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    • 2. 发明授权
    • Method and apparatus for dynamic observation of specimen
    • 试样动态观察方法及装置
    • US5698798A
    • 1997-12-16
    • US411316
    • 1995-03-28
    • Makiko KohnoShigeyuki HosokiTsuyoshi HasegawaYusuke YajimaToshio Katsuyama
    • Makiko KohnoShigeyuki HosokiTsuyoshi HasegawaYusuke YajimaToshio Katsuyama
    • G01D21/00G01N23/00G01N25/00G01N33/00G01Q80/00
    • G01Q60/12B82Y35/00Y10S977/852
    • In a measuring method and a measuring apparatus which are suited for observing a dynamic physical phenomenon particularly in a microdevice, a signal for generating a physical phenomenon in a specimen is inputted to the specimen, and a signal which is caused by this dynamic physical phenomenon is detected by a probe which is close to or in contact with the specimen surface in correspondence with a signal input to the specimen on the basis of the specific time. The measuring apparatus has a scanning probe microscope with a probe (tip) which is close to or in contact with the specimen surface, a pulse voltage application control unit for applying respective pulse voltages to the specimen and probe, and a signal measuring unit for measuring a signal from the specimen detected by the probe. The measuring apparatus causes a dynamic physical phenomenon in the specimen by applying the pulse voltage to the specimen, applies a bias voltage between the probe and specimen by applying the pulse voltage to the probe, and detects the signal caused by the dynamic physical phenomenon in the specimen. Pulse voltage application to the probe is executed by the pulse voltage application control unit in correspondence with pulse voltage application to the specimen on the basis of the specific time. A dynamic physical phenomenon in a microarea of a specimen which is caused by the particle property or wave property of electrons can thus be observed.
    • 在适于观察动态物理现象的测量方法和测量装置中,特别是在微型装置中,用于产生样本中的物理现象的信号被输入到样本,并且由该动态物理现象引起的信号是 通过与基于特定时间输入到样本的信号相对应的与探针接近或接触的探针来检测。 测量装置具有扫描探针显微镜,其具有与试样表面接近或接触的探针(尖端),用于向样本和探针施加相应脉冲电压的脉冲电压施加控制单元,以及用于测量 由探针检测到的样本的信号。 测量装置通过向样本施加脉冲电压来引起样品中的动态物理现象,通过向探针施加脉冲电压在探针和样品之间施加偏置电压,并且检测由于动态物理现象引起的信号 标本。 脉冲电压施加到探针由脉冲电压施加控制单元根据具体时间对标本施加脉冲电压进行。 因此可以观察到由电子的粒子特性或波特性引起的样品的微区域中的动态物理现象。
    • 6. 发明授权
    • Method and apparatus of inspecting foreign matters during mass
production start-up and mass production line in semiconductor
production process
    • 在半导体生产过程中批量生产启动和批量生产线中检查异物的方法和装置
    • US5233191A
    • 1993-08-03
    • US679317
    • 1991-04-02
    • Minori NoguchiYukio KemboHiroshi MoriokaHiroshi YamaguchiMakiko KohnoYoshimasa Ohshima
    • Minori NoguchiYukio KemboHiroshi MoriokaHiroshi YamaguchiMakiko KohnoYoshimasa Ohshima
    • G01N21/94G01N21/956G01Q10/00G01Q30/02G01Q30/04G01Q30/14G01Q60/10G01R31/311H01J37/256H01L21/00H01L21/66
    • H01L21/67253G01R31/311H01J37/256H01L21/67276H01L21/67288H01L22/20B82Y35/00G01N2021/8822G01N21/94G01N21/95623
    • Method and apparatus of detecting, analyzing and evaluating the content of foreign matters such as dusts and impurities contained in various materials, units, processes and environment standing for constituting components of a mass production line during mass production start-up and during mass production, in order to manage a semiconductor production process. A mass production off-line system including an apparatus for detecting, analyzing and evaluating the content of foreign matters during the mass production start-up is separated from the production line and installed independently thereof. Monitors for detection of foreign matters are provided at necessary locations in the production line and monitor data is evaluated through various units to manage the content of foreign matters in the production line, permitting efficient and economical mass production start-up and mass production. The kind of element of a foreign matter on sampling wafer detected in the mass production line is analyzed by means of STM/STS and the results are compared with a data base to effect identification. A foreign matter or a contaminant is detected by detecting a scatttered beam, of a light spot which scans the surface of a substrate. The detection of the scattered beam is carried out under the condition that Rayleigh scattering of the light spot on the light spot irradiation and reflection paths and Rayleigh scattering of the scattered beam on the scattered beam detection path are suppressed to a minimum. For the suppression of Rayleigh scattering, a low-pressure or low-temperature atmosphere may be used.
    • 检测,分析和评估大规模生产启动期间和批量生产期间大规模生产线组成部件的各种材料,单位,工艺和环境中所含的灰尘和杂质等杂质的含量, 为了管理半导体生产过程。 包括用于在批量生产启动期间检测,分析和评估异物含量的装置的批量生产离线系统与生产线分离并独立安装。 在生产线必需的位置提供检测异物的监测器,通过各种单位对监测数据进行评估,对生产线内的异物含量进行管理,实现高效,经济的批量生产启动和批量生产。 通过STM / STS分析在大规模生产线上检测到的采样晶圆上的异物元素的种类,并将结果与​​数据库进行比较以进行识别。 通过检测扫描基板表面的光斑的光斑光束来检测异物或污染物。 在光点照射和反射路径上的光斑的瑞利散射和散射光束检测路径上的散射光束的瑞利散射被抑制到最小的条件下进行散射光束的检测。 为了抑制瑞利散射,可以使用低压或低温气氛。