专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US06714279B2 Lithographic projection apparatus, device manufacturing method and device manufactured thereby 失效
标题翻译：平版印刷设备，装置制造方法和由此制造的装置
公开(公告)号：US06714279B2
公开(公告)日：2004-03-30
申请号：US09942952
申请日：2001-08-31
申请人： Vadim Y. Banine , Jeroen Jonkers
发明人： Vadim Y. Banine , Jeroen Jonkers
IPC分类号： G03B2752
CPC分类号： G03F7/70883 , G03F7/70916 , G03F7/70933
摘要： A lithographic projection apparatus comprising a radiation system for supplying a projection beam of radiation, a mask table for holding a mask, a substrate table for holding a substrate and a projection system for imaging an irradiated portion of the mask onto a target portion of the substrate. Either or both of the radiation system and the projection system is supplied with an inert gas at a pressure of from 0.1 to 10 Pa in order to suppress contamination, for example by hydrocarbon molecules, of any optical components in the system(s).
摘要翻译：一种光刻投影装置，包括用于提供投射辐射束的辐射系统，用于保持掩模的掩模台，用于保持基板的基板台和用于将掩模的照射部分成像到基板的目标部分上的投影系统。在0.1至10Pa的压力下，向辐射系统和投影系统中的任何一个或两个供应惰性气体，以便抑制系统中任何光学部件（例如烃分子）的污染。

2. 发明授权

US06576912B2 Lithographic projection apparatus equipped with extreme ultraviolet window serving simultaneously as vacuum window 有权
标题翻译：装有极紫外光窗口的平版印刷设备同时作为真空窗口
公开(公告)号：US06576912B2
公开(公告)日：2003-06-10
申请号：US09752818
申请日：2001-01-03
申请人： Hugo M. Visser , Richard L. Sandstrom , Theodorus H. J. Bisschops , Vadim Y. Banine , Jeroen Jonkers
发明人： Hugo M. Visser , Richard L. Sandstrom , Theodorus H. J. Bisschops , Vadim Y. Banine , Jeroen Jonkers
IPC分类号： G21G500
CPC分类号： B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70916 , G21K1/06
摘要： A lithographic projection apparatus has a discharge plasma radiation source that is contained in a vacuum chamber. The radiation source is to generate a beam of EUV radiation. A chamber wall of the vacuum chamber incorporates a channel structure comprising adjacent narrow channels separated by walls that are substantially parallel to a propagation direction of the radiation generated so as to pass the radiation from the vacuum chamber through the structure to another subsequent vacuum chamber. In the subsequent vacuum chamber, a much higher vacuum level (lower pressure) can be maintained than is present in the vacuum chamber of the radiation source.
摘要翻译：光刻投影装置具有包含在真空室中的放电等离子体辐射源。辐射源是产生一束EUV辐射。真空室的室壁包括通道结构，该通道结构包括由壁隔开的相邻窄通道，该窄通道基本上平行于所产生的辐射的传播方向，以便将来自真空室的辐射通过该结构传递到另一个随后的真空室。在随后的真空室中，可以比辐射源的真空室中存在的更高的真空度（较低的压力）得到保持。

3. 发明授权

US07671965B2 Lithographic projection apparatus, device manufacturing method and device manufactured thereby 有权
标题翻译：平版印刷设备，装置制造方法和由此制造的装置
公开(公告)号：US07671965B2
公开(公告)日：2010-03-02
申请号：US09943758
申请日：2001-09-04
申请人： Vadim Y. Banine , Jeroen Jonkers
发明人： Vadim Y. Banine , Jeroen Jonkers
IPC分类号： G03B27/42 , C23F1/00
CPC分类号： G03F7/70983 , G03F7/70883 , G03F7/70916 , G03F7/70933 , G03F7/70958
摘要： A lithographic projection apparatus comprising a radiation system for supplying a projection beam of electromagnetic radiation in the extreme ultraviolet (EUV) range, a support structure for supporting patterning structure, the patterning structure serving to pattern the projection beam according to a desired pattern, a substrate table for holding a substrate and a projection system for projecting the patterned beam onto a target portion of the substrate. A space within the apparatus, which space contains a mirror, is supplied with a hydrocarbon gas which forms a protective cap layer on the mirror surface. The partial pressure of the hydrocarbon gas in the space is controlled in response to variations in the background pressure in the space and/or in the reflectivity of the mirror, such that the thickness of the cap layer on the mirror remains within an acceptable range. The partial pressure of hydrocarbon may be increased in order to sputter away the cap layer and/or, if extra multilayers are provided on the mirror, the top layer(s) of the mirror, thus providing a clean mirror surface. The hydrocarbon used may be an alcohol, in which case the cap layer formed is self-terminating.
摘要翻译：一种光刻投影设备，包括用于提供极紫外（EUV）范围内的电磁辐射投影光束的辐射系统，用于支撑图形结构的支撑结构，用于根据期望图案对投影光束进行图案化的图案结构;基板用于保持基板的台和用于将图案化的光束投影到基板的目标部分上的投影系统。该装置内的空间包含反射镜，在其上形成有保护盖层的碳氢化合物气体。响应于空间中背景压力和/或反射镜的反射率的变化来控制空间中的烃气体的分压，使得反射镜上的盖层的厚度保持在可接受的范围内。可以增加碳氢化合物的分压以便溅射掉盖层和/或如果反射镜上设置多余层，则反射镜的顶层可提供干净的镜面。所使用的烃可以是醇，在这种情况下形成的盖层是自终止的。

4. 发明授权

US06452194B2 Radiation source for use in lithographic projection apparatus 有权
标题翻译：用于光刻投影仪的辐射源
公开(公告)号：US06452194B2
公开(公告)日：2002-09-17
申请号：US09735641
申请日：2000-12-14
申请人： Frederik Bijkerk , Henryk Fiedorowicz , Cornelis C. de Bruijn , Andrzej Bartnik , Konstantin N. Koshelev , Vadim Y. Banine
发明人： Frederik Bijkerk , Henryk Fiedorowicz , Cornelis C. de Bruijn , Andrzej Bartnik , Konstantin N. Koshelev , Vadim Y. Banine
IPC分类号： G21K510
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , H05G2/005
摘要： A radiation source of a radiation system of a lithographic projection apparatus comprises electrodes for creating a discharge in a space between them such that the discharge collapses into a pinch volume. The collapsing discharge creates a highly ionized, high temperature plasma in the pinch volume. A working fluid is ejected from a jet nozzle into the pinching volume and is thereby raised to a high temperature state and emits extreme ultraviolet radiation.
摘要翻译：光刻投影装置的辐射系统的辐射源包括用于在它们之间的空间中产生放电的电极，使得放电塌陷成掐体积。塌陷放电在收缩体积中产生高度电离的高温等离子体。工作流体从喷嘴喷射到夹持体积中，从而升高到高温状态并发射极紫外线。

5. 发明授权

US06456362B1 Integrating waveguide for use in lithographic projection apparatus 失效
标题翻译：集成波导用于光刻投影设备
公开(公告)号：US06456362B1
公开(公告)日：2002-09-24
申请号：US09584722
申请日：2000-06-01
申请人： Vadim Y. Banine
发明人： Vadim Y. Banine
IPC分类号： G03B2754
CPC分类号： B82Y10/00 , G03F7/70075 , G03F7/70166 , Y10S385/901
摘要： A lithographic projection apparatus includes an illumination system for supplying a projection beam of electromagnetic radiation having a wavelength less than or equal to 50 nm, a mask table provided with a mask holder for holding a mask, a substrate table provided with a substrate holder for holding a substrate, a projection system for imaging an irradiated portion of the mask onto a target portion of the substrate, wherein the radiation system comprises an integrating element disposed in the path of the radiation, the integrating element comprising a hollow waveguide.
摘要翻译：光刻投影装置包括用于提供波长小于或等于50nm的电磁辐射的投影光束的照明系统，设置有用于保持掩模的掩模支架的掩模台，设置有用于保持的基板保持器的基板台衬底，用于将掩模的照射部分成像到衬底的目标部分上的投影系统，其中所述辐射系统包括设置在辐射路径中的积分元件，所述积分元件包括中空波导。

6. 发明授权

US06721389B2 Lithographic apparatus, device manufacturing method, and device manufactured thereby 有权
标题翻译：平版印刷设备，器件制造方法和由此制造的器件
公开(公告)号：US06721389B2
公开(公告)日：2004-04-13
申请号：US09934681
申请日：2001-08-23
申请人： Jan E. Van Der Werf , Mark Kroon , Wilhelmus C. Keur , Vadim Y. Banine , Hans Van Der Laan , Johannes H. J. Moors , Erik R. Loopstra
发明人： Jan E. Van Der Werf , Mark Kroon , Wilhelmus C. Keur , Vadim Y. Banine , Hans Van Der Laan , Johannes H. J. Moors , Erik R. Loopstra
IPC分类号： G03F720
CPC分类号： G03F7/70558 , G01J1/58 , G03F7/70741 , G03F7/7085 , G03F7/70916 , G03F7/70983
摘要： A lithographic projection apparatus includes a radiation system for providing a projection beam of radiation having a wavelength &lgr;1 smaller than 50 nm; a support structure for supporting patterning structure, the patterning structure serving to pattern the projection beam according to a desired pattern; a substrate table for holding a substrate; and a projection system for projecting the patterned beam onto a target portion of the substrate. The apparatus further includes a radiation sensor which is located so as to be able to receive radiation out of the projection beam, said sensor comprising a radiation-sensitive material which converts incident radiation of wavelength &lgr;1 into secondary radiation; and sensing means capable of detecting said secondary radiation emerging from said layer.
摘要翻译：光刻投影设备包括用于提供波长λ1小于50nm的辐射投射光束的辐射系统; 用于支撑图案形成结构的支撑结构，用于根据期望图案对投影光束进行图案化的图案形成结构; 用于保持衬底的衬底台; 以及用于将图案化的光束投影到基板的目标部分上的投影系统。该装置还包括辐射传感器，其被定位成能够接收来自投影光束的辐射，所述传感器包括将波长λ1的入射辐射转换成二次辐射的辐射敏感材料; 以及能够检测从所述层出射的所述次级辐射的感测装置。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式