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1. 发明申请

US20060245057A1 Spectral purity filter for multi-layer mirror, lithographic apparatus including such multi-layer mirror, method for enlarging the ratio of desired radiation and undesired radiation, and device manufacturing method 有权
标题翻译：用于多层反射镜的光谱纯度滤光器，包括这种多层反射镜的光刻设备，用于扩大所需辐射和不期望辐射的比率的方法，以及器件制造方法
公开(公告)号：US20060245057A1
公开(公告)日：2006-11-02
申请号：US11115406
申请日：2005-04-27
申请人： Maarten Marinus Johannes Van Herpen , Levinus Bakker , Vadim Banine , Derk Jan Klunder
发明人： Maarten Marinus Johannes Van Herpen , Levinus Bakker , Vadim Banine , Derk Jan Klunder
IPC分类号： G03C1/005 , G03C1/494 , G02B1/10
CPC分类号： G02B1/10 , B82Y10/00 , B82Y40/00 , G02B5/0816 , G02B5/0891 , G02B5/283 , G03F1/24 , G03F7/70575 , G03F7/70958 , G21K1/062 , G21K2201/067
摘要： A multi-layer mirror includes on top of the multi-layer mirror a spectral purity enhancement layer, for example for application in an EUV lithographic apparatus. This spectral purity enhancement layer includes a first spectral purity enhancement layer, but between the multi-layer mirror and first spectral purity enhancement layer there may optionally be an intermediate layer or a second spectral purity enhancement layer and intermediate layer. Hence, multi-layer mirrors with the following configurations are possible: multi-layer mirror/first spectral purity enhancement layer; multi-layer mirror/intermediate layer/first spectral purity enhancement layer; and multi-layer mirror/second spectral purity enhancement layer/intermediate layer/first spectral purity enhancement layer. The spectral purity of normal incidence radiation may be enhanced, such that DUV radiation is diminished relatively stronger than EUV radiation.
摘要翻译：多层反射镜在多层镜的顶部包括光谱纯度增强层，例如用于EUV光刻设备中。该光谱纯度增强层包括第一光谱纯度增强层，但是在多层反射镜和第一光谱纯度增强层之间，可选地可以有中间层或第二光谱纯度增强层和中间层。因此，具有以下配置的多层反射镜是可能的：多层镜/第一光谱纯度增强层; 多层镜/中间层/第一光谱纯度增强层; 和多层镜/第二光谱纯度增强层/中间层/第一光谱纯度增强层。可以增强正常入射辐射的光谱纯度，使得DUV辐射比EUV辐射相对更强。

2. 发明申请

US20060245058A1 Spectral purity filter for a multi-layer mirror, lithographic apparatus including such multi-layer mirror, method for enlarging the ratio of desired radiation and undesired radiation, and device manufacturing method 有权
标题翻译：用于多层反射镜的光谱纯度滤光器，包括这种多层反射镜的光刻设备，用于扩大所需辐射和不期望辐射的比率的方法，以及器件制造方法
公开(公告)号：US20060245058A1
公开(公告)日：2006-11-02
申请号：US11337807
申请日：2006-01-24
申请人： Maarten Marinus Johannes Van Herpen , Levinus Bakker , Vadim Banine , Derk Jan Klunder
发明人： Maarten Marinus Johannes Van Herpen , Levinus Bakker , Vadim Banine , Derk Jan Klunder
IPC分类号： G02B1/10
CPC分类号： G02B1/10 , B82Y10/00 , B82Y40/00 , G02B5/0816 , G02B5/0891 , G02B5/283 , G03F1/24 , G03F7/70575 , G03F7/70958 , G21K1/062 , G21K2201/067
摘要： A multi-layer mirror includes on top of the multi-layer mirror a spectral purity enhancement layer, for example for application in an EUV lithographic apparatus. This spectral purity enhancement layer includes a first spectral purity enhancement layer, but between the multi-layer mirror and first spectral purity enhancement layer there may optionally be an intermediate layer or a second spectral purity enhancement layer and intermediate layer. Hence, multi-layer mirrors with the following configurations are possible: multi-layer mirror/first spectral purity enhancement layer; multi-layer mirror/intermediate layer/first spectral purity enhancement layer; and multi-layer mirror/second spectral purity enhancement layer/intermediate layer/first spectral purity enhancement layer. The spectral purity of normal incidence radiation may be enhanced, such that DUV radiation is diminished relatively stronger than EUV radiation.
摘要翻译：多层反射镜在多层镜的顶部包括光谱纯度增强层，例如用于EUV光刻设备中。该光谱纯度增强层包括第一光谱纯度增强层，但是在多层反射镜和第一光谱纯度增强层之间，可选地可以有中间层或第二光谱纯度增强层和中间层。因此，具有以下配置的多层反射镜是可能的：多层镜/第一光谱纯度增强层; 多层镜/中间层/第一光谱纯度增强层; 和多层镜/第二光谱纯度增强层/中间层/第一光谱纯度增强层。可以增强正常入射辐射的光谱纯度，使得DUV辐射比EUV辐射相对更强。

3. 发明申请

US20070146659A1 Lithographic apparatus and device manufacturing method 失效
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20070146659A1
公开(公告)日：2007-06-28
申请号：US11319190
申请日：2005-12-28
申请人： Derk Jan Klunder , Levinus Bakker , Vadim Banine , Frank Jeroen Schuurmans , Dominik Vaudrevange , Maarten Marinus Wilhelmus Van Herpen
发明人： Derk Jan Klunder , Levinus Bakker , Vadim Banine , Frank Jeroen Schuurmans , Dominik Vaudrevange , Maarten Marinus Wilhelmus Van Herpen
IPC分类号： G03B27/52
CPC分类号： G03F7/70916 , B82Y10/00 , G03F7/70166
摘要： A lithographic apparatus includes a radiation system for providing a beam of radiation. The radiation system includes at least one of a contaminant trap for trapping material emanating from the radiation source and a collector for collecting the beam of radiation. The at least one of the contaminant trap and the collector includes an element arranged in the path of the radiation beam on which the material emanating from the radiation source can deposit during propagation of the radiation beam in the radiation system. At least a part of the element disposed in the path of the radiation beam has a surface that has a highly specular grazing incidence reflectivity to reduce the absorption of the radiation beam in a direction of propagation of the radiation beam substantially non-parallel to the surface of the element, so that a thermal load experienced by the element is reduced.
摘要翻译：光刻设备包括用于提供辐射束的辐射系统。辐射系统包括用于捕获从辐射源发出的材料的污染物阱和用于收集辐射束的收集器中的至少一个。污染物捕集阱和收集器中的至少一个包括布置在辐射束的路径中的元件，在辐射束的辐射束在辐射系统中的传播期间，从辐射源发出的材料可以沉积。设置在辐射束的路径中的元件的至少一部分具有表面，该表面具有高镜面的掠入射反射率，以减少辐射束在基本上不平行于表面的辐射束的传播方向上的吸收的元件，使得元件经历的热负荷降低。

4. 发明申请

US20060138362A1 LITHOGRAPHIC APPARATUS, ILLUMINATION SYSTEM AND DEBRIS TRAPPING SYSTEM 有权
标题翻译： LITHOGRAPHIC装置，照明系统和DEBRIS TRAPPING系统
公开(公告)号：US20060138362A1
公开(公告)日：2006-06-29
申请号：US11020674
申请日：2004-12-27
申请人： Levinus Bakker , Derk Klunder , Maarten Marinus Johannes Van Herpen
发明人： Levinus Bakker , Derk Klunder , Maarten Marinus Johannes Van Herpen
IPC分类号： G01J3/10
CPC分类号： G03F7/70058 , G03F7/70916 , G03F7/70933
摘要： A debris trapping system for trapping debris particles released with the generation of radiation by a radiation source in a lithographic apparatus includes first and second sets of channels. Each channel of the first set enables radiation from a radiating source to propagate therethrough and has an inner wall for catching debris particles. The second set of channels is situated downstream of the first set with respect to a propagation direction of the radiation. Each channel of the second set enables radiation from the radiating source to also propagate therethrough and has an inner wall for catching debris particles. A gas supply and a gas exhaust are configured to provide between the first set and the second set of channels a gas flow having a net flow direction substantially across the propagation direction of the radiation from a radiating source.
摘要翻译：用于捕获由光刻设备中的辐射源产生辐射而释放的碎屑颗粒的碎片捕集系统包括第一和第二组通道。第一组的每个通道使来自辐射源的辐射能够通过其传播并具有用于捕获碎屑颗粒的内壁。相对于辐射的传播方向，第二组通道位于第一组的下游。第二组的每个通道使得来自辐射源的辐射也能够通过其传播，并且具有用于捕获碎屑颗粒的内壁。气体供应和排气被配置为在第一组和第二组通道之间提供气流，其具有基本上横跨辐射源的辐射的传播方向的净流动方向。

5. 发明申请

US20070140910A1 System and method for detecting at least one contamination species in a lithographic apparatus 失效
标题翻译：用于检测光刻设备中的至少一种污染物质的系统和方法
公开(公告)号：US20070140910A1
公开(公告)日：2007-06-21
申请号：US11311623
申请日：2005-12-20
申请人： Vadim Banine , Levinus Bakker , Ralph Kurt , Johannes Moors , Lucas Stevens , Peter Zalm
发明人： Vadim Banine , Levinus Bakker , Ralph Kurt , Johannes Moors , Lucas Stevens , Peter Zalm
IPC分类号： G01N33/00
CPC分类号： G01N25/142 , G01N25/68 , Y10T436/25875
摘要： A system for detecting at least one contamination species in an interior space of a lithographic apparatus, including: at least one monitoring surface configured to be in contact with the interior space, a thermal controller configured to control the temperature of the monitoring surface to at least one detection temperature, and at least one detector configured to detect condensation of the at least one contamination species onto the monitoring surface.
摘要翻译：一种用于检测光刻设备的内部空间中的至少一种污染物质的系统，包括：被配置为与所述内部空间接触的至少一个监测表面;被配置为将所述监测表面的温度控制在至少一个检测温度，以及至少一个检测器，被配置为检测所述至少一种污染物质到所述监测表面上的冷凝。

6. 发明申请

US20060151717A1 APPARATUS INCLUDING A RADIATION SOURCE, A FILTER SYSTEM FOR FILTERING PARTICLES OUT OF RADIATION EMITTED BY THE SOURCE, AND A PROCESSING SYSTEM FOR PROCESSING THE RADIATION, A LITHOGRAPHIC APPARATUS INCLUDING SUCH AN APPARATUS, AND A METHOD OF FILTERING PARTICLES O 有权
标题翻译：包括辐射源的装置，用于过滤由源发射的辐射的颗粒的滤光器系统和用于处理辐射的处理系统，包括这种装置的光刻装置以及滤光片的方法O
公开(公告)号：US20060151717A1
公开(公告)日：2006-07-13
申请号：US11031535
申请日：2005-01-10
申请人： Derk Klunder , Levinus Bakker , Vadim Banine , Maarten Marinus Johannes Wilhelmus Herpen
发明人： Derk Klunder , Levinus Bakker , Vadim Banine , Maarten Marinus Johannes Wilhelmus Herpen
IPC分类号： G21K3/00 , G21K5/00 , G03F7/20
CPC分类号： G03F7/70916
摘要： Particles emitted by a radiation source, and moving from the radiation source towards a processing system for processing the radiation from the radiation source, are filtered out of radiation propagating through a predetermined cross section of the radiation as emitted by the radiation source by a filter system. The filter system includes a plurality of foils and a transporter for transporting the foils along a trajectory which extends within the beam so that the foils intercept the particles within the beam. The transporter is arranged to transport the foils by a substantially translatory movement of the foils along at least a part of the trajectory.
摘要翻译：由辐射源发射并从辐射源朝向用于处理来自辐射源的辐射的处理系统移动的颗粒被从辐射源通过辐射源发射的预定横截面传播的辐射过滤掉，该辐射源由过滤系统。过滤器系统包括多个箔片和运送器，用于沿着在光束内延伸的轨迹传送箔片，使得箔片截取光束内的颗粒。输送器布置成通过沿着轨迹的至少一部分的箔片的基本上平移的运动来运输箔片。

7. 发明申请

US20050243297A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20050243297A1
公开(公告)日：2005-11-03
申请号：US10836613
申请日：2004-05-03
申请人： Vadim Banine , Levinus Bakker , Jeroen Jonkers , Erik Loopstra
发明人： Vadim Banine , Levinus Bakker , Jeroen Jonkers , Erik Loopstra
IPC分类号： G02B5/08 , G03B27/54 , G03F7/20 , H01L21/027
CPC分类号： G03F7/70008 , G03F7/7005
摘要： A lithographic apparatus includes an illumination system configured to provide a beam of radiation, a support configured to support a patterning device, a substrate table and a projection system. Furthermore, the lithographic apparatus includes a plurality of EUV sources for providing EUV radiation to the illumination system and distribution means which are arranged to convert the EUV radiation from each of the EUV sources into an intermediate beam of radiation. The intermediate beam of radiation is directed from the distribution means in a first direction by a mirror surface. The distribution means further comprise a rotationally driven mirror arrangement, the axis of rotation being non-parallel to the mirror surface.
摘要翻译：光刻设备包括被配置为提供辐射束的照明系统，被配置为支撑图案形成装置的支撑件，衬底台和投影系统。此外，光刻设备包括用于向照明系统提供EUV辐射的多个EUV源和被布置成将来自每个EUV源的EUV辐射转换成中间辐射束的分配装置。中间的辐射束通过镜面从第一方向从分布装置引导。分配装置还包括旋转驱动的反射镜装置，旋转轴线不平行于镜面。

8. 发明申请

US20050098741A1 Lithographic projection apparatus, particle barrier for use therein, integrated structure manufacturing method, and device manufactured thereby 有权
标题翻译：平版印刷设备，其中使用的粒子屏障，一体化结构制造方法以及由此制造的器件
公开(公告)号：US20050098741A1
公开(公告)日：2005-05-12
申请号：US11000381
申请日：2004-12-01
申请人： Levinus Bakker , Frank Schuurmans , Vadim Banine
发明人： Levinus Bakker , Frank Schuurmans , Vadim Banine
IPC分类号： G03F7/20 , H01L21/027 , H01L21/425
CPC分类号： G03F7/70166 , G03F7/70058 , G03F7/708 , G03F7/70825 , G03F7/70916 , G03F7/70983
摘要： A lithographic projection apparatus for EUV lithography includes a foil trap, or channel barrier. The foil trap forms an open structure after the source to let the radiation pass unhindered. The foil trap is configured to be rotatable around an optical axis. By rotating the foil trap, an impulse transverse to the direction of propagation of the radiation can be transferred on debris present in the beam. This debris will not pass the foil trap. In this way, the amount of debris on the optical components downstream of the foil trap is reduced. The foil trap may be alternately rotated around the optical axis in a first direction and a second direction opposite the first direction.
摘要翻译：用于EUV光刻的光刻投影装置包括箔陷阱或通道屏障。箔夹在源之后形成开放结构，以使辐射不受阻碍地通过。箔捕获器被配置为围绕光轴可旋转。通过旋转箔捕获器，横向于辐射传播方向的脉冲可以转移到光束中存在的碎片上。这个碎片不会通过箔片陷阱。以这种方式，箔陷阱下游的光学部件上的碎屑的量减少。箔捕获器可以在与第一方向相反的第一方向和第二方向上围绕光轴交替旋转。

9. 发明申请

US20060219950A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20060219950A1
公开(公告)日：2006-10-05
申请号：US11094490
申请日：2005-03-31
申请人： Levinus Bakker , Vadim Banine , Vladimir Ivanov , Konstantin Koshelev , Bastiaan Mertens , Johannes Moors , Frank Schuurmans , Givi Zukavishvili , Bastiaan Wolschrijn , Marc Van Der Velden
发明人： Levinus Bakker , Vadim Banine , Vladimir Ivanov , Konstantin Koshelev , Bastiaan Mertens , Johannes Moors , Frank Schuurmans , Givi Zukavishvili , Bastiaan Wolschrijn , Marc Van Der Velden
IPC分类号： G03F7/20 , G21K5/00
CPC分类号： G03F7/70933 , B82Y10/00 , G03F7/70033 , G03F7/70916
摘要： A lithographic apparatus is arranged to project a beam from a radiation source onto a substrate. The apparatus includes an optical element in a path of the beam, a gas inlet for introducing a gas into the path of the beam so that the gas will be ionized by the beam to create electric fields toward the optical element, and a gas source coupled to the gas inlet for supplying the gas. The gas has a threshold of kinetic energy for sputtering the optical element that is greater than the kinetic energy developed by ions of the gas in the electric fields.
摘要翻译：光刻设备被布置成将来自辐射源的光束投影到基底上。该装置包括在光束的路径中的光学元件，用于将气体引入光束的路径中的气体入口，使得气体将被光束离子化以产生朝向光学元件的电场，并且气体源耦合到用于供应气体的气体入口。气体具有用于溅射光学元件的动能阈值，其大于由电场中的气体的离子产生的动能。

10. 发明申请

US20060175558A1 Method for removal of deposition on an optical element, lithographic apparatus, device manufacturing method, and device manufactured thereby 有权
标题翻译：用于去除光学元件上的沉积的方法，光刻设备，器件制造方法以及由此制造的器件
公开(公告)号：US20060175558A1
公开(公告)日：2006-08-10
申请号：US11051477
申请日：2005-02-07
申请人： Levinus Bakker , Vadim Banine , Johannes Josephina Moors , Carolus Ida Maria Spee , Johannes Leonardus Franken , Arnoud Wassink , Paul Antonius Brom
发明人： Levinus Bakker , Vadim Banine , Johannes Josephina Moors , Carolus Ida Maria Spee , Johannes Leonardus Franken , Arnoud Wassink , Paul Antonius Brom
IPC分类号： G03B7/20
CPC分类号： G03F7/70175 , G03F7/70916
摘要： A method for removal of deposition on a radiation collector of a lithographic apparatus includes providing a gas barrier to an end of a radiation collector, thereby providing a radiation collector enclosure volume; providing a gas to the enclosure volume, the gas selected from a halogen containing gas and a hydrogen containing gas; and removing at least part of the deposition from the radiation collector. A lithographic apparatus includes a radiation collector; a circumferential hull enclosing the radiation collector; a gas barrier at an end of the radiation collector, thereby providing a radiation collector enclosure volume. The radiation collector is enclosed by the circumferential hull and the gas barrier. An inlet provides a gas to the radiation collector enclosure volume and an outlet removes a gas from the radiation collector enclosure volume.
摘要翻译：用于去除光刻设备的辐射收集器上的沉积的方法包括向辐射收集器的端部提供气体阻挡层，从而提供辐射收集器外壳体积; 向封闭体积提供气体，所述气体选自含卤素气体和含氢气体; 以及从所述辐射收集器去除所述沉积物的至少一部分。光刻设备包括辐射收集器; 围绕辐射收集器的周向船体; 在辐射收集器的端部处的气体屏障，从而提供辐射收集器外壳体积。辐射收集器被周向壳体和气体屏障包围。入口为辐射收集器外壳体积提供气体，出口从辐射收集器外壳体积中除去气体。

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