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    • 10. 发明授权
    • Amorphous carbon, amorphous-carbon coated member, and process for forming amorphous carbon film
    • 无定形碳,无定形碳涂层构件和形成无定形碳膜的方法
    • US07455824B2
    • 2008-11-25
    • US11002125
    • 2004-12-03
    • Kazuyuki NakanishiTadashi OshimaHideo HasegawaHiroyuki MoriTakashi IsekiHideo TachikawaMunehisa Matsui
    • Kazuyuki NakanishiTadashi OshimaHideo HasegawaHiroyuki MoriTakashi IsekiHideo TachikawaMunehisa Matsui
    • B32B9/00
    • C23C16/26Y10T428/30
    • To provide a soft amorphous carbon exhibiting a low elastic modulus, an amorphous-carbon coated member provided with a coated film comprising the amorphous carbon, and a process for forming an amorphous carbon film. The amorphous carbon comprises carbon as a major component and hydrogen in an amount of from more than 30 atomic % to 60 atomic % or less, and exhibits an elastic modulus of from 40 or more to 150 GPa or less. Moreover, the amorphous-carbon coated member comprises a conductive substrate, and a coated film fixed on at least a part of a surface of the substrate and composed of the amorphous carbon. In addition, in a process for forming the amorphous-carbon coated film, an amorphous carbon film is formed on a surface of conductive substrates by a plasma CVD method. Not only a plurality of the substrates are disposed on a substrate holder, which is disposed in a film-forming furnace and is connected with a negative electrode, in such a state that they face to each other, but also a processing gas pressure and a plasma power source are operated so as to overlap negative glows of the neighboring two substrates.
    • 为了提供具有低弹性模量的软无定形碳,设置有包含无定形碳的涂膜的非晶碳涂覆部件以及形成非晶碳膜的方法。 无定形碳包含碳为主要成分,氢为超过30原子%至60原子%以下的量,弹性模量为40以上且150GPa以下。 此外,无定形碳涂覆部件包括导电基板和固定在基板表面的至少一部分上并由非晶碳构成的涂膜。 另外,在形成非晶碳涂膜的方法中,通过等离子体CVD法在导电性基板的表面上形成无定形碳膜。 不仅多个基板被设置在基板保持器上,所述基板保持器设置在成膜炉中并且与负极连接,并且彼此相对的状态,而且处理气体压力和 等离子体动力源被操作成与相邻两个基板的负发光重叠。