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1. 再颁专利

USRE30107E Thermographic recording process 失效
标题翻译：热成像记录过程
公开(公告)号：USRE30107E
公开(公告)日：1979-10-02
申请号：US925962
申请日：1978-07-18
申请人： Urbain L. Laridon , Albert L. Poot , Jozef F. Willems
发明人： Urbain L. Laridon , Albert L. Poot , Jozef F. Willems
IPC分类号： C07D311/24
CPC分类号： C07D311/24 , Y10T428/31678
摘要： A recording process, wherein an organic reducing compound being present in a supported or self-supporting layer and corresponding to one of the following general formulae (I) and (II): ##STR1## wherein: R.sub.1 represents hydrogen, an aliphatic group of a cycloaliphatic group, andR.sub.2 represents an aliphatic oxy group, a cycloaliphatic oxy group, an aryloxy group, an amino group of the formula ##STR2## in which R.sub.3 and R.sub.4 (same or different) represent hydrogen, an aliphatic, a cycloaliphatic or an aromatic group or R.sub.3 and R.sub.4 represent together the necessary atoms to close a heterocyclic nitrogen containing nucleus; ##STR3## wherein R.sub.5 represents an aliphatic, cycloaliphatic, aromatic or heterocyclic group, is caused to effect in said layer under the influence of information-wise heating an information-wise reduction of a reducible reaction partner.

2. 发明授权

US4255513A Photopolymerizable recording materials 失效
标题翻译：可光聚合记录材料
公开(公告)号：US4255513A
公开(公告)日：1981-03-10
申请号：US64895
申请日：1979-08-08
申请人： Urbain L. Laridon , August M. Marien , Walter F. De Winter , Hendrik E. Kokelenberg
发明人： Urbain L. Laridon , August M. Marien , Walter F. De Winter , Hendrik E. Kokelenberg
IPC分类号： C08F2/00 , C08F2/50 , G03F7/031 , H01L21/027 , G03C1/68
CPC分类号： C08F2/50 , G03F7/031 , Y10S430/111 , Y10S430/117 , Y10S430/12
摘要： A photosensitive material is described which comprises a base and a solid photosensitive layer comprising a photopolymerizable compound and a photopolymerization initiating mixture consisting of an oxime ester, a photopolymerization initiator and a p-dialkylaminobenzene of the formula ##STR1## wherein R.sup.1 and R.sup.2 are lower alkyl, R.sup.3 is hydrogen, alkyl, alkoxy or N(R.sup.1) (R.sup.2) and X is --CO--, --CS--, CH.sub.2, or --CH(OH)--.Synergistic photocuring sensitivity is obtained by said oxime ester in admixture with said p-dialkyl aminobenzene compound.
摘要翻译：描述了一种感光材料，其包含基底和包含可光聚合化合物的固体感光层和由肟酯，光聚合引发剂和下式的对二烷基氨基苯组成的光聚合引发混合物，其中R 1和R 2是低级烷基，R3是氢，烷基，烷氧基或N（R1）（R2），X是-CO-，-CS-，CH2或-CH（OH） - ，所述肟酯与所述对二烷基氨基苯化合物。

3. 发明授权

US4411978A Photoresist materials and processes of using with photosensitive naphthoquinone diazides and nitrones 失效
标题翻译：光敏材料和使用光敏萘醌二氮嗪和硝酮的方法
公开(公告)号：US4411978A
公开(公告)日：1983-10-25
申请号：US885998
申请日：1978-03-13
申请人： Urbain L. Laridon , Hendrik E. Kokelenberg , Rafael P. Samijn
发明人： Urbain L. Laridon , Hendrik E. Kokelenberg , Rafael P. Samijn
IPC分类号： G03C1/00 , G03C1/72 , G03F7/004 , G03F7/038 , G03F7/095 , G03F7/20 , H01L21/027 , H05K3/00 , G03C1/54 , G03C1/60 , G03C5/00
CPC分类号： G03F7/095
摘要： A photosensitive recording material which includes in a supported layer a mixture of photosensitive substances in admixture with one or more polymers that are soluble in an alkaline aqueous liquid, characterized in that such mixture of photosensitive substances essentially consists of:(A) at least one photosensitive nitrone of the formula: ##STR1## in which: R is an aromatic hydrocarbon group including a substituted aromatic hydrocarbon group,R.sup.1 is an aromatic or heterocyclic group including these groups in substituted form,n represents zero or 1, and(B) at least one photosensitive naphthoquinone-(1,2)-diazide (2) compound, that has a higher ultraviolet absorption in the wavelength range of 350 to 400 nm and a higher visible light absorption above 400 nm than each such nitrone has, the (A) and (B) compounds being present in such relative quantities to each other that the layer exhibits a relative decrease in solubility in an alkaline aqueous liquid upon a sufficient exposure to a UV-light and a relative increase in solubilty in such alkaline aqueous liquid upon a lesser exposure to visible light or to UV-light.
摘要翻译：一种感光记录材料，其在支撑层中包含与可溶于碱性含水液体的一种或多种聚合物混合的感光性物质的混合物，其特征在于，感光物质的这种混合物基本上由以下组成：（A）至少一种感光性硝基酮，其结构式如下：其中R为含有取代芳香族烃基的芳香族烃基，R 1为包含取代基的这些基团的芳香族或杂环基，n表示0或1，（B）至少（A）的光敏萘醌 - （1,2） - 二叠氮化物（2）化合物在350〜400nm的波长范围内具有较高的紫外线吸收，高于400nm的可见光吸收，和（B）化合物以彼此相对的量存在，使得当充分暴露于UV时，该层在碱性水性液体中表现出相对降低的溶解度并且在较少的可见光或紫外线照射下，这种碱性水性液体的溶解度相对增加。

4. 发明授权

US4282309A Photosensitive composition containing an ethylenically unsaturated compound, initiator and sensitizer 失效
标题翻译：含有烯属不饱和化合物，引发剂和敏化剂的感光组合物
公开(公告)号：US4282309A
公开(公告)日：1981-08-04
申请号：US106166
申请日：1979-12-21
申请人： Urbain L. Laridon , Walter F. DeWinter , Hendrik E. Kokelenberg
发明人： Urbain L. Laridon , Walter F. DeWinter , Hendrik E. Kokelenberg
IPC分类号： G03C1/00 , C08F2/00 , C08F2/50 , G03F7/004 , G03F7/031 , G03F7/038 , G03C1/68
CPC分类号： C08F2/50 , G03F7/031 , Y10S430/121
摘要： A photosensitive composition of matter suited for the production of polymer resist images which composition comprises a mixture of:(1) a photopolymerizable ethylenically unsaturated compound,(2) at least one oxime ester photopolymerization initiator, and(3) at least one sensitizer increasing the photopolymerization rate of said composition said sensitizer being defined in two general formulae said formulae including respectively a merocyanine dye, a zeromethine merocyanine dye, a carbostyril compound, an aryl-substituted 2-pyrazoline compound, an aryl-substituted oxazole compound, an aryl-substituted 1,2,4-triazole compound, an aryl-substituted 1,3,4-oxadiazole compound or an aryl-substituted-4-oxazolin-2-one compound.
摘要翻译：适用于生产聚合物抗蚀剂图像的光敏组合物，其组成包含以下混合物：（1）可光聚合的烯键式不饱和化合物，（2）至少一种肟酯光聚合引发剂，和（3）至少一种增感剂所述组合物的光聚合速率，所述敏化剂在两个通式中定义，所述式包括分别为部花青染料，月桂酸亚菁染料，喹诺酮化合物，芳基取代的2-吡唑啉化合物，芳基取代的恶唑化合物，芳基取代的 1,2,4-三唑化合物，芳基取代的1,3,4-恶二唑化合物或芳基取代的-4-恶唑啉-2-酮化合物。

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