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    • 6. 发明授权
    • Methods and systems for processing a microelectronic topography
    • 用于处理微电子拓扑的方法和系统
    • US08003159B2
    • 2011-08-23
    • US11108589
    • 2005-04-18
    • Igor C. IvanovWeiguo Zhang
    • Igor C. IvanovWeiguo Zhang
    • B05D3/04
    • H01L21/68728H01L21/67051H01L21/6708Y02P80/30
    • Methods and systems are provided which are adapted to process a microelectronic topography, particularly in association with an electroless deposition process. In general, the methods may include loading the topography into a chamber, closing the chamber to form an enclosed area, and supplying fluids to the enclosed area. In some embodiments, the fluids may fill the enclosed area. In addition or alternatively, a second enclosed area may be formed about the topography. As such, the provided system may be adapted to form different enclosed areas about a substrate holder. In some cases, the method may include agitating a solution to minimize the accumulation of bubbles upon a wafer during an electroless deposition process. As such, the system provided herein may include a means for agitating a solution in some embodiments. Such a means for agitation may be distinct from the inlet/s used to supply the solution to the chamber.
    • 提供了适于处理微电子拓扑的方法和系统,特别是与无电沉积工艺相关联。 通常,方法可以包括将形貌加载到腔室中,关闭腔室以形成封闭区域,并将流体供应到封闭区域。 在一些实施例中,流体可以填充封闭区域。 另外或替代地,围绕地形可以形成第二封闭区域。 因此,所提供的系统可以适于在基板保持器周围形成不同的封闭区域。 在一些情况下,该方法可以包括搅拌溶液以在无电沉积工艺期间使气泡在晶片上的累积最小化。 因此,本文提供的系统可以包括在一些实施例中用于搅拌溶液的装置。 用于搅拌的这种手段可能不同于用于将溶液供应到室的入口。
    • 8. 发明授权
    • Method and system for measuring and compensating for eddy currents induced during NMR imaging operations
    • 用于测量和补偿在NMR成像操作期间引起的涡流的方法和系统
    • US06448773B1
    • 2002-09-10
    • US09512323
    • 2000-02-24
    • Weiguo Zhang
    • Weiguo Zhang
    • G01V300
    • G01R33/56518
    • A method and apparatus is disclosed for measuring and compensating the effects of eddy currents induced during NMR imaging operations. A cubic or cylindrical sample is placed in the imaging volume of a MRI system at a position centrally located with respect to the main magnetic field and oriented with its longitudinal axis parallel to a desired measuring direction. A magnetic field gradient pulse is applied for inducing eddy currents as well as for generating a slice-selective spin-echo signal. The spin-echo signal is acquired immediately after the termination of each eddy-current inducing gradient pulse. Two slices are selected along the desired measurement direction at symmetrical equal distance from the center of the main magnetic field. Two spin-echo signals are acquired for each slice with the polarity of the eddy-current inducing gradient pulse reversed between the two echo signals. Quantitative values for eddy-current induced field gradients and B0 oscillations are determined based on the precessing frequencies of the acquired NMR signals. NMR imaging is improved by compensating for eddy currents effects by applying the quantified values of the field gradients and B0 oscillations to set an appropriate pre-emphasis network. Gradient pulses in MRI/MRS pulse sequences may also be selectively pre-distorted or modified to compensate for resulting gradient-switching induced eddy currents. Other aspects of the disclosed method include measuring the time course of gradient switching, altering the pulse sequences to measure eddy currents having long time constants, repeatedly measuring the eddy currents to assist in pre-emphasis adjustments, and measuring EC-induced field gradients and B0 oscillation in the presence of moderately large background field inhomogeneities.
    • 公开了用于测量和补偿在NMR成像操作期间感应的涡流的影响的方法和装置。 将立方体或圆柱形样品放置在相对于主磁场中心定位的位置处的MRI系统的成像体积中,并且其纵向轴线平行于期望的测量方向。 施加磁场梯度脉冲以诱导涡流以及用于产生切片选择性自旋回波信号。 在每个涡电流感生梯度脉冲终止之后立即获取自旋回波信号。 沿着与主磁场中心对称等距的所需测量方向选择两个切片。 对于每个切片获取两个自旋回波信号,其中涡电流感应梯度脉冲的极性在两个回波信号之间相反。 基于获取的NMR信号的进动频率来确定涡流感应场梯度和B0振荡的定量值。 通过应用场梯度和B0振荡的量化值来补偿涡流效应来改善NMR成像,以设置适当的预加重网络。 MRI / MRS脉冲序列中的梯度脉冲也可以被选择性地预失真或修改以补偿所得到的梯度切换感应涡流。 所公开方法的其他方面包括测量梯度切换的时间过程,改变脉冲序列以测量具有长时间常数的涡流,重复测量涡流以辅助预加重调整,以及测量EC诱导的场梯度和B0 存在中等大背景场不均匀性的情况下的振荡。
    • 10. 发明申请
    • Methods and System for Processing a Microelectronic Topography
    • 微电子地形处理方法与系统
    • US20110271905A1
    • 2011-11-10
    • US13185638
    • 2011-07-19
    • Igor C. IvanovWeiguo Zhang
    • Igor C. IvanovWeiguo Zhang
    • B05C11/00
    • H01L21/68728H01L21/67051H01L21/6708Y02P80/30
    • Methods and systems are provided which are adapted to process a microelectronic topography, particularly in association with an electroless deposition process. In general, the methods may include loading the topography into a chamber, closing the chamber to form an enclosed area, and supplying fluids to the enclosed area. In some embodiments, the fluids may fill the enclosed area. In addition or alternatively, a second enclosed area may be formed about the topography. As such, the provided system may be adapted to form different enclosed areas about a substrate holder. In some cases, the method may include agitating a solution to minimize the accumulation of bubbles upon a wafer during an electroless deposition process. As such, the system provided herein may include a means for agitating a solution in some embodiments. Such a means for agitation may be distinct from the inlet/s used to supply the solution to the chamber.
    • 提供了适于处理微电子拓扑的方法和系统,特别是与无电沉积工艺相关联。 通常,方法可以包括将形貌加载到腔室中,关闭腔室以形成封闭区域,并将流体供应到封闭区域。 在一些实施例中,流体可以填充封闭区域。 另外或替代地,围绕地形可以形成第二封闭区域。 因此,所提供的系统可以适于在基板保持器周围形成不同的封闭区域。 在一些情况下,该方法可以包括搅拌溶液以在无电沉积工艺期间使气泡在晶片上的累积最小化。 因此,本文提供的系统可以包括在一些实施例中用于搅拌溶液的装置。 用于搅拌的这种手段可能不同于用于将溶液供应到室的入口。