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1. 发明授权

US5326672A Resist patterns and method of forming resist patterns 失效
标题翻译：抗蚀剂图案和形成抗蚀剂图案的方法
公开(公告)号：US5326672A
公开(公告)日：1994-07-05
申请号：US964715
申请日：1992-10-22
申请人： Toshihiko Tanaka , Mitsuaki Morigami , Iwao Higashikawa , Takeo Watanabe
发明人： Toshihiko Tanaka , Mitsuaki Morigami , Iwao Higashikawa , Takeo Watanabe
IPC分类号： G03F7/30 , G03C5/00
CPC分类号： G03F7/30
摘要： In accordance with a proposed resist pattern forming method, contact angles between the surface of a resist and a rinse is adjusted within a predetermined range, a volatil surfactant which does not remain by drying is mixed in the rinse so as to reduce a surface tension, the rinse is dried under a critical condition of the rinse in order not to cause the surface tension to exert. The occurrence of an attractive force between the resist patterns may be thereby weakened or nullified, so that falling of the patterns can be effectively prevented which very often happened at forming fine resist patterns or resist patterns of high aspect. On the other hand, depending upon structure of said resist pattern, it is possible to effectively prevent outermost main patterns of gathering resist patterns from falling down. By providing such effects, yielding of products are increased. Further, the present invention may be also applied to a lithography illumination sources of which are light, electron, X-ray, ion beam, etc.
摘要翻译：根据所提出的抗蚀剂图案形成方法，将抗蚀剂表面和冲洗液之间的接触角调节到预定范围内，将不保持干燥的挥发性表面活性剂在冲洗液中混合以降低表面张力，冲洗液在冲洗的临界条件下干燥，以免引起表面张力。因此抗蚀剂图案之间的吸引力的发生可能被削弱或消失，从而可以有效地防止图形的下降，这在形成精细抗蚀剂图案或高方面的抗蚀剂图案时经常发生。另一方面，根据所述抗蚀剂图案的结构，可以有效地防止聚集抗蚀剂图案的最外面的主要图案掉落。通过提供这种效果，产品的产量增加。此外，本发明还可以应用于光，电子，X射线，离子束等的光刻照明源

2. 发明授权

US5374502A Resist patterns and method of forming resist patterns 失效
标题翻译：抗蚀剂图案和形成抗蚀剂图案的方法
公开(公告)号：US5374502A
公开(公告)日：1994-12-20
申请号：US083131
申请日：1993-06-25
申请人： Toshihiko Tanaka , Mitsuaki Morigami , Iwao Higashikawa , Takeo Watanabe
发明人： Toshihiko Tanaka , Mitsuaki Morigami , Iwao Higashikawa , Takeo Watanabe
IPC分类号： G03F7/30 , G03F7/32 , G03C5/00
CPC分类号： G03F7/32 , G03F7/30
摘要： In accordance with a proposed resist pattern forming method, contact angles between the surface of a resist and a rinse is adjusted within a predetermined range, a volatil surfactant which does not remain by drying is mixed in the rinse so as to reduce a surface tension, the rinse is dried under a critical condition of the rinse in order not to cause the surface tension to exert. The occurrence of an attractive force between the resist patterns may be thereby weakened or nullified, so that falling of the patterns can be effectively prevented which very often happened at forming fine resist patterns or resist patterns of high aspect. On the other hand, depending upon structure of said resist pattern, it is possible to effectively prevent outermost main patterns of gathering resist patterns from falling down. By providing such effects, yieldings of products are increased. Further, the present invention may be also applied to a lithography illumination sources of which are light, electron, X-ray, ion beam, etc.
摘要翻译：根据所提出的抗蚀剂图案形成方法，将抗蚀剂表面和冲洗液之间的接触角调节到预定范围内，将不保持干燥的挥发性表面活性剂在冲洗液中混合以降低表面张力，冲洗液在冲洗的临界条件下干燥，以免引起表面张力。因此抗蚀剂图案之间的吸引力的发生可能被削弱或消失，从而可以有效地防止图形的下降，这在形成精细抗蚀剂图案或高方面的抗蚀剂图案时经常发生。另一方面，根据所述抗蚀剂图案的结构，可以有效地防止聚集抗蚀剂图案的最外面的主要图案掉落。通过提供这样的效果，产品的产量增加。此外，本发明还可以应用于光，电子，X射线，离子束等的光刻照明源

3. 发明授权

US07879528B2 Resist composition for electron beam or EUV 有权
标题翻译：抗蚀剂组成为电子束或EUV
公开(公告)号：US07879528B2
公开(公告)日：2011-02-01
申请号：US12044678
申请日：2008-03-07
申请人： Takeo Watanabe , Hideo Hada , Hiroo Kinoshita
发明人： Takeo Watanabe , Hideo Hada , Hiroo Kinoshita
IPC分类号： G03F7/00 , G03F7/004 , G03F7/20 , G03F7/26 , G03F7/40
CPC分类号： G03F7/0048 , G03F7/0397 , Y10S430/106 , Y10S430/114 , Y10S430/118 , Y10S430/12 , Y10S430/143 , Y10S430/146
摘要： A resist composition and a method of forming a resist pattern that enable contamination within the exposure apparatus to be prevented in lithography processes using an electron beam or EUV (extreme ultraviolet light). In this method, an organic solvent containing, as the principal component, one or more compounds selected from a group consisting of propylene glycol monomethyl ether (PGME), methyl amyl ketone (MAK), butyl acetate (BuOAc), and 3-methyl methoxy propionate (MMP) is used as the resist solvent.
摘要翻译：在使用电子束或EUV（极紫外光）的光刻工艺中，抗蚀剂组合物和形成能够防止曝光装置内的污染的抗蚀剂图案的方法。在该方法中，含有选自丙二醇单甲基醚（PGME），甲基戊基酮（MAK），乙酸丁酯（BuOAc）和3-甲基甲氧基中的一种或多种化合物作为主要成分的有机溶剂丙酸盐（MMP）用作抗蚀剂溶剂。

4. 发明授权

US07604882B2 Substrate for information recording media and manufacturing method thereof, information recording medium, and starting material glass plate 有权
标题翻译：用于信息记录介质的基板及其制造方法，信息记录介质和起始材料玻璃板
公开(公告)号：US07604882B2
公开(公告)日：2009-10-20
申请号：US11407586
申请日：2006-04-20
申请人： Masamichi Kezuka , Koji Okuhata , Kensuke Matsuno , Takeo Watanabe
发明人： Masamichi Kezuka , Koji Okuhata , Kensuke Matsuno , Takeo Watanabe
IPC分类号： G11B5/71 , B32B17/08
CPC分类号： G11B5/7315 , C03C19/00 , G11B5/8404 , G11B7/00 , G11B11/10589
摘要： A substrate for use as a disk substrate in a hard disk drive or the like, an information recording medium such as a magnetic disk, and a starting material glass plate which is a starting material of the substrate for information recording media. The forming conditions of the starting material glass plate are controlled such that the starting material glass plate has a long-wavelength waviness of not more than 6 nm. This starting material glass plate is polished so as to have a long-wavelength waviness of not more than 6 nm using CeO2 abrasive grains having a mean grain diameter of not less than 0.01 μm and a 90% diameter of the volume grain size distribution of not less than 0.02 μm. The resulting substrate for an information recording medium has an excellent planarity, can be obtained in a short time and with a low polishing amount, and the resulting information recording medium is able to cope with increased data zone recording density.
摘要翻译：用作硬盘驱动器等中的盘基板的基板，诸如磁盘的信息记录介质和作为用于信息记录介质的基板的起始材料的起始材料玻璃板。控制起始材料玻璃板的成形条件使原料玻璃板的长波长波长不大于6nm。使用平均粒径不小于0.01μm的CeO2磨粒和体积粒径分布的90％直径，将该原料玻璃板进行抛光，使其长波长波纹不大于6nm 小于0.02毫米。所得信息记录介质的基板具有优异的平面性，可以在短时间内以低抛光量获得，并且所得到的信息记录介质能够应对增加的数据区记录密度。

5. 发明申请

US20090225541A1 LUMINOUS DEVICE MOUNTING SUBSTRATE, LUMINOUS DEVICE MOUNTING PACKAGE, AND PLANAR LIGHT SOURCE DEVICE 审中-公开
标题翻译：发光装置安装基板，灯泡装置安装包和平面光源装置
公开(公告)号：US20090225541A1
公开(公告)日：2009-09-10
申请号：US12090725
申请日：2006-10-16
申请人： Shuji Gomi , Kenji Shinozaki , Shuichi Naijo , Takeo Watanabe
发明人： Shuji Gomi , Kenji Shinozaki , Shuichi Naijo , Takeo Watanabe
IPC分类号： F21V9/00
CPC分类号： H01L25/0753 , F21K9/00 , G02F1/133603 , G02F2001/133613 , H01L2924/0002 , H01L2924/00
摘要： The luminous device mounting substrate, in which plural kinds of luminous devices with different luminance colors are mounted, is characterized by comprising a plurality of luminous device mounting portions each of which is for enclosing a luminous device corresponding to a luminance color, wherein the luminous device mounting portion has a configuration in which a plurality of luminous devices can be mounted on each luminous device mounting portion.
摘要翻译：其中安装有不同亮度颜色的多种发光装置的发光装置安装基板的特征在于包括多个发光装置安装部分，每个发光装置安装部分用于封闭对应于亮度颜色的发光装置，其中发光装置安装部具有可以在各发光体安装部上安装多个发光装置的结构。

6. 发明申请

US20060188756A1 Substrate for information recording media and manufacturing method thereof, information recording medium, and starting material glass plate 有权
标题翻译：用于信息记录介质的基板及其制造方法，信息记录介质和起始材料玻璃板
公开(公告)号：US20060188756A1
公开(公告)日：2006-08-24
申请号：US11407586
申请日：2006-04-20
申请人： Masamichi Kezuka , Koji Okuhata , Kensuki Matsuno , Takeo Watanabe
发明人： Masamichi Kezuka , Koji Okuhata , Kensuki Matsuno , Takeo Watanabe
IPC分类号： G11B5/706
CPC分类号： G11B5/7315 , C03C19/00 , G11B5/8404 , G11B7/00 , G11B11/10589
摘要： A substrate for use as a disk substrate in a hard disk drive or the like, an information recording medium such as a magnetic disk, and a starting material glass plate which is a starting material of the substrate for information recording media. The forming conditions of the starting material glass plate are controlled such that the starting material glass plate has a long-wavelength waviness of not more than 6 nm. This starting material glass plate is polished so as to have a long-wavelength waviness of not more than 6 nm using CeO2 abrasive grains having a mean grain diameter of not less than 0.01 μm and a 90% diameter of the volume grain size distribution of not less than 0.02 μm. The resulting substrate for an information recording medium has an excellent planarity, can be obtained in a short time and with a low polishing amount, and the resulting information recording medium is able to cope with increased data zone recording density.
摘要翻译：用作硬盘驱动器等中的盘基板的基板，诸如磁盘的信息记录介质和作为用于信息记录介质的基板的起始材料的起始材料玻璃板。控制起始材料玻璃板的成形条件使原料玻璃板的长波长波长不大于6nm。使用平均粒径为0.01μm以上且直径为90％的CeO 2 2磨粒，对原料玻璃板进行抛光，使其长波长波长不大于6nm 的体积粒径分布不小于0.02μm。所得信息记录介质的基板具有优异的平面性，可以在短时间内以低抛光量获得，并且所得到的信息记录介质能够应对增加的数据区记录密度。

7. 发明授权

US07065984B2 Substrate for information recording media and manufacturing method thereof, information recording medium, and starting material glass plate 有权
标题翻译：用于信息记录介质的基板及其制造方法，信息记录介质和起始材料玻璃板
公开(公告)号：US07065984B2
公开(公告)日：2006-06-27
申请号：US10300383
申请日：2002-11-20
申请人： Masamichi Kezuka , Koji Okuhata , Kensuki Matsuno , Takeo Watanabe
发明人： Masamichi Kezuka , Koji Okuhata , Kensuki Matsuno , Takeo Watanabe
IPC分类号： C03B18/02 , C03C19/00
CPC分类号： G11B5/7315 , C03C19/00 , G11B5/8404 , G11B7/00 , G11B11/10589
摘要： A substrate for use as a disk substrate in a hard disk drive or the like, an information recording medium such as a magnetic disk, and a starting material glass plate which is a starting material of the substrate for information recording media. The forming conditions of the starting material glass plate are controlled such that the starting material glass plate has a long-wavelength waviness of not more than 6 nm. This starting material glass plate is polished so as to have a long-wavelength waviness of not more than 6 nm using CeO2 abrasive grains having a mean grain diameter of not less than 0.0l μm and a 90% diameter of the volume grain size distribution of not less than 0.02 μm. The resulting substrate for an information recording medium has an excellent planarity, can be obtained in a short time and with a low polishing amount, and the resulting information recording medium is able to cope with increased data zone recording density.
摘要翻译：用作硬盘驱动器等中的盘基板的基板，诸如磁盘的信息记录介质和作为用于信息记录介质的基板的起始材料的起始材料玻璃板。控制起始材料玻璃板的成形条件使原料玻璃板的长波长波长不大于6nm。使用平均粒径不小于0.01μm的CeO 2×2磨粒和90％的平均粒径，研磨该原料玻璃板，使其长波长波长不大于6nm。体积粒径分布的直径不小于0.02μm。所得信息记录介质的基板具有优异的平面性，可以在短时间内以低抛光量获得，并且所得到的信息记录介质能够应对增加的数据区记录密度。

8. 发明授权

US07033150B2 Hermetic type compressor 失效
标题翻译：密封式压缩机
公开(公告)号：US07033150B2
公开(公告)日：2006-04-25
申请号：US10425931
申请日：2003-04-30
申请人： Tsutomu Nozaki , Nobuo Abe , Kensuke Kato , Takeo Watanabe
发明人： Tsutomu Nozaki , Nobuo Abe , Kensuke Kato , Takeo Watanabe
IPC分类号： F04B39/10
CPC分类号： F04B39/125 , F04B39/122 , Y10S417/902
摘要： A high-performance hermetic type compressor in which the influence of a cylinder bore deformation caused during assembly is reduced and the sealing tightness between a piston and a cylinder block is improved. A bore hole in the cylinder block has a hollow portion. Depth H1 of the hollow portion is larger than thickness H2 of compression space V at the moment when the pressure in the compression space V reaches the discharge pressure level Pd.
摘要翻译：一种高性能密封型压缩机，其中组装期间引起的气缸孔变形的影响减小，并且提高了活塞和气缸体之间的密封性。气缸体中的钻孔具有中空部分。中空部的深度H 1大于压缩空间V的压力达到排出压力水平Pd时的压缩空间V的厚度H 2。

9. 发明授权

US5646291A Process for the manufacture of 2-phenyl-4,5-oxazoledione 4-phenylhydrazone derivatives 失效
标题翻译： 2-苯基-4,5-恶唑二酮4-苯腙衍生物的制备方法
公开(公告)号：US5646291A
公开(公告)日：1997-07-08
申请号：US431573
申请日：1995-05-01
申请人： Hajime Hoshi , Kazuhiko Sunagawa , Takeo Watanabe
发明人： Hajime Hoshi , Kazuhiko Sunagawa , Takeo Watanabe
IPC分类号： C09B26/02 , C07D263/18
CPC分类号： C09B26/02
摘要： A process for manufacturing derivatives of 2-phenyl-4,5-oxazoledione 4-phenylhyrazone is disclosed. The process comprises reacting a derivative of a benezenediazonium salt, a hippuric acid derivative, and acetic anhydride in the presence of a neutralizing agent to effect the cyclization reaction for the formation of the oxazolone ring and the succeeding diazo-coupling reaction. The process does not require the conventional separate, independent step for the preparation of a solution of a hippuric acid derivative and acetic anhydride, thus eliminating the quick heating and quenching procedures and further avoiding the loss of the hippuric acid derivative due to decomposition of the oxazolone derivative. There is thus obtained a high yield of the desired product in a short period of time.
摘要翻译：公开了一种制备2-苯基-4,5-恶唑二酮4-苯基腙的衍生物的方法。该方法包括在中和剂存在下使衍生重氮盐，马尿酸衍生物和乙酸酐的衍生物进行反应，以进行恶唑酮环的形成和后续的重氮偶合反应的环化反应。该方法不需要用于制备马尿酸衍生物和乙酸酐的常规独立的独立步骤，因此消除了快速加热和淬灭程序，并进一步避免了由于恶唑酮分解导致的马尿酸衍生物的损失衍生物。因此在短时间内获得了高产率的所需产物。

10. 发明授权

US4973353A 1,5-diphenyl-1H-1,2,4-triazole-3-carboxamide derivatives and herbicidal composition containing the same 失效
标题翻译： 1,5-二苯基-1H-1,2,4-三唑-3-甲酰胺衍生物和含有它们的除草组合物
公开(公告)号：US4973353A
公开(公告)日：1990-11-27
申请号：US162699
申请日：1988-03-01
申请人： Takafumi Shida , Hideo Arabori , Takeo Watanabe , Yoshikazu Kubota , Isao Ichinose , Yoichi Kanda , Shiro Yamazaki , Hiroyasu Shinkawa
发明人： Takafumi Shida , Hideo Arabori , Takeo Watanabe , Yoshikazu Kubota , Isao Ichinose , Yoichi Kanda , Shiro Yamazaki , Hiroyasu Shinkawa
IPC分类号： A01N43/653 , C07C205/34 , C07C205/35 , C07C217/76 , C07D249/10
CPC分类号： C07C205/34 , A01N43/653 , C07C205/35 , C07C217/76 , C07D249/10
摘要： Disclosed herein is a derivative of 1,5-diphenyl-1H-1,2,4-triazole-3-carboxamide represented by the formula (I): ##STR1## wherein R is a straight-chain alkyl group having 1 to 10 carbon atoms which is non-substituted or substituted with 1 to 19 fluorine atoms, a branched alkyl group having 3 to 10 carbon atoms which is non-substituted or substituted with 1 to 19 fluorine atoms, a cyclic alkyl group having 3 to 10 carbon atoms, an alkyl group having 1 to 3 carbon atoms which is substituted with an alicyclic structure having 3 to 7 carbon atoms, a phenyl group or an aralkyl group having 7 to 9 carbon atoms; X.sup.1 is a halogen or an alkyl group having 1 to 3 carbon atoms; X.sup.2 is a hydrogen, a halogen or an alkyl group having 1 to 3 carbon atoms; Y.sup.1 is a hydrogen or a fluorine; and Y.sup.2 is a hydrogen or a fluorine, and the herbicidal compositions containing said derivatives as active ingredient therefor.The derivative of 1,5-diphenyl-1H-1,2,4-triazole-3-carboxamide represented by the formula (I) of the present invention is the compound having high herbicidal activity and also showing excellent selectivity for killing weeds alone without doing any serious harm to the crops such as rice, wheat and corn.

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