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    • 1. 发明授权
    • Double mill process for patterning current perpendicular to plane (CPP) magnetoresistive devices to minimize barrier shorting and barrier damage
    • 用于图形化垂直于平面(CPP)磁阻器件的电流的双轧机工艺,以最小化障碍物短路和屏障损坏
    • US07639456B2
    • 2009-12-29
    • US11246720
    • 2005-10-06
    • Ying HongWipul Pemsiri Jayasekara
    • Ying HongWipul Pemsiri Jayasekara
    • G11B5/39
    • G11B5/398B82Y25/00G01R33/093G11B5/3163G11B5/3906
    • A current perpendicular to plane (CPP) sensor and method of manufacturing such a sensor that prevents current shunting at the sides of the barrier/spacer layer due to redeposited material. A first ion mill is performed to remove at least the free layer. A quick glancing ion mill can be performed to remove the small amount of redep that may have accumulated on the sides of the free layer and barrier/spacer layer. Then an insulation layer is deposited to protect the sides of the free layer/barrier layer during subsequent manufacturing which can include further ion milling to define the rest of the sensor and another glancing ion mill to remove the redep formed by the further ion milling. This results in a sensor having no current shunting at the sides of the sensor and having no damage to the sensor layers.
    • 垂直于平面(CPP)传感器的电流和制造这种传感器的方法,其防止由于再沉积材料在阻挡层/间隔层的侧面的电流分流。 执行第一离子研磨以去除至少自由层。 可以进行快速扫查离子磨,以除去可能积聚在自由层和阻挡层/间隔层的侧面上的少量重排物。 然后沉积绝缘层以在随后的制造期间保护自由层/阻挡层的侧面,其可以包括进一步的离子铣削以限定传感器的其余部分和另一个扫掠离子磨机以移除由进一步的离子铣削形成的重复。 这导致传感器在传感器的侧面没有电流分流并且不会损坏传感器层。
    • 4. 发明授权
    • Laminated draped shield for CPP read sensors
    • CPP读取传感器的层压罩
    • US07446979B2
    • 2008-11-04
    • US10955701
    • 2004-09-30
    • Wipul Pemsiri Jayasekara
    • Wipul Pemsiri Jayasekara
    • G11B5/39
    • G11B5/332G11B5/313
    • A magnetic head is disclosed having a CPP read head which produces reduced cross-track interference. The CPP read head includes a read sensor, a first shield and a second shield. The second shield has side drapes having an edge portion adjacent to the read sensor. The side drapes include a plurality of laminated layers which discourages formation of closure domains at the edge portions, and thus maintaining the side drapes in a state of high magnetic permeability. The laminated layers each include a magnetic layer and a non-magnetic spacer layer. Also disclosed is an edge closed lamination structure.
    • 公开了一种具有产生减小的交叉磁道干扰的CPP读取头的磁头。 CPP读头包括读取传感器,第一屏蔽和第二屏蔽。 第二屏蔽件具有侧面,其具有与读取传感器相邻的边缘部分。 侧帘包括多个层压层,其阻止在边缘部分处形成封闭结构域,并且因此将侧帘保持在高磁导率的状态。 层叠层各自包括磁性层和非磁性间隔层。 还公开了一种边缘封闭层压结构。
    • 5. 发明申请
    • MAGNETORESISTIVE SENSOR HAVING AN ANISOTROPIC HARD BIAS WITH HIGH COERCIVITY
    • 具有高可靠性的ANISOTROPIC硬偏差磁传感器
    • US20080151441A1
    • 2008-06-26
    • US11615825
    • 2006-12-22
    • James Mac FreitagMustafa Michael PinarbasiWipul Pemsiri Jayasekara
    • James Mac FreitagMustafa Michael PinarbasiWipul Pemsiri Jayasekara
    • G11B5/33B05D5/12
    • G11B5/398B82Y25/00G01R33/093G11B5/3932
    • A magnetoresistive sensor having magnetically anisotropic bias layers for biasing the free layer of the sensor. The sensor includes a sensor stack with a pinned layer structure and a free layer structure and having first and second sides. Hard bias structures for biasing the magnetization of the free layer are formed at either side of the sensor stack, and each of the hard bias structure includes a hard magnetic layer that has a magnetic anisotropy to enhance the stability of the biasing. The hard bias structure can include a Cr under-layer having a surface that has been treated by a low power angled ion milling to form it with an anisotropic surface texture. A layer of Cr—Mo alloy is formed over the Cr under-layer and the hard magnetic material layer is formed over the Cr—Mo alloy layer. The anisotropic surface texture of the Cr layer induces an aligned crystalline structure in the hard magnetic layer that causes the hard magnetic layer to have a magnetic anisotropy. In another embodiment, the hard bias structure can include a layer of Ta that has a surface formed with the anisotropic roughness. A layer of Cr—Mo alloy is formed over the Ta layer and the hard magnetic layer is formed over the Cr—Mo alloy layer. In yet another embodiment, the hard bias structure includes first and second Ta layers with a Si layer sandwiched between them. The second Ta layer has a surface treated with the anisotropic texture. A layer of Cr—Mo alloy can then be formed over the second Ta layer and the hard magnetic material formed over the Cr—Mo alloy layer.
    • 具有用于偏置传感器自由层的磁各向异性偏置层的磁阻传感器。 传感器包括具有钉扎层结构和自由层结构并具有第一和第二侧面的传感器堆叠。 在传感器堆叠的任一侧形成用于偏置自由层的磁化的硬偏置结构,并且每个硬偏置结构都包括具有磁各向异性以增强偏置稳定性的硬磁性层。 硬偏压结构可以包括具有通过低功率角度离子铣削处理以形成各向异性表面纹理的表面的Cr底层。 在Cr底层上形成Cr-Mo合金层,在Cr-Mo合金层上形成硬磁性体层。 Cr层的各向异性表面结构在硬磁性层中引起对准的结晶结构,使得硬磁性层具有磁各向异性。 在另一个实施例中,硬偏压结构可以包括具有由各向异性粗糙度形成的表面的Ta层。 在Ta层上形成一层Cr-Mo合金,在Cr-Mo合金层上形成硬磁性层。 在另一个实施例中,硬偏置结构包括夹在它们之间的Si层的第一和第二Ta层。 第二Ta层具有用各向异性结构处理的表面。 然后可以在第二Ta层上形成Cr-Mo合金层,并在Cr-Mo合金层上形成硬磁性材料。
    • 8. 发明授权
    • Methods of making magnetic heads with improved contiguous junctions
    • 制造具有改进的连续结的磁头的方法
    • US06996894B2
    • 2006-02-14
    • US10109110
    • 2002-03-28
    • Richard HsiaoWipul Pemsiri JayasekaraMustafa PinarbasiPatrick Rush Webb
    • Richard HsiaoWipul Pemsiri JayasekaraMustafa PinarbasiPatrick Rush Webb
    • G11B5/127B44C1/22
    • B82Y10/00G11B5/3116G11B5/313G11B5/3163G11B5/3903Y10T29/49041Y10T29/49043Y10T29/49046Y10T29/49048Y10T29/49052
    • Methods of making a read head with improved contiguous junctions are described. After sensor layer materials are deposited over a substrate, a lift-off mask is formed over the sensor layer materials in a central region which is surrounded by end regions. Ion milling is performed with use of the lift-off mask such that the sensor layer materials in the end regions are removed and those in the central region remain to form a read sensor. A high-angle ion mill (e.g. between 45–80 degrees) is then performed to remove redeposited material from side walls of the lift-off mask. Next, a reactive ion etch (RIE) is used to reduce the thickness and the width of the lift-off mask and to remove capping layer materials from the top edges of the read sensor. With the reduced-size lift-off mask in place, hard bias and lead layers are deposited adjacent the read sensor as well as over the mask. The reduced-size lift-off mask allows the amount of hard bias to be increased in the contiguous junction region, and the edges of the leads to be deposited more closely over the top edges of the read sensor. Advantageously, the stability of the sensor is enhanced and the transfer curve is improved using a method which can be controlled independently from the initial mask structure and ion milling process. No critical alignments or multiple photoresist processes are necessary.
    • 描述了制造具有改进的连续结的读取头的方法。 在传感器层材料沉积在衬底上之后,在由端部区域包围的中心区域中的传感器层材料上形成剥离掩模。 使用剥离掩模进行离子铣削,使得端部区域中的传感器层材料被去除,并且在中心区域中的传感器层材料保持形成读取传感器。 然后执行高角度离子磨(例如在45-80度之间)以从剥离掩模的侧壁去除再沉积的材料。 接下来,使用反应离子蚀刻(RIE)来减小剥离掩模的厚度和宽度,并从读取传感器的顶部边缘去除封盖层材料。 随着尺寸减小的剥离掩模就位,硬读取传感器以及掩模附近沉积了硬偏置和引线层。 缩小尺寸的剥离掩模允许在连续接合区域中增加硬偏置的量,并且引线的边缘更紧密地沉积在读取传感器的顶部边缘上。 有利地,增强了传感器的稳定性,并且使用可以独立于初始掩模结构和离子铣削过程进行控制的方法来提高传递曲线。 不需要临界对准或多个光刻胶工艺。