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1. 发明授权

US5101054A Novel fluorine-containing platinum complex 失效
标题翻译：新型富含荧光素的铂复合物
公开(公告)号：US5101054A
公开(公告)日：1992-03-31
申请号：US613888
申请日：1990-12-04
申请人： Tsuneo Yamashita , Hiroyuki Iwai , Kazuhiro Shimokawa
发明人： Tsuneo Yamashita , Hiroyuki Iwai , Kazuhiro Shimokawa
IPC分类号： C07F15/00
CPC分类号： C07F15/0093
摘要： A fluorine-containing platinum complex having anti-tumor activity of the formula: ##STR1## wherein R.sub.1 is a fluorine atom or a trifluoromethyl group,R.sub.2 is a fluorine atom, a hydrogen atom or a lower alkyl group,X is a halogen atom, a group of the formula: --NO.sub.2, or two Xs combined to form a group of the formulae: ##STR2## Y is a hydroxyl group or a halogen atom, and n is 0 or 1,and an anti-tumor composition comprising the same as an active ingredient.

2. 发明授权

US4876245A Fluorine-containing macrolide compounds and their use 失效
标题翻译：含氟大环内酯类化合物及其用途
公开(公告)号：US4876245A
公开(公告)日：1989-10-24
申请号：US136125
申请日：1987-12-21
申请人： Yorisato Hisanaga , Kazuhiro Shimokawa , Toshihiko Kawano , Yasunori Suita , Tsuneo Yamashita
发明人： Yorisato Hisanaga , Kazuhiro Shimokawa , Toshihiko Kawano , Yasunori Suita , Tsuneo Yamashita
IPC分类号： C07H17/08
CPC分类号： C07H17/08
摘要： A fluorine-containing macrolide compound of the formula: ##STR1## wherein R.sup.1 is hydroxy or --OR (wherein R is C.sub.1 -C.sub.5 alkyl),R.sup.2 is hydrogen or hydroxy, orR.sup.1 and R.sup.2 together form a cyclic residue of the formula: ##STR2## (wherein R' and R" are independently hydrogen or C.sub.1 -C.sub.5 alkyl), ##STR3## when R.sup.4 is hydrogen or C.sub.1 -C.sub.5 alkyl, or R.sup.3 is ##STR4## when R.sup.4 is ##STR5## (wherein Ph is phenyl), R.sup.5 is hydrogen or C.sub.1 -C.sub.5 alkyl, andR.sup.6 is hydrogen or methyland an antimicrobial agent containing the fluorine-containing macrolide compound (I) as an effective component.

3. 发明授权

US08614361B2 Process for preparation of 2,3,3,3-tetrafluoropropene 有权
标题翻译：制备2,3,3,3-四氟丙烯的方法
公开(公告)号：US08614361B2
公开(公告)日：2013-12-24
申请号：US13265396
申请日：2010-04-22
申请人： Atsushi Suzuki , Masatoshi Nose , Tsuneo Yamashita
发明人： Atsushi Suzuki , Masatoshi Nose , Tsuneo Yamashita
IPC分类号： C07C17/00
CPC分类号： C07C17/206 , C07C17/383 , C07C21/18 , C07C19/08
摘要： The present invention provides an effective, selective, and industrially applicable process for producing 2,3,3,3-tetrafluoropropene. Specifically, the present invention provides a process for producing 2,3,3,3-tetrafluoropropene including reacting 2-chloro-3,3,3-trifluoropropene with hydrogen fluoride in the presence of oxygen and a catalyst comprising chromium oxide represented by the composition formula: CrOm (1.5
摘要翻译：本发明提供了一种生产2,3,3,3-四氟丙烯的有效，选择性和工业上适用的方法。具体地说，本发明提供一种生产2,3,3,3-四氟丙烯的方法，包括在氧气存在下使2-氯-3,3,3-三氟丙烯与氟化氢反应，和由组合物式：CrOm（1.5

4. 发明申请

US20100297564A1 POLYMERIZABLE FLUORINE-CONTAINING MONOMER, FLUORINE-CONTAINING POLYMER AND METHOD OF FORMING RESIST PATTERN 审中-公开
标题翻译：含氟聚合物单体，含氟聚合物及形成电阻图案的方法
公开(公告)号：US20100297564A1
公开(公告)日：2010-11-25
申请号：US12810076
申请日：2008-12-22
申请人： Tsuneo Yamashita , Yosuke Kishikawa , Yoshito Tanaka , Masamichi Morita
发明人： Tsuneo Yamashita , Yosuke Kishikawa , Yoshito Tanaka , Masamichi Morita
IPC分类号： G03F7/20 , C07C69/65 , C08F120/22
CPC分类号： G03F7/0397 , C08F220/22 , G03F7/0046 , G03F7/11 , G03F7/2041
摘要： A polymerizable fluorine-containing monomer and a fluorine-containing polymer which are suitable for a resist layer and a protective layer of a laminated resist for forming a fine pattern in production of semiconductor devices, and further are useful especially in immersion lithography using water as a liquid medium, and a method of forming a resist pattern are provided. The polymerizable fluorine-containing monomer is represented by the formula (1): wherein R1 is hydrogen atom or a monovalent saturated or unsaturated hydrocarbon group of 1 to 15 carbon atoms, and the hydrocarbon group may be chain or cyclic structure and may have oxygen atom, nitrogen atom, sulfur atom or halogen atom, the polymer is a homopolymer or copolymer of the monomer, and the method of forming a resist pattern using such a homopolymer or copolymer is carried out by immersion lithography.
摘要翻译：一种可聚合的含氟单体和含氟聚合物，其适用于半导体器件生产中用于形成精细图案的抗蚀剂层和层压抗蚀剂的保护层，并且还特别适用于使用水作为液体介质和形成抗蚀剂图案的方法。可聚合的含氟单体由式（1）表示：其中R1是氢原子或1〜15个碳原子的一价饱和或不饱和烃基，烃基可以是链或环状结构，并且可以具有氧原子，氮原子，硫原子或卤素原子，该聚合物是单体的均聚物或共聚物，使用这种均聚物或共聚物形成抗蚀剂图案的方法通过浸渍光刻法进行。

5. 发明申请

US20050181304A1 Method of forming fine pattern 审中-公开
标题翻译：形成精细图案的方法
公开(公告)号：US20050181304A1
公开(公告)日：2005-08-18
申请号：US11057832
申请日：2005-02-15
申请人： Takayuki Araki , Tsuneo Yamashita , Takuji Ishikawa , Tomohiro Yoshida , Takuya Hagiwara , Takamitsu Furukawa
发明人： Takayuki Araki , Tsuneo Yamashita , Takuji Ishikawa , Tomohiro Yoshida , Takuya Hagiwara , Takamitsu Furukawa
IPC分类号： C08F214/18 , C08F232/08 , G03C1/492 , G03F7/004 , G03F7/033 , G03F7/039 , H01L21/027
CPC分类号： G03F7/0046 , G03F7/0395 , G03F7/0397
摘要： There is provided a method of forming a fine pattern by using a highly practicable fluorine-containing polymer which has a high transparency to exposure light having a short wavelength such as F2 laser and can improve dry etching resistance without remarkably lowering transparency. The method comprises (I) a step for preparing a resist composition comprising (a) a fluorine-containing polymer having protective group, (b) a photoacid generator and (c) a solvent; (II) a step for forming a resist film comprising the above-mentioned resist composition on a substrate or on a given layer on the substrate; (III) a step for exposing by selectively irradiating given areas of the resist film with energy ray, and (IV) a step for subjecting the exposed resist film to developing treatment and selectively removing the exposed portions of the resist film to form a fine pattern, in which the fluorine-containing polymer (a) having protective group is a fluorine-containing polymer comprising a structural unit (M2-1A) derived from a norbornene derivative having OH group and a structural unit (M2-1B) derived from a norbornene derivative having a saturated hydrocarbon group containing bicyclo saturated hydrocarbon structure as a protective group.
摘要翻译：提供了一种通过使用对具有短波长的诸如F 2激光的曝光光具有高透明度的高度实用的含氟聚合物形成精细图案的方法，并且可以提高无干蚀刻电阻，而无需显着降低透明度。该方法包括（I）制备抗蚀剂组合物的步骤，其包含（a）具有保护基的含氟聚合物，（b）光致酸产生剂和（c）溶剂; （II）在衬底上或衬底上的给定层上形成包含上述抗蚀剂组合物的抗蚀剂膜的步骤; （III）通过用能量射线选择性地照射抗蚀剂膜的给定区域进行曝光的步骤，以及（IV）对曝光的抗蚀剂膜进行显影处理并选择性地除去抗蚀剂膜的曝光部分以形成精细图案的步骤其中，具有保护基的含氟聚合物（a）为含有衍生自具有OH基的降冰片烯衍生物的结构单元（M2-1A）和来自降冰片烯的结构单元（M2-1B）的含氟聚合物具有含有双环饱和烃结构的饱和烃基作为保护基的衍生物。

6. 发明申请

US20120302803A1 PROCESS FOR PRODUCING 2-CHLORO-3,3,3-TRIFLUOROPROPENE 审中-公开
标题翻译：生产2-氯-3,3,3-三氟丙烯的方法
公开(公告)号：US20120302803A1
公开(公告)日：2012-11-29
申请号：US13575702
申请日：2011-02-17
申请人： Tsuneo Yamashita , Masatoshi Nose , Kenichi Katsukawa
发明人： Tsuneo Yamashita , Masatoshi Nose , Kenichi Katsukawa
IPC分类号： C07C17/25
CPC分类号： C07C17/25 , C07C21/18
摘要： The present invention provides a process for producing 2-chloro-3,3,3-trifluoropropene represented by the chemical formula: CF3CCl═CH2, comprising mixing a fluorine-containing alkane, in a liquid state, represented by the formula: CF3CH—ClCH2X, wherein X is halogen, with an aqueous solution containing at least one metal hydroxide selected from the group consisting of alkali metal hydroxides and alkali earth metal hydroxides in the presence of a catalyst to perform a dehydrohalogenation reaction of the fluorine-containing alkane. According to the present invention, 2-chloro-3,3,3-trifluoropropene (HCFO-1233xf) can be obtained at a very high yield at a relatively low reaction temperature.
摘要翻译：本发明提供一种由化学式CF 3 CCl = CH 2表示的2-氯-3,3,3-三氟丙烯的制备方法，该方法包括以液态混合由CF 3 CH-ClCH 2 X表示的含氟烷烃其中X是卤素，在催化剂存在下含有选自碱金属氢氧化物和碱土金属氢氧化物的至少一种金属氢氧化物的水溶液进行含氟烷烃的脱卤化氢反应。根据本发明，可以在相对较低的反应温度下以非常高的产率获得2-氯-3,3,3-三氟丙烯（HCFO-1233xf）。

7. 发明申请

US20120065436A1 PROCESS FOR PREPARING FLUORINE-CONTAINING PROPANE 审中-公开
标题翻译：制备含氟丙烯的方法
公开(公告)号：US20120065436A1
公开(公告)日：2012-03-15
申请号：US13319588
申请日：2010-05-11
申请人： Daisuke Karube , Tsuneo Yamashita , Akinarri Sugiyama , Takashi Shibanuma
发明人： Daisuke Karube , Tsuneo Yamashita , Akinarri Sugiyama , Takashi Shibanuma
IPC分类号： C07C17/281
CPC分类号： C07C17/278 , C07C19/08 , C07C19/10
摘要： The present invention provides a process for preparing a fluorine-containing propane represented by the formula: CF2XCF2CH3 wherein X is F or Cl, the process including reacting tetrafluoroethylene and methyl chloride in the presence of an antimony halide represented by the formula: SbFxC5-x wherein x is a value of 0 to 5. According to the present invention, the fluorine-containing propane represented by the formula: CF2XCF2CH3 wherein X is F or Cl, which is useful as a starting material of 2,3,3,3-tetrafluoropropene (1234yf), can be obtained by a simple process, using relatively inexpensive starting materials.
摘要翻译：本发明提供一种由式CF 2 XCF 2 CH 3表示的含氟丙烷的制备方法，其中X为F或Cl，该方法包括在由式：SbF x C 5-x表示的锑卤化物存在下使四氟乙烯与氯甲烷反应，其中 x是0〜5的数值。根据本发明，由式CF2XCF2CH3表示的含氟丙烷，其中X为F或Cl，可用作2,3,3,3-四氟丙烯的原料（1234yf），可以通过简单的方法获得，使用相对便宜的起始原料。

8. 发明申请

US20120065434A1 PROCESS FOR PREPARING CHLORINE-CONTAINING FLUOROCARBON COMPOUND 有权
标题翻译：制备含氯化物氟化合物的方法
公开(公告)号：US20120065434A1
公开(公告)日：2012-03-15
申请号：US13319564
申请日：2010-05-12
申请人： Masatoshi Nose , Tsuneo Yamashita , Atsushi Suzuki
发明人： Masatoshi Nose , Tsuneo Yamashita , Atsushi Suzuki
IPC分类号： C07C17/20
CPC分类号： C07C17/35 , C07C17/206 , Y02P20/582 , C07C19/10 , C07C21/04 , C07C21/18
摘要： The present invention provides a process for preparing at least one chlorine-containing fluorocarbon compound selected from the group consisting of chlorine-containing fluoropropane compounds represented by Formula (1): CFnCl3-nCHClCH2—Cl, wherein n is 1 or 2, and chlorine-containing fluoropropene compounds represented by Formula (2): CFnCl3-nCCl═CH2, wherein n is 1 or 2, wherein the process includes the step of contacting at least one chlorine-containing compound selected from the group consisting of 1,1,1,2,3-pentachloropropane, 1,1,2,3-tetrachloropropene, and 2,3,3,3-tetrachloropropene with hydrogen fluoride in the absence of a catalyst while heating. According to the present invention, the chlorine-containing propane and propene compounds having 1 or 2 fluorine atoms can be prepared by an industrially applicable, simple and effective process.
摘要翻译：本发明提供一种制备选自由式（1）表示的含氯氟代丙烷化合物中的至少一种含氯碳氟化合物的方法：其中n为1或2的CF nCl 3 -NCHClCH 2 Cl，和氯 - （2）表示的氟代丙烯化合物：CF nCl 3 -nCCl = CH 2，其中n为1或2，其中所述方法包括使至少一种选自1,1,1， 2,3,5-三氯丙烷，1,1,2,3-四氯丙烯和2,3,3,3-四氯丙烯与氟化氢在不存在催化剂的同时加热。根据本发明，具有1或2个氟原子的含氯丙烷和丙烯化合物可以通过工业上可应用的简单有效的方法制备。

9. 发明申请

US20120022303A1 PROCESS FOR PREPARING 2-CHLORO-3,3,3-TRIFLUOROPROPENE 有权
标题翻译：制备2-氯-3,3,3-三氟苯酚的方法
公开(公告)号：US20120022303A1
公开(公告)日：2012-01-26
申请号：US13259828
申请日：2010-04-21
申请人： Masatoshi Nose , Atsushi Suzuki , Tsuneo Yamashita , Kenichi Katsukawa
发明人： Masatoshi Nose , Atsushi Suzuki , Tsuneo Yamashita , Kenichi Katsukawa
IPC分类号： C07C17/25 , C07C17/23 , C07C17/20
CPC分类号： C07C21/18 , C07C17/206 , C07C17/25 , Y02P20/582
摘要： The present invention provides a process for preparing 2-chloro-3,3,3-trifluoropropene including subjecting, in the absence of a catalyst, at least one chlorine-containing compound selected from the group consisting of chloropropane represented by formula (1): CClX2CHClCH2Cl, wherein each X is the same or different and each represents Cl or F, chloropropene represented by formula (2): CClY2CCl═CH2, wherein each Y is the same or different and each represents Cl or F, and chloropropene represented by formula (3): CZ2═CClCH2Cl, wherein each Z is the same or different and each represents Cl or F, to a reaction with hydrogen fluoride under heating in a gas phase. According to the present invention, 2-chloro-3,3,3-trifluoropropene (HCFC-1233xf) can be effectively prepared by an easy and economically advantageous process that is suitable for industrial scale production.
摘要翻译：本发明提供一种制备2-氯-3,3,3-三氟丙烯的方法，包括在不存在催化剂的情况下，使用至少一种选自由式（1）表示的氯代丙烷的含氯化合物： CClX 2 CHClCH 2 Cl，其中每个X相同或不同，并且各自表示Cl或F，由式（2）表示的氯丙烯：CClY 2 CCl = CH 2，其中每个Y相同或不同，各自表示Cl或F，和由式 3）：CZ2 = CClCH2Cl，其中每个Z相同或不同，并且各自表示Cl或F，以在气相中加热时与氟化氢反应。根据本发明，2-氯-3,3,3-三氟丙烯（HCFC-1233xf）可以通过适用于工业规模生产的容易且经济上有利的方法有效地制备。

10. 发明授权

US08779219B2 Process for preparing chlorine-containing fluorocarbon compound 有权
标题翻译：制备含氯氟碳化合物的方法
公开(公告)号：US08779219B2
公开(公告)日：2014-07-15
申请号：US13319564
申请日：2010-05-12
申请人： Masatoshi Nose , Tsuneo Yamashita , Atsushi Suzuki
发明人： Masatoshi Nose , Tsuneo Yamashita , Atsushi Suzuki
IPC分类号： C07C17/087
CPC分类号： C07C17/35 , C07C17/206 , Y02P20/582 , C07C19/10 , C07C21/04 , C07C21/18
摘要： The present invention provides a process for preparing at least one chlorine-containing fluorocarbon compound selected from the group consisting of chlorine-containing fluoropropane compounds represented by Formula (1): CFnCl3-nCHClCH2—Cl, wherein n is 1 or 2, and chlorine-containing fluoropropene compounds represented by Formula (2): CFnCl3-nCCl═CH2, wherein n is 1 or 2, wherein the process includes the step of contacting at least one chlorine-containing compound selected from the group consisting of 1,1,1,2,3-pentachloropropane, 1,1,2,3-tetrachloropropene, and 2,3,3,3-tetrachloropropene with hydrogen fluoride in the absence of a catalyst while heating. According to the present invention, the chlorine-containing propane and propene compounds having 1 or 2 fluorine atoms can be prepared by an industrially applicable, simple and effective process.
摘要翻译：本发明提供一种制备选自由式（1）表示的含氯氟代丙烷化合物中的至少一种含氯碳氟化合物的方法：其中n为1或2的CF nCl 3 -NCHClCH 2 Cl，和氯 - （2）表示的氟代丙烯化合物：CF nCl 3 -nCCl = CH 2，其中n为1或2，其中所述方法包括使至少一种选自1,1,1， 2,3,5-三氯丙烷，1,1,2,3-四氯丙烯和2,3,3,3-四氯丙烯与氟化氢在不存在催化剂的同时加热。根据本发明，具有1或2个氟原子的含氯丙烷和丙烯化合物可以通过工业上可应用的简单有效的方法制备。

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