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1. 发明授权

US08062717B2 RF current return path for a large area substrate plasma reactor 失效
标题翻译：用于大面积衬底等离子体反应器的RF电流返回路径
公开(公告)号：US08062717B2
公开(公告)日：2011-11-22
申请号：US11425679
申请日：2006-06-21
申请人： Wendell Blonigan , Ernst Keller , Carl Sorensen
发明人： Wendell Blonigan , Ernst Keller , Carl Sorensen
IPC分类号： H05H1/24
CPC分类号： H01J37/32082 , H01J37/32577
摘要： An apparatus for providing a return current path for RF current between a chamber wall and a substrate support is provided comprising a low impedance flexible curtain having a first end and a second end, the first end adapted to be electrically connected to the chamber wall and the second end adapted to be connected to the substrate support, wherein the curtain further comprises at least one fold in the curtain material, located an axial distance between the first end and the second end, and at least one perforation cut into the curtain proximate the second end.
摘要翻译：提供一种用于在室壁和衬底支撑件之间提供用于RF电流的返回电流路径的装置，其包括具有第一端和第二端的低阻抗柔性帘幕，所述第一端适于电连接到室壁和第二端适于连接到基板支撑件，其中帘幕还包括帘幕材料中的至少一个折叠部，位于第一端部和第二端部之间的轴向距离处，并且至少一个穿孔切入靠近第二端部的帘幕结束。

2. 发明申请

US20060231029A1 RF CURRENT RETURN PATH FOR A LARGE AREA SUBSTRATE PLASMA REACTOR 失效
标题翻译：大面积基片等离子体反应器的RF电流返回路径
公开(公告)号：US20060231029A1
公开(公告)日：2006-10-19
申请号：US11425679
申请日：2006-06-21
申请人： Wendell Blonigan , Ernst Keller , Carl Sorensen
发明人： Wendell Blonigan , Ernst Keller , Carl Sorensen
IPC分类号： C23C16/00
CPC分类号： H01J37/32082 , H01J37/32577
摘要： An apparatus for providing a return current path for RF current between a chamber wall and a substrate support is provided comprising a low impedance flexible curtain having a first end and a second end, the first end adapted to be electrically connected to the chamber wall and the second end adapted to be connected to the substrate support, wherein the curtain further comprises at least one fold in the curtain material, located an axial distance between the first end and the second end, and at least one perforation cut into the curtain proximate the second end.
摘要翻译：提供一种用于在室壁和衬底支撑件之间提供用于RF电流的返回电流路径的装置，其包括具有第一端和第二端的低阻抗柔性帘幕，所述第一端适于电连接到室壁和第二端适于连接到基板支撑件，其中帘幕还包括帘幕材料中的至少一个折叠部，位于第一端部和第二端部之间的轴向距离处，并且至少一个穿孔切入靠近第二端部的帘幕结束。

3. 发明授权

US07083702B2 RF current return path for a large area substrate plasma reactor 失效
标题翻译：用于大面积衬底等离子体反应器的RF电流返回路径
公开(公告)号：US07083702B2
公开(公告)日：2006-08-01
申请号：US10460916
申请日：2003-06-12
申请人： Wendell Blonigan , Ernst Keller , Carl Sorensen
发明人： Wendell Blonigan , Ernst Keller , Carl Sorensen
IPC分类号： H01L21/00
CPC分类号： H01J37/32082 , H01J37/32577
摘要： An apparatus for providing a return current path for RF current between a chamber wall and a substrate support is provided comprising a low impedance flexible curtain having a first end and a second end, the first end adapted to be electrically connected to the chamber wall and the second end adapted to be connected to the substrate support, wherein the curtain further comprises at least one fold in the curtain material, located an axial distance between the first end and the second end, and at least one perforation cut into the curtain proximate the second end.
摘要翻译：提供一种用于在室壁和衬底支撑件之间提供用于RF电流的返回电流路径的装置，其包括具有第一端和第二端的低阻抗柔性帘幕，所述第一端适于电连接到室壁和第二端适于连接到基板支撑件，其中帘幕还包括帘幕材料中的至少一个折叠部，位于第一端部和第二端部之间的轴向距离处，并且至少一个穿孔切入靠近第二端部的帘幕结束。

4. 发明申请

US20050265818A1 Methods and apparatus for supporting substrates 有权
标题翻译：用于支撑基材的方法和装置
公开(公告)号：US20050265818A1
公开(公告)日：2005-12-01
申请号：US11140777
申请日：2005-05-31
申请人： Wendell Blonigan , Carl Sorensen , John White , Robin Tiner
发明人： Wendell Blonigan , Carl Sorensen , John White , Robin Tiner
IPC分类号： H01L21/683 , B65G1/00 , B66C1/00 , B66C3/00 , H01L21/00 , H01L21/68 , H01L21/687
CPC分类号： H01L21/67259 , H01L21/68742 , H01L21/68778
摘要： Substrate support methods and apparatus include vertically aligned lift pins that have bearing surfaces that engage friction plates and/or magnetic fields to maintain the vertical orientation of the lift pins during substrate lifting. In some embodiments, a magnetic field and/or weighting may alternatively or additionally be used to control the vertical orientation of the lift pins, limit the angle of the lift pins, and/or prevent the lift pins from unintentionally binding in a susceptor as the susceptor is raised and prevent the resulting uneven support of the substrate.
摘要翻译：衬底支撑方法和装置包括垂直对齐的提升销，其具有接合摩擦板和/或磁场的承载表面，以在衬垫提升期间保持提升销的垂直取向。在一些实施例中，可以替代地或另外地使用磁场和/或加权来控制提升销的垂直定向，限制提升销的角度和/或防止提升销在基座中无意地结合，因为感受器被升高并且防止由此产生的基板不均匀的支撑。

5. 发明授权

US08004293B2 Plasma processing chamber with ground member integrity indicator and method for using the same 有权
标题翻译：具有接地构件完整性指示器的等离子体处理室及其使用方法
公开(公告)号：US08004293B2
公开(公告)日：2011-08-23
申请号：US11561463
申请日：2006-11-20
申请人： John M. White , Carl Sorensen
发明人： John M. White , Carl Sorensen
IPC分类号： G01R27/08 , G01R31/08
CPC分类号： H01L21/67069 , C23C16/4585 , C23C16/52 , H01J37/32935
摘要： A method and apparatus for monitoring the integrity of a ground member coupling a substrate support to a chamber body in a plasma processing system is provided. In one embodiment, a processing chamber is provided that includes a ground path member coupled between a substrate support and a chamber body. A sensor is positioned to sense a metric indicative of current passing through the ground member. In another embodiment, a method monitoring the integrity of a ground member coupling a substrate support to a chamber body in a plasma processing chamber includes monitoring a metric indicative of current passing through the ground member during processing, and setting a flag in response to the metric exceeding a predefined threshold.
摘要翻译：提供了一种用于监测在等离子体处理系统中将衬底支撑件耦合到室主体的接地构件的完整性的方法和装置。在一个实施例中，提供了处理室，其包括联接在基板支撑件和室主体之间的接地路径构件。定位传感器以感测指示通过接地构件的电流的度量。在另一个实施例中，监测在等离子体处理室中将衬底支撑件耦合到室主体的接地构件的完整性的方法包括在处理期间监视指示通过接地构件的电流的度量，以及响应于度量而设置标志超过预定阈值。

6. 发明申请

US20060289608A1 Friction stirring of high softening temperature materials using new surface features on a tool 有权
标题翻译：使用工具上新的表面特征对高软化温度材料进行摩擦搅拌
公开(公告)号：US20060289608A1
公开(公告)日：2006-12-28
申请号：US11452097
申请日：2006-06-12
申请人： Russell Steel , Scott Packer , Carl Sorensen , Tracy Nelson , Richard Flak
发明人： Russell Steel , Scott Packer , Carl Sorensen , Tracy Nelson , Richard Flak
IPC分类号： A47J36/02
CPC分类号： B23K20/1255 , B23K20/22 , B23K2103/02
摘要： A method of selecting a geometry for a friction stirring tool, said tool having a melting point that is higher than the workpiece material, wherein the tool is placed in motion against the workpiece to generate heat in the workpiece such that workpiece material is transported in surface features of the tool, and wherein surface features manage workpiece material flow around the tool, and wherein the tool can be used in friction stir processing, friction stir mixing, friction stir welding, and friction stir spot welding of high melting temperature materials or high softening temperature materials.
摘要翻译：一种选择摩擦搅拌工具的几何形状的方法，所述工具具有高于工件材料的熔点，其中工具被放置成运动抵靠工件以在工件中产生热量，使得工件材料在表面上传送工具的特征，其中表面特征管理工具周围的工件材料流动，并且其中该工具可用于摩擦搅拌处理，摩擦搅拌混合，摩擦搅拌焊接和高熔点材料的摩擦搅拌点焊或高软化温度材料。

7. 发明授权

US08365682B2 Methods and apparatus for supporting substrates 有权
标题翻译：用于支撑基材的方法和装置
公开(公告)号：US08365682B2
公开(公告)日：2013-02-05
申请号：US11140777
申请日：2005-05-31
申请人： Wendell T. Blonigan , Carl Sorensen , John M. White , Robin L. Tiner
发明人： Wendell T. Blonigan , Carl Sorensen , John M. White , Robin L. Tiner
IPC分类号： B65G49/07
CPC分类号： H01L21/67259 , H01L21/68742 , H01L21/68778
摘要： Substrate support methods and apparatus include vertically aligned lift pins that have bearing surfaces that engage friction plates and/or magnetic fields to maintain the vertical orientation of the lift pins during substrate lifting. In some embodiments, a magnetic field and/or weighting may alternatively or additionally be used to control the vertical orientation of the lift pins, limit the angle of the lift pins, and/or prevent the lift pins from unintentionally binding in a susceptor as the susceptor is raised and prevent the resulting uneven support of the substrate.
摘要翻译：衬底支撑方法和装置包括垂直对齐的提升销，其具有接合摩擦板和/或磁场的承载表面，以在衬垫提升期间保持提升销的垂直取向。在一些实施例中，可以替代地或另外地使用磁场和/或加权来控制提升销的垂直定向，限制提升销的角度和/或防止提升销在基座中无意地结合，因为感受器被升高并且防止由此产生的基板不均匀的支撑。

8. 发明授权

US08147614B2 Multi-gas flow diffuser 失效
标题翻译：多气流扩散器
公开(公告)号：US08147614B2
公开(公告)日：2012-04-03
申请号：US12794756
申请日：2010-06-06
申请人： John M. White , Carl Sorensen , Robin Tiner , Beom Soo Park , Soo Young Choi
发明人： John M. White , Carl Sorensen , Robin Tiner , Beom Soo Park , Soo Young Choi
IPC分类号： C23C16/00
CPC分类号： C23C16/45565 , C23C16/45591 , H01J37/32091 , H01J37/32357 , H01J37/3244 , H01J37/32449
摘要： Embodiments of the disclosure generally provide a method and apparatus for processing a substrate in a vacuum process chamber. In one embodiment a vacuum process chamber is provided that includes a chamber body and lid disposed on the chamber body. A blocker plate is coupled to the lid and bounds a staging plenum therewith. A gas distribution plate is coupled to the lid. The gas distribution plate separates a main plenum defined between the gas distribution plate and the blocker plate from a process volume defined within the chamber body. The gas distribution plate and the blocker plate define a spacing gradient therebetween which influences mixing of gases within the main plenum.
摘要翻译：本公开的实施例通常提供用于在真空处理室中处理衬底的方法和装置。在一个实施例中，提供真空处理室，其包括设置在室主体上的室主体和盖。阻挡板联接到盖子并且与其分隔起来。气体分配板联接到盖子上。气体分配板将限定在气体分配板和阻挡板之间的主增压室与室主体内限定的过程体积分开。气体分配板和阻挡板限定了它们之间的间隔梯度，其影响主增压室内气体的混合。

9. 发明授权

US07518466B2 Methods and apparatus for symmetrical and/or concentric radio frequency matching networks 有权
标题翻译：用于对称和/或同心的射频匹配网络的方法和装置
公开(公告)号：US07518466B2
公开(公告)日：2009-04-14
申请号：US11507649
申请日：2006-08-21
申请人： Carl Sorensen , John M. White
发明人： Carl Sorensen , John M. White
IPC分类号： H03H7/38
CPC分类号： H01J37/32183 , H01J37/32082 , H05H1/46
摘要： Apparatus and methods are provided that are adapted to match the impedance of an electrical load to an impedance of an electrical signal generator. The invention includes providing a plurality of electrical components adapted to collectively match the impedance of the electrical load to the impedance of the electrical signal generator. The electrical components are arranged symmetrically and concentrically about an axis. Additionally, the invention may also include a first connector adapted to electrically couple the electrical signal generator to the electrical components. Additionally, the invention may also include a second connector adapted to electrically couple the load to the electrical components. Numerous other aspects are provided.
摘要翻译：提供了适于将电负载的阻抗与电信号发生器的阻抗相匹配的装置和方法。本发明包括提供多个电气部件，其适于将电负载的阻抗统一地匹配到电信号发生器的阻抗。电气部件围绕轴对称地并且同心地布置。另外，本发明还可以包括适于将电信号发生器电耦合到电气部件的第一连接器。另外，本发明还可以包括适于将负载电耦合到电气部件的第二连接器。提供了许多其他方面。

10. 发明申请

US20060017386A1 Apparatus and methods for a fixed impedance transformation network for use in connection with a plasma chamber 有权
公开(公告)号：US20060017386A1
公开(公告)日：2006-01-26
申请号：US11179036
申请日：2005-07-11
申请人： Carl Sorensen , John White , Suhail Anwar
发明人： Carl Sorensen , John White , Suhail Anwar
IPC分类号： H01J7/24
CPC分类号： H01J37/32082 , H01J37/32183
摘要： In certain embodiments, an apparatus for providing a fixed impedance transformation network for driving a plasma chamber includes a pre-match network adapted to couple between an Active RF match network and a plasma chamber load associated with the plasma chamber. The pre-match network includes (1) a first capacitive element; (2) an inductive element connected in parallel with the first capacitive element to form a parallel circuit that presents a stepped-up impedance to an output of the Active RF match network such that a voltage required to drive the plasma chamber load is reduced; and (3) a second capacitive element coupled to the parallel circuit and adapted to couple to the plasma chamber load. The second capacitive element reduces or cancels at least in part a reactance corresponding to an inductance associated with the plasma chamber load. Numerous other aspects are provided.

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