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1. 发明申请

US20110242524A1 FLAT SURFACE INSPECTION APPARATUS 审中-公开
标题翻译：平面检查装置
公开(公告)号：US20110242524A1
公开(公告)日：2011-10-06
申请号：US13007433
申请日：2011-01-14
申请人： YUKI SHIMIZU , Junguo Xu , Shigeo Nakamura , Toshiyuki Nakao , Toshihiko Nakata , Toshifumi Honda
发明人： YUKI SHIMIZU , Junguo Xu , Shigeo Nakamura , Toshiyuki Nakao , Toshihiko Nakata , Toshifumi Honda
IPC分类号： G01N21/00
CPC分类号： G01N21/9501 , G01N21/47
摘要： An object is to provide a flat surface inspection apparatus that can prevent sliders from being damaged and detect micro defects. A flat surface inspection apparatus includes: a measured subject; a stage that supports the measured subject; a spindle that rotates the stage; a first part having light sources applying light beam onto the measured subject, a scattered-light-detecting section, a signal processing section that converts the scattered light into information about a first defect, and a first memory section that stores therein the information about the first defect; and a second part having sliders mounted with a contact sensor that detects a second defect smaller than the first defect, a loading/unloading mechanism that flies the slider over the measured subject, a slider control section that controls the loading/unloading mechanism based on the information about the first defects and second defects.
摘要翻译：本发明的目的是提供一种能够防止滑块损坏并检测微缺陷的平面检查装置。平面检查装置包括：测量对象; 支持被测科目的阶段; 旋转舞台的主轴; 具有将光束施加到测量对象上的第一部分，散射光检测部分，将散射光转换成关于第一缺陷的信息的信号处理部分，以及存储关于第一缺陷的信息的第一存储部分第一缺陷; 以及第二部分，其具有安装有接触传感器的滑块，所述接触传感器检测到比所述第一缺陷小的第二缺陷;在所述测量对象上飞行所述滑块的装载/卸载机构;滑块控制部，其基于所述滑块控制部关于第一个缺陷和第二个缺陷的信息。

2. 发明申请

US20130155400A1 METHOD AND DEVICE FOR INSPECTING FOR DEFECTS 有权
标题翻译：用于检查缺陷的方法和装置
公开(公告)号：US20130155400A1
公开(公告)日：2013-06-20
申请号：US13700520
申请日：2011-05-20
申请人： Toshiyuki Nakao , Junguo Xu , Yuki Shimizu , Toshihiko Nakata , Toshifumi Honda , Yukihiro Shibata , Yuta Urano
发明人： Toshiyuki Nakao , Junguo Xu , Yuki Shimizu , Toshihiko Nakata , Toshifumi Honda , Yukihiro Shibata , Yuta Urano
IPC分类号： G01N21/95
CPC分类号： G01N21/95 , G01N21/9501 , G01Q60/22 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： A defect inspecting method is provided which comprises a pre-scan defect inspecting process including a pre-scan irradiating step for casting irradiation light onto the surface of a sample, a pre-scan detecting step for detecting the scattered lights, and a pre-scan defect information collecting step for obtaining information on preselected defects present on the sample surface on the basis of the scattered lights; a near-field defect inspecting process including a near-field irradiating step in which the distance between the sample surface and a near-field head is adjusted so that the sample surface is irradiated, a near-field detecting step for detecting near-field light response, and a near-field defect information collecting step for obtaining information on the preselected defects on the basis of the near-field light response; and a merging process for inspecting defects present on the sample surface by merging the pieces of information on the preselected defects.
摘要翻译：提供一种缺陷检查方法，其包括预扫描缺陷检查处理，其包括用于将照射光投射到样品表面上的预扫描照射步骤，用于检测散射光的预扫描检测步骤，以及预扫描缺陷信息收集步骤，用于基于散射光获得在样品表面上存在的预选缺陷的信息; 包括近场照射步骤的近场缺陷检查处理，其中调整样品表面和近场磁头之间的距离以照射样品表面;近场检测步骤，用于检测近场光响应和近场缺陷信息收集步骤，用于基于近场光响应获得关于预选缺陷的信息; 以及通过合并关于预选缺陷的信息来检查存在于样品表面上的缺陷的合并过程。

3. 发明授权

US08670116B2 Method and device for inspecting for defects 有权
标题翻译：用于检查缺陷的方法和装置
公开(公告)号：US08670116B2
公开(公告)日：2014-03-11
申请号：US13700520
申请日：2011-05-20
申请人： Toshiyuki Nakao , Junguo Xu , Yuki Shimizu , Toshihiko Nakata , Toshifumi Honda , Yukihiro Shibata , Yuta Urano
发明人： Toshiyuki Nakao , Junguo Xu , Yuki Shimizu , Toshihiko Nakata , Toshifumi Honda , Yukihiro Shibata , Yuta Urano
IPC分类号： G01N21/95
CPC分类号： G01N21/95 , G01N21/9501 , G01Q60/22 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： A defect inspecting method is provided which comprises a pre-scan defect inspecting process including a pre-scan irradiating step for casting irradiation light onto the surface of a sample, a pre-scan detecting step for detecting the scattered lights, and a pre-scan defect information collecting step for obtaining information on preselected defects present on the sample surface on the basis of the scattered lights; a near-field defect inspecting process including a near-field irradiating step in which the distance between the sample surface and a near-field head is adjusted so that the sample surface is irradiated, a near-field detecting step for detecting near-field light response, and a near-field defect information collecting step for obtaining information on the preselected defects on the basis of the near-field light response; and a merging process for inspecting defects present on the sample surface by merging the pieces of information on the preselected defects.
摘要翻译：提供一种缺陷检查方法，其包括预扫描缺陷检查处理，其包括用于将照射光投射到样品表面上的预扫描照射步骤，用于检测散射光的预扫描检测步骤，以及预扫描缺陷信息收集步骤，用于基于散射光获得在样品表面上存在的预选缺陷的信息; 包括近场照射步骤的近场缺陷检查处理，其中调整样品表面和近场磁头之间的距离以照射样品表面;近场检测步骤，用于检测近场光响应和近场缺陷信息收集步骤，用于基于近场光响应获得关于预选缺陷的信息; 以及通过合并关于预选缺陷的信息来检查存在于样品表面上的缺陷的合并过程。

4. 发明授权

US08804112B2 Method of defect inspection and device of defect inspection 有权
标题翻译：缺陷检查方法和缺陷检查装置
公开(公告)号：US08804112B2
公开(公告)日：2014-08-12
申请号：US13265935
申请日：2010-04-22
申请人： Yukihiro Shibata , Toshihiko Nakata , Taketo Ueno , Atsushi Taniguchi , Toshifumi Honda
发明人： Yukihiro Shibata , Toshihiko Nakata , Taketo Ueno , Atsushi Taniguchi , Toshifumi Honda
IPC分类号： G01N21/00
CPC分类号： G01N21/95623 , G01N21/95607 , G01N2021/8822 , G01N2201/062 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： A method of inspecting defects and a device inspecting defects of detecting defects at high sensitivity and high capture efficiency even on various patterns existing on a wafer. In the device of inspecting defects, an illumination optical system is formed of two systems of a coherent illumination of a laser 5 and an incoherent illumination of LEDs 6a, 6b, 6c and 6d, and light paths are divided in a detecting system corresponding to respective illumination light, spatial modulation elements 55a and 55b are arranged to detecting light paths, respectively, scattered light inhibiting sensitivity is shielded by the spatial modulating elements 55a and 55b, scattered light transmitted through the spatial modulation elements 55a and 55b is detected by image sensors 90a and 90b arranged to respective light paths, and images detected by these two image sensors 90a and 90b are subjected to a comparison processing, thereby determining a defect candidate.
摘要翻译：一种检测缺陷的方法，以及即使在晶片上存在的各种图案，也可以检测高灵敏度和高捕获效率的缺陷检测缺陷。在检查缺陷的装置中，照明光学系统由激光器5的相干照明和LED 6a，6b，6c和6d的非相干照明的两个系统形成，并且光路被分成对应于相应的照明光，空间调制元件55a和55b分别被布置成检测光路，散射光抑制灵敏度被空间调制元件55a和55b屏蔽，传播通过空间调制元件55a和55b的散射光被图像传感器90a检测和90b，并且由这两个图像传感器90a和90b检测到的图像进行比较处理，从而确定缺陷候选。

5. 发明申请

US20130329227A1 OPTICAL INSPECTION METHOD AND OPTICAL INSPECTION APPARATUS 有权
标题翻译：光学检测方法和光学检测装置
公开(公告)号：US20130329227A1
公开(公告)日：2013-12-12
申请号：US13983077
申请日：2011-12-20
申请人： Kenji Nakahira , Toshifumi Honda , Toshihiko Nakata
发明人： Kenji Nakahira , Toshifumi Honda , Toshihiko Nakata
IPC分类号： G01N21/88
CPC分类号： G01N21/88 , G01N21/9501 , G01N21/956 , G01N2021/8835
摘要： An optical inspection apparatus is provided which suppresses the influence of quantum noise including: light irradiator which irradiates a sample with light; reference light emitter which emits reference light; light interference unit which generates interfering light through interference between transmitted light, scattered light, or reflected light from the sample irradiated with light by the light irradiator, and the reference light emitted by the reference light emitter; light detector which detects the interfering light generated by the light interference unit; defect identifier which identifies the presence or absence of a defect based on a detection signal obtained by the light detector detecting the interfering light; and light convertor which converts at least the state of the transmitted, scattered, or reflected light from the sample, the state of the reference light emitted by the reference light emitter, or the state of the interfering light generated by the light interference unit.
摘要翻译：提供抑制量子噪声影响的光学检查装置，包括：用光照射样品的光照射器; 发射参考光的参考光发射器; 光干涉单元，其通过光照射器照射的样品的透射光，散射光或反射光之间的干涉产生干涉光，以及由参考光发射器发射的参考光; 光检测器，其检测由光干涉单元产生的干涉光; 缺陷识别器，其基于由所述光检测器检测到所述干扰光获得的检测信号来识别缺陷的存在或不存在; 以及光转换器，其至少转换来自样品的透射，散射或反射光的状态，由参考光发射器发射的参考光的状态或由光干涉单元产生的干涉光的状态。

6. 发明申请

US20120019816A1 DEFECT INSPECTION METHOD AND DEFECT INSPECTION APPARATUS 审中-公开
标题翻译：缺陷检查方法和缺陷检查装置
公开(公告)号：US20120019816A1
公开(公告)日：2012-01-26
申请号：US13145138
申请日：2010-01-06
申请人： Yukihiro Shibata , Toshihiko Nakata , Toshifumi Honda , Yasuhiro Yoshitake
发明人： Yukihiro Shibata , Toshihiko Nakata , Toshifumi Honda , Yasuhiro Yoshitake
IPC分类号： G01N21/88
CPC分类号： G01N21/95 , G01N21/21 , G01N21/47 , G01N21/9501 , G01N21/956 , G01N21/95607
摘要： The present invention provides a spatial filtering technology for exposing a defect image independently of polarization properties of defect scattered light, a defect inspection method for increasing a defect capture rate by suppressing the brightness saturation of a normal pattern, and a defect inspection apparatus that uses the defect inspection method. An array of spatial filters is disposed in one or more optical paths, which are obtained by polarizing and splitting a detection optical path, to filter diffracted light and scattered light emitted from the normal pattern. An image whose brightness saturation is suppressed is obtained by controlling an illumination light amount and/or detection efficiency during image detection in accordance with the amount of scattered light from the normal pattern.
摘要翻译：本发明提供了一种独立于缺陷散射光的偏振特性曝光缺陷图像的空间滤波技术，通过抑制正常图案的亮度饱和来增加缺陷捕获率的缺陷检查方法，以及使用缺陷检查方法。空间滤波器阵列设置在通过偏振和分离检测光路获得的一个或多个光路中，以滤除衍射光和从正常图案发射的散射光。根据来自正常图案的散射光的量，通过控制图像检测期间的照明光量和/或检测效率来获得亮度饱和度被抑制的图像。

7. 发明授权

US09267898B2 Optical inspection method and optical inspection apparatus 有权
标题翻译：光学检测方法和光学检测仪器
公开(公告)号：US09267898B2
公开(公告)日：2016-02-23
申请号：US13983077
申请日：2011-12-20
申请人： Kenji Nakahira , Toshifumi Honda , Toshihiko Nakata
发明人： Kenji Nakahira , Toshifumi Honda , Toshihiko Nakata
IPC分类号： G01N21/88 , G01N21/956 , G01N21/95
CPC分类号： G01N21/88 , G01N21/9501 , G01N21/956 , G01N2021/8835
摘要： An optical inspection apparatus is provided which suppresses the influence of quantum noise including: light irradiator which irradiates a sample with light; reference light emitter which emits reference light; light interference unit which generates interfering light through interference between transmitted light, scattered light, or reflected light from the sample irradiated with light by the light irradiator, and the reference light emitted by the reference light emitter; light detector which detects the interfering light generated by the light interference unit; defect identifier which identifies the presence or absence of a defect based on a detection signal obtained by the light detector detecting the interfering light; and light convertor which converts at least the state of the transmitted, scattered, or reflected light from the sample, the state of the reference light emitted by the reference light emitter, or the state of the interfering light generated by the light interference unit.
摘要翻译：提供抑制量子噪声影响的光学检查装置，包括：用光照射样品的光照射器; 发射参考光的参考光发射器; 光干涉单元，其通过光照射器照射的样品的透射光，散射光或反射光之间的干涉产生干涉光，以及由参考光发射器发射的参考光; 光检测器，其检测由光干涉单元产生的干涉光; 缺陷识别器，其基于由所述光检测器检测到所述干扰光获得的检测信号来识别缺陷的存在或不存在; 以及光转换器，其至少转换来自样品的透射，散射或反射光的状态，由参考光发射器发射的参考光的状态或由光干涉单元产生的干涉光的状态。

8. 发明申请

US20120092657A1 METHOD OF DEFECT INSPECTION AND DEVICE OF DEFECT INSPECTION 有权
标题翻译：缺陷检查方法和缺陷检查装置
公开(公告)号：US20120092657A1
公开(公告)日：2012-04-19
申请号：US13265935
申请日：2010-04-22
申请人： Yukihiro Shibata , Toshihiko Nakata , Taketo Ueno , Atsushi Taniguchi , Toshifumi Honda
发明人： Yukihiro Shibata , Toshihiko Nakata , Taketo Ueno , Atsushi Taniguchi , Toshifumi Honda
IPC分类号： G01N21/88
CPC分类号： G01N21/95623 , G01N21/95607 , G01N2021/8822 , G01N2201/062 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： A method of inspecting defects and a device inspecting defects of detecting defects at high sensitivity and high capture efficiency even on various patterns existing on a wafer. In the device of inspecting defects, an illumination optical system is formed of two systems of a coherent illumination of a laser 5 and an incoherent illumination of LEDs 6a, 6b, 6c and 6d, and light paths are divided in a detecting system corresponding to respective illumination light, spatial modulation elements 55a and 55b are arranged to detecting light paths, respectively, scattered light inhibiting sensitivity is shielded by the spatial modulating elements 55a and 55b, scattered light transmitted through the spatial modulation elements 55a and 55b is detected by image sensors 90a and 90b arranged to respective light paths, and images detected by these two image sensors 90a and 90b are subjected to a comparison processing, thereby determining a defect candidate.
摘要翻译：一种检测缺陷的方法，以及即使在晶片上存在的各种图案，也可以检测高灵敏度和高捕获效率的缺陷检测缺陷。在检查缺陷的装置中，照明光学系统由激光器5的相干照明和LED 6a，6b，6c和6d的非相干照明的两个系统形成，并且光路被分成对应于相应的照明光，空间调制元件55a和55b分别被布置成检测光路，散射光抑制灵敏度被空间调制元件55a和55b屏蔽，传播通过空间调制元件55a和55b的散射光被图像传感器90a检测和90b，并且由这两个图像传感器90a和90b检测到的图像进行比较处理，从而确定缺陷候选。

9. 发明授权

US08599369B2 Defect inspection device and inspection method 有权
标题翻译：缺陷检查装置及检验方法
公开(公告)号：US08599369B2
公开(公告)日：2013-12-03
申请号：US13378418
申请日：2010-06-09
申请人： Yuta Urano , Shigenobu Maruyama , Toshiyuki Nakao , Toshifumi Honda
发明人： Yuta Urano , Shigenobu Maruyama , Toshiyuki Nakao , Toshifumi Honda
IPC分类号： G01N21/47 , G01N21/55
CPC分类号： G01N21/9501 , G01N2021/8861 , G01N2021/8874
摘要： A defect inspection method wherein illumination light having a substantially uniform illumination intensity distribution in a certain direction on the surface of a specimen is radiated onto the surface of the specimen; wherein multiple components of those scattered light beams from the surface of the specimen which are emitted mutually different directions are detected, thereby obtaining corresponding multiple scattered light beam detection signals; wherein the multiple scattered light beam detection signals is subjected to processing, thereby determining the presence of defects; wherein the corresponding multiple scattered light detecting signals is processed with respect to all of the spots determined to be defective by the processing, thereby determining the sizes of defects; and wherein the defect locations on the specimen and the defect sizes are displayed with respect to all of the spots determined to be defective by the processing.
摘要翻译：一种缺陷检查方法，其中将在试样表面上沿某一方向具有基本均匀的照明强度分布的照明光辐射到样品的表面上; 其中检测出来自样本表面的这些散射光束相互不同方向发射的多个分量，从而获得相应的多个散射光束检测信号; 其中对所述多个散射光束检测信号进行处理，由此确定缺陷的存在; 其中相应的多个散射光检测信号相对于通过处理确定为有缺陷的所有点进行处理，从而确定缺陷的尺寸; 并且其中相对于通过处理确定为有缺陷的所有点显示样本上的缺陷位置和缺陷尺寸。

10. 发明申请

US20130141715A1 FAULT INSPECTION DEVICE AND FAULT INSPECTION METHOD 有权
标题翻译：故障检测设备和故障检测方法
公开(公告)号：US20130141715A1
公开(公告)日：2013-06-06
申请号：US13703414
申请日：2011-05-20
申请人： Yuta Urano , Shigenobu Maruyama , Toshiyuki Nakao , Toshifumi Honda , Yukihiro Shibata
发明人： Yuta Urano , Shigenobu Maruyama , Toshiyuki Nakao , Toshifumi Honda , Yukihiro Shibata
IPC分类号： G01N21/88
CPC分类号： G01N21/94 , G01N21/47 , G01N21/8806 , G01N21/9501 , G01N21/956 , G01N2021/4711 , G01N2021/8867 , G01N2021/8874 , G01N2201/0806 , G01N2201/10
摘要： Proposed is a defect inspection method whereby: illuminating light having a substantially uniform illumination intensity distribution in one direction of a sample surface irradiated on the sample surface; multiple scattered light components, which are output in multiple independent directions, are detected among the scattered light from the sample surface and multiple corresponding scattered light detection signals are obtained; at least one of the multiple scattered light detection signals is processed and the presence of defects is determined; at least one of the multiple scattered light detection signals that correspond to each of the points determined by the processing as a defect is processed and the dimensions of the defect are determined; and the position and dimensions of the defect on the sample surface, at each of the points determined as a defect, are displayed.
摘要翻译：提出了一种缺陷检查方法，其中：照射在样品表面上的样品表面的一个方向具有基本上均匀的照明强度分布的光; 在来自样品表面的散射光中检测多个独立方向输出的多个散射光分量，并获得多个相应的散射光检测信号; 处理多个散射光检测信号中的至少一个并确定缺陷的存在; 处理与通过处理确定的每个点对应的多个散射光检测信号中的至少一个作为缺陷，并确定缺陷的尺寸; 并且显示在被确定为缺陷的每个点处的样品表面上的缺陷的位置和尺寸。

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