会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 5. 发明授权
    • Manufacturing method for a thin film with an anti-reflection rough
surface
    • 具有抗反射粗糙表面的薄膜的制造方法
    • US6093646A
    • 2000-07-25
    • US33113
    • 1998-03-02
    • Jacky KuoMark LinSteven Hsiao
    • Jacky KuoMark LinSteven Hsiao
    • H01L21/285H01L21/3213H01L21/44
    • H01L21/28525H01L21/32139
    • The present invention provides a manufacturing method for a poly film with an anti-reflection rough surface is provided. The method comprises steps of, at first, a thin film is formed over a substrate, and a amorphous silicon layer is formed over the thin film. Next, in situ a first annealing procedure is performed over the amorphous silicon layer. The amorphous silicon layer is changed into a polysilicon layer with the anti-reflection rough surface. Next, in situ a second annealing procedure is selectively performed. The polysilicon layer with the anti-reflection rough surface is doped by reacting with a gas induced. Then, the thin film and the polysilicon layer with the anti-reflection rough surface is defined, whereby the poly film with an anti-reflection rough surface is formed over the substrate.
    • 本发明提供了一种具有防反射粗糙表面的多层膜的制造方法。 该方法包括以下步骤:首先在衬底上形成薄膜,并在该薄膜上形成非晶硅层。 接下来,原位地在非晶硅层上进行第一退火程序。 非晶硅层变成具有抗反射粗糙表面的多晶硅层。 接下来,选择性地进行第二退火处理。 具有抗反射粗糙表面的多晶硅层通过与气体诱导反应而掺杂。 然后,限定具有防反射粗糙表面的薄膜和多晶硅层,由此在基板上形成具有防反射粗糙表面的多层膜。