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    • 3. 发明授权
    • Spin-wave architectures
    • 旋波架构
    • US07535070B2
    • 2009-05-19
    • US11668896
    • 2007-01-30
    • Mary M. Eshaghian-WilnerAlexander KhitunKang L. Wang
    • Mary M. Eshaghian-WilnerAlexander KhitunKang L. Wang
    • H01L45/02
    • G11C11/54B82Y10/00G11C11/14H01L29/66984H03K19/168Y10S977/933
    • Nano-scale and multi-scale computational architectures using spin waves as a physical mechanism for device interconnection are provided. Solid-state spin-wave computing devices using nano-scale and multi-scale computational architectures comprised of a plurality of inputs and a plurality of outputs are described where such devices are configured to simultaneously transmit data elements from the inputs to the outputs by using spin-waves of differing frequencies. These devices include but are not limited to a spin-wave crossbar, a spin-wave reconfigurable mesh, a spin-wave fully-interconnected cluster, a hierarchical multi-scale spin-wave crossbar, a hierarchical multi-scale spin-wave reconfigurable mesh and a hierarchical multi-scale spin-wave fully-interconnected cluster.
    • 提供了使用自旋波作为器件互连的物理机制的纳米级和多尺度计算架构。 描述了使用包括多个输入和多个输出的纳米尺度和多尺度计算体系结构的固态自旋波计算设备,其中这样的设备被配置为通过使用旋转从输入到输出同时发送数据元素 不同频率的波。 这些装置包括但不限于自旋波交叉开关,自旋波可重构网格,自旋波全互连簇,分层多尺度自旋波横截面,分级多尺度自旋波可重构网格 以及分层多尺度自旋波全互联集群。
    • 5. 发明授权
    • Field effect devices having short period superlattice structures using
Si and Ge
    • 具有使用Si和Ge的短周期超晶格结构的场效应器件
    • US5357119A
    • 1994-10-18
    • US019719
    • 1993-02-19
    • Kang L. WangJin S. Park
    • Kang L. WangJin S. Park
    • H01L27/092H01L27/12
    • H01L27/092
    • Carrier mobility in a heterojunction field effect device is increased by reducing or eliminating alloy scattering. The active channel region of the field effect device uses alternating layers of pure silicon and germanium which form a short period superlattice with the thickness of each layer in the superlattice being no greater than the critical thickness for maintaining a strained heterojunction. The gate contact of the field effect device can comprise quantum Si/Ge wires which provide quantum confinement in the growth plane, thereby allowing the field effect device to further improve the mobility by restricting phonon scattering. The structure can be used to improve device speed performance.
    • 通过减少或消除合金散射来增加异质结场效应器件中的载流子迁移率。 场效应器件的有源沟道区域使用形成短周期超晶格的纯硅和锗的交替层,超晶格中每层的厚度不大于用于维持应变异质结的临界厚度。 场效应器件的栅极接触可以包括在生长平面中提供量子限制的量子Si / Ge线,从而允许场效应器件通过限制声子散射来进一步提高迁移率。 该结构可用于提高设备速度性能。
    • 9. 发明授权
    • Vertical gate-depleted single electron transistor
    • 垂直栅极耗尽的单电子晶体管
    • US07547932B2
    • 2009-06-16
    • US10302635
    • 2002-11-22
    • Yaohui ZhangFilipp A. BaronKang L. Wang
    • Yaohui ZhangFilipp A. BaronKang L. Wang
    • H01L27/108
    • B82Y10/00H01L29/7613H01L29/812
    • A vertical gate-depleted single electron transistor (SET) is fabricated on a conducting or insulating substrate. A plurality of lightly doped basic materials and tunneling barriers are fabricated on top of a substrate, wherein at least two of the layers of basic materials sandwich the layers of tunneling barriers and at least two of the layers of tunneling barriers sandwich at least one of the layers of basic materials. A mesa is fabricated on top of the layers of basic materials and tunneling barriers, and has an undercut shape. An ohmic contact is fabricated on top of the mesa, and one or more gate Schottky contacts are fabricated on top of the layers of lightly doped basic materials and tunneling barriers. A quantum dot is induced by gate depletion, when a source voltage is set as zero, a drain voltage is set to be less than 0.1, and a gate voltage is set to be negative. The depletion region expands toward the center of the device and forms a lateral confinement to the quantum well, wherein a quantum dot is obtained. Because the size of the quantum dot is so small, the Coulomb charging energy achieved is large enough to let the device operate at room temperature.
    • 在导电或绝缘基板上制造垂直栅极耗尽的单电子晶体管(SET)。 在衬底的顶部上制造多个轻掺杂的基本材料和隧道势垒,其中至少两层基本材料层夹着隧道势垒的层,并且至少两层隧穿势垒夹着至少一层 层的基本材料。 在基础材料和隧道屏障层之上制造台面,并具有底切形状。 在台面的顶部制造欧姆接触,并且在轻掺杂的基础材料和隧道势垒的层之上制造一个或多个栅极肖特基接触。 当栅极耗尽时,源极电压被设置为零,漏极电压被设定为小于0.1,栅极电压被设定为负值,就会产生量子点。 耗尽区朝向器件的中心扩展,并形成量子阱的侧向约束,其中获得量子点。 因为量子点的尺寸如此之小,所以实现的库仑充电能够足够大以使器件在室温下工作。