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    • 7. 发明申请
    • FLIP-CHIP LED PACKAGE AND LED CHIP
    • FLIP-CHIP LED封装和LED芯片
    • US20070200119A1
    • 2007-08-30
    • US11307875
    • 2006-02-26
    • Yun-Li LiWay-Jze WenFen-Ren Chien
    • Yun-Li LiWay-Jze WenFen-Ren Chien
    • H01L33/00
    • H01L33/08H01L33/20
    • A light emitting diode (LED) chip mainly includes a substrate, a first type doped semiconductor layer, light-emitting layers, second type doped semiconductor layers, a first electrode and second electrodes. The first type doped semiconductor layer is disposed on the substrate and includes protrusions which is upward extended; the light-emitting layers are disposed on the corresponding protrusions respectively; the second type doped semiconductor layers are disposed on the corresponding light-emitting layers respectively; the first electrode is disposed on the first type doped semiconductor layer except the protrusions and electrically connected to the first type doped semiconductor layer; the second electrodes are disposed on the corresponding second type doped semiconductor layers respectively; and the first electrode is electrically insulated from the second electrodes.
    • 发光二极管(LED)芯片主要包括基板,第一类型掺杂半导体层,发光层,第二类型掺杂半导体层,第一电极和第二电极。 所述第一掺杂半导体层设置在所述基板上,并且包括向上延伸的突起; 发光层分别设置在相应的凸起上; 第二类掺杂半导体层分别设置在相应的发光层上; 第一电极设置在除了突起之外的第一类型掺杂半导体层上,并电连接到第一类型掺杂半导体层; 第二电极分别设置在相应的第二类型的掺杂半导体层上; 并且第一电极与第二电极电绝缘。
    • 9. 发明申请
    • Light-emitting diode
    • 发光二极管
    • US20050145873A1
    • 2005-07-07
    • US10750784
    • 2004-01-03
    • Shyi-Ming PanFen-Ren ChienLung-Chien Chen
    • Shyi-Ming PanFen-Ren ChienLung-Chien Chen
    • H01L33/06H01L33/12H01L33/14H01L33/32H01L33/00
    • H01L33/32H01L33/007
    • A light-emitting diode device is provided with the following manufacturing method: forming an n-GaN layer on a substrate; growing an SiO2 layer on the n-GaN surface, and using the photo-lithography process to expose the n-GaN within the mesa area; using MOCVD to grow an LED structure in the epitaxy within the mesa area, the formed structure being a p-n coplanar structure due to the selective area characteristic; and finally, forming the electrodes on the structure to complete an LED device. The device can be manufactured without the etching process to form the p-n coplanar structure. In comparison to other conventional manufacturing methods, the method simplifies the manufacturing process, and avoids many problems associated with etching, including non-uniform etching, overly rough surface, etching damages, and current leakage. Furthermore, SiO2 is used as a scattering layer to prevent emitted light from internally reflected, and therefore, improves the external quantum efficiency.
    • 一种发光二极管器件具有以下制造方法:在衬底上形成n-GaN层; 在n-GaN表面上生长SiO 2层,并使用光刻工艺在台面区域内露出n-GaN; 使用MOCVD在台面区域内的外延生长LED结构,由于选择区域特性,形成的结构是p-n共面结构; 最后,在结构上形成电极以完成LED器件。 可以在没有蚀刻工艺的情况下制造器件以形成p-n共面结构。 与其他常规制造方法相比,该方法简化了制造工艺,并且避免了与蚀刻相关的许多问题,包括不均匀蚀刻,过度粗糙的表面,蚀刻损伤和电流泄漏。 此外,使用SiO 2作为散射层以防止发射的光从内部反射,因此提高了外部量子效率。