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1. 发明授权

US08604251B2 Oligofunctional photoinitiators 有权
标题翻译：低功能光引发剂
公开(公告)号：US08604251B2
公开(公告)日：2013-12-10
申请号：US13256947
申请日：2010-03-19
申请人： Ulrich Berens , Jean-Luc Birbaum , Katia Studer
发明人： Ulrich Berens , Jean-Luc Birbaum , Katia Studer
IPC分类号： C07C49/00 , C07C49/12 , C07C49/15 , C07C49/17 , C08F2/50 , C08J3/28
CPC分类号： C07C45/63 , B33Y70/00 , C07C45/64 , C07C67/14 , C07C69/76 , C07C69/80 , C07C69/82 , C09D11/101 , C07C49/813 , C07C49/83
摘要： The invention pertains to novel oligofunctional photoinitiators of the formula (1) or (1A). R1 and R2 are methyl or together are —(CH2)5—; and n is 2 or 3, and the solvent in (1A) is water or an organic solvent; and their use in photopolymerizable compositions, in particular inks.
摘要翻译：本发明涉及式（1）或（1A）的新型低官能光引发剂。 R1和R2是甲基或一起是 - （CH2）5-; n为2或3，（1A）中的溶剂为水或有机溶剂; 以及它们在可光聚合组合物中的用途，特别是油墨。

2. 发明申请

US20120029107A1 NOVEL OLIGOFUNCTIONAL PHOTOINITIATORS 有权
标题翻译：新颖的功能性摄影机
公开(公告)号：US20120029107A1
公开(公告)日：2012-02-02
申请号：US13256947
申请日：2010-03-19
申请人： Ulrich Berens , Jean-Luc Birbaum , Katia Studer
发明人： Ulrich Berens , Jean-Luc Birbaum , Katia Studer
IPC分类号： C09D137/00 , C07C67/52 , C07C45/64 , C09J137/00 , C09D143/04 , C08J3/28 , C09J143/04 , C07C69/82 , C07C49/83
CPC分类号： C07C45/63 , B33Y70/00 , C07C45/64 , C07C67/14 , C07C69/76 , C07C69/80 , C07C69/82 , C09D11/101 , C07C49/813 , C07C49/83
摘要： The invention pertains to novel oligofunctional photoinitiators of the formula (1) or (1A). R1 and R2 are methyl or together are —(CH2)5—; and n is 2 or 3, and the solvent in (1A) is water or an organic solvent; and their use in photopolymerizable compositions, in particular inks.
摘要翻译：本发明涉及式（1）或（1A）的新型低官能光引发剂。 R1和R2是甲基或一起是 - （CH2）5-; n为2或3，（1A）中的溶剂为水或有机溶剂; 以及它们在可光聚合组合物中的用途，特别是油墨。

3. 发明申请

US20120142793A1 SILSESQUIOXANE PHOTOINITIATORS 有权
标题翻译： SILSESQUIOXANE照相机
公开(公告)号：US20120142793A1
公开(公告)日：2012-06-07
申请号：US13130796
申请日：2009-11-24
申请人： Markus Frey , Christophe Frossard , Katia Studer , Karin Powell , Jean-Luc Birbaum , Martin Müller
发明人： Markus Frey , Christophe Frossard , Katia Studer , Karin Powell , Jean-Luc Birbaum , Martin Müller
IPC分类号： C08F2/46 , C08G77/38 , C08J9/00 , C09D137/00 , C09D11/10 , C09J137/00 , C08G77/388 , C08F224/00
CPC分类号： C07F7/21 , B33Y70/00
摘要： Photoinitiator compounds comprising both a photoactive moiety and an amine functionality, bonded to a polyhedral oligomeric silsesquioxane, which photoinitiator is represented by formula (1) or (1′) wherein n is 2m; m is an integer of 2 to 30; the sum of n′+a is an integer 4-60; n′ is an even-numbered integer; a is an even- or uneven-numbered integer; and for example different A C1-C12alkyl, or a photoactive moiety Q1, or a group of formula (2); E for example is a direct bond, L is linear or branched C1-C3alkylene, preferably propylene; R1 and R2 for example are a photoactive moiety Q, or C2-20alkyl; Q is for example a group of formula (4); Z2 is for example C1-C6alkylene which is unsubstituted or substituted by one or more OR6; and R6, R12, R13 and R14 for example are hydrogen; are especially suitable as low-migrating photoinitiators.
摘要翻译：光引发剂化合物，其包含与多面体低聚倍半硅氧烷结合的光活性部分和胺官能团，该光引发剂由式（1）或（1'）表示，其中n为2m; m为2〜30的整数， n'+ a的和为4-60的整数; n'是偶数整数; a是偶数或不均匀的整数; 例如不同的A C1-C12烷基或光活性部分Q1或式（2）的基团; E例如是直接键合，L是直链或支链C1-C3亚烷基，优选丙烯; R1和R2例如是光活性部分Q或C2-20烷基; Q例如是式（4）的一组; Z2为例如未被取代或被一个或多个OR 6取代的C 1 -C 6亚烷基; R 6，R 12，R 13和R 14例如为氢; 特别适用于低迁移性光引发剂。

4. 发明授权

US08637585B2 Silsesquioxane photoinitiators 有权
标题翻译：倍半硅氧烷光引发剂
公开(公告)号：US08637585B2
公开(公告)日：2014-01-28
申请号：US13130796
申请日：2009-11-24
申请人： Markus Frey , Christophe Frossard , Katia Studer , Karin Powell , Jean-Luc Birbaum , Martin Müller
发明人： Markus Frey , Christophe Frossard , Katia Studer , Karin Powell , Jean-Luc Birbaum , Martin Müller
IPC分类号： C08F2/50 , C08J3/28 , C08F283/12 , C08F283/00
CPC分类号： C07F7/21 , B33Y70/00
摘要： Photoinitiator compounds comprising both a photoactive moiety and an amine functionality, bonded to a polyhedral oligomeric silsesquioxane, which photoinitiator is represented by formula (1) or (1′) wherein n is 2m; m is an integer of 2 to 30; the sum of n′+a is an integer 4-60; n′ is an even-numbered integer; a is an even- or uneven-numbered integer; and for example different A C1-C12alkyl, or a photoactive moiety Q1, or a group of formula (2); E for example is a direct bond, L is linear or branched C1-C3alkylene, preferably propylene; R1 and R2 for example are a photoactive moiety Q, or C2-20alkyl; Q is for example a group of formula (4); Z2 is for example C1-C6alkylene which is unsubstituted or substituted by one or more OR6; and R6, R12, R13 and R14 for example are hydrogen; are especially suitable as low-migrating photoinitiators.
摘要翻译：光引发剂化合物，其包含与多面体低聚倍半硅氧烷结合的光活性部分和胺官能团，该光引发剂由式（1）或（1'）表示，其中n为2m; m为2〜30的整数， n'+ a的和为4-60的整数; n'是偶数整数; a是偶数或不均匀的整数; 例如不同的A C1-C12烷基或光活性部分Q1或式（2）的基团; E例如是直接键合，L是直链或支链C1-C3亚烷基，优选丙烯; R1和R2例如是光活性部分Q或C2-20烷基; Q例如是式（4）的一组; Z2为例如未被取代或被一个或多个OR 6取代的C 1 -C 6亚烷基; R 6，R 12，R 13和R 14例如为氢; 特别适用于低迁移性光引发剂。

5. 发明授权

US08012672B2 Sulphonium salt photoinitiators 有权
标题翻译：锍盐光引发剂
公开(公告)号：US08012672B2
公开(公告)日：2011-09-06
申请号：US12442823
申请日：2007-09-24
申请人： Pascal Hayoz , Jean-Luc Birbaum , Stephan Ilg
发明人： Pascal Hayoz , Jean-Luc Birbaum , Stephan Ilg
IPC分类号： C07C381/12 , G03F7/004 , G03F7/039 , G03C1/73
CPC分类号： C07C381/12 , B33Y70/00 , B33Y80/00 , C07C2601/14 , C08K5/375 , C09D7/63 , G03F7/0045 , G03F7/038
摘要： Compounds of the formula (I), wherein L1, L2, L3 and L4 independently of one another are hydrogen or an organic substituent; R is for example C1-C20alkyl, C5-C12cycloalkyl, C2-C20alkenyl, substituted C1-C20alkyl; X is O, S, NRa or NCORa; Ra is for example hydrogen or C1-C20alkyl; and Y is an inorganic or organic anion; are suitable as photolatent acid generators.
摘要翻译：式（I）的化合物，其中L1，L2，L3和L4彼此独立地是氢或有机取代基; R是例如C 1 -C 20烷基，C 5 -C 12环烷基，C 2 -C 20烯基，取代的C 1 -C 20烷基; X为O，S，NRa或NCORa; R a是例如氢或C 1 -C 20烷基; Y为无机或有机阴离子; 适合作为光潜酸产生剂。

6. 发明授权

US07901867B2 Sulphonium salt initiators 有权
标题翻译：锍盐引发剂
公开(公告)号：US07901867B2
公开(公告)日：2011-03-08
申请号：US11922444
申请日：2006-06-21
申请人： Jean-Pierre Wolf , Attila Latika , Jean-Luc Birbaum , Stephan Ilg , Pascal Hayoz
发明人： Jean-Pierre Wolf , Attila Latika , Jean-Luc Birbaum , Stephan Ilg , Pascal Hayoz
IPC分类号： G03F7/004 , G03F7/30 , C07C381/12
CPC分类号： C07D209/88 , B33Y70/00 , C07C309/06 , C07C381/12 , G03F7/0045 , G03F7/038 , Y10S430/122
摘要： Compounds of the formula (I), (II), (III), (IV) and wherein, R is hydrogen, C1-C20alkyl; C2-C20alkyl interrupted by one or more O; is -L-X—R2 or -L-R2; R1 has for example one of the meanings as given for R; R2 is a monovalent sensitizer or photoinitiator moiety; Ar1 and Ar2 for example independently of one another are phenyl substituted by C1-C20alkyl, halogen or OR3; or are unsubstituted naphthyl, anthryl, phenanthryl or biphenylyl; or are naphthyl, anthryl, phenanthryl or biphenylyl substituted by C1-C20alkyl, OH or OR3; or are —Ar4-A-Ar3; Ar3 is unsubstituted phenyl naphthyl, anthryl, phenanthryl or biphenylyl; or is phenyl, naphthyl, anthryl, phenanthryl or biphenylyl substituted by C1-C20alkyl, OR3 or benzoyl; Ar4 is phenylene, naphthylene, anthrylene or phenanthrylene; A is a direct bond, S, O or C1-C20alkylene; X is CO, C(O)O, OC(O), O, S or NR3; L is C1-C20alkylene or C2-C20alkylene interrupted by one or more O; R3 is C1-C20alkyl or C1-C20hydroxyalkyl; and Y is an anion, are suitable as photolatent acid generators.
摘要翻译：式（I），（II），（III），（IV）的化合物，其中R是氢，C 1 -C 20烷基; 被一个或多个O中断的C 2 -C 20烷基; 是-L-X-R2或-L-R2; R1具有例如R给出的含义之一; R2是单价敏化剂或光引发剂部分; Ar 1和Ar 2例如彼此独立地是被C 1 -C 20烷基，卤素或OR 3取代的苯基; 或未取代的萘基，蒽基，菲基或联苯基; 或被C 1 -C 20烷基，OH或OR 3取代的萘基，蒽基，菲基或联苯基; 或为-Ar4-A-Ar3; Ar 3是未取代的苯基萘基，蒽基，菲基或联苯基; 或由C 1 -C 20烷基，OR 3或苯甲酰基取代的苯基，萘基，蒽基，菲基或联苯基; Ar4是亚苯基，亚萘基，亚蒽基或菲基; A是直接键合，S，O或C1-C20亚烷基; X是CO，C（O）O，OC（O），O，S或NR 3; L是被一个或多个O中断的C 1 -C 20亚烷基或C 2 -C 20亚烷基; R3是C1-C20烷基或C1-C20羟烷基; 并且Y是阴离子，适合作为光潜酸产生剂。

7. 发明授权

US06512020B1 Oxime derivatives and the use thereof as latent acids 有权
标题翻译：肟衍生物及其作为潜伏酸的用途
公开(公告)号：US06512020B1
公开(公告)日：2003-01-28
申请号：US09820115
申请日：2001-03-28
申请人： Toshikage Asakura , Hitoshi Yamato , Masaki Ohwa , Jean-Luc Birbaum , Kurt Dietliker , Junichi Tanabe
发明人： Toshikage Asakura , Hitoshi Yamato , Masaki Ohwa , Jean-Luc Birbaum , Kurt Dietliker , Junichi Tanabe
IPC分类号： C08J328
CPC分类号： G03F7/0045 , B33Y70/00 , C07C251/62 , C07C309/00 , C07C309/65 , C07C317/32 , C07C323/47 , C07C381/00 , C07C2602/42 , C07D319/18 , C07D333/22
摘要： Compounds of formula I, II and III, wherein wherein R1 is for example hydrogen, C1-C12alkyl, C3-C30cycloalkyl, C2-C12alkenyl, C4-C8cycloalkenyl, phenyl, which is unsubstituted or substituted, naphthyl, anthracyl or phenanthryl, unsubstituted or substituted, heteroaryl radical which is unsubstituted or substituted; wherein all radicals R1 with the exception of hydrogen can additionally be substituted by a group having a —O—C-bond or a —O—Si-bond which cleaves upon the action of an acid; R′1 is for example phenylene, naphthylene, diphenylene or oxydiphenylene, wherein these radicals are unsubstituted or substituted; R2 is halogen or C1-C10haloalkyl; R3 is for example C1-C18alkylsulfonyl, phenylsulfonyl, naphthylsulfonyl, anthracylsulfonyl or phenanthrylsulfonyl, wherein the groups are unsubstituted or substituted, or R3 is e.g. C2-C6haloalkanoyl, or halobenzoyl, R′3 is for example phenylenedisulfonyl, naphthylenedisulfonyl, diphenylenedisulfonyl, or oxydiphenylenedisulfonyl, wherein these radicals are unsubstituted or substituted, X is halogen; are especially suitable as photosensitive acid-donors in chemically amplified resist formulations.
摘要翻译：式I，II和III的化合物，其中R1是例如氢，C1-C12烷基，C3-C30环烷基，C2-C12链烯基，C4-C8环烯基，苯基，未取代或取代的萘基，蒽基或菲基，未取代或取代的，未取代或取代的杂芳基; 其中除氢之外的所有基团R1可以另外被具有在酸作用下切割的-O-C键或-O-Si键的基团取代; R'1是例如亚苯基，亚萘基，亚二苯基或氧联二苯基，其中这些基团是未取代的或被取代的; R2是卤素或C1-C10卤代烷基; R3是例如C1-C18烷基磺酰基，苯基磺酰基，萘基磺酰基，蒽磺酰基或菲基磺酰基，其中基团是未取代的或被取代的，或者R3是例如。 C 2 -C 6卤代烷酰基或卤代苯甲酰基，R'3是例如亚苯基二磺酰基，萘基二磺酰基，二苯基二磺酰基或氧基二苯基二磺酰基，其中这些基团是未取代的或被取代的，X是卤素; 在化学放大抗蚀剂配方中特别适合用作光敏酸供体。

8. 发明授权

US06485886B1 Oxime derivatives and the use thereof as latent acids 失效
标题翻译：肟衍生物及其作为潜伏酸的用途
公开(公告)号：US06485886B1
公开(公告)日：2002-11-26
申请号：US09830248
申请日：2001-04-24
申请人： Hitoshi Yamato , Toshikage Asakura , Jean-Luc Birbaum , Kurt Dietliker
发明人： Hitoshi Yamato , Toshikage Asakura , Jean-Luc Birbaum , Kurt Dietliker
IPC分类号： G03C173
CPC分类号： C07C255/64 , B33Y70/00 , C07D333/36 , Y10S430/114 , Y10S430/117 , Y10S430/12
摘要： New oxime derivatives of formula (I) or. (II), wherein m is 0 or 1; R1 inter alia is phenyl, naphthyl, anthracyl, phenanthryl or a heteroaryl radical; R′1 is for example C2-C12alkylene, phenylene, naphthylene; R2 is CN; R3 is C2-C6haloalkanoyl, halobenzoyl, a phosphoryl or an organosilyl group; R4, R5, R10 and R11 inter alia are hydrogen, C1-C6alkyl, C1-C6alkoxy; R6 inter alia is hydrogen phenyl, C1-C12alkyl; R7 and R8 inter alia are hydrogen, C1-C12alkyl; or R7 and R8, together with the nitrogen atom to which they are bonded, form a 5-, 6 or 7-membered ring; R9 is for example C1-C12alkyl; and A inter alia is S, O, NR7a; are useful as latent acids, especially in photoresist applications.
摘要翻译：式（I）的新肟衍生物或。（II），其中m为0或1; R1特别是苯基，萘基，蒽基，菲基或杂芳基; R'1例如为C 2 -C 12亚烷基，亚苯基，亚萘基; R2为CN; R3是C2-C6卤代烷酰基，卤代苯甲酰基，磷酰基或有机甲硅烷基; R4，R5，R10和R11尤其是氢，C1-C6烷基，C1-C6烷氧基; R6尤其是氢苯基，C1-C12烷基; R 7和R 8尤其是氢，C 1 -C 12烷基; 或R 7和R 8与它们所键合的氮原子一起形成5-，6-或7-元环; R 9为例如C 1 -C 12烷基; A特别是S，O，NR7a; 可用作潜酸，特别是在光致抗蚀剂中。

9. 发明授权

US06187919B1 Stabilized organic material 失效
标题翻译：稳定有机材料
公开(公告)号：US06187919B1
公开(公告)日：2001-02-13
申请号：US08591419
申请日：1996-01-19
申请人： Jean-Luc Birbaum , Jean Rody , Mario Slongo , Andreas Valet , Roland A. E. Winter
发明人： Jean-Luc Birbaum , Jean Rody , Mario Slongo , Andreas Valet , Roland A. E. Winter
IPC分类号： C07D25124
CPC分类号： C07D405/12 , C07D251/24 , C07F9/6521 , C08K5/3435 , C08K5/3492 , C08K5/34926 , C09D7/48
摘要： o-Hydroxyphenyl-s-triazines of the formula I in which n is 1 to 4 and R1 to R7 are as defined in claim 1, can be used, in combination with sterically hindered amines of the polyalkylpiperidine type, for stabilizing organic polymers. Some of these compounds ate novel and can also be used without polyalkylpiperidine.
摘要翻译： n为1至4且R 1至R 7如权利要求1所定义的式Iin的邻羟基苯基-s-三嗪可与聚烷基哌啶类型的空间位阻胺一起用于稳定有机聚合物。这些化合物中的一些具有新颖性，并且也可以不使用聚烷基哌啶来使用。

10. 发明授权

US5753729A Coating compositions stabilized against damage by light, heat, and oxygen 失效
标题翻译：涂料组合物稳定，防止光，热和氧气的损伤
公开(公告)号：US5753729A
公开(公告)日：1998-05-19
申请号：US665041
申请日：1996-06-07
申请人： Andreas Valet , Jean-Luc Birbaum , Gerhard Rytz , Norbert Wurms
发明人： Andreas Valet , Jean-Luc Birbaum , Gerhard Rytz , Norbert Wurms
IPC分类号： C07D239/26 , C07D401/12 , C08K5/3442 , C08K5/3462 , C08K5/3472 , C08K5/3475 , C08K5/3477 , C08K5/3492 , C09D7/12 , C09K3/00 , C08K5/3495
CPC分类号： C07D239/26 , C07D401/12 , C08K5/3462 , C09D7/1241
摘要： Coatings comprising A) a binder based on an organic polymer and B) as stabilizer against damage by light, heat and oxygen, a 2-(2'-hydroxyphenyl)-1,3-pyrimidine of the formula I ##STR1## in which the radicals R.sub.1 to R.sup.6 are as defined in claim 1 have an outstanding resistance to the damaging effects of light, oxygen and heat. Compounds of the formula Ib defined in claim 18 are suitable in general for the stabilization of organic material.
摘要翻译：包含A）基于有机聚合物的粘合剂和B）作为防止光，热和氧损伤的稳定剂的式I（I）的2-（2'-羟基苯基）-1,3-嘧啶，其中基团R 1至R 6如权利要求1中所定义，具有突出的抗光，氧和热的破坏作用的抗性。权利要求18中定义的式Ib化合物通常适用于有机材料的稳定化。

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