专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20080074917A1 Magnetoresistive RAM and associated methods 失效
标题翻译：磁阻RAM及相关方法
公开(公告)号：US20080074917A1
公开(公告)日：2008-03-27
申请号：US11902711
申请日：2007-09-25
申请人： Woo-yeong Cho , Yun-seung Shin
发明人： Woo-yeong Cho , Yun-seung Shin
IPC分类号： G11C11/02
CPC分类号： G11C11/1675 , G11C11/1655 , G11C11/1659 , Y10S977/935
摘要： A magnetoresistive random access memory (RAM) may include a plurality of variable resistance devices, a plurality of read bitlines electrically connected to respective variable resistance devices, and a plurality of write bitlines alternating with the read bitlines. The magnetoresistive RAM may be configured to apply a first write current through a first write bitline adjacent to a first variable resistance device when writing a first data to the first variable resistance device, and apply a first inhibition current through a second write bitline adjacent to a second variable resistance device, the second variable resistance device being adjacent to the first write bitline, and between the first write bitline and the second write bitline, and the first write current and the first inhibition current flowing in a same direction.
摘要翻译：磁阻随机存取存储器（RAM）可以包括多个可变电阻器件，电连接到相应的可变电阻器件的多个读位线以及与读位线交替的多个写位线。磁阻RAM可以被配置为当向第一可变电阻器件写入第一数据时，通过与第一可变电阻器件相邻的第一写入位线施加第一写入电流，并且将第一写入电流施加到与第一可写入位置相邻的第二写入位置第二可变电阻器件，第二可变电阻器件与第一写入位线相邻，第一写入位线和第二写入位线之间以及第一写入电流和第一抑制电流沿相同的方向流动。

2. 发明授权

US07791929B2 Magnetoresistive RAM and associated methods 失效
标题翻译：磁阻RAM及相关方法
公开(公告)号：US07791929B2
公开(公告)日：2010-09-07
申请号：US11902711
申请日：2007-09-25
申请人： Woo-yeong Cho , Yun-seung Shin
发明人： Woo-yeong Cho , Yun-seung Shin
IPC分类号： G11C11/00
CPC分类号： G11C11/1675 , G11C11/1655 , G11C11/1659 , Y10S977/935
摘要： A magnetoresistive random access memory (RAM) may include a plurality of variable resistance devices, a plurality of read bitlines electrically connected to respective variable resistance devices, and a plurality of write bitlines alternating with the read bitlines. The magnetoresistive RAM may be configured to apply a first write current through a first write bitline adjacent to a first variable resistance device when writing a first data to the first variable resistance device, and apply a first inhibition current through a second write bitline adjacent to a second variable resistance device, the second variable resistance device being adjacent to the first write bitline, and between the first write bitline and the second write bitline, and the first write current and the first inhibition current flowing in a same direction.
摘要翻译：磁阻随机存取存储器（RAM）可以包括多个可变电阻器件，电连接到相应的可变电阻器件的多个读位线以及与读位线交替的多个写位线。磁阻RAM可以被配置为当向第一可变电阻器件写入第一数据时，通过与第一可变电阻器件相邻的第一写入位线施加第一写入电流，并且将第一写入电流施加到与第一可写入位置相邻的第二写入位置第二可变电阻器件，第二可变电阻器件与第一写入位线相邻，第一写入位线和第二写入位线之间以及第一写入电流和第一抑制电流沿相同的方向流动。

3. 发明授权

US07952918B2 Method of operating a magnetoresistive RAM 失效
标题翻译：操作磁阻RAM的方法
公开(公告)号：US07952918B2
公开(公告)日：2011-05-31
申请号：US12875297
申请日：2010-09-03
申请人： Woo-yeong Cho , Yun-seung Shin
发明人： Woo-yeong Cho , Yun-seung Shin
IPC分类号： G11C11/00
CPC分类号： G11C11/1675 , G11C11/1655 , G11C11/1659 , Y10S977/935
摘要： A magnetoresistive random access memory (RAM) may include a plurality of variable resistance devices, a plurality of read bitlines electrically connected to respective variable resistance devices, and a plurality of write bitlines alternating with the read bitlines. The magnetoresistive RAM may be configured to apply a first write current through a first write bitline adjacent to a first variable resistance device when writing a first data to the first variable resistance device, and apply a first inhibition current through a second write bitline adjacent to a second variable resistance device, the second variable resistance device being adjacent to the first write bitline, and between the first write bitline and the second write bitline, and the first write current and the first inhibition current flowing in a same direction.
摘要翻译：磁阻随机存取存储器（RAM）可以包括多个可变电阻器件，电连接到相应的可变电阻器件的多个读位线以及与读位线交替的多个写位线。磁阻RAM可以被配置为当向第一可变电阻器件写入第一数据时，通过与第一可变电阻器件相邻的第一写入位线施加第一写入电流，并且将第一写入电流施加到与第一可写入位置相邻的第二写入位置第二可变电阻器件，第二可变电阻器件与第一写入位线相邻，第一写入位线和第二写入位线之间以及第一写入电流和第一抑制电流沿相同的方向流动。

4. 发明授权

US07573411B2 Digital-to-analog converter, display panel driver having the same, and digital-to-analog converting method 有权
标题翻译：数模转换器，具有相同功能的显示面板驱动器和数 - 模转换方法
公开(公告)号：US07573411B2
公开(公告)日：2009-08-11
申请号：US12007333
申请日：2008-01-09
申请人： Yun-seung Shin , Ju-hyun Ko
发明人： Yun-seung Shin , Ju-hyun Ko
IPC分类号： H03M1/68 , G09G5/10
CPC分类号： H03M1/667 , H03M1/662 , H03M1/682 , H03M1/765
摘要： A digital-to-analog converter outputting an analog data voltage corresponding to n-bit data, includes a chopping amplification unit adapted to receive an upper bit voltage corresponding to upper x bits of the n-bit data and a lower bit voltage corresponding to lower y bits of the n-bit data and to output the analog data voltage. The chopping amplification unit may include a sample and hold capacitor adapted to be charged with the upper bit voltage in a non-inverting mode, and a chopping amplifier adapted to supply the upper bit voltage to the sample and hold capacitor in the non-inverting mode and adapted to output a voltage corresponding to the sum of the upper bit voltage and the lower bit voltage as the analog data voltage in an inverting mode.
摘要翻译：输出对应于n位数据的模拟数据电压的数模转换器包括斩波放大单元，其适于接收对应于n位数据的高x位的高位电压和对应于低位的低位电压 y比特数据，并输出模拟数据电压。斩波放大单元可以包括适于以非反相模式对高位电压进行充电的采样和保持电容器，以及斩波放大器，其适于以非反相模式将采样和保持电容器提供高位电压并且适于在反相模式中输出对应于高位电压和低位电压之和的电压作为模拟数据电压。

5. 发明授权

US5965939A Semiconductor device and a method of manufacture 失效
标题翻译：半导体器件及其制造方法
公开(公告)号：US5965939A
公开(公告)日：1999-10-12
申请号：US838044
申请日：1997-04-22
申请人： Kyeong-tae Kim , Yun-seung Shin , Young-hun Park , Won-mo Park , Ji-hong Ahn
发明人： Kyeong-tae Kim , Yun-seung Shin , Young-hun Park , Won-mo Park , Ji-hong Ahn
IPC分类号： H01L21/3205 , H01L21/3105 , H01L21/768 , H01L21/8242 , H01L27/10 , H01L27/105 , H01L27/108 , H01L23/48
CPC分类号： H01L27/10808 , H01L21/31056 , H01L21/76819 , H01L27/105 , Y10S438/926
摘要： A semiconductor device having a closed step portion and a global step portion including an insulating layer having a planarized surface on the global step portion is provided. A dummy pattern is formed by forming an insulating layer on the global step portion and then patterning through a photolithography process. After forming the dummy pattern for compensating steps in the global step portion and between the closed step portion and the global step portion, a BPSG layer is formed on both the closed step portion and the global step portion, and then the BPSG layer is heat-treated to cause it to reflow. The BPSG layer as an insulating interlayer having a planarized surface. The improved planarization decreases the occurrence of notching and discontinuities in the succeeding metallization processes thereby enhancing the yield and electrical characteristics of the semiconductor device.
摘要翻译：提供一种半导体器件，其具有闭合台阶部分和包括在全局台阶部分上具有平坦化表面的绝缘层的全局阶跃部分。通过在全局台阶部分上形成绝缘层，然后通过光刻工艺进行图案化，形成虚拟图案。在形成用于补偿全局台阶部分之间和闭合台阶部分与全局台阶部分之间的步骤的虚拟图案之后，在封闭台阶部分和全局台阶部分上形成BPSG层，然后BPSG层被热封，处理以使其回流。作为具有平坦化表面的绝缘中间层的BPSG层。改进的平面化减少了随后的金属化处理中的开槽和不连续的发生，从而提高了半导体器件的产量和电特性。

6. 发明授权

US5858860A Methods of fabricating field isolated semiconductor devices including step reducing regions 失效
标题翻译：制造包括降阶区域的场隔离半导体器件的方法
公开(公告)号：US5858860A
公开(公告)日：1999-01-12
申请号：US795103
申请日：1997-02-06
申请人： Myoung-seob Shim , Won-taek Choi , Yun-seung Shin
发明人： Myoung-seob Shim , Won-taek Choi , Yun-seung Shin
IPC分类号： H01L21/316 , H01L21/76 , H01L21/762
CPC分类号： H01L21/76202 , Y10S438/978
摘要： Isolated semiconductor devices are formed by forming field oxide regions in a face of a semiconductor substrate to define active regions therebetween. The field oxide regions extend to above the substrate face and include an oblique surface which extends from above the substrate face to the substrate face. A step reducing region is formed on a respective one of the oblique surfaces of the field oxide regions, extending onto the active regions at the substrate face. The step reducing region can reduce the steepness of the step between the substrate face and the field oxide regions, thereby facilitating further processing and reliability of the semiconductor devices.
摘要翻译：隔离半导体器件通过在半导体衬底的表面形成场氧化物区域以在其间限定有效区域来形成。场氧化物区域延伸到衬底面的上方，并且包括从衬底表面上方延伸到衬底面的倾斜表面。在场氧化物区域的相应一个倾斜表面上形成有延伸到衬底面上的有源区上的阶梯减小区域。减小栅极区域可以降低衬底面和场氧化物区域之间的台阶的陡度，从而有助于半导体器件的进一步处理和可靠性。

7. 发明授权

US5523255A Method for forming a device isolation film of a semiconductor device 失效
标题翻译：用于形成半导体器件的器件隔离膜的方法
公开(公告)号：US5523255A
公开(公告)日：1996-06-04
申请号：US455646
申请日：1995-05-31
申请人： Yong-woo Hyung , Don-young Ku , Byung-hong Chung , Yong-oon Hwang , Hung-mo Yang , Yun-seung Shin
发明人： Yong-woo Hyung , Don-young Ku , Byung-hong Chung , Yong-oon Hwang , Hung-mo Yang , Yun-seung Shin
IPC分类号： H01L21/316 , H01L21/318 , H01L21/32 , H01L21/76
CPC分类号： H01L21/32 , Y10S438/911
摘要： A method for forming a device isolation film of a semiconductor device, which includes the steps of forming a pad oxide film on a semiconductor substrate, forming an oxidation buffer layer on the pad oxide film, forming an oxidation prevention film on the oxidation buffer layer, forming an aperture in the oxidation prevention film and a longitudinally co-extensive recess in the oxidation buffer layer, to thereby expose a portion of the oxidation buffer layer, forming a cap oxide film on the exposed portion of the oxidation buffer layer by subjecting a first resultant structure obtained by the preceding steps to a thermal oxidation process, forming an oxynitride film at an interface between the cap oxide film and the oxidation buffer layer by heat-treating a second resultant structure obtained by the preceding steps in a nitrogen atmosphere, and, forming the device isolation film by subjecting a third resultant structure obtained by the preceding steps to a thermal oxidation process.
摘要翻译：一种形成半导体器件的器件隔离膜的方法，包括以下步骤：在半导体衬底上形成衬垫氧化膜，在衬垫氧化膜上形成氧化缓冲层，在氧化缓冲层上形成氧化防止膜，在氧化防止膜中形成孔，在氧化缓冲层中形成纵向共同延伸的凹部，从而暴露出氧化缓冲层的一部分，在氧化缓冲层的暴露部分上形成帽氧化膜，通过前述步骤获得的热成型结构，通过在氮气气氛中热处理由前述步骤获得的第二结果结构，在盖氧化膜和氧化缓冲层之间的界面处形成氧氮化物膜，通过将由前述步骤获得的第三结果结构进行热氧化处理来形成器件隔离膜。

8. 发明授权

US5488007A Method of manufacture of a semiconductor device 失效
标题翻译：半导体器件的制造方法
公开(公告)号：US5488007A
公开(公告)日：1996-01-30
申请号：US42490
申请日：1993-04-16
申请人： Kyeong-Tae Kim , Yun-seung Shin , Young-hun Park , Won-mo Park , Ji-hong Ahn
发明人： Kyeong-Tae Kim , Yun-seung Shin , Young-hun Park , Won-mo Park , Ji-hong Ahn
IPC分类号： H01L21/3205 , H01L21/3105 , H01L21/768 , H01L21/8242 , H01L27/10 , H01L27/105 , H01L27/108 , H01L21/00
CPC分类号： H01L27/10808 , H01L21/31056 , H01L21/76819 , H01L27/105 , Y10S438/926
摘要： A method for manufacturing a semiconductor device having a closed step portion and a global step portion including an insulating layer is provided. A dummy pattern is formed by forming an insulating layer on the global step portion and then patterning through a photolithography process. After forming the dummy pattern for compensating steps in the global step portion and between the closed step portion and the global step portion, a BPSG layer is formed on both the closed step portion and the global step portion, and then the BPSG layer is heat-treated to cause it to reflow. The BPSG layer as an insulating interlayer having a planarized surface. The improved planarization decreases the occurrence of notching and discontinuities in the succeeding metallization processes thereby enhancing the yield and electrical characteristics of the semiconductor device.
摘要翻译：提供了一种制造具有封闭台阶部分和包括绝缘层的全局台阶部分的半导体器件的方法。通过在全局台阶部分上形成绝缘层，然后通过光刻工艺进行图案化，形成虚拟图案。在形成用于补偿全局台阶部分之间和闭合台阶部分与全局台阶部分之间的步骤的虚拟图案之后，在封闭台阶部分和全局台阶部分上形成BPSG层，然后BPSG层被热封，处理以使其回流。作为具有平坦化表面的绝缘中间层的BPSG层。改进的平面化减少了随后的金属化处理中的开槽和不连续的发生，从而提高了半导体器件的产量和电特性。

9. 发明授权

US5960293A Methods including oxide masks for fabricating capacitor structures for integrated circuit devices 失效
标题翻译：包括用于制造用于集成电路器件的电容器结构的氧化物掩模的方法
公开(公告)号：US5960293A
公开(公告)日：1999-09-28
申请号：US806080
申请日：1997-02-25
申请人： Weon-cheol Hong , Yun-seung Shin
发明人： Weon-cheol Hong , Yun-seung Shin
IPC分类号： H01L27/04 , H01L21/822 , H01L21/8242 , H01L27/108
CPC分类号： H01L27/10852 , H01L27/10817
摘要： A method for forming a capacitor for an integrated circuit device includes the following steps. An interlayer dielectric layer is formed on a substrate, and a contact hole is formed in the interlayer dielectric layer. A first conductive layer is then formed on the interlayer dielectric layer, wherein the first conductive layer is electrically connected to the substrate through the contact hole. A hole having a depth less than the thickness of the first conductive layer is etched in the first conductive layer. An insulating layer is formed in the hole and the first conductive layer is then etched to a predetermined depth using the insulating layer as an etching mask to expose a side wall of an upper portion of the insulating layer. A spacer is formed on the side wall of the upper portion of the insulating layer. The first conductive layer is then etched using the insulating layer and the spacer as etching marks to form an electrode structure. The insulating layer and spacer are then removed. Lastly, the capacitor is completed by forming a dielectric layer on the electrode structure and then forming a second conductive layer on the dielectric layer.
摘要翻译：一种用于形成用于集成电路器件的电容器的方法包括以下步骤。在基板上形成层间电介质层，在层间电介质层中形成接触孔。然后在层间电介质层上形成第一导电层，其中第一导电层通过接触孔与基板电连接。在第一导电层中蚀刻深度小于第一导电层的厚度的孔。在孔中形成绝缘层，然后使用绝缘层作为蚀刻掩模将第一导电层蚀刻到预定深度，以暴露绝缘层的上部的侧壁。在绝缘层的上部的侧壁上形成间隔物。然后使用绝缘层和间隔物作为蚀刻标记来蚀刻第一导电层以形成电极结构。然后去除绝缘层和间隔物。最后，通过在电极结构上形成电介质层，然后在电介质层上形成第二导电层来完成电容器。

10. 发明授权

US5930621A Methods for forming vertical electrode structures and related structures 失效
标题翻译：形成垂直电极结构和相关结构的方法
公开(公告)号：US5930621A
公开(公告)日：1999-07-27
申请号：US806065
申请日：1997-02-25
申请人： Dug-Dong Kang , Yun-seung Shin
发明人： Dug-Dong Kang , Yun-seung Shin
IPC分类号： H01L27/04 , H01L21/822 , H01L21/8242 , H01L27/108
CPC分类号： H01L27/10852 , H01L27/10817
摘要： A method for forming an electrode for an integrated circuit device includes the steps of forming a first conductive layer on a surface of a microelectronic substrate, and forming a patterned photoresist layer on the first conductive layer. A spacer is formed along sidewalls of the patterned photoresist layer, and the first conductive layer is etched to a predetermined depth less than a thickness of the first conductive layer using the patterned photoresist layer and the spacer as an etch mask thereby defining a hole in the first conductive layer. A protective layer is formed in the hole which covers exposed portions of the first conductive layer, and the patterned photoresist layer is removed. The first conductive layer is then etched using the spacer and the protective layer as an etching mask to form a vertical electrode structure. Related structures are also discussed.
摘要翻译：一种形成集成电路器件电极的方法包括以下步骤：在微电子衬底的表面上形成第一导电层，并在第一导电层上形成图案化的光致抗蚀剂层。沿图案化的光致抗蚀剂层的侧壁形成间隔物，并且使用图案化的光致抗蚀剂层和间隔物作为蚀刻掩模，将第一导电层蚀刻到小于第一导电层的厚度的预定深度，从而在第一导电层。在该孔中形成保护层，其覆盖第一导电层的暴露部分，并去除图案化的光致抗蚀剂层。然后使用间隔物和保护层作为蚀刻掩模蚀刻第一导电层以形成垂直电极结构。还讨论了相关结构。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式