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    • 6. 发明申请
    • LIGHT-EMITTING DIODE PACKAGE
    • 发光二极管封装
    • US20070272930A1
    • 2007-11-29
    • US11308926
    • 2006-05-26
    • Huan-Che TsengWay-Jze WenShyi-Ming Pan
    • Huan-Che TsengWay-Jze WenShyi-Ming Pan
    • H01L33/00
    • H01L33/22H01L33/60H01L2224/16225
    • A light-emitting diode package (LED package) includes a LED and a carrier. The LED includes a substrate, a semiconductor layer, a first electrode and a second electrode. The semiconductor layer is located on a surface of the substrate and has a rough surface. The semiconductor layer includes a first-type doped semiconductor layer, a second-type doped semiconductor layer and a light-emitting layer disposed between the two doped semiconductor layers. The first electrode and the second electrode are disposed on and electrically coupled the first-type doped semiconductor layer and the second-type doped semiconductor layer, respectively. The carrier has a rough carrying surface and includes a first contact pad and a second contact pad disposed on the rough carrying surface. The first electrode and the second electrode of the LED face the carrier and are electrically coupled to the first contact pad and a second contact pad, respectively.
    • 发光二极管封装(LED封装)包括LED和载体。 LED包括基板,半导体层,第一电极和第二电极。 半导体层位于基板的表面上,具有粗糙的表面。 半导体层包括第一掺杂半导体层,第二掺杂半导体层和设置在两个掺杂半导体层之间的发光层。 第一电极和第二电极分别设置在第一掺杂半导体层和第二掺杂半导体层上并电耦合。 载体具有粗糙的承载表面,并且包括设置在粗糙承载表面上的第一接触焊盘和第二接触焊盘。 LED的第一电极和第二电极面向载体并且分别电耦合到第一接触焊盘和第二接触焊盘。
    • 9. 发明申请
    • Light-emitting diode
    • 发光二极管
    • US20050145873A1
    • 2005-07-07
    • US10750784
    • 2004-01-03
    • Shyi-Ming PanFen-Ren ChienLung-Chien Chen
    • Shyi-Ming PanFen-Ren ChienLung-Chien Chen
    • H01L33/06H01L33/12H01L33/14H01L33/32H01L33/00
    • H01L33/32H01L33/007
    • A light-emitting diode device is provided with the following manufacturing method: forming an n-GaN layer on a substrate; growing an SiO2 layer on the n-GaN surface, and using the photo-lithography process to expose the n-GaN within the mesa area; using MOCVD to grow an LED structure in the epitaxy within the mesa area, the formed structure being a p-n coplanar structure due to the selective area characteristic; and finally, forming the electrodes on the structure to complete an LED device. The device can be manufactured without the etching process to form the p-n coplanar structure. In comparison to other conventional manufacturing methods, the method simplifies the manufacturing process, and avoids many problems associated with etching, including non-uniform etching, overly rough surface, etching damages, and current leakage. Furthermore, SiO2 is used as a scattering layer to prevent emitted light from internally reflected, and therefore, improves the external quantum efficiency.
    • 一种发光二极管器件具有以下制造方法:在衬底上形成n-GaN层; 在n-GaN表面上生长SiO 2层,并使用光刻工艺在台面区域内露出n-GaN; 使用MOCVD在台面区域内的外延生长LED结构,由于选择区域特性,形成的结构是p-n共面结构; 最后,在结构上形成电极以完成LED器件。 可以在没有蚀刻工艺的情况下制造器件以形成p-n共面结构。 与其他常规制造方法相比,该方法简化了制造工艺,并且避免了与蚀刻相关的许多问题,包括不均匀蚀刻,过度粗糙的表面,蚀刻损伤和电流泄漏。 此外,使用SiO 2作为散射层以防止发射的光从内部反射,因此提高了外部量子效率。