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1. 发明申请

US20090272916A1 RADIATION SOURCE AND LITHOGRAPHIC APPARATUS 有权
标题翻译：辐射源和光刻设备
公开(公告)号：US20090272916A1
公开(公告)日：2009-11-05
申请号：US12431367
申请日：2009-04-28
申请人： Wouter Anthon SOER , Maarten Marinus Johannes Van Herpen , Martin Jacobus Johan Jak
发明人： Wouter Anthon SOER , Maarten Marinus Johannes Van Herpen , Martin Jacobus Johan Jak
IPC分类号： G21K5/00 , H05G2/00
CPC分类号： G03F7/70916 , G03F7/70033 , G03F7/70058
摘要： A radiation source is configured to generate extreme ultraviolet radiation. The radiation source includes a plasma formation site located at a position in which a fuel is contacted by a beam of radiation to form a plasma, a collector constructed and arranged to collect extreme ultraviolet radiation formed at the plasma formation site and form an extreme ultraviolet radiation beam, and a contamination barrier. The contamination barrier includes a plurality of foils at least partially located between the plasma formation site and the collector, and a rotatable base operatively connected to the plurality of foils. The rotatable base is configured to allow the beam of radiation to pass through the contamination barrier to the plasma formation site.
摘要翻译：辐射源被配置成产生极紫外辐射。辐射源包括位于燃料被辐射束接触以形成等离子体的位置处的等离子体形成位置，构造和布置成收集在等离子体形成部位处形成的极紫外辐射并形成极紫外辐射的收集器光束和污染屏障。污染屏障包括至少部分地位于等离子体形成位置和集电器之间的多个箔，以及可操作地连接到多个箔的可旋转底座。可旋转底座构造成允许辐射束通过污染屏障到等离子体形成部位。

2. 发明申请

US20090027637A1 Debris prevention system and lithographic apparatus 失效
标题翻译：防碎片系统和光刻设备
公开(公告)号：US20090027637A1
公开(公告)日：2009-01-29
申请号：US11878306
申请日：2007-07-23
申请人： Wouter Anthon Soer , Maarten Marinus Johannes Van Herpen
发明人： Wouter Anthon Soer , Maarten Marinus Johannes Van Herpen
IPC分类号： G03B27/42
CPC分类号： G03F7/70925 , B08B1/00 , B82Y10/00 , G03F7/70166 , G03F7/70916
摘要： A debris prevention system is constructed and arranged to prevent debris emanating from a radiation source from propagating with radiation from the radiation source into or within a lithographic apparatus. The debris prevention system includes a first foil trap that is rotatable around an axis of rotation, and a second foil trap that at least partly encloses the first foil trap. The second foil trap includes a plurality of foils optically open respective to a central location for placement of a radiation source and optically closed respective to directions perpendicular to the axis of rotation.
摘要翻译：构建和布置防碎片系统，以防止从辐射源发出的碎屑从辐射源的辐射传播到光刻设备内或其内。碎片防止系统包括可围绕旋转轴线旋转的第一箔捕获器和至少部分地包围第一箔捕获器的第二箔阱。第二箔捕获器包括多个箔片，其相应于中心位置光学地打开，用于放置辐射源并且相应于垂直于旋转轴线的方向光学地闭合。

3. 发明申请

US20060138362A1 LITHOGRAPHIC APPARATUS, ILLUMINATION SYSTEM AND DEBRIS TRAPPING SYSTEM 有权
标题翻译： LITHOGRAPHIC装置，照明系统和DEBRIS TRAPPING系统
公开(公告)号：US20060138362A1
公开(公告)日：2006-06-29
申请号：US11020674
申请日：2004-12-27
申请人： Levinus Bakker , Derk Klunder , Maarten Marinus Johannes Van Herpen
发明人： Levinus Bakker , Derk Klunder , Maarten Marinus Johannes Van Herpen
IPC分类号： G01J3/10
CPC分类号： G03F7/70058 , G03F7/70916 , G03F7/70933
摘要： A debris trapping system for trapping debris particles released with the generation of radiation by a radiation source in a lithographic apparatus includes first and second sets of channels. Each channel of the first set enables radiation from a radiating source to propagate therethrough and has an inner wall for catching debris particles. The second set of channels is situated downstream of the first set with respect to a propagation direction of the radiation. Each channel of the second set enables radiation from the radiating source to also propagate therethrough and has an inner wall for catching debris particles. A gas supply and a gas exhaust are configured to provide between the first set and the second set of channels a gas flow having a net flow direction substantially across the propagation direction of the radiation from a radiating source.
摘要翻译：用于捕获由光刻设备中的辐射源产生辐射而释放的碎屑颗粒的碎片捕集系统包括第一和第二组通道。第一组的每个通道使来自辐射源的辐射能够通过其传播并具有用于捕获碎屑颗粒的内壁。相对于辐射的传播方向，第二组通道位于第一组的下游。第二组的每个通道使得来自辐射源的辐射也能够通过其传播，并且具有用于捕获碎屑颗粒的内壁。气体供应和排气被配置为在第一组和第二组通道之间提供气流，其具有基本上横跨辐射源的辐射的传播方向的净流动方向。

4. 发明申请

US20070125963A1 RADIATION SYSTEM AND LITHOGRAPHIC APPARATUS 失效
标题翻译：辐射系统和光刻设备
公开(公告)号：US20070125963A1
公开(公告)日：2007-06-07
申请号：US11292310
申请日：2005-12-02
申请人： Maarten Marinus Johannes Van Herpen , Johannes Moors , Derk Klunder
发明人： Maarten Marinus Johannes Van Herpen , Johannes Moors , Derk Klunder
IPC分类号： G03F7/20
CPC分类号： G03F7/70916 , B82Y10/00 , G03F7/70033 , G03F7/70041 , G03F7/70191 , G03F7/7055 , G03F7/70908 , G21K1/043 , G21K1/062
摘要： A radiation system for generating a beam of radiation is disclosed. The radiation system includes a pulsed EUV source for generating EUV radiation, and a spectral filter mounted in front of the EUV source for selectively passing a spectral range of a beam of EUV radiation from the EUV source. The spectral filter is mounted on a movable mount configured to be moved in synchronicity with the pulsed EUV source to prevent debris traveling from the EUV source from impacting the spectral filter. Accordingly, the spectral filter is kept substantially free from contamination by the debris.
摘要翻译：公开了一种用于产生辐射束的辐射系统。辐射系统包括用于产生EUV辐射的脉冲EUV源和安装在EUV源前面的光谱滤波器，用于选择性地通过来自EUV源的EUV辐射束的光谱范围。光谱滤光器安装在可移动的安装座上，可移动的安装件被配置为与脉冲EUV源同步地移动，以防止从EUV源传播的碎屑撞击光谱滤波器。因此，光谱滤波器基本上不受碎屑的污染。

5. 发明申请

US20060138361A1 Lithographic apparatus, illumination system and method for mitigating debris particles 失效
公开(公告)号：US20060138361A1
公开(公告)日：2006-06-29
申请号：US11020555
申请日：2004-12-27
申请人： Maarten Marinus Johannes Van Herpen
发明人： Maarten Marinus Johannes Van Herpen
IPC分类号： G01J3/10
CPC分类号： G03F7/70916
摘要： A lithographic apparatus includes a source for generating radiation bursts with a predetermined frequency, an illumination system for conditioning the radiation, a patterning device for patterning the radiation, and a projection system for projecting the patterned radiation onto a substrate. The illumination system includes a debris mitigating system for mitigating debris particles released with the generation of the radiation. The debris mitigating system is arranged to apply on the basis of the predetermined frequency a dynamically applicable condition to which the debris particles are exposed.

6. 发明申请

US20060245057A1 Spectral purity filter for multi-layer mirror, lithographic apparatus including such multi-layer mirror, method for enlarging the ratio of desired radiation and undesired radiation, and device manufacturing method 有权
标题翻译：用于多层反射镜的光谱纯度滤光器，包括这种多层反射镜的光刻设备，用于扩大所需辐射和不期望辐射的比率的方法，以及器件制造方法
公开(公告)号：US20060245057A1
公开(公告)日：2006-11-02
申请号：US11115406
申请日：2005-04-27
申请人： Maarten Marinus Johannes Van Herpen , Levinus Bakker , Vadim Banine , Derk Jan Klunder
发明人： Maarten Marinus Johannes Van Herpen , Levinus Bakker , Vadim Banine , Derk Jan Klunder
IPC分类号： G03C1/005 , G03C1/494 , G02B1/10
CPC分类号： G02B1/10 , B82Y10/00 , B82Y40/00 , G02B5/0816 , G02B5/0891 , G02B5/283 , G03F1/24 , G03F7/70575 , G03F7/70958 , G21K1/062 , G21K2201/067
摘要： A multi-layer mirror includes on top of the multi-layer mirror a spectral purity enhancement layer, for example for application in an EUV lithographic apparatus. This spectral purity enhancement layer includes a first spectral purity enhancement layer, but between the multi-layer mirror and first spectral purity enhancement layer there may optionally be an intermediate layer or a second spectral purity enhancement layer and intermediate layer. Hence, multi-layer mirrors with the following configurations are possible: multi-layer mirror/first spectral purity enhancement layer; multi-layer mirror/intermediate layer/first spectral purity enhancement layer; and multi-layer mirror/second spectral purity enhancement layer/intermediate layer/first spectral purity enhancement layer. The spectral purity of normal incidence radiation may be enhanced, such that DUV radiation is diminished relatively stronger than EUV radiation.
摘要翻译：多层反射镜在多层镜的顶部包括光谱纯度增强层，例如用于EUV光刻设备中。该光谱纯度增强层包括第一光谱纯度增强层，但是在多层反射镜和第一光谱纯度增强层之间，可选地可以有中间层或第二光谱纯度增强层和中间层。因此，具有以下配置的多层反射镜是可能的：多层镜/第一光谱纯度增强层; 多层镜/中间层/第一光谱纯度增强层; 和多层镜/第二光谱纯度增强层/中间层/第一光谱纯度增强层。可以增强正常入射辐射的光谱纯度，使得DUV辐射比EUV辐射相对更强。

7. 发明申请

US20070259275A1 Anti-reflection coating for an EUV mask 有权
标题翻译：防反射涂层用于EUV面罩
公开(公告)号：US20070259275A1
公开(公告)日：2007-11-08
申请号：US11418465
申请日：2006-05-05
申请人： Maarten Marinus Johannes Van Herpen , Vadim Banine , Koen Schenau , Derk Klunder
发明人： Maarten Marinus Johannes Van Herpen , Vadim Banine , Koen Schenau , Derk Klunder
IPC分类号： G03B27/42 , G21K5/00 , G03F1/00
CPC分类号： G03F1/24 , B82Y10/00 , B82Y40/00 , G02B5/0816 , G03F7/70575 , G21K1/062
摘要： An EUV mask includes, on top of a multi-layer mirror, a spectral purity enhancement layer, for application in an EUV lithographic apparatus. On top of the spectral purity enhancement layer, a patterned absorber layer is provided. The spectral purity enhancement layer includes a first spectral purity enhancement layer, but between the multi-layer mirror and first spectral purity enhancement layer there may be an intermediate layer or a second spectral purity enhancement layer and intermediate layer. The patterned absorber layer may also itself function as an anti-reflection (AR) coating. The AR effect of this absorber layer is a function of the aperture sizes in the pattern. The spectral purity of a mask may be enhanced, such that DUV radiation is diminished relatively stronger than EUV radiation.
摘要翻译： EUV掩模在多层反射镜之上包括光谱纯度增强层，用于EUV光刻设备中。在光谱纯度增强层的顶部，提供了图案化的吸收层。光谱纯度增强层包括第一光谱纯度增强层，但是在多层反射镜和第一光谱纯度增强层之间，可以存在中间层或第二光谱纯度增强层和中间层。图案化的吸收层本身也可以用作抗反射（AR）涂层。该吸收层的AR效应是图案中孔径尺寸的函数。可以增强掩模的光谱纯度，使得DUV辐射比EUV辐射相对更强。

8. 发明申请

US20060245058A1 Spectral purity filter for a multi-layer mirror, lithographic apparatus including such multi-layer mirror, method for enlarging the ratio of desired radiation and undesired radiation, and device manufacturing method 有权
标题翻译：用于多层反射镜的光谱纯度滤光器，包括这种多层反射镜的光刻设备，用于扩大所需辐射和不期望辐射的比率的方法，以及器件制造方法
公开(公告)号：US20060245058A1
公开(公告)日：2006-11-02
申请号：US11337807
申请日：2006-01-24
申请人： Maarten Marinus Johannes Van Herpen , Levinus Bakker , Vadim Banine , Derk Jan Klunder
发明人： Maarten Marinus Johannes Van Herpen , Levinus Bakker , Vadim Banine , Derk Jan Klunder
IPC分类号： G02B1/10
CPC分类号： G02B1/10 , B82Y10/00 , B82Y40/00 , G02B5/0816 , G02B5/0891 , G02B5/283 , G03F1/24 , G03F7/70575 , G03F7/70958 , G21K1/062 , G21K2201/067
摘要： A multi-layer mirror includes on top of the multi-layer mirror a spectral purity enhancement layer, for example for application in an EUV lithographic apparatus. This spectral purity enhancement layer includes a first spectral purity enhancement layer, but between the multi-layer mirror and first spectral purity enhancement layer there may optionally be an intermediate layer or a second spectral purity enhancement layer and intermediate layer. Hence, multi-layer mirrors with the following configurations are possible: multi-layer mirror/first spectral purity enhancement layer; multi-layer mirror/intermediate layer/first spectral purity enhancement layer; and multi-layer mirror/second spectral purity enhancement layer/intermediate layer/first spectral purity enhancement layer. The spectral purity of normal incidence radiation may be enhanced, such that DUV radiation is diminished relatively stronger than EUV radiation.
摘要翻译：多层反射镜在多层镜的顶部包括光谱纯度增强层，例如用于EUV光刻设备中。该光谱纯度增强层包括第一光谱纯度增强层，但是在多层反射镜和第一光谱纯度增强层之间，可选地可以有中间层或第二光谱纯度增强层和中间层。因此，具有以下配置的多层反射镜是可能的：多层镜/第一光谱纯度增强层; 多层镜/中间层/第一光谱纯度增强层; 和多层镜/第二光谱纯度增强层/中间层/第一光谱纯度增强层。可以增强正常入射辐射的光谱纯度，使得DUV辐射比EUV辐射相对更强。

9. 发明申请

US20090038636A1 Cleaning method 审中-公开
标题翻译：清洗方法
公开(公告)号：US20090038636A1
公开(公告)日：2009-02-12
申请号：US11889213
申请日：2007-08-09
申请人： Sander Frederik Wuister , Vadim Yevgenyevich Banine , Maarten Marinus Johannes Van Herpen
发明人： Sander Frederik Wuister , Vadim Yevgenyevich Banine , Maarten Marinus Johannes Van Herpen
IPC分类号： B08B5/00 , B08B3/00
CPC分类号： B08B7/00 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： A method of cleaning an imprint template is disclosed. The method includes exposing the imprint template to a reductive fluid.
摘要翻译：公开了一种清洁压印模板的方法。该方法包括将印模模板暴露于还原液中。

10. 发明申请

US20070125964A1 Lithographic apparatus including a cleaning device and method for cleaning an optical element 失效
标题翻译：光刻设备包括清洁装置和清洁光学元件的方法
公开(公告)号：US20070125964A1
公开(公告)日：2007-06-07
申请号：US11292312
申请日：2005-12-02
申请人： Maarten Marinus Johannes Van Herpen , Derk Klunder
发明人： Maarten Marinus Johannes Van Herpen , Derk Klunder
IPC分类号： G03F7/20
CPC分类号： G03F7/70916 , B82Y10/00 , G03F7/70033 , G03F7/70175 , G03F7/70883 , G03F7/70908 , G03F7/70983
摘要： An EUV lithographic apparatus includes an EUV radiation source, an optical element and a cleaning device. The cleaning device includes a hydrogen radical source and a flow tube in communication with the hydrogen radical source. The cleaning device is configured to provide a flow of hydrogen radicals and the flow tube is arranged to provide a hydrogen radical flow at a predetermined position within the lithographic apparatus, for example for cleaning a collector mirror.
摘要翻译： EUV光刻设备包括EUV辐射源，光学元件和清洁装置。清洁装置包括氢自由基源和与氢根源连通的流管。清洁装置被配置为提供氢自由基流，并且流管布置成在光刻设备内的预定位置处提供氢自由基流，例如用于清洁收集镜。

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