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1. 发明授权

US08675948B2 Mask inspection apparatus and mask inspection method 有权
标题翻译：面膜检查仪和面膜检查方法
公开(公告)号：US08675948B2
公开(公告)日：2014-03-18
申请号：US13066180
申请日：2011-04-07
申请人： Yoshiaki Ogiso , Tsutomu Murakawa
发明人： Yoshiaki Ogiso , Tsutomu Murakawa
IPC分类号： G06K9/00
CPC分类号： H01J37/28 , G03F1/86 , H01J37/222 , H01J2237/2817
摘要： A mask inspection apparatus includes irradiation means for irradiating a sample with an electron beam, electron detection means for detecting a quantity of electrons generated from the sample having a pattern formed thereon by the irradiation with the electron beam, image processing means for generating image data of the pattern on the basis of the quantity of the electrons, and control means for creating a line profile and a differential profile of the pattern formed on the sample on the basis of the quantity of the electrons detected by the electron detection means. The control means detects a rising edge and a falling edge of the pattern on the basis of the differential profile, and then generates mask data of a multi-level structure on the basis of data of the edges and the image data created by the image processing means.
摘要翻译：掩模检查装置包括用电子束照射样品的照射装置，用于通过用电子束的照射检测从其上形成有图案的样品产生的电子量的电子检测装置，用于产生电子束的图像数据的图像处理装置基于电子量的图案，以及用于根据由电子检测装置检测的电子量产生样品上形成的图案的线轮廓和差分轮廓的控制装置。控制装置根据差分轮廓检测图案的上升沿和下降沿，然后根据边缘数据和由图像处理产生的图像数据生成多级结构的掩码数据手段。

2. 发明授权

US08559697B2 Mask inspection apparatus and image generation method 有权
标题翻译：面膜检查装置及图像生成方法
公开(公告)号：US08559697B2
公开(公告)日：2013-10-15
申请号：US13066274
申请日：2011-04-11
申请人： Tsutomu Murakawa , Yoshiaki Ogiso
发明人： Tsutomu Murakawa , Yoshiaki Ogiso
IPC分类号： G06K9/00
CPC分类号： H01J37/28 , G03F1/74 , H01J2237/221 , H01J2237/2811 , H01J2237/2817
摘要： A mask inspection system includes irradiation means for irradiating a sample with an electron beam, electron detection means for detecting a quantity of electrons generated from the sample, image processing means, storage means, and control means for determining divided areas in such a way that divided images adjacent to each other overlap with each other, and acquiring the divided images of the respective divided areas. The control means extracts two divided images adjacent to each other in a predetermined sequence, then detects an image of a same pattern formation area included in an overlap area, and determines the detected image to be a combination reference image. The control means then combines the two divided images adjacent to each other on the basis of the combination reference image to thereby form an entire SEM image of the observed area.
摘要翻译：掩模检查系统包括用于用电子束照射样品的照射装置，用于检测从样品产生的电子量的电子检测装置，图像处理装置，存储装置和用于确定分割区域的分割区域的控制装置，彼此相邻的图像彼此重叠，并且获取各分割区域的分割图像。控制装置以预定的顺序提取彼此相邻的两个分割图像，然后检测包括在重叠区域中的相同图案形成区域的图像，并将检测到的图像确定为组合参考图像。控制装置然后基于组合参考图像组合彼此相邻的两个分割图像，从而形成观察区域的整个SEM图像。

3. 发明授权

US08071943B2 Mask inspection apparatus and image creation method 失效
标题翻译：面膜检查装置及图像制作方法
公开(公告)号：US08071943B2
公开(公告)日：2011-12-06
申请号：US12653792
申请日：2009-12-21
申请人： Tsutomu Murakawa , Toshimichi Iwai , Jun Matsumoto , Takayuki Nakamura , Yoshiaki Ogiso
发明人： Tsutomu Murakawa , Toshimichi Iwai , Jun Matsumoto , Takayuki Nakamura , Yoshiaki Ogiso
IPC分类号： G01N23/00 , H01J37/28
CPC分类号： G03F1/86
摘要： Provided is a mask inspection apparatus including: emitting unit for emitting electron beams onto a sample; electron detecting unit for detecting the quantity of electrons produced, by the emission of the electron beams, from the sample with patterns formed thereon; image processing unit for generating image data for the patterns on the basis of the electron quantity; and controlling unit for controlling the emitting unit, the electron detecting unit, and the image processing unit. The controlling unit calculates, from the size of a designated observation area of the sample, a division number of divisional images that are synthesized to form a joint image that covers the entire designated observation area. The controlling unit determines divisional areas so that adjacent divisional areas partially overlap each other. The controlling unit acquires SEM images for the respective divisional areas. The controlling unit synthesizes the SEM images of the divisional areas on the basis of coordinate data for the divisional areas and on the basis of edge information for patterns included in the overlapping regions, and thereby creates an SEM image of a wide field of view that covers the observation area.
摘要翻译：提供了一种掩模检查装置，包括：用于向样品发射电子束的发射单元; 电子检测单元，用于通过发射电子束从形成在其上的图案的样品检测产生的电子量; 图像处理单元，用于基于电子量产生用于图案的图像数据; 以及用于控制发光单元，电子检测单元和图像处理单元的控制单元。控制单元根据样本的指定观察区域的大小，计算合成为形成覆盖整个指定观察区域的关节图像的分割图像的分割数。控制单元确定分区，使得相邻的分区彼此部分重叠。控制单元获取各分区的SEM图像。控制单元基于分割区域的坐标数据并基于重叠区域中包含的图案的边缘信息来合成分割区域的SEM图像，从而创建覆盖了宽视场的SEM图像观察区。

4. 发明申请

US20110249885A1 Mask inspection apparatus and image generation method 有权
标题翻译：面膜检查装置及图像生成方法
公开(公告)号：US20110249885A1
公开(公告)日：2011-10-13
申请号：US13066274
申请日：2011-04-11
申请人： Tsutomu Murakawa , Yoshiaki Ogiso
发明人： Tsutomu Murakawa , Yoshiaki Ogiso
IPC分类号： G06K9/00
CPC分类号： H01J37/28 , G03F1/74 , H01J2237/221 , H01J2237/2811 , H01J2237/2817
摘要： A mask inspection system includes irradiation means for irradiating a sample with an electron beam, electron detection means for detecting a quantity of electrons generated from the sample, image processing means, storage means, and control means for calculating the number of divided images, which foam an entire combined image, on the basis of a size of a specified observed area of the sample, determining divided areas in such a way that divided images adjacent to each other overlap with each other, acquiring the divided images of the respective divided areas, and storing the divided images in the storage means, the divided images forming an entire combined image. The control means extracts two divided images adjacent to each other in a predetermined sequence starting from a specified one of the divided images. For each of the two divided images adjacent to each other, the control means then detects an image of a same pattern formation area included in an overlap area, and determines the detected image to be a combination reference image. The control means then combines the two divided images adjacent to each other on the basis of the combination reference image to thereby form an entire SEM image of the observed area.
摘要翻译：掩模检查系统包括用于用电子束照射样品的照射装置，用于检测从样品产生的电子量的电子检测装置，图像处理装置，存储装置和用于计算分割图像数目的控制装置，基于样本的指定观察区域的大小，整个组合图像以彼此相邻的分割图像彼此重叠的方式确定分割区域，获取各分割区域的分割图像，以及将分割的图像存储在存储装置中，分割的图像形成整个组合图像。控制装置以从分割图像中指定的一个开始的预定顺序提取彼此相邻的两个分割图像。对于彼此相邻的两个分割图像中的每一个，控制装置然后检测包括在重叠区域中的相同图案形成区域的图像，并将检测到的图像确定为组合参考图像。控制装置然后基于组合参考图像组合彼此相邻的两个分割图像，从而形成观察区域的整个SEM图像。

5. 发明申请

US20110249108A1 Mask inspection apparatus and mask inspection method 有权
标题翻译：面膜检查仪和面膜检查方法
公开(公告)号：US20110249108A1
公开(公告)日：2011-10-13
申请号：US13066180
申请日：2011-04-07
申请人： Yoshiaki Ogiso , Tsutomu Murakawa
发明人： Yoshiaki Ogiso , Tsutomu Murakawa
IPC分类号： H04N7/18 , G06K9/00
CPC分类号： H01J37/28 , G03F1/86 , H01J37/222 , H01J2237/2817
摘要： A mask inspection apparatus includes irradiation means for irradiating a sample with an electron beam, electron detection means for detecting a quantity of electrons generated from the sample having a pattern formed thereon by the irradiation with the electron beam, image processing means for generating image data of the pattern on the basis of the quantity of the electrons, and control means for creating a line profile and a differential profile of the pattern formed on the sample on the basis of the quantity of the electrons detected by the electron detection means. The control means detects a rising edge and a falling edge of the pattern on the basis of the differential profile, and then generates mask data of a multi-level structure on the basis of data of the edges and the image data created by the image processing means.
摘要翻译：掩模检查装置包括用电子束照射样品的照射装置，用于通过用电子束的照射检测从其上形成有图案的样品产生的电子量的电子检测装置，用于产生电子束的图像数据的图像处理装置基于电子量的图案，以及用于根据由电子检测装置检测的电子量产生样品上形成的图案的线轮廓和差分轮廓的控制装置。控制装置根据差分轮廓检测图案的上升沿和下降沿，然后根据边缘数据和由图像处理产生的图像数据生成多级结构的掩码数据手段。

6. 发明申请

US20100196804A1 Mask inspection apparatus and image creation method 失效
标题翻译：面膜检查装置及图像制作方法
公开(公告)号：US20100196804A1
公开(公告)日：2010-08-05
申请号：US12653792
申请日：2009-12-21
申请人： Tsutomu Murakawa , Toshimichi Iwai , Jun Matsumoto , Takayuki Nakamura , Yoshiaki Ogiso
发明人： Tsutomu Murakawa , Toshimichi Iwai , Jun Matsumoto , Takayuki Nakamura , Yoshiaki Ogiso
IPC分类号： G03F1/00 , G01N23/00
CPC分类号： G03F1/86
摘要： Provided is a mask inspection apparatus including: emitting unit for emitting electron beams onto a sample; electron detecting unit for detecting the quantity of electrons produced, by the emission of the electron beams, from the sample with patterns formed thereon; image processing unit for generating image data for the patterns on the basis of the electron quantity; and controlling unit for controlling the emitting unit, the electron detecting unit, and the image processing unit. The controlling unit calculates, from the size of a designated observation area of the sample, a division number of divisional images that are synthesized to form a joint image that covers the entire designated observation area. The controlling unit determines divisional areas so that adjacent divisional areas partially overlap each other. The controlling unit acquires SEM images for the respective divisional areas. The controlling unit synthesizes the SEM images of the divisional areas on the basis of coordinate data for the divisional areas and on the basis of edge information for patterns included in the overlapping regions, and thereby creates an SEM image of a wide field of view that covers the observation area.
摘要翻译：提供了一种掩模检查装置，包括：用于向样品发射电子束的发射单元; 电子检测单元，用于通过发射电子束从形成在其上的图案的样品检测产生的电子量; 图像处理单元，用于基于电子量产生用于图案的图像数据; 以及用于控制发光单元，电子检测单元和图像处理单元的控制单元。控制单元根据样本的指定观察区域的大小，计算合成为形成覆盖整个指定观察区域的关节图像的分割图像的分割数。控制单元确定分区，使得相邻的分区彼此部分重叠。控制单元获取各分区的SEM图像。控制单元基于分割区域的坐标数据并基于重叠区域中包含的图案的边缘信息来合成分割区域的SEM图像，从而创建覆盖了宽视场的SEM图像观察区。

7. 发明申请

US20120112066A1 Defect review apparatus and defect review method 有权
标题翻译：缺陷审查设备和缺陷审查方法
公开(公告)号：US20120112066A1
公开(公告)日：2012-05-10
申请号：US13317317
申请日：2011-10-14
申请人： Yoshiaki Ogiso , Isao Yonekura
发明人： Yoshiaki Ogiso , Isao Yonekura
IPC分类号： H01J37/28
CPC分类号： G06T7/001 , H01J2237/221 , H01J2237/24495 , H01J2237/2817 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： A defect review apparatus includes: an electron scanning part which irradiates and scans an electron beam over an observation region on a surface of a sample; four electron detectors arranged around the optical axis of the electron beam with 90° intervals; and a signal processing unit which generates multiple pieces of image data of the observation region on the basis of detection signals from the electron detectors, the multiple pieces of image data respectively taken in different directions. When a pattern in the observation region is a line-and-space pattern, the defect inspection unit performs defect detection on the basis of a subtract between two pieces of the image data respectively taken in two predetermined directions with the optical axis of the electron beam in between.
摘要翻译：缺陷检查装置包括：电子扫描部，其在样品的表面上的观察区域上照射并扫描电子束; 四个电子检测器以90°的间隔围绕电子束的光轴布置; 以及信号处理单元，其基于来自电子检测器的检测信号，分别沿不同方向分别拍摄的多个图像数据生成观察区域的多个图像数据。当观察区域中的图案是线空间图案时，缺陷检查单元基于在两个预定方向上分别与电子束的光轴分别拍摄的两个图像数据之间的减法来执行缺陷检测之间。

8. 发明申请

US20110049362A1 Pattern measuring apparatus and pattern measuring method 有权
标题翻译：图案测量装置和图案测量方法
公开(公告)号：US20110049362A1
公开(公告)日：2011-03-03
申请号：US12807615
申请日：2010-09-09
申请人： Jun Matsumoto , Yoshiaki Ogiso
发明人： Jun Matsumoto , Yoshiaki Ogiso
IPC分类号： H01J37/22
CPC分类号： H01J37/222 , G03F1/84 , G03F1/86 , H01J37/244 , H01J37/28 , H01J2237/24578 , H01J2237/24592 , H01J2237/2816 , H01J2237/2817
摘要： A pattern measuring apparatus includes: an electron irradiating unit for radiating an electron beam onto a sample while scanning; an image data acquiring unit for acquiring an image of a pattern on the basis of an amount of electrons generated from the sample where the pattern is formed, by the radiation of the electron beam; a measurement region setting unit for setting paired measurement regions each including a pattern edge in the image of the pattern; and a controlling unit for calculating a distance between pattern edges in the paired measurement regions by detecting a shape of the pattern edge in each measurement region, respectively. The control unit calculates edge characteristic curves by finding moving averages of edge profiles by use of predetermined moving average widths, respectively, each edge profile representing the pattern edge in one of the measurement regions with position coordinates of each of measurement points arranged at predetermined intervals, and defines the positions of peak values of the edge characteristic curves as edge positions of the patterns in the measurement regions.
摘要翻译：图案测量装置包括：电子照射单元，用于在扫描时将电子束辐射到样品上; 图像数据获取单元，用于通过电子束的辐射获取基于从形成有图案的样品产生的电子的量的图案的图像; 测量区域设置单元，用于设置在图案的图像中包括图案边缘的成对测量区域; 以及控制单元，用于通过分别检测每个测量区域中的图案边缘的形状来计算成对的测量区域中的图案边缘之间的距离。控制单元分别通过使用预定的移动平均宽度来找出边缘轮廓的移动平均值来计算边缘特性曲线，每个边缘轮廓表示在测量区域之一中的图案边缘，其中每个测量点的位置坐标以预定间隔排列，并且将边缘特性曲线的峰值的位置定义为测量区域中的图案的边缘位置。

9. 发明授权

US08809778B2 Pattern inspection apparatus and method 有权
标题翻译：图案检验装置及方法
公开(公告)号：US08809778B2
公开(公告)日：2014-08-19
申请号：US13616596
申请日：2012-09-14
申请人： Ryuichi Ogino , Soichi Shida , Yoshiaki Ogiso
发明人： Ryuichi Ogino , Soichi Shida , Yoshiaki Ogiso
IPC分类号： H01J37/28
CPC分类号： H01J37/28 , H01J37/222 , H01J2237/24578 , H01J2237/2826
摘要： A pattern inspection apparatus configured to perform pattern inspection based on a SEM image previously measures distortion amount data representing a magnitude distribution of positional displacement caused by distortion of the SEM image in a scanning direction. When the pattern inspection is performed, the apparatus makes design data and the SEM image correspond to each other by adjusting at least one of the design data and the SEM image on the basis of the distortion amount data, and places a measurement region on the SEM image on the basis of a correspondence between the design data and the SEM image. The apparatus may further find a matching rate between a pattern of the design data and a pattern of the SEM image.
摘要翻译：配置为基于SEM图像执行图案检查的图案检查装置预先测量表示由扫描方向上的SEM图像的变形引起的位移的幅度分布的失真量数据。当进行图案检查时，通过基于失真量数据调整设计数据和SEM图像中的至少一个，使设备数据和SEM图像彼此对应，并将测量区域放置在SEM 基于设计数据和SEM图像之间的对应关系图像。该装置还可以找到设计数据的图案和SEM图像的图案之间的匹配率。

10. 发明授权

US08779359B2 Defect review apparatus and defect review method 有权
标题翻译：缺陷审查设备和缺陷审查方法
公开(公告)号：US08779359B2
公开(公告)日：2014-07-15
申请号：US13317317
申请日：2011-10-14
申请人： Yoshiaki Ogiso , Isao Yonekura
发明人： Yoshiaki Ogiso , Isao Yonekura
IPC分类号： G01N23/225 , H01J37/28 , H01J37/26 , H01J37/24 , G06T7/00 , H01L21/66
CPC分类号： G06T7/001 , H01J2237/221 , H01J2237/24495 , H01J2237/2817 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： A defect review apparatus includes: an electron scanning part which irradiates and scans an electron beam over an observation region on a surface of a sample; four electron detectors arranged around the optical axis of the electron beam with 90° intervals; and a signal processing unit which generates multiple pieces of image data of the observation region on the basis of detection signals from the electron detectors, the multiple pieces of image data respectively taken in different directions. When a pattern in the observation region is a line-and-space pattern, the defect inspection unit performs defect detection on the basis of a subtract between two pieces of the image data respectively taken in two predetermined directions with the optical axis of the electron beam in between.
摘要翻译：缺陷检查装置包括：电子扫描部，其在样品的表面上的观察区域上照射并扫描电子束; 四个电子检测器以90°的间隔围绕电子束的光轴布置; 以及信号处理单元，其基于来自电子检测器的检测信号，分别沿不同方向分别拍摄的多个图像数据生成观察区域的多个图像数据。当观察区域中的图案是线空间图案时，缺陷检查单元基于在两个预定方向上分别与电子束的光轴分别拍摄的两个图像数据之间的减法来执行缺陷检测之间。

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