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1. 发明授权

US08754050B2 Macrocyclic compounds useful as inhibitors of histone deacetylases 有权
标题翻译：可用作组蛋白脱乙酰酶抑制剂的大环化合物
公开(公告)号：US08754050B2
公开(公告)日：2014-06-17
申请号：US13700373
申请日：2011-05-26
申请人： Xuedong Liu , Andrew J. Phillips , Dana Ungermannova , Christopher G. Nasveschuk , Gan Zhang
发明人： Xuedong Liu , Andrew J. Phillips , Dana Ungermannova , Christopher G. Nasveschuk , Gan Zhang
IPC分类号： A61K38/12 , A61K38/06 , A61K38/07 , A61K39/395 , C07K11/00 , C07K11/02
CPC分类号： C07K11/02 , A61K31/425 , A61K38/005 , A61K38/15 , A61K39/3955 , A61K45/06 , C07K5/0821 , C07K11/00
摘要： The present invention provides a novel macrocyclic compound of general Formula (I) having histone deacetylase (HDAC) inhibitory activity, a pharmaceutical composition comprising the compound, and a method useful to treat diseases using the compound.
摘要翻译：本发明提供了具有组蛋白脱乙酰酶（HDAC）抑制活性的通式（I）的新型大环化合物，包含该化合物的药物组合物和可用于使用该化合物治疗疾病的方法。

2. 发明申请

US20130203681A1 Macrocyclic Compounds Useful as Inhibitors of Histone Deacetylases 有权
公开(公告)号：US20130203681A1
公开(公告)日：2013-08-08
申请号：US13700373
申请日：2011-05-26
申请人： Xuedong Liu , Andrew J. Phillips , Dana Ungermannova , Christopher G. Nasveschuk , Gan Zhang
发明人： Xuedong Liu , Andrew J. Phillips , Dana Ungermannova , Christopher G. Nasveschuk , Gan Zhang
IPC分类号： C07K11/02 , A61K45/06 , A61K38/00
CPC分类号： C07K11/02 , A61K31/425 , A61K38/005 , A61K38/15 , A61K39/3955 , A61K45/06 , C07K5/0821 , C07K11/00
摘要： The present invention provides a novel macrocyclic compound of general Formula (I) having histone deacetylase (HDAC) inhibitory activity, a pharmaceutical composition comprising the compound, and a method useful to treat diseases using the compound.

3. 发明申请

US20080121810A1 SYSTEM AND METHOD FOR A CHARGED PARTICLE BEAM 有权
标题翻译：充电颗粒束的系统和方法
公开(公告)号：US20080121810A1
公开(公告)日：2008-05-29
申请号：US11923012
申请日：2007-10-24
申请人： Xuedong Liu , Xu Zhang , Joe Wang , Edward Tseng , Zhongwei Chen
发明人： Xuedong Liu , Xu Zhang , Joe Wang , Edward Tseng , Zhongwei Chen
IPC分类号： H01J1/50
CPC分类号： H01J37/145 , H01J37/28 , H01J2237/0475 , H01J2237/12 , H01J2237/14 , H01J2237/24485 , H01J2237/2807
摘要： System and method for charged particle beam. According an embodiment, the present invention provides a charged particle beam apparatus. The apparatus includes a charged particle source for generating a primary charged particle beam. The apparatus also includes at least one condenser lens for pre-focusing the primary charge particle beam. Furthermore, the apparatus includes a compound objective lens for forming the magnetic field and the electrostatic field to focus the primary charged particle beam onto a specimen in the charged particle beam path. The specimen includes a specimen surface. The compound objective lens includes a conical magnetic lens, an immersion magnetic lens, and an electrostatic lens, the conical magnetic lens including an upper pole piece, a shared pole piece being electrically insulated from the upper pole piece, and an excitation coil.
摘要翻译：带电粒子束的系统和方法。根据实施例，本发明提供一种带电粒子束装置。该装置包括用于产生初级带电粒子束的带电粒子源。该装置还包括用于预聚焦初级充电粒子束的至少一个聚光透镜。此外，该装置包括用于形成磁场的复合物镜和静电场，以将初级带电粒子束聚焦到带电粒子束路径中的样本上。样品包括样品表面。复合物镜包括锥形磁性透镜，浸没式磁透镜和静电透镜，该圆锥形磁性透镜包括上极片，与上极片电绝缘的共用极片和励磁线圈。

4. 发明申请

US20080006771A1 ELECTRON BEAM APPARATUS TO COLLECT SIDE-VIEW AND/OR PLANE-VIEW IMAGE WITH IN-LENS SECTIONAL DETECTOR 有权
标题翻译：用电子束装置收集侧视图和/或平面视图与内窥镜部分检测器
公开(公告)号：US20080006771A1
公开(公告)日：2008-01-10
申请号：US11755705
申请日：2007-05-30
申请人： Chi-Hua Tseng , Zhong-Wei Chen , Xuedong Liu
发明人： Chi-Hua Tseng , Zhong-Wei Chen , Xuedong Liu
IPC分类号： G01N23/00
CPC分类号： G01N23/225 , H01J37/244 , H01J37/28 , H01J2237/24465 , H01J2237/2449
摘要： An electron beam apparatus and method are presented for collecting side-view and plane-view SEM imagery. The electron beam apparatus includes an electron source, some intermediate lenses if needed, an objective lens and an in-lens sectional detector. The electron source will provide an electron beam. The intermediate lenses focus the electron beam further. The objective lens is a combination of an immersion magnetic lens and a retarding electrostatic lens focuses the electron beam onto the specimen surface. The in-lens detector will be divided into two or more sections to collect secondary electrons emanating from the specimen with different azimuth and polar angle so that side-view SEM imagery can be obtained.
摘要翻译：提出了一种用于收集侧视图和平面视图SEM图像的电子束装置和方法。电子束装置包括电子源，如果需要的话，一些中间透镜，物镜和透镜内部分检测器。电子源将提供电子束。中间透镜进一步聚焦电子束。物镜是浸没式磁透镜和阻滞静电透镜的组合，将电子束聚焦在样品表面上。镜片内检测器将被分为两个或多个部分，以收集具有不同方位角和极角的样品发出的二次电子，从而可以获得侧视SEM图像。

5. 发明授权

US08624186B2 Movable detector for charged particle beam inspection or review 有权
标题翻译：用于带电粒子束检测或检查的可移动检测器
公开(公告)号：US08624186B2
公开(公告)日：2014-01-07
申请号：US12787139
申请日：2010-05-25
申请人： Yi-Xiang Wang , Joe Wang , Xuedong Liu , Zhongwei Chen
发明人： Yi-Xiang Wang , Joe Wang , Xuedong Liu , Zhongwei Chen
IPC分类号： H01J37/244
CPC分类号： H01J37/244 , H01J37/28 , H01J2237/024 , H01J2237/24465 , H01J2237/24475 , H01J2237/2448 , H01J2237/24495 , H01J2237/2611 , H01J2237/2817
摘要： The present invention generally relates to a detection unit of a charged particle imaging system. More particularly, portion of the detection unit can move into or out of the detection system as imaging condition required. With the assistance of a Wein filter (also known as an E×B charged particle analyzer) and a movable detector design, the present invention provides a stereo imaging system that suitable for both low current, high resolution mode and high current, high throughput mode. Merely by way of example, the invention has been applied to a scanning electron beam inspection system. But it would be recognized that the invention could apply to other system using charged particle beam as an observation tool.
摘要翻译：本发明一般涉及带电粒子成像系统的检测单元。更具体地，检测单元的一部分可以作为所需的成像条件移入或移出检测系统。在Wein滤波器（也称为E×B带电粒子分析仪）和可移动检测器设计的帮助下，本发明提供了一种适用于低电流，高分辨率模式和高电流，高通量模式的立体成像系统。仅作为示例，本发明已经应用于扫描电子束检查系统。但是应当认识到，本发明可以应用于使用带电粒子束作为观测工具的其它系统。

6. 发明申请

US20100270468A1 SYSTEM AND METHOD FOR A CHARGED PARTICLE BEAM 有权
标题翻译：充电颗粒束的系统和方法
公开(公告)号：US20100270468A1
公开(公告)日：2010-10-28
申请号：US12832127
申请日：2010-07-08
申请人： Xuedong Liu , Xu Zhang , Joe Wang , Edward Tseng , Zhongwei Chen
发明人： Xuedong Liu , Xu Zhang , Joe Wang , Edward Tseng , Zhongwei Chen
IPC分类号： H01J37/145 , H01J37/28
CPC分类号： H01J37/145 , H01J37/28 , H01J2237/0475 , H01J2237/12 , H01J2237/14 , H01J2237/24485 , H01J2237/2807
摘要： System and method for charged particle beam. According an embodiment, the present invention provides a charged particle beam apparatus. The apparatus includes a charged particle source for generating a primary charged particle beam. The apparatus also includes at least one condenser lens for pre-focusing the primary charge particle beam. Furthermore, the apparatus includes a compound objective lens for forming the magnetic field and the electrostatic field to focus the primary charged particle beam onto a specimen in the charged particle beam path. The specimen includes a specimen surface. The compound objective lens includes a conical magnetic lens, an immersion magnetic lens, and an electrostatic lens, the conical magnetic lens including an upper pole piece, a shared pole piece being electrically insulated from the upper pole piece, and an excitation coil.
摘要翻译：带电粒子束的系统和方法。根据实施例，本发明提供一种带电粒子束装置。该装置包括用于产生初级带电粒子束的带电粒子源。该装置还包括用于预聚焦初级充电粒子束的至少一个聚光透镜。此外，该装置包括用于形成磁场的复合物镜和静电场，以将初级带电粒子束聚焦到带电粒子束路径中的样本上。样品包括样品表面。复合物镜包括锥形磁性透镜，浸没式磁透镜和静电透镜，该圆锥形磁性透镜包括上极片，与上极片电绝缘的共用极片和励磁线圈。

7. 发明授权

US07759653B2 Electron beam apparatus 失效
标题翻译：电子束装置
公开(公告)号：US07759653B2
公开(公告)日：2010-07-20
申请号：US12130879
申请日：2008-05-30
申请人： Zhong-Wei Chen , Xuedong Liu , Xu Zhang , Weiming Ren , Juying Dou
发明人： Zhong-Wei Chen , Xuedong Liu , Xu Zhang , Weiming Ren , Juying Dou
IPC分类号： H01J37/00 , H01J37/28
CPC分类号： H01J37/28 , H01J37/141 , H01J2237/0475 , H01J2237/1035
摘要： The present invention includes an electron beam device for examining defects on semiconductor devices. The device includes an electron source for generating a primary electron beam, wherein the total acceleration potential is divided and is provided across the ground potential. Also included is at least one condenser lens for pre-focusing the primary electron beam, an aperture for confining the primary electron beam to ameliorate electron-electron interaction, wherein the aperture is positioned right underneath the last condenser lens, and a SORIL objective lens system for forming immersion magnetic field and electrostatic field to focus the primary beam onto the specimen in the electron beam path. A pair of grounding rings for providing virtual ground voltage potential to those components within the electron beam apparatus installed below a source anode and above a last polepiece of the SORIL objective lens.
摘要翻译：本发明包括用于检查半导体器件上的缺陷的电子束装置。该装置包括用于产生一次电子束的电子源，其中总加速电位被分开并提供在地电位之间。还包括至少一个用于预聚焦一次电子束的聚光透镜，用于限制一次电子束以改善电子 - 电子相互作用的孔，其中孔位于最后的聚光透镜的正下方，以及SORIL物镜系统用于形成浸没磁场和静电场，以将主光束聚焦在电子束路径中的样本上。一对接地环，用于为安装在源极阳极和SORIL物镜的最后一个极点之上的电子束装置内的那些部件提供虚拟接地电压电位。

8. 发明申请

US20130112889A1 WIEN FILTER 有权
公开(公告)号：US20130112889A1
公开(公告)日：2013-05-09
申请号：US13292455
申请日：2011-11-09
申请人： Zhongwei Chen , Xuedong Liu , Weiming Ren
发明人： Zhongwei Chen , Xuedong Liu , Weiming Ren
IPC分类号： H01J3/26
CPC分类号： H01J37/05 , H01J49/288 , H01J2237/057
摘要： This invention provides a multi-pole type Wien filter, which acts more purely approaching its fundamentally expected performance. A 12-electrode electric device acts as an electric deflector,or acts as an electric deflector and an electric stigmator together. A cylindrical 4-coil magnetic device with a magnetic core acts as a magnetic deflector. Both can produce a dipole field while only incurring a negligibly-small 3rd order field harmonic. The magnetic core enhances the strength and more preciously regulates the distribution of the magnetic field originally generated by the coils. Then two ways to construct a Wien filter are proposed. One way is based on both of the foregoing electric and magnetic devices, and the other way is based on the foregoing electric device and a conventional magnetic deflector. The astigmatism in each of such Wien filters can be compensated by the electric stigmator of the electric device.
摘要翻译：本发明提供了一种多极型Wien滤波器，其更加纯粹地接近其根本预期的性能。 12电极电气装置用作电导向器，或者用作电导向器和电极连接器。具有磁芯的圆柱形4线圈磁性装置用作磁导流器。两者都可以产生偶极场，同时只产生一个可忽略的小三阶场谐波。磁芯增强了强度，更加珍贵地调节了最初由线圈产生的磁场的分布。然后提出构建维恩滤波器的两种方法。一种方法是基于上述电气和磁性装置两者，另一种方法是基于前述的电气装置和常规的磁导向装置。每个这样的维恩滤波器中的像散可以通过电气设备的电极来补偿。

9. 发明授权

US08294095B2 Apparatus of plural charged particle beams with multi-axis magnetic lens 有权
标题翻译：具有多轴磁性透镜的多个带电粒子束的装置
公开(公告)号：US08294095B2
公开(公告)日：2012-10-23
申请号：US12968201
申请日：2010-12-14
申请人： Zhongwei Chen , Weiming Ren , Kenichi Kanai , Xuedong Liu
发明人： Zhongwei Chen , Weiming Ren , Kenichi Kanai , Xuedong Liu
IPC分类号： H01J29/56 , G01N23/225
CPC分类号： G01N23/2251 , G01N2223/6116 , G01N2223/646 , H01J37/141 , H01J2237/2817
摘要： An apparatus basically uses a simple and compact multi-axis magnetic lens to focus each of a plurality of charged particle beams on sample surface at the same time. In each sub-lens module of the multi-axis magnetic lens, two magnetic rings are respectively inserted into upper and lower holes with non-magnetic radial gap. Each gap size is small enough to keep a sufficient magnetic coupling and large enough to get a sufficient axial symmetry of magnetic scale potential distribution in the space near to its optical axis. This method eliminates the non-axisymmetric transverse field in each sub-lens and the round lens field difference among all sub-lenses at the same time; both exist inherently in a conventional multi-axis magnetic lens. In the apparatus, some additional magnetic shielding measures such as magnetic shielding tubes, plates and house are used to eliminate the non-axisymmetric transverse field on the charged particle path from each charged particle source to the entrance of each sub-lens and from the exit of each sub-lens to the sample surface.
摘要翻译：设备基本上使用简单紧凑的多轴磁性透镜来同时将多个带电粒子束中的每一个聚焦在样品表面上。在多轴磁性透镜的每个子透镜模块中，两个磁环分别插入具有非磁性径向间隙的上孔和下孔中。每个间隙尺寸足够小以保持足够的磁耦合并且足够大以在靠近其光轴的空间中获得足够的磁标势电位分布的轴向对称性。该方法同时消除了每个子透镜中的非轴对称横向场和所有子透镜之间的圆透镜场差; 都存在于传统的多轴磁性透镜中。在该装置中，使用一些额外的磁屏蔽措施，例如磁屏蔽管，板和房子来消除带电粒子路径上从每个带电粒子源到每个子透镜的入口和从出口的入口处的非轴对称横向场每个子透镜到样品表面。

10. 发明授权

US08164060B2 System and method for a charged particle beam 有权
标题翻译：带电粒子束的系统和方法
公开(公告)号：US08164060B2
公开(公告)日：2012-04-24
申请号：US12832127
申请日：2010-07-08
申请人： Xuedong Liu , Xu Zhang , Joe Wang , Edward Tseng , Zhongwei Chen
发明人： Xuedong Liu , Xu Zhang , Joe Wang , Edward Tseng , Zhongwei Chen
IPC分类号： H01J37/244 , H01J37/145
CPC分类号： H01J37/145 , H01J37/28 , H01J2237/0475 , H01J2237/12 , H01J2237/14 , H01J2237/24485 , H01J2237/2807
摘要： System and method for charged particle beam. According an embodiment, the present invention provides a charged particle beam apparatus. The apparatus includes a charged particle source for generating a primary charged particle beam. The apparatus also includes at least one condenser lens for pre-focusing the primary charge particle beam. Furthermore, the apparatus includes a compound objective lens for forming the magnetic field and the electrostatic field to focus the primary charged particle beam onto a specimen in the charged particle beam path. The specimen includes a specimen surface. The compound objective lens includes a conical magnetic lens, an immersion magnetic lens, and an electrostatic lens, the conical magnetic lens including an upper pole piece, a shared pole piece being electrically insulated from the upper pole piece, and an excitation coil.
摘要翻译：带电粒子束的系统和方法。根据实施例，本发明提供一种带电粒子束装置。该装置包括用于产生初级带电粒子束的带电粒子源。该装置还包括用于预聚焦初级充电粒子束的至少一个聚光透镜。此外，该装置包括用于形成磁场的复合物镜和静电场，以将初级带电粒子束聚焦到带电粒子束路径中的样本上。样品包括样品表面。复合物镜包括锥形磁性透镜，浸没式磁透镜和静电透镜，该圆锥形磁性透镜包括上极片，与上极片电绝缘的共用极片和励磁线圈。

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