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    • 1. 发明授权
    • Semiconductor light emitting device and method for manufacturing same
    • 半导体发光器件及其制造方法
    • US08766297B2
    • 2014-07-01
    • US13030264
    • 2011-02-18
    • Toshihide ItoToshiyuki OkaKotaro ZaimaTaisuke SatoShinya Nunoue
    • Toshihide ItoToshiyuki OkaKotaro ZaimaTaisuke SatoShinya Nunoue
    • H01L33/36H01L33/42
    • H01L33/145H01L33/405H01L33/42
    • According to one embodiment, a semiconductor light emitting device includes a stacked structural body, first and second electrodes, a high resistance layer and a transparent conductive layer. The stacked structural body includes first and second semiconductor layers and a light emitting layer. The first semiconductor layer is disposed between the first electrode and the second semiconductor layer. The second semiconductor layer is disposed between the second electrode and the first semiconductor layer. The second electrode has reflectivity with respect to luminescent light. The high resistance layer is in contact with the second semiconductor layer between the second semiconductor layer and the second electrode and includes a portion overlapping with the first electrode. The transparent conductive layer is in contact with the second semiconductor layer between the second semiconductor layer and the second electrode. The transparent conductive layer has a resistance lower than a resistance of the high resistance layer.
    • 根据一个实施例,半导体发光器件包括堆叠结构体,第一和第二电极,高电阻层和透明导电层。 堆叠结构体包括第一和第二半导体层和发光层。 第一半导体层设置在第一电极和第二半导体层之间。 第二半导体层设置在第二电极和第一半导体层之间。 第二电极具有相对于发光的反射率。 高电阻层与第二半导体层与第二电极之间的第二半导体层接触并且包括与第一电极重叠的部分。 透明导电层与第二半导体层在第二半导体层和第二电极之间接触。 透明导电层的电阻低于高电阻层的电阻。
    • 2. 发明申请
    • SEMICONDUCTOR LIGHT EMITTING DEVICE AND METHOD FOR MANUFACTURING SAME
    • 半导体发光器件及其制造方法
    • US20120043550A1
    • 2012-02-23
    • US13030264
    • 2011-02-18
    • Toshihide ITOToshiyuki OkaKotaro ZaimaTaisuke SatoShinya Nunoue
    • Toshihide ITOToshiyuki OkaKotaro ZaimaTaisuke SatoShinya Nunoue
    • H01L33/60H01L33/30H01L33/36
    • H01L33/145H01L33/405H01L33/42
    • According to one embodiment, a semiconductor light emitting device includes a stacked structural body, first and second electrodes, a high resistance layer and a transparent conductive layer. The stacked structural body includes first and second semiconductor layers and a light emitting layer. The first semiconductor layer is disposed between the first electrode and the second semiconductor layer. The second semiconductor layer is disposed between the second electrode and the first semiconductor layer. The second electrode has reflectivity with respect to luminescent light. The high resistance layer is in contact with the second semiconductor layer between the second semiconductor layer and the second electrode and includes a portion overlapping with the first electrode. The transparent conductive layer is in contact with the second semiconductor layer between the second semiconductor layer and the second electrode. The transparent conductive layer has a resistance lower than a resistance of the high resistance layer.
    • 根据一个实施例,半导体发光器件包括堆叠结构体,第一和第二电极,高电阻层和透明导电层。 堆叠结构体包括第一和第二半导体层和发光层。 第一半导体层设置在第一电极和第二半导体层之间。 第二半导体层设置在第二电极和第一半导体层之间。 第二电极具有相对于发光的反射率。 高电阻层与第二半导体层与第二电极之间的第二半导体层接触并且包括与第一电极重叠的部分。 透明导电层与第二半导体层在第二半导体层和第二电极之间接触。 透明导电层的电阻低于高电阻层的电阻。
    • 6. 发明授权
    • Semiconductor light emitting device and method for manufacturing the same
    • 半导体发光器件及其制造方法
    • US08735925B2
    • 2014-05-27
    • US13450063
    • 2012-04-18
    • Kotaro ZaimaToru GotodaToshiyuki OkaShinya Nunoue
    • Kotaro ZaimaToru GotodaToshiyuki OkaShinya Nunoue
    • H01L33/00
    • H01L33/22H01L33/04H01L33/06
    • Certain embodiments provide a semiconductor light emitting device including: a first metal layer; a stack film including a p-type nitride semiconductor layer, an active layer, and an n-type nitride semiconductor layer; an n-electrode; a second metal layer; and a protection film protecting an outer circumferential region of the upper face of the n-type nitride semiconductor layer, side faces of the stack film, a region of an upper face of the second metal layer other than a region in contact with the p-type nitride semiconductor layer, and a region of an upper face of the first metal layer other than a region in contact with the second metal layer. Concavities and convexities are formed in a region of the upper face of the n-type nitride semiconductor layer, the region being outside the region in which the n-electrode is provided and being outside the regions covered with the protection film.
    • 某些实施例提供一种半导体发光器件,包括:第一金属层; 包括p型氮化物半导体层,有源层和n型氮化物半导体层的堆叠膜; n电极; 第二金属层; 以及保护膜,其保护所述n型氮化物半导体层的上表面的外周区域,所述堆叠膜的侧面,除了与所述p型膜接触的区域以外的所述第二金属层的上表面的区域, 氮化物半导体层以及与第二金属层接触的区域以外的第一金属层的上表面的区域。 在n型氮化物半导体层的上表面的区域形成凹凸,该区域位于设置有n电极的区域的外部,并且覆盖有保护膜的区域之外。
    • 9. 发明申请
    • SEMICONDUCTOR LIGHT EMITTING DEVICE AND METHOD FOR MANUFACTURING THE SAME
    • 半导体发光器件及其制造方法
    • US20110215293A1
    • 2011-09-08
    • US12874475
    • 2010-09-02
    • Kotaro ZaimaToru GotodaToshiyuki OkaShinya Nunoue
    • Kotaro ZaimaToru GotodaToshiyuki OkaShinya Nunoue
    • H01L33/04
    • H01L33/22H01L33/04H01L33/06
    • Certain embodiments provide a semiconductor light emitting device including: a first metal layer; a stack film including a p-type nitride semiconductor layer, an active layer, and an n-type nitride semiconductor layer; an n-electrode; a second metal layer; and a protection film protecting an outer circumferential region of the upper face of the n-type nitride semiconductor layer, side faces of the stack film, a region of an upper face of the second metal layer other than a region in contact with the p-type nitride semiconductor layer, and a region of an upper face of the first metal layer other than a region in contact with the second metal layer. Concavities and convexities are formed in a region of the upper face of the n-type nitride semiconductor layer, the region being outside the region in which the n-electrode is provided and being outside the regions covered with the protection film.
    • 某些实施例提供一种半导体发光器件,包括:第一金属层; 包括p型氮化物半导体层,有源层和n型氮化物半导体层的堆叠膜; n电极; 第二金属层; 以及保护膜,其保护所述n型氮化物半导体层的上表面的外周区域,所述堆叠膜的侧面,除了与所述p型膜接触的区域以外的所述第二金属层的上表面的区域, 氮化物半导体层以及与第二金属层接触的区域以外的第一金属层的上表面的区域。 在n型氮化物半导体层的上表面的区域形成凹凸,该区域位于设置有n电极的区域的外部,并且覆盖有保护膜的区域之外。