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1. 发明申请

US20080142370A1 Aqueous, Acidic Solution and Method for Electrolytically Depositing Copper Coatings as Well as Use of Said Solution 审中-公开
标题翻译：水性，酸性溶液和电解沉积铜涂层的方法以及所述溶液的使用
公开(公告)号：US20080142370A1
公开(公告)日：2008-06-19
申请号：US10566913
申请日：2004-07-28
申请人： Wolfgang Dahms , Carl Christian Fels , Gunther Bauer
发明人： Wolfgang Dahms , Carl Christian Fels , Gunther Bauer
IPC分类号： C25D5/00 , C25D3/38 , H05K1/09
CPC分类号： C25D3/38
摘要： The aqueous acidic solution for electrolytically depositing high polish, decorative bright, smooth and level copper coatings on large area metal or plastic parts contains a) at least one oxygen-containing, high molecular additive and b) at least one water soluble sulfur compound, wherein the solution additionally contains c) at least one aromatic halogen derivative having the general formula (I), wherein R1, R2, R3, R4, R5 and R6 are each independently radicals selected from the group comprising hydrogen, aldehyde, acetyl, hydroxyls, hydroxyalkyl having 1-4 carbon atoms, alkyl having 1-4 carbon atoms and halogen, with the proviso that the number of residues R1, R2, R3, R4, R5 and R6 which are halogen ranges from 1 to 5.
摘要翻译：用于在大面积金属或塑料部件上电解沉积高抛光，光亮和平滑的铜涂层的酸性水溶液含有a）至少一种含氧高分子添加剂和b）至少一种水溶性硫化合物，其中溶液另外含有c）至少一种具有通式（I）的芳族卤素衍生物，其中R 1，R 2，R 3， R 4，R 5和R 6各自独立地选自氢，醛，乙酰基，羟基，羟基烷基，具有1个 -4个碳原子，具有1-4个碳原子的烷基和卤素，条件是残基R 1，R 2，R 3， R 4，R 4，R 5和R 6是卤素，其范围为1至5。

2. 发明申请

US20100119713A1 PROCESS FOR APPLYING A METAL COATING TO A NON-CONDUCTIVE SUBSTRATE 有权
标题翻译：将金属涂层应用于非导电性基材的方法
公开(公告)号：US20100119713A1
公开(公告)日：2010-05-13
申请号：US12451191
申请日：2008-04-24
申请人： Sigrid Schadow , Brigitte Dyrbusch , Carl Christian Fels
发明人： Sigrid Schadow , Brigitte Dyrbusch , Carl Christian Fels
IPC分类号： C23C18/28
CPC分类号： C25D5/54 , C23C18/1653 , C23C18/1893 , C23C18/2086 , C23C18/30 , C25D5/56
摘要： Described is a new process for applying a metal coating to a non-conductive substrate comprising the steps of (a) contacting the substrate with an activator comprising a noble metal/group IVA metal sol to obtain a treated substrate, (b) contacting said treated substrate with a composition comprising a solution of: (i) a Cu(II), Ag, Au or Ni soluble metal salt or mixtures thereof, (ii) 0.05 to 5 mol/l of a group IA metal hydroxide and (iii) a complexing agent for an ion of the metal of said metal salt, wherein an iminosuccinic acid or a derivative thereof is used as said complexing agent.
摘要翻译：描述了将金属涂层施加到非导电基底上的新方法，其包括以下步骤：（a）使基底与包含贵金属/ⅣA族金属溶胶的活化剂接触以获得经处理的基底，（b）使所述经处理的底物，其组合物包含以下溶液：（i）Cu（II），Ag，Au或Ni可溶性金属盐或其混合物，（ii）0.05至5mol / l的IA族金属氢氧化物和（iii）所述金属盐的金属离子的络合剂，其中使用亚氨基琥珀酸或其衍生物作为所述络合剂。

3. 发明授权

US07494578B2 Iron-phosphorus electroplating bath and method 有权
标题翻译：铁磷电镀浴及方法
公开(公告)号：US07494578B2
公开(公告)日：2009-02-24
申请号：US10790365
申请日：2004-03-01
申请人： Carl Christian Fels , Shoichi Kamiya , Allen R. Jones
发明人： Carl Christian Fels , Shoichi Kamiya , Allen R. Jones
IPC分类号： C25D3/56 , C23C18/32
CPC分类号： C25D3/562 , C25D3/20
摘要： In one embodiment, this invention relates to an aqueous acid iron phosphorus bath which comprises (A) at least one compound from which iron can be electrolytically deposited, (B) hypophosphite ion, and (C) a sulfur-containing compound selected from sulfoalkylated polyethylene imines, sulfonated safranin dye, and mercapto aliphatic sulfonic acids or alkali metal salts thereof. Optionally, the aqueous acidic iron phosphorus electroplating bath of the invention also may comprise aluminum irons. The alloys which are deposited on the substrates by the process of the present invention are characterized by the presence of iron, phosphorus and sulfur.
摘要翻译：在一个实施方案中，本发明涉及酸性铁磷酸盐水溶液，其包含（A）至少一种可以电解沉积铁的化合物，（B）次亚磷酸根离子，和（C）选自磺烷基化聚乙烯的含硫化合物亚胺，磺化番红素染料和巯基脂族磺酸或其碱金属盐。任选地，本发明的酸性磷酸铁电镀浴也可以包括铝铁。通过本发明的方法沉积在基材上的合金的特征在于铁，磷和硫的存在。

4. 发明授权

US08152914B2 Process for applying a metal coating to a non-conductive substrate 有权
标题翻译：将金属涂层施加到非导电基底的方法
公开(公告)号：US08152914B2
公开(公告)日：2012-04-10
申请号：US12451191
申请日：2008-04-24
申请人： Sigrid Schadow , Brigitte Dyrbusch , Carl Christian Fels
发明人： Sigrid Schadow , Brigitte Dyrbusch , Carl Christian Fels
IPC分类号： C25D5/54 , C25D5/56 , C23C18/28 , C23C18/30 , C23C28/04
CPC分类号： C25D5/54 , C23C18/1653 , C23C18/1893 , C23C18/2086 , C23C18/30 , C25D5/56
摘要： Described is a new process for applying a metal coating to a non-conductive substrate comprising the steps of (a) contacting the substrate with an activator comprising a noble metal/group IVA metal sol to obtain a treated substrate, (b) contacting said treated substrate with a composition comprising a solution of: (i) a Cu(II), Ag, Au or Ni soluble metal salt or mixtures thereof, (ii) 0.05 to 5 mol/l of a group IA metal hydroxide and (iii) a complexing agent for an ion of the metal of said metal salt, wherein an iminosuccinic acid or a derivative thereof is used as said complexing agent.
摘要翻译：描述了将金属涂层施加到非导电基底上的新方法，其包括以下步骤：（a）使基底与包含贵金属/ⅣA族金属溶胶的活化剂接触以获得经处理的基底，（b）使所述经处理的底物，其组合物包含以下溶液：（i）Cu（II），Ag，Au或Ni可溶性金属盐或其混合物，（ii）0.05至5mol / l的IA族金属氢氧化物和（iii）所述金属盐的金属离子的络合剂，其中使用亚氨基琥珀酸或其衍生物作为所述络合剂。

5. 发明授权

US07588675B2 Iron-phosphorus electroplating bath and method 失效
标题翻译：铁磷电镀浴及方法
公开(公告)号：US07588675B2
公开(公告)日：2009-09-15
申请号：US12342468
申请日：2008-12-23
申请人： Carl Christian Fels , Shoichi Kamiya , Allen R. Jones
发明人： Carl Christian Fels , Shoichi Kamiya , Allen R. Jones
IPC分类号： C25D3/56 , C23C18/32
CPC分类号： C25D3/562 , C25D3/20
摘要： In one embodiment, this invention relates to an aqueous acid iron phosphorus bath which comprises (A) at least one compound from which iron can be electrolytically deposited, (B) hypophosphite ion, and (C) sulfur-containing compound represented by the formula Y—S—R1—SO3X I wherein X is H or an alkali metal, R1 is an alkylene group containing from 1 to about 5 carbon atoms, Y is H, S—R1—SO3X, C(S)NR2″, C(S)OR″, C(NH2)NR2″, or a heterocyclic group, and each R″ is independently H, or an alkyl group containing from 1 to about 5 carbon atoms. Optionally, the aqueous acidic iron phosphorus electroplating bath of the invention also may comprise aluminum irons. The alloys which are deposited on the substrates by the process of the present invention are characterized by the presence of iron, phosphorus and sulfur.
摘要翻译：在一个实施方案中，本发明涉及酸性铁磷酸盐水溶液，其包含（A）至少一种可以电解沉积铁的化合物，（B）次亚磷酸根离子，和（C）由下式表示的含硫化合物：？in-line-formula description =“In-line Formulas”end =“lead”？> YS-R1-SO3X I <？in-line-formula description =“In-line Formulas”end =“tail”？>其中 X是H或碱金属，R 1是含有1至约5个碳原子的亚烷基，Y是H，S-R 1 -SO 3 X，C（S）NR 2“，C（S）OR”，C（ NH 2）NR 2“或杂环基，并且每个R”独立地为H或含有1至约5个碳原子的烷基。任选地，本发明的酸性磷酸铁电镀浴也可以包括铝铁。通过本发明的方法沉积在基底上的合金的特征在于铁，磷和硫的存在。

6. 发明申请

US20090101515A1 IRON-PHOSPHORUS ELECTROPLATING BATH AND METHOD 失效
标题翻译：铁磷电泳浴和方法
公开(公告)号：US20090101515A1
公开(公告)日：2009-04-23
申请号：US12342468
申请日：2008-12-23
申请人： Carl Christian Fels , Shoichi Kamiya , Allen R. Jones
发明人： Carl Christian Fels , Shoichi Kamiya , Allen R. Jones
IPC分类号： C25D3/56
CPC分类号： C25D3/562 , C25D3/20
摘要： In one embodiment, this invention relates to an aqueous acid iron phosphorus bath which comprises(A) at least one compound from which iron can be electrolytically deposited,(B) hypophosphite ion, and(C) sulfur-containing compound represented by the formula Y—S—R1—SO3X I wherein X is H or an alkali metal, R1 is an alkylene group containing from 1 to about 5 carbon atoms, Y is H, S—R1—SO3X, C(S)NR2″, C(S)OR″, C(NH2)NR2″, or a heterocyclic group, and each R″ is independently H, or an alkyl group containing from 1 to about 5 carbon atoms. Optionally, the aqueous acidic iron phosphorus electroplating bath of the invention also may comprise aluminum irons. The alloys which are deposited on the substrates by the process of the present invention are characterized by the presence of iron, phosphorus and sulfur.
摘要翻译：在一个实施方案中，本发明涉及酸性铁磷酸盐水溶液，其包含（A）至少一种可以电解沉积铁的化合物，（B）次亚磷酸根离子，和（C）由下式表示的含硫化合物：？in-line-formula description =“In-line Formulas”end =“lead”？> YS-R1-SO3X I <？in-line-formula description =“In-line Formulas”end =“tail”？>其中 X是H或碱金属，R 1是含有1至约5个碳原子的亚烷基，Y是H，S-R 1 -SO 3 X，C（S）NR 2“，C（S）OR”，C（ NH 2）NR 2“或杂环基，并且每个R”独立地为H或含有1至约5个碳原子的烷基。任选地，本发明的酸性磷酸铁电镀浴也可以包括铝铁。通过本发明的方法沉积在基底上的合金的特征在于铁，磷和硫的存在。

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