会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 7. 发明授权
    • Method for rectification and apparatus therefor
    • 整改方法及其设备
    • US5200040A
    • 1993-04-06
    • US668742
    • 1991-03-13
    • Yuji NakaTatsuo SatoAkihiro Kawashima
    • Yuji NakaTatsuo SatoAkihiro Kawashima
    • B01D3/38
    • B01D3/38Y10S203/11
    • A method for rectification includes steps of supplying raw materials to a rectifying column from a raw material feed pipe; returning a refluent fluid from a refluxing pipe to the column; leading a hold-up liquid from a bottom tank having a higher surface to a bottom tank having a lower surface of a liquid in a bottom portion of the column; heating the hold-up in each of bottom tanks; exchanging heat by bringing a vapor produced by heating the bottoms into counter-current contact with the reluent liquid returned to the rectifying column on plates arranged in the rectifying column, taking out a vapor from the top of the rectifying column, and taking out bottoms from the bottom tank. An apparatus for rectification includes a rectifying column having a raw material feed pipe, an offtake pipe for taking out the vapor, a reflux pipe for returning the refluent liquid to the inside of the column in the upper portion of the rectifying column and plates for exchanging heat by bringing the vapor into contact with the refluent liquid. The bottom portion is divided into at least two bottom tanks having surfaces of liquid different in height, in the bottom portion of rectifying column. The bottoms in each of the bottom tanks are heated and an offtake pipe takes out the bottoms.
    • 精馏方法包括从原料供给管向精馏塔供给原料的工序; 将回流管返回到塔中; 将具有较高表面的底部罐的保持液引导到具有在塔的底部中的液体的下表面的底部罐; 加热每个底部储罐中的滞留物; 通过将通过加热底部产生的蒸汽与返回到精馏塔​​中的精馏塔的排出液反向接触,从精馏塔的顶部取出蒸气,并从塔顶馏出物 底部坦克。 一种整流装置,包括:具有原料供给管的精馏塔,取出蒸气的排出管,将排出液返回至精馏塔上部的塔内的回流管和交换用的板 通过使蒸气与反应液体接触而产生热量。 底部在精馏塔的底部被分成至少两个具有不同高度的液体表面的底部罐。 每个底部罐中的底部被加热,并且出料管取出底部。
    • 10. 发明授权
    • Method and apparatus for controlling the diameter of a silicon single
crystal
    • 用于控制硅单晶直径的方法和装置
    • US5246535A
    • 1993-09-21
    • US936071
    • 1992-08-26
    • Akihiro KawashimaTatsuo SatoToshio Okawa
    • Akihiro KawashimaTatsuo SatoToshio Okawa
    • G01B11/08
    • G01B11/08
    • A method of controlling the diameter of a silicon single crystal. In the course of manufacturing a silicon single crystal by pulling the silicon single crystal while rotating it relative to a crucible, a comparison between a measured diameter value of the pulled single crystal measured by optical means and a desired diameter value is made to determine a deviation so that the resulting deviation is subjected to an incomplete differential PID processing or the Smith method processing to calculate a pull rate and the pull rate is applied to a motor controller of a crystal pulling apparatus thereby performing the diameter control of the pulled single crystal through the manipulation of the pull rate. An apparatus for controlling the diameter of a silicon single crystal includes input means for receiving a measured diameter value of a pulled single crystal measured by optical means, incomplete differential PID computing means for making a comparison between a measured diameter value of the pulled single crystal and a desired diameter value a plurality of times at intervals of a unit rotational period to calculate a pull rate, and output means for applying the pull rate to a motor controller of a crystal pulling apparatus.
    • 一种控制硅单晶直径的方法。 在通过在相对于坩埚旋转的同时拉动硅单晶而制造硅单晶的过程中,通过光学装置测量的拉伸单晶的测量直径值与期望的直径值进行比较,以确定偏差 使得所得到的偏差受到不完全差分PID处理或史密斯方法处理以计算拉动率,并且拉伸速率被施加到晶体拉制装置的电动机控制器,由此通过所述拉伸单晶的直径控制 操纵拉力。 一种用于控制硅单晶直径的装置包括:输入装置,用于接收通过光学装置测量的拉伸单晶的测量直径值;不完全差分PID计算装置,用于比较被测单体的测量直径值与 以单位旋转周期的间隔多次进行期望的直径值,以计算牵引速度;以及输出装置,用于将牵引速率施加到晶体牵引装置的电动机控制器。