada
IPC分类号： C03C15/00 , C03C25/68 , C23F1/00 , B44C3/08 , B44C5/04 , B81C1/00 , B44C1/22 , H01L21/033 , G03F7/00 , B41M5/00
CPC分类号： B44C1/227 , B41M5/00 , B81C1/0046 , B81C2201/0153 , B82Y10/00 , B82Y40/00 , G03F7/0002 , H01L21/0337 , Y10T156/1041
摘要： A pattern forming method according to an embodiment includes: forming a pattern film on a first substrate, the pattern film having a concave-convex pattern, the pattern film being made of a material containing a first to-be-imprinted agent; forming a material film on a second substrate, the material film containing a second to-be-imprinted agent having a higher etching rate than an etching rate of the first to-be-imprinted agent; transferring the concave-convex pattern of the pattern film onto the material film by applying pressure between the first substrate and the second substrate, with the pattern film being positioned to face the material film, and by curing the second to-be-imprinted agent; detaching the first substrate from the pattern film; and removing the material film by etching, to leave the pattern film on the second substrate.
摘要翻译：根据实施例的图案形成方法包括：在第一基板上形成图案膜，所述图案膜具有凹凸图案，所述图案膜由包含第一待打印剂的材料制成; 在第二基板上形成材料膜，所述材料膜含有蚀刻速率高于第一待打印剂的蚀刻速率的第二待定印剂; 通过在第一基板和第二基板之间施加压力将图案膜的凹凸图案转印到材料膜上，图案膜定位成面对材料膜，并且通过固化第二待打印剂; 从图案膜分离第一衬底; 并通过蚀刻去除材料膜，以将图案膜留在第二基板上。

3. 发明授权

US08300340B2 Magnetic recording medium 有权
标题翻译：磁记录介质
公开(公告)号：US08300340B2
公开(公告)日：2012-10-30
申请号：US13039158
申请日：2011-03-02
申请人： Masatoshi Sakurai , Ryosuke Yamamoto , Naoko Kihara , Akiko Yuzawa , Yoshiyuki Kamata
发明人： Masatoshi Sakurai , Ryosuke Yamamoto , Naoko Kihara , Akiko Yuzawa , Yoshiyuki Kamata
IPC分类号： G11B5/09 , G11B21/02 , G11B5/82 , G11B5/64
CPC分类号： G11B5/59688 , B82Y10/00 , G11B5/743 , G11B5/855
摘要： According to one embodiment, a servo area of a magnetic recording medium includes magnetic dots arrayed at a period L0. The magnetic dots include a plurality of magnetic dot regions divided in the cross track direction. A width Wm in the down track direction of the mth magnetic dot region from the innermost circumference and a number Nm of dot rows in the down track direction of the mth region meet a relationship represented by L0{Nm√3/2−0.3}≦Wm≦L0{Nm√3/2+0.3} (1).
摘要翻译：根据一个实施例，磁记录介质的伺服区包括以周期L0排列的磁点。磁点包括沿交叉磁道方向分割的多个磁点区域。第m个区域的第m个磁性区域的向下轨道方向的宽度Wm和第m个区域的向下轨道方向的点行数为Nm满足L0 {Nm3 / 2-0.3}＆nlE ; Wm＆nlE; L0 {Nm√3/ 2 + 0.3}（1）。

4. 发明申请

US20110259849A1 METHOD FOR PRODUCING IMPRINT MOLD AND MAGNETIC RECORDING MEDIUM 审中-公开
标题翻译：生产印模和磁记录介质的方法
公开(公告)号：US20110259849A1
公开(公告)日：2011-10-27
申请号：US13093507
申请日：2011-04-25
申请人： Masatoshi Sakurai , Naoko Kihara , Hiroki Tanaka , Ryosuke Yamamoto , Akiko Yuzawa
发明人： Masatoshi Sakurai , Naoko Kihara , Hiroki Tanaka , Ryosuke Yamamoto , Akiko Yuzawa
IPC分类号： B29C33/38 , B44C1/22
CPC分类号： G03F7/0002 , B81C99/009 , B81C2201/0149 , B82Y10/00 , B82Y40/00 , G11B5/743 , G11B5/82 , G11B5/855
摘要： According to one embodiment, a method for producing an imprint mold includes forming, on a substrate, a plurality of guides including a first wall surface and a second wall surface, wherein an angle between at least one of the first and second wall surfaces and an exposed substrate surface is 131° or less, applying a self-assembling material, which forms a sphere when phase-separated, to a guide groove area defined by the first wall surface, the second wall surface and the substrate surface, and self-assembling the self-assembling material to form a dot pattern, etching the substrate by using the dot pattern as a mask to transfer the dot pattern and forming an imprint mold by using the substrate with the dot pattern transferred as a master mold.
摘要翻译：根据一个实施例，一种用于生产压印模具的方法包括在基底上形成包括第一壁表面和第二壁表面的多个引导件，其中第一和第二壁表面中的至少一个与第一壁表面之间的角度曝光的基板表面为131°或更小，将由相分离形成球体的自组装材料施加到由第一壁表面，第二壁表面和基板表面限定的引导槽区域，以及自组装自组装材料形成点图案，通过使用点图案作为掩模蚀刻基板以转印点图案，并通过使用以图案转印的基板作为母模转印形成压印模具。

5. 发明授权

US08105952B2 Method of forming a pattern 有权
标题翻译：形成图案的方法
公开(公告)号：US08105952B2
公开(公告)日：2012-01-31
申请号：US12222916
申请日：2008-08-19
申请人： Naoko Kihara , Hiroyuki Hieda , Yoshiyuki Kamata
发明人： Naoko Kihara , Hiroyuki Hieda , Yoshiyuki Kamata
IPC分类号： H01L21/302 , H01L21/461
CPC分类号： G11B5/82 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G11B5/855
摘要： A pattern forming method is provided, which includes forming, above a substrate, a layer of a diblock copolymer composition containing at least PS and PEO, subjecting the layer to phase separation to obtain a phase-separated layer, thereby forming an easy-to-etch region constituted by PS and having a cylindrical or lamellar configuration extending in a first direction, forming an imprinting resist layer on the phase-separated layer, subjecting the imprinting resist layer to imprinting to form, on the imprinting resist layer, an uneven pattern consisting of projections and recesses extending in a second direction intersecting with the first direction, selectively removing, from the imprinting resist layer, the recesses, thereby leaving only the projections and, at the same time, selectively removing the PS from the phase-separated layer to obtain an etching resistive pattern containing PEO, and etching the substrate using, as a mask, not only the projections but also the etching resistive pattern.
摘要翻译：提供了图案形成方法，其包括在基底上形成含有至少PS和PEO的二嵌段共聚物组合物层，使该层相分离以获得相分离层，由此形成易于蚀刻区域由PS构成并且具有在第一方向上延伸的圆柱形或层状结构，在相分离层上形成刻印抗蚀剂层，使压印抗蚀剂层压印以在压印抗蚀剂层上形成不均匀图案，该不均匀图案包括在与第一方向相交的第二方向上延伸的突起和凹部，从压印抗蚀剂层选择性地去除凹部，从而仅留下突起，并且同时从相分离层选择性地去除PS 获得含有PEO的蚀刻电阻图案，并且使用不仅突起而且还具有抗蚀刻性，作为掩模来蚀刻基板 ve模式。

6. 发明申请

US20090078673A1 Method of forming a pattern 有权
标题翻译：形成图案的方法
公开(公告)号：US20090078673A1
公开(公告)日：2009-03-26
申请号：US12222916
申请日：2008-08-19
申请人： Naoko Kihara , Hiroyuki Hieda , Yoshiyuki Kamata
发明人： Naoko Kihara , Hiroyuki Hieda , Yoshiyuki Kamata
IPC分类号： C25F3/14
CPC分类号： G11B5/82 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G11B5/855
摘要： A pattern forming method is provided, which includes forming, above a substrate, a layer of a diblock copolymer composition containing at least PS and PEO, subjecting the layer to phase separation to obtain a phase-separated layer, thereby forming an easy-to-etch region constituted by PS and having a cylindrical or lamellar configuration extending in a first direction, forming an imprinting resist layer on the phase-separated layer, subjecting the imprinting resist layer to imprinting to form, on the imprinting resist layer, an uneven pattern consisting of projections and recesses extending in a second direction intersecting with the first direction, selectively removing, from the imprinting resist layer, the recesses, thereby leaving only the projections and, at the same time, selectively removing the PS from the phase-separated layer to obtain an etching resistive pattern containing PEO, and etching the substrate using, as a mask, not only the projections but also the etching resistive pattern.
摘要翻译：提供了图案形成方法，其包括在基底上形成含有至少PS和PEO的二嵌段共聚物组合物层，使该层相分离以获得相分离层，由此形成易于蚀刻区域由PS构成并且具有在第一方向上延伸的圆柱形或层状结构，在相分离层上形成刻印抗蚀剂层，使压印抗蚀剂层压印以在压印抗蚀剂层上形成不均匀图案，该不均匀图案包括在与第一方向相交的第二方向上延伸的突起和凹部，从压印抗蚀剂层选择性地去除凹部，从而仅留下突起，并且同时从相分离层选择性地去除PS 获得含有PEO的蚀刻电阻图案，并且使用不仅突起而且还具有抗蚀刻性，作为掩模来蚀刻基板 ve模式。

7. 发明授权

US08896951B2 Magnetic disk and magnetic recording/reproducing apparatus 有权
标题翻译：磁盘和磁记录/再现装置
公开(公告)号：US08896951B2
公开(公告)日：2014-11-25
申请号：US13537859
申请日：2012-06-29
申请人： Takeshi Okino , Naoko Kihara , Yoshiyuki Kamata
发明人： Takeshi Okino , Naoko Kihara , Yoshiyuki Kamata
IPC分类号： G11B5/09 , G11B5/82 , G11B5/855 , G11B5/74
CPC分类号： G11B5/82 , G11B5/746 , G11B5/855
摘要： A magnetic disk according to an embodiment includes: a plurality of data regions each including a plurality of tracks, each of the tracks being arranged to extend in a circumferential direction; a servo region provided between the data regions, the servo region extending in a radial direction, the servo region including: a plurality of guide patterns each extending in the radial direction; and at least one line of dots arranged by post patterns in the radial direction at least on a side of one of adjacent guide patterns, the post patterns being arranged in the radial direction between the adjacent guide patterns.
摘要翻译：根据实施例的磁盘包括：多个数据区域，每个数据区域包括多个轨道，每个轨道布置成沿圆周方向延伸; 所述伺服区域设置在所述数据区域之间，所述伺服区域在径向方向上延伸，所述伺服区域包括：多个引导图案，每个引导图案沿径向方向延伸; 以及至少一排点，其至少在相邻引导图案之一的至少一侧的径向上由柱状图案排列，所述柱形图案沿径向布置在相邻的引导图案之间。

8. 发明授权

US07931819B2 Method for pattern formation 有权
标题翻译：图案形成方法
公开(公告)号：US07931819B2
公开(公告)日：2011-04-26
申请号：US11727158
申请日：2007-03-23
申请人： Naoko Kihara , Hiroyuki Hieda
发明人： Naoko Kihara , Hiroyuki Hieda
IPC分类号： H01L21/302
CPC分类号： H01L21/3086 , B82Y10/00 , Y10S438/942
摘要： There is provided a method for pattern formation, including a step of coating a composition comprising a block copolymer, a silicon compound, and a solvent for dissolving these components onto an object to form a layer of the composition on the object, a step of subjecting the layer of the composition to self-organization of the block copolymer to cause phase separation into a first phase, in which the silicon compound is localized, having higher etching resistance by heat treatment or/and oxygen plasma treatment, and a second phase comprising a polymer phase and having lower etching resistance by heat treatment or/and oxygen plasma treatment, and thereby forming a pattern layer with a fine pattern, and a step of etching the object using as a mask the thus formed pattern layer.
摘要翻译：提供了一种形成图案的方法，其包括将包含嵌段共聚物，硅化合物和溶剂的组合物涂布到物体上以形成该物质层的步骤，所述组合物层自组织所述嵌段共聚物以引起相分离成其中所述硅化合物定位的第一相，通过热处理或/和氧等离子体处理具有较高的耐蚀刻性，以及第二相，其包含聚合物相，并且通过热处理或/和氧等离子体处理具有较低的耐腐蚀性，从而形成具有精细图案的图案层，以及使用由此形成的图案层作为掩模蚀刻该物体的步骤。

9. 发明申请

US20060257694A1 Magnetic recording media 有权
标题翻译：磁记录媒体
公开(公告)号：US20060257694A1
公开(公告)日：2006-11-16
申请号：US11434519
申请日：2006-05-16
申请人： Hiroyuki Hieda , Naoko Kihara , Yoshitaka Yanagita
发明人： Hiroyuki Hieda , Naoko Kihara , Yoshitaka Yanagita
IPC分类号： G11B5/64
CPC分类号： G11B5/855
摘要： A magnetic recording media has recording cells formed of two-dimensionally arrayed magnetic material, a nonmagnetic layer surrounding the recording cells, an adhesive film formed on each of the recording cells, and a lubricant directly adhered to the adhesive film.
摘要翻译：磁记录介质具有由二维排列的磁性材料形成的记录单元，围绕记录单元的非磁性层，形成在每个记录单元上的粘合膜，以及直接附着在粘合膜上的润滑剂。

10. 发明申请

US20060078681A1 Pattern forming method and method of processing a structure by use of same 有权
公开(公告)号：US20060078681A1
公开(公告)日：2006-04-13
申请号：US11248587
申请日：2005-10-13
申请人： Hiroyuki Hieda , Naoko Kihara , Katsuyuki Naito
发明人： Hiroyuki Hieda , Naoko Kihara , Katsuyuki Naito
IPC分类号： B05D3/04 , B05D5/12 , B05D3/02
CPC分类号： G11B5/855
摘要： The present invention provides a pattern forming method using phase separation structure of self-assembling block copolymer and minimizing variations in pattern. A substrate having groove structure pre-formed thereon, is coated with a solution of the block copolymer comprising at least one block having a mesogen group. The block copolymer is caused to self-assemble in the groove to form block copolymer assemblies, which are regularly arrayed. The invention also relates to a processing method of processing a substrate by the use of the pattern obtained by the pattern forming method as a template.

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