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1. 发明授权

US08426329B2 Duplex eutectic silicon alloy, manufacturing method thereof, and manufacturing method of sintered compact using silicon alloy powder 失效
标题翻译：双相共晶硅合金及其制造方法以及使用硅合金粉末的烧结体的制造方法
公开(公告)号：US08426329B2
公开(公告)日：2013-04-23
申请号：US12917820
申请日：2010-11-02
申请人： Toshiyuki Watanabe , Masafumi Matsushita , Toshitaka Sakurai , Kazuya Sato , Yoko Matsushita , Takayoshi Misaki , Setsuko Shindo , Ayumi Shindo , Yumiko Kubota , Akiko Matsushita , Kunio Saito , Takumi Shitara , Futoshi Yanagino , Takashi Yoshida , Takashi Mizushima , Osamu Matsuzono , Kazuaki Sato , Kouki Shimizu
发明人： Toshiyuki Watanabe , Masafumi Matsushita , Toshitaka Sakurai , Kazuya Sato , Yoko Matsushita , Takayoshi Misaki , Setsuko Shindo , Ayumi Shindo , Yumiko Kubota , Akiko Matsushita , Kunio Saito , Takumi Shitara , Futoshi Yanagino , Takashi Yoshida , Takashi Mizushima , Osamu Matsuzono , Kazuaki Sato , Kouki Shimizu
IPC分类号： C04B35/599
CPC分类号： C04B35/597 , C04B35/6263 , C04B35/62655 , C04B35/6316 , C04B2235/3418 , C04B2235/421 , C04B2235/5445 , C04B2235/606 , C04B2235/658 , C04B2235/76 , C04B2235/767 , C04B2235/81 , C04B2235/9623
摘要： A duplex eutectic silicon alloy including 30-70 weight % silicon, 10-45 weight % nitrogen, 1-40 weight % aluminum, and 1-40 weight % oxygen has a eutectic structure comprising a β′-sialon phase and an ο′-sialon phase. The alloy is produced by controlling cooling at a rate of 50° C. or less per minute in combustion synthesis. A ductile sintered product capable of replacing steel in various applications can be produced by placing a compact composed of a powder of the alloy in a sintering furnace which can supply a heat quantity at least ten times the heat capacity of the compact; and sintering the compact at a pressure at least as great as atmospheric pressure, within a nitrogen atmosphere in which the silicon gas mole fraction is 10% or more, and at a temperature within the range from 1400° C. to 1700° C.
摘要翻译：包含30-70重量％硅，10-45重量％氮，1-40重量％铝和1-40重量％氧气的双相共晶硅合金具有包含β'-赛隆相和二甲基亚砜的共晶结构，赛隆相通过在燃烧合成中以每分钟50℃或更低的速率控制冷却来生产合金。能够在各种应用中替代钢的延性烧结体可以通过将由合金粉末组成的压块放置在烧结炉中来制造，所述烧结炉能够提供至少十倍于压坯的热容量的热量; 在至少与大气压相同的压力下，在硅气体摩尔分数为10％以上的氮气气氛中，在1400℃〜1700℃的温度范围内烧结成形体。

2. 发明申请

US20080159905A1 Silicon alloy, alloy powder thereof, manufacturing apparatus, manufacturing process and sintered alloy thereof 审中-公开
标题翻译：硅合金，其合金粉末，制造装置，制造工艺及其烧结合金
公开(公告)号：US20080159905A1
公开(公告)日：2008-07-03
申请号：US11788243
申请日：2007-04-19
申请人： Toshiyuki Watanabe , Masafumi Matsushita , Toshitaka Sakurai , Kazuya Sato , Yoko Matsushita
发明人： Toshiyuki Watanabe , Masafumi Matsushita , Toshitaka Sakurai , Kazuya Sato , Yoko Matsushita
IPC分类号： C22C30/00 , B22F1/00 , C21D11/00
CPC分类号： C22C30/00 , B22F3/23 , C21D11/00
摘要： A controlled combustion synthesis apparatus comprises an ignition system, a pressure sensor for detecting internal pressure, a nitrogen supply, a gas pressure control valve for feeding nitrogen and exhausting reaction gas, means for detecting the internal temperature of the reaction container, a water cooled jacket, and a cooling plate. A temperature control system controls the temperature of the reaction container by controlling the flow of cooling water supplied to the jacket and the cooling plate in response to the detected temperature. By combustion synthesizing, while controlling the internal pressure and temperature, the apparatus can synthesize a silicon alloy including 30-70 wt. % silicon, 10-45 wt. % nitrogen, 1-40 wt. % aluminum, and 1-40 wt % oxygen.
摘要翻译：控制燃烧合成装置包括点火系统，用于检测内部压力的压力传感器，氮气供应，用于输入氮气和排出反应气体的气体压力控制阀，用于检测反应容器的内部温度的装置，水冷套管，和冷却板。温度控制系统通过响应于检测到的温度控制供给到护套和冷却板的冷却水的流量来控制反应容器的温度。通过燃烧合成，在控制内部压力和温度的同时，该装置可以合成包含30-70wt。％硅，10-45wt。％氮，1-40重量％％铝和1-40重量％的氧。

3. 发明授权

US08273291B2 Silicon alloy, alloy powder thereof, manufacturing apparatus, manufacturing process and sintered alloy thereof 失效
标题翻译：硅合金，其合金粉末，制造装置，制造工艺及其烧结合金
公开(公告)号：US08273291B2
公开(公告)日：2012-09-25
申请号：US12407300
申请日：2009-03-19
申请人： Toshiyuki Watanabe , Masafumi Matsushita , Toshitaka Sakurai , Kazuya Sato , Yoko Matsushita
发明人： Toshiyuki Watanabe , Masafumi Matsushita , Toshitaka Sakurai , Kazuya Sato , Yoko Matsushita
IPC分类号： B22F1/00
CPC分类号： C22C30/00 , B22F3/23 , C21D11/00
摘要： A controlled combustion synthesis apparatus comprises an ignition system, a pressure sensor for detecting internal pressure, a nitrogen supply, a gas pressure control valve for feeding nitrogen and exhausting reaction gas, means for detecting the internal temperature of the reaction container, a water cooled jacket, and a cooling plate. A temperature control system controls the temperature of the reaction container by controlling the flow of cooling water supplied to the jacket and the cooling plate in response to the detected temperature. By combustion synthesizing, while controlling the internal pressure and temperature, the apparatus can synthesize a silicon alloy including 30-70 wt. % silicon, 10-45 wt. % nitrogen, 1-40 wt. % aluminum, and 1-40 wt % oxygen.
摘要翻译：控制燃烧合成装置包括点火系统，用于检测内部压力的压力传感器，氮气供应，用于输入氮气和排出反应气体的气体压力控制阀，用于检测反应容器的内部温度的装置，水冷套管，和冷却板。温度控制系统通过响应于检测到的温度控制供给到护套和冷却板的冷却水的流量来控制反应容器的温度。通过燃烧合成，在控制内部压力和温度的同时，该装置可以合成包含30-70wt。％硅，10-45wt。％氮，1-40重量％％铝和1-40重量％的氧。

4. 发明申请

US20090185947A1 SILICON ALLOY, ALLOY POWDER THEREOF, MANUFACTURING APPARATUS, MANUFACTURING PROCESS AND SINTERED ALLOY THEREOF 失效
标题翻译：硅合金，其合金粉末，制造设备，制造工艺及其烧结合金
公开(公告)号：US20090185947A1
公开(公告)日：2009-07-23
申请号：US12407300
申请日：2009-03-19
申请人： Toshiyuki Watanabe , Masafumi Matsushita , Toshitaka Sakurai , Kazuya Sato , Yoko Matsushita
发明人： Toshiyuki Watanabe , Masafumi Matsushita , Toshitaka Sakurai , Kazuya Sato , Yoko Matsushita
IPC分类号： C22C28/00 , B22F1/00 , C22C1/00 , C22C30/00 , C21D11/00 , C09K3/00
CPC分类号： C22C30/00 , B22F3/23 , C21D11/00
摘要： A controlled combustion synthesis apparatus comprises an ignition system, a pressure sensor for detecting internal pressure, a nitrogen supply, a gas pressure control valve for feeding nitrogen and exhausting reaction gas, means for detecting the internal temperature of the reaction container, a water cooled jacket, and a cooling plate. A temperature control system controls the temperature of the reaction container by controlling the flow of cooling water supplied to the jacket and the cooling plate in response to the detected temperature. By combustion synthesizing, while controlling the internal pressure and temperature, the apparatus can synthesize a silicon alloy including 30-70 wt. % silicon, 10-45 wt. % nitrogen, 1-40 wt. % aluminum, and 1-40 wt % oxygen.
摘要翻译：控制燃烧合成装置包括点火系统，用于检测内部压力的压力传感器，氮气供应，用于输入氮气和排出反应气体的气体压力控制阀，用于检测反应容器的内部温度的装置，水冷套管，和冷却板。温度控制系统通过响应于检测到的温度控制供给到护套和冷却板的冷却水的流量来控制反应容器的温度。通过燃烧合成，在控制内部压力和温度的同时，该装置可以合成包含30-70wt。％硅，10-45wt。％氮，1-40重量％％铝和1-40重量％的氧。

5. 外观设计

USD656381S1 Cutter knife 有权
标题翻译：刀刀
公开(公告)号：USD656381S1
公开(公告)日：2012-03-27
申请号：US29375017
申请日：2010-09-16
申请人： Toshiyuki Watanabe
设计人： Toshiyuki Watanabe

6. 发明授权

US07911599B2 Reticle defect inspection apparatus and reticle defect inspection method 有权
标题翻译：光罩缺陷检查装置和掩模版缺陷检查方法
公开(公告)号：US07911599B2
公开(公告)日：2011-03-22
申请号：US12047554
申请日：2008-03-13
申请人： Toshiyuki Watanabe , Riki Ogawa
发明人： Toshiyuki Watanabe , Riki Ogawa
IPC分类号： G01N21/00 , G01N21/88
CPC分类号： G01N21/956 , G01N2021/95676 , G03F1/84
摘要： A reticle defect inspection apparatus that can carry out a defect inspection with high detection sensitivity are provided. The apparatus includes an optical system of transmitted illumination for irradiating one surface of a sample with a first inspection light, an optical system of reflected illumination for irradiating another surface of the sample with a second inspection light, and a detecting optical system that can simultaneously detect a transmitted light obtained by the first inspection light being passed through the sample and a reflected light obtained by the second inspection light being reflected by the sample. And the optical system of transmitted illumination includes a focusing lens driving mechanism for correcting a focal point shift of the transmitted light resulting from thickness of the sample.
摘要翻译：提供了能够进行高检测灵敏度的缺陷检查的掩模版缺陷检查装置。该装置包括用于利用第一检查光照射样品的一个表面的透射照明的光学系统，用第二检查光照射样品的另一个表面的反射照明的光学系统，以及可以同时检测的检测光学系统通过第一检查光通过样品而获得的透射光和由第二检查光获得的反射光被样品反射。并且透射照明的光学系统包括用于校正由样品的厚度产生的透射光的焦点偏移的聚焦透镜驱动机构。

7. 发明授权

US07760349B2 Mask-defect inspecting apparatus with movable focusing lens 有权
标题翻译：具有可移动聚焦透镜的掩模缺陷检测设备
公开(公告)号：US07760349B2
公开(公告)日：2010-07-20
申请号：US11083323
申请日：2005-03-18
申请人： Akihiko Sekine , Ikunao Isomura , Toshiyuki Watanabe , Shinji Sugihara , Riki Ogawa
发明人： Akihiko Sekine , Ikunao Isomura , Toshiyuki Watanabe , Shinji Sugihara , Riki Ogawa
IPC分类号： G01N21/00
CPC分类号： G01N21/956
摘要： A mask-defect inspection apparatus including a plurality of illumination optical systems (2) for illuminating different areas (14a, 14b) on a mask (4) on which a pattern (6) is formed, an objective lens (OL) disposed to face the mask, and at least a pair of detection optical systems (15, 16) each having a detection sensor (17, 19) to form an image of the pattern and for receiving illumination light from each of the different areas through the objective lens, each of the detection optical systems having a mechanism (18a, 20a) for adjusting an angle of an aperture.
摘要翻译：一种掩模缺陷检查装置，包括：多个照明光学系统（2），用于照射形成有图案（6）的掩模（4）上的不同区域（14a，14b）;物镜（OL）所述掩模和至少一对检测光学系统（15,16），每个具有检测传感器（17,19）以形成所述图案的图像并且用于通过所述物镜接收来自每个所述不同区域的照明光，每个检测光学系统具有用于调整孔的角度的机构（18a，20a）。

8. 发明申请

US20100098457A1 IMAGE FORMING APPARATUS 有权
标题翻译：图像形成装置
公开(公告)号：US20100098457A1
公开(公告)日：2010-04-22
申请号：US12580421
申请日：2009-10-16
申请人： Toshiyuki Watanabe
发明人： Toshiyuki Watanabe
IPC分类号： G03G21/16
CPC分类号： G03G21/1853 , G03G21/1647 , G03G2221/1684
摘要： An image forming apparatus for forming an image on a recording material includes a cartridge, a main assembly including a positioner positioning the cartridge and an urger urging the cartridge to the positioner, a mover supporting the cartridge and movable between a pulled out position outside of the main assembly and an inside position inside the main assembly, and a gripper mounted to the mover and movable between a reference position and an outward position located outwardly with respect to the pull out direction of the mover. When the mover is at the inside position, the cartridge is positioned to the positioner by the urger to be placed in a positioning state when the gripper is at the reference position and the positioning state of the cartridge is released by moving the gripper from the reference position to the outward position.
摘要翻译：用于在记录材料上形成图像的图像形成装置包括：盒，主组件，其包括定位盒定位器和将盒推送到定位器的推动器;支撑盒的移动器，主组件和主组件内部的内部位置，以及安装到移动器上并可在参考位置和相对于移动器的拉出方向向外定位的向外位置之间移动的夹具。当移动器位于内部位置时，当夹持器处于基准位置时，墨盒定位在定位器上，以便在夹持器处于基准位置时被放置在定位状态，并且通过从夹持器移动夹具来释放墨盒的定位状态位置向外位置。

9. 发明申请

US20080166054A1 PATTERN INSPECTION APPARATUS 有权
标题翻译：图案检查装置
公开(公告)号：US20080166054A1
公开(公告)日：2008-07-10
申请号：US12040541
申请日：2008-02-29
申请人： Hideo Tsuchiya , Kyoji Yamashita , Toshiyuki Watanabe , Ikunao Isomura , Toru Tojo , Yasushi Sanada
发明人： Hideo Tsuchiya , Kyoji Yamashita , Toshiyuki Watanabe , Ikunao Isomura , Toru Tojo , Yasushi Sanada
IPC分类号： G06K9/46
CPC分类号： G06T7/0004 , G06T2207/30148
摘要： A pattern inspection apparatus uses a die-to-database comparison method which compares detected pattern data obtained from an optical image of a pattern of a plate to be inspected with first reference pattern data obtained from designed pattern data in combination with a die-to-die comparison method which compares the detected pattern data with second reference pattern data obtained by detecting an area to be a basis for repetition. A computer detects presence of a plurality of repeated pattern areas from layout information contained in the designed pattern data, reads the arrangement, the number, the dimension and the repeated pitch of the repeated pattern areas, and automatically fetches an inspection area of the die-to-die comparison method.
摘要翻译：图案检查装置使用芯片对数据库比较方法，将从被检查板的图案的光学图像获得的检测图案数据与从设计图案数据获得的第一参考图案数据结合，芯片比较方法，其将检测到的图案数据与通过检测作为重复基础的区域获得的第二参考图案数据进行比较。计算机从包含在设计图案数据中的布局信息中检测多个重复图案区域的存在，读取重复图案区域的布置，数量，尺寸和重复间距，并且自动取出模具数据的检查区域，对比方法。

10. 发明申请

US20080151230A1 PATTERN INSPECTION METHOD 有权
标题翻译：模式检验方法
公开(公告)号：US20080151230A1
公开(公告)日：2008-06-26
申请号：US12033599
申请日：2008-02-19
申请人： Toru Tojo , Toshiyuki Watanabe , Ikunao Isomura , Akihiko Sekine
发明人： Toru Tojo , Toshiyuki Watanabe , Ikunao Isomura , Akihiko Sekine
IPC分类号： G01N21/00
CPC分类号： G01N21/956
摘要： A pattern inspection apparatus comprises an illumination optics applying a first inspection light on a predetermined wavelength to a surface opposite to a pattern formed surface of the substrate, and a second inspection light whose wavelength is equal to the wavelength of the first inspection light to the pattern formed surface, a detector independently detecting a transmitted light from the substrate by irradiation of the first inspection light and a reflected light from the substrate by irradiation of the second inspection light, and a space separation mechanism provided in the vicinity of an optical focal plane toward the pattern formed surface, and spatially separates an irradiation area of the first and second inspection lights such that the transmitted and reflected lights from the substrate are imaged in two discrete areas separated on the optical focal plane.
摘要翻译：图案检查装置包括将预定波长的第一检查光施加到与基板的图案形成表面相对的表面的照明光学器件以及其波长等于第一检查光的波长与图案的第二检查光形成表面，检测器，通过照射第一检查光和通过照射第二检查光的来自基板的反射光独立地检测来自基板的透射光;以及空间分离机构，设置在光学焦平面附近，朝向图案形成表面，并且在空间上分离第一和第二检查光的照射区域，使得来自基板的透射和反射光成像在在光学焦平面上分离的两个离散区域中。

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