专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US5645351A Temperature measuring method using thermal expansion and an apparatus for carrying out the same 失效
标题翻译：使用热膨胀的温度测量方法及其执行装置
公开(公告)号：US5645351A
公开(公告)日：1997-07-08
申请号：US364777
申请日：1994-12-27
申请人： Toshihiko Nakata , Shigeki Hirasawa , Yoko Saito , Takanori Ninomiya , Mineo Nomoto
发明人： Toshihiko Nakata , Shigeki Hirasawa , Yoko Saito , Takanori Ninomiya , Mineo Nomoto
IPC分类号： G01K5/52 , G01N21/17 , G01N29/24 , G01N29/34 , G01J5/38
CPC分类号： G01N29/346 , G01K5/52 , G01N21/171 , G01N29/2418 , G01N2291/012
摘要： A temperature measuring method and apparatus for measuring temperature of at least one measuring point of a sample. At least one measuring point on a surface of a sample at least with a first light. A displacement of the at least one measuring point on the surface of the sample occurs from thermal expansion of the sample in response to the first light impinging thereon and a signal indicative of the displacement is produced. The temperature of the at least one measuring point of the sample is determined from the signal.
摘要翻译：一种用于测量样品的至少一个测量点的温度的温度测量方法和装置。至少一个样品表面上至少有一个测量点至少有一个第一个光。样品表面上的至少一个测量点的位移是由于样品响应于其上的第一个光的热膨胀而发生的，并且产生了表示位移的信号。根据信号确定样品的至少一个测量点的温度。

2. 发明授权

US06355570B1 Semiconductor manufacturing methods, plasma processing methods and plasma processing apparatuses 有权
公开(公告)号：US06355570B1
公开(公告)日：2002-03-12
申请号：US09260074
申请日：1999-03-02
申请人： Toshihiko Nakata , Takanori Ninomiya , Sachio Uto , Hiroyuki Nakano
发明人： Toshihiko Nakata , Takanori Ninomiya , Sachio Uto , Hiroyuki Nakano
IPC分类号： H01L21302
CPC分类号： G01N21/53 , G01N21/94 , G01N21/9501
摘要： The present invention provides a semiconductor manufacturing method, a plasma processing method and a plasma processing apparatus for generating a plasma in a processing chamber and carrying out processing on material to be processed by using the plasma, comprising a floating-foreign-particle measuring apparatus including: a light radiating optical system for radiating a light having a desired wavelength and completing intensity modulation at a desired frequency to the processing chamber; a scattered-light detecting optical system for separating a component with the desired wavelength from scattered lights obtained from the processing chamber as a result of radiation of the light by the light radiating optical system, for optically receiving the component and for converting the component into a first signal; and a foreign-particle-signal extracting unit which separates a second signal representing foreign particle floating in the plasma or in an area in proximity to the plasma from a third signal obtained by emission of the plasma for detection of the second signal by extraction of a component with the desired frequency used for the intensity modulation from the first signal obtained from the scattered-light detecting optical system.

3. 发明授权

US06576559B2 Semiconductor manufacturing methods, plasma processing methods and plasma processing apparatuses 有权
公开(公告)号：US06576559B2
公开(公告)日：2003-06-10
申请号：US10095066
申请日：2002-03-12
申请人： Toshihiko Nakata , Takanori Ninomiya , Sachio Uto , Hiroyuki Nakano
发明人： Toshihiko Nakata , Takanori Ninomiya , Sachio Uto , Hiroyuki Nakano
IPC分类号： H01L21302
CPC分类号： G01N21/53 , G01N21/94 , G01N21/9501 , H01J2237/0225
摘要： The present invention provides a semiconductor manufacturing method, a plasma processing method and a plasma processing apparatus for generating a plasma in a processing chamber and carrying out processing on material to be processed by using the plasma, comprising a floating-foreign-particle measuring apparatus including: a light radiating optical system for radiating a light having a desired wavelength and completing intensity modulation at a desired frequency to the processing chamber; a scattered-light detecting optical system for separating a component with the desired wavelength from scattered lights obtained from the processing chamber as a result of radiation of the light by the light radiating optical system, for optically receiving the component and for converting the component into a first signal; and a foreign-particle-signal extracting unit which separates a second signal representing foreign particle floating in the plasma or in an area in proximity to the plasma from a third signal obtained by emission of the plasma for detection of the second signal by extraction of a component with the desired frequency used for the intensity modulation from the first signal obtained from the scattered-light detecting optical system.

4. 发明授权

US5479259A Method and apparatus for detecting photoacoustic signal 失效
标题翻译：用于检测光声信号的方法和装置
公开(公告)号：US5479259A
公开(公告)日：1995-12-26
申请号：US994150
申请日：1992-12-21
申请人： Toshihiko Nakata , Takanori Ninomiya , Hilario H. Kobayashi
发明人： Toshihiko Nakata , Takanori Ninomiya , Hilario H. Kobayashi
IPC分类号： G01K5/52 , G01N21/17 , G01N29/06 , G01N29/24 , G01N29/34 , G01B9/02
CPC分类号： G01N29/346 , G01K5/52 , G01N21/1702 , G01N29/0609 , G01N29/2418 , G01N2291/012
摘要： A method and an apparatus for detecting a photoacoustic signal are provided which irradiate an excitation light beam, modulated by a desired frequency, simultaneously to a plurality of points being measured on a surface of a sample, irradiate the excitation light and a probe light simultaneously to the plurality of the points being measured, detect an interference light of a reflected light beam of the probe light and a specified reference light with a detector made up of a plurality of photoelectric converting elements corresponding to the respective points being measured, the detector being in conjugate relation with the surface of the sample, detect a thermal distortion of the frequency component equal to the intensity-modulated frequency at the plurality of the points being measured from the interference light intensity signal detected by the detector, and detect information relative to the surface and the subsurface of the measuring points on the sample from the thermal distortion of the frequency component.
摘要翻译：提供了一种用于检测光声信号的方法和装置，其将在期望频率下调制的激发光束同时照射到在样品表面上测量的多个点，同时将激发光和探针光照射到测量的多个点，利用由与被测量的各个点相对应的多个光电转换元件组成的检测器检测探测光的反射光束和指定参考光的干涉光，检测器处于与样品表面的共轭关系，根据由检测器检测到的干涉光强度信号测量的多个点处，检测与等于强度调制频率的频率成分的热失真，并检测相对于表面的信息和样品上的测量点的地表从热失真的频率分量。

5. 发明授权

US5989928A Method and device for detecting end point of plasma treatment, method and device for manufacturing semiconductor device, and semiconductor device 失效
标题翻译：用于检测等离子体处理终点的方法和装置，用于制造半导体器件的方法和装置以及半导体器件
公开(公告)号：US5989928A
公开(公告)日：1999-11-23
申请号：US51767
申请日：1998-04-20
申请人： Toshihiko Nakata , Takanori Ninomiya
发明人： Toshihiko Nakata , Takanori Ninomiya
IPC分类号： C23F4/00 , H01J37/32 , H01L21/302 , H01L21/3065 , H01L21/66 , H01L21/00
CPC分类号： B24B37/013 , H01J37/32935 , H01J37/32963 , H01L22/26
摘要： In order to detect the end point of a plasma process stably and at a high precision always without being affected by the fine delineation of a pattern to be processed and an external disturbance, it is constructed such that emission wavelength components 27 of species are taken out of a plasma emission 24 and only a frequency component synchronous with a high-frequency electric power for plasma excitation is extracted by a synchronous detection circuit 30 and so on. Thereby, the progressing status of etching is seized more accurately and a change in signal at an end point becomes clear. As a result, the precision of detection of the end point of a plasma process for a minute aperture pattern is improved.
摘要翻译： PCT No.PCT / JP96 / 03042 Sec。 371日期：1998年4月20日 102（e）1998年4月20日PCT PCT 1996年10月21日PCT公布。出版物WO97 / 15074 日期1997年04月24日为了在不受待处理图案的精细描绘和外部干扰的影响的情况下稳定且高精度地检测等离子体处理的终点，构成为使发射波长成分27 的物质从等离子体发射24中取出，并且只有与用于等离子体激发的高频电力同步的频率分量由同步检测电路30等提取。因此，更精确地检测蚀刻的进行状态，并且终点处的信号变化变得清晰。结果，提高了用于微小孔径图案的等离子体处理的终点的检测精度。

6. 发明授权

US5781294A Method and apparatus for detecting photoacoustic signal to detect surface and subsurface information of the specimen 失效
标题翻译：用于检测光声信号以检测样品的表面和地下信息的方法和装置
公开(公告)号：US5781294A
公开(公告)日：1998-07-14
申请号：US548015
申请日：1995-10-25
申请人： Toshihiko Nakata , Takanori Ninomiya , Hilario Haruomi Kobayashi , Kazushi Yoshimura
发明人： Toshihiko Nakata , Takanori Ninomiya , Hilario Haruomi Kobayashi , Kazushi Yoshimura
IPC分类号： G01N21/17 , G01N29/06 , G01N29/24 , G01N29/34 , G01B9/02
CPC分类号： G01N29/346 , G01N21/1702 , G01N29/0609 , G01N29/2418 , G01N2291/012
摘要： A method and an apparatus for detecting a photoacoustic signal are provided which irradiate an excitation light beam, modulated by a desired frequency, simultaneously to a plurality of points being measured on a surface of a sample, irradiate the excitation light and a probe light simultaneously to the plurality of the points being measured, detect an interference light of a reflected light beam of the probe light and a specified reference light with a detector made up of a plurality of photoelectric converting elements corresponding to the respective points being measured, the detector being in conjugate relation with the surface of the sample, detect a thermal distortion of the frequency component equal to the intensity-modulated frequency at the plurality of the points being measured from the interference light intensity signal detected by the detector, and detect information relative to the surface and the subsurface of the measuring points on the sample from the thermal distortion of the frequency component. A plurality of measuring points on a specimen are excited simultaneously with an intensity-modulated flat light beam and the thermal expansion displacements of the measuring points are detected simultaneously by interference between a flat probe light beam and a flat reference light beam to detect photothermal displacement signals representing the photothermal displacements of the plurality of measuring points simultaneously.
摘要翻译：提供了一种用于检测光声信号的方法和装置，其将在期望频率下调制的激发光束同时照射到在样品表面上测量的多个点，同时将激发光和探针光照射到测量的多个点，利用由与被测量的各个点相对应的多个光电转换元件组成的检测器检测探测光的反射光束和指定参考光的干涉光，检测器处于与样品表面的共轭关系，根据由检测器检测到的干涉光强度信号测量的多个点处，检测与等于强度调制频率的频率成分的热失真，并检测相对于表面的信息和样品上的测量点的地表从热失真的频率分量。试样上的多个测量点与强度调制的平坦光束同时激发，并且通过平坦探测光束和平坦参考光束之间的干涉同时检测测量点的热膨胀位移，以检测光热位移信号同时表示多个测量点的光热位移。

7. 发明授权

US08695110B2 Scanning probe microscope and sample observing method using the same 有权
标题翻译：扫描探针显微镜及使用其的样品观察方法
公开(公告)号：US08695110B2
公开(公告)日：2014-04-08
申请号：US13586754
申请日：2012-08-15
申请人： Toshihiko Nakata , Masahiro Watanabe , Takashi Inoue , Kishio Hidaka , Motoyuki Hirooka
发明人： Toshihiko Nakata , Masahiro Watanabe , Takashi Inoue , Kishio Hidaka , Motoyuki Hirooka
IPC分类号： G01Q70/00 , G01Q70/16 , G01N13/00
CPC分类号： G01Q60/18 , G01Q60/22
摘要： In a near-field scanning microscope using an aperture probe, the upper limit of the aperture formation is at most several ten nm in practice. In a near-field scanning microscope using a scatter probe, the resolution ability is limited to at most several ten nm because of the external illuminating light serving as background noise. Moreover, measurement reproducibility is seriously lowered by a damage or abrasion of a probe. Optical data and unevenness data of the surface of a sample can be measured at a nm-order resolution ability and a high reproducibility while damaging neither the probe nor the sample by fabricating a plasmon-enhanced near-field probe having a nm-order optical resolution ability by combining a nm-order cylindrical structure with nm-order microparticles and repeatedly moving the probe toward the sample and away therefrom at a low contact force at individual measurement points on the sample.
摘要翻译：在使用孔径探针的近场扫描显微镜中，实际上孔径形成的上限为至多几十nm。在使用散射探针的近场扫描显微镜中，由于外部照明光作为背景噪声，分辨能力被限制在至多几十nm。此外，通过探针的损伤或磨损，测量再现性被严重降低。可以以nm级分辨能力和高再现性测量样品表面的光学数据和不均匀性数据，同时通过制造具有nm级光学分辨率的等离子体增强近场探针而不损害探针和样品通过将nm级圆柱形结构与nm级微粒组合，并在样品上的各个测量点处以低接触力将探针重复地移动到样品并从中离开它们的能力。

8. 发明授权

US08629985B2 Displacement measurement method and apparatus thereof, stage apparatus, and probe microscope 失效
标题翻译：位移测量方法及其装置，平台装置和探针显微镜
公开(公告)号：US08629985B2
公开(公告)日：2014-01-14
申请号：US13605395
申请日：2012-09-06
申请人： Toshihiko Nakata , Masahiro Watanabe , Shuichi Baba , Mineo Nomoto
发明人： Toshihiko Nakata , Masahiro Watanabe , Shuichi Baba , Mineo Nomoto
IPC分类号： G01B9/02
CPC分类号： G01Q20/02 , G01B9/02014 , G01B9/02057 , G01B9/02058 , G01B9/02076 , G01B2290/45 , G01B2290/70 , G01S17/50
摘要： A displacement measurement method, an apparatus thereof, and a probe microscope. which enable stable measure an amount of displacement and a moving distance of an object under measurement with an accuracy of the sub-nanometer order or below without being affected by disturbances such as fluctuations of air and mechanical vibration. A pulsed beam is split into two; one beam is reflected by an object under measurement and then inputted to a delay optical path equivalent to one pulse period; and the other beam is sent through the same delay optical path in the opposite direction up to the object under measurement with a delay of one pulse period, and then reflected by the object under measurement. An optical phase variation caused by the movement of the object under measurement is obtained by subjecting the two pulsed beams to interference.
摘要翻译：位移测量方法，其装置和探针显微镜。这使得能够以亚纳米级或更低的精度稳定地测量被测物体的位移量和移动距离，而不受诸如空气波动和机械振动之类的扰动的影响。脉冲束被分成两部分; 一个光束被测量对象反射，然后输入到等于一个脉冲周期的延迟光路; 并且另一个光束在相对的方向上通过相同的延迟光路被发送到被测物体的一个脉冲周期的延迟，然后被测量对象反射。通过对两束脉冲光束进行干涉而获得由测量对象的运动引起的光学相位变化。

9. 发明申请

US20130329227A1 OPTICAL INSPECTION METHOD AND OPTICAL INSPECTION APPARATUS 有权
标题翻译：光学检测方法和光学检测装置
公开(公告)号：US20130329227A1
公开(公告)日：2013-12-12
申请号：US13983077
申请日：2011-12-20
申请人： Kenji Nakahira , Toshifumi Honda , Toshihiko Nakata
发明人： Kenji Nakahira , Toshifumi Honda , Toshihiko Nakata
IPC分类号： G01N21/88
CPC分类号： G01N21/88 , G01N21/9501 , G01N21/956 , G01N2021/8835
摘要： An optical inspection apparatus is provided which suppresses the influence of quantum noise including: light irradiator which irradiates a sample with light; reference light emitter which emits reference light; light interference unit which generates interfering light through interference between transmitted light, scattered light, or reflected light from the sample irradiated with light by the light irradiator, and the reference light emitted by the reference light emitter; light detector which detects the interfering light generated by the light interference unit; defect identifier which identifies the presence or absence of a defect based on a detection signal obtained by the light detector detecting the interfering light; and light convertor which converts at least the state of the transmitted, scattered, or reflected light from the sample, the state of the reference light emitted by the reference light emitter, or the state of the interfering light generated by the light interference unit.
摘要翻译：提供抑制量子噪声影响的光学检查装置，包括：用光照射样品的光照射器; 发射参考光的参考光发射器; 光干涉单元，其通过光照射器照射的样品的透射光，散射光或反射光之间的干涉产生干涉光，以及由参考光发射器发射的参考光; 光检测器，其检测由光干涉单元产生的干涉光; 缺陷识别器，其基于由所述光检测器检测到所述干扰光获得的检测信号来识别缺陷的存在或不存在; 以及光转换器，其至少转换来自样品的透射，散射或反射光的状态，由参考光发射器发射的参考光的状态或由光干涉单元产生的干涉光的状态。

10. 发明授权

US08361784B2 Method of inspecting a DNA chip and apparatus thereof 有权
标题翻译：检查DNA芯片的方法及其装置
公开(公告)号：US08361784B2
公开(公告)日：2013-01-29
申请号：US11709120
申请日：2007-02-22
申请人： Yoshitada Oshida , Toshihiko Nakata , Tomoaki Sakata , Kenji Yasuda , Satoshi Takahashi
发明人： Yoshitada Oshida , Toshihiko Nakata , Tomoaki Sakata , Kenji Yasuda , Satoshi Takahashi
IPC分类号： C12M1/34 , G01N21/64
CPC分类号： G01N21/6428 , G01N21/6452 , G01N21/6456 , Y10S436/80 , Y10T436/143333
摘要： A DNA inspecting apparatus including driving means for relatively changing positions of the multi-spot lights and a position of the DNA chip so as to detect the fluorescent lights in such a manner that a desired area on the DNA chip is irradiated with the multi-spot lights, and a control system for determining and inspecting DNA information about the to-be-inspected DNA chip from fluorescent light intensities and fluorescent light positions of the desired area on the DNA chip, the fluorescent light intensities and the fluorescent light positions being detected by the driving means and the fluorescent light detecting means.
摘要翻译：一种DNA检查装置，包括用于相对改变多点灯位置的驱动装置和DNA芯片的位置，以便以这样的方式检测荧光，使得DNA芯片上的期望区域被多点照射灯和用于从DNA芯片上的期望区域的荧光强度和荧光灯位置确定和检查关于待检查DNA芯片的DNA信息的控制系统，荧光强度和荧光灯位置由驱动装置和荧光检测装置。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式