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1. 发明授权

US07182122B2 Heating and cooling apparatus, and vacuum processing apparatus equipped with this apparatus 有权
公开(公告)号：US07182122B2
公开(公告)日：2007-02-27
申请号：US09906130
申请日：2001-07-17
申请人： Toshiaki Koguchi , Kazuhito Watanabe , Nobuyuki Takahashi
发明人： Toshiaki Koguchi , Kazuhito Watanabe , Nobuyuki Takahashi
IPC分类号： F25B29/00
CPC分类号： H01L21/67161 , H01L21/67109 , H01L21/67115 , H01L21/67178
摘要： A heating and cooling apparatus with which batch processing is possible and throughput can be increased, and furthermore which is more compact and uses less energy. A substrate heating chamber and a substrate cooling chamber each capable of simultaneously holding a plurality of substrates are provided in a thermally separated state in a heating and cooling apparatus with a single vacuum processing chamber. The substrate heating chamber is equipped with a plurality of communicating or non-communicating substrate holding spaces. The substrate cooling chamber is also equipped with a plurality of communicating or non-communicating substrate holding spaces. The communicating substrate holding spaces allow the batch heat treatment of substrates, while the non-communicating substrate holding spaces allow the batch or individual processing of substrates.

2. 发明申请

US20070089852A1 Heating and cooling apparatus, and vacuum processing apparatus equipped with this apparatus 有权
标题翻译：加热和冷却装置以及配备有该装置的真空处理装置
公开(公告)号：US20070089852A1
公开(公告)日：2007-04-26
申请号：US11637925
申请日：2006-12-13
申请人： Toshiaki Koguchi , Kazuhito Watanabe , Nobuyuki Takahashi
发明人： Toshiaki Koguchi , Kazuhito Watanabe , Nobuyuki Takahashi
IPC分类号： F25B29/00
CPC分类号： H01L21/67161 , H01L21/67109 , H01L21/67115 , H01L21/67178
摘要： A heating and cooling apparatus with which batch processing is possible and throughput can be increased, and furthermore which is more compact and uses less energy. A substrate heating chamber and a substrate cooling chamber each capable of simultaneously holding a plurality of substrates are provided in a thermally separated state in a heating and cooling apparatus with a single vacuum processing chamber. The substrate heating chamber is equipped with a plurality of communicating or non-communicating substrate holding spaces. The substrate cooling chamber is also equipped with a plurality of communicating or non-communicating substrate holding spaces. The communicating substrate holding spaces allow the batch heat treatment of substrates, while the non-communicating substrate holding spaces allow the batch or individual processing of substrates.
摘要翻译：可以增加批量处理和加工量的加热和冷却装置，此外，其更紧凑并且使用更少的能量。在具有单个真空处理室的加热和冷却装置中，以热分离的状态提供各自同时保持多个基板的基板加热室和基板冷却室。基板加热室配备有多个连通或不连通的基板保持空间。基板冷却室还配备有多个连通或不连通的基板保持空间。连通基板保持空间允许对基板进行批量热处理，而不连通的基板保持空间允许基板的批量或单独处理。

3. 发明授权

US07886808B2 Heating and cooling apparatus, and vacuum processing apparatus equipped with this apparatus 有权
标题翻译：加热和冷却装置以及配备有该装置的真空处理装置
公开(公告)号：US07886808B2
公开(公告)日：2011-02-15
申请号：US11637925
申请日：2006-12-13
申请人： Toshiaki Koguchi , Kazuhito Watanabe , Nobuyuki Takahashi
发明人： Toshiaki Koguchi , Kazuhito Watanabe , Nobuyuki Takahashi
IPC分类号： F25B29/00 , F28F7/00 , C23C16/00
CPC分类号： H01L21/67161 , H01L21/67109 , H01L21/67115 , H01L21/67178
摘要： A substrate heating chamber and a substrate cooling chamber each capable of simultaneously holding a plurality of substrates are provided in a thermally separated state in a heating and cooling apparatus with a single vacuum processing chamber. The substrate heating chamber is equipped with a plurality of communicating or non-communicating substrate holding spaces. The substrate cooling chamber is also equipped with a plurality of communicating or non-communicating substrate holding spaces. The communicating substrate holding spaces allow the batch heat treatment of substrates, while the non-communicating substrate holding spaces allow the batch or individual processing of substrates.
摘要翻译：在具有单个真空处理室的加热和冷却装置中，以热分离的状态提供各自同时保持多个基板的基板加热室和基板冷却室。基板加热室配备有多个连通或不连通的基板保持空间。基板冷却室还配备有多个连通或不连通的基板保持空间。连通基板保持空间允许对基板进行批量热处理，而不连通的基板保持空间允许基板的批量或单独处理。

4. 发明授权

US06432261B1 Plasma etching system 有权
公开(公告)号：US06432261B1
公开(公告)日：2002-08-13
申请号：US09758141
申请日：2001-01-12
申请人： Kazuhito Watanabe , Hironari Shimizu , Toshiaki Koguchi , Nobuyuki Takahashi
发明人： Kazuhito Watanabe , Hironari Shimizu , Toshiaki Koguchi , Nobuyuki Takahashi
IPC分类号： C23F102
摘要： A substrate holder and an electrode are arranged facing each other in a vacuum chamber. The electrode is provided with a process gas introduction mechanism and a gas blowoff plate. A substrate is loaded on the substrate holder, the process gas is introduced, and electric power is supplied between the substrate holder and the electrode to generate plasma for etching the substrate surface. At the rear side of the gas blowoff plate in the vacuum chamber, a plurality of magnets is provided at concentric positions. The magnetic field strength resulting from the magnets on the surface of the substrate is made 0 Gauss. By using the magnets in this way and improving the magnets, it is possible to establish a better etching process for various materials to be etched.

5. 发明授权

US5676758A CVD apparatus 失效
标题翻译： CVD装置
公开(公告)号：US5676758A
公开(公告)日：1997-10-14
申请号：US635492
申请日：1996-04-22
申请人： Shinya Hasegawa , Shigeru Mizuno , Kazuhito Watanabe , Nobuyuki Takahashi , Manabu Tagami , Takanori Yoshimura , Hajime Sahase
发明人： Shinya Hasegawa , Shigeru Mizuno , Kazuhito Watanabe , Nobuyuki Takahashi , Manabu Tagami , Takanori Yoshimura , Hajime Sahase
IPC分类号： C23C16/50 , C23C16/44 , C23C16/455 , C23C16/458 , C23C16/509 , H01J37/32 , H01L21/205 , H01L21/285 , C23C16/00
CPC分类号： C23C16/45521 , C23C16/455 , C23C16/45568 , C23C16/45591 , C23C16/4583 , C23C16/509 , H01J37/3244
摘要： A CVD mechanism includes a reactor, a substrate holder, a heating apparatus for heating the substrate holder, a reaction gas supply plate for supplying reaction gas into the reactor, and at least two cylinders disposed in a concentric form on the substrate-facing surface of the reaction gas supply plate so that reaction gas is supplied from an inward portion of each cylinder in the reaction gas supply plate. A power supply mechanism for supplying power to the reaction gas supply plate and the substrate holder, and ring magnets disposed in the upper and lower portions of the reactor are provided so that magnetic lines of force passing through a plasma space are generated by the facing magnetic pole parts of the respective magnets.
摘要翻译： CVD机构包括反应器，基板保持器，用于加热基板保持器的加热装置，用于将反应气体供应到反应器中的反应气体供给板，以及至少两个以同心形式设置在圆筒形基板的表面的基板反应气体供给板，使得反应气体从反应气体供给板中的每个气缸的向内部分供给。设置用于向反应气体供给板和基板保持器供电的供电机构和设置在电抗器的上部和下部的环形磁铁，使得通过等离子体空间的磁力线由面对的磁体各个磁体的极部分。

6. 发明授权

US5766363A Heater for CVD apparatus 失效
标题翻译： CVD装置加热器
公开(公告)号：US5766363A
公开(公告)日：1998-06-16
申请号：US634873
申请日：1996-04-19
申请人： Shigeru Mizuno , Kazuhito Watanabe , Takanori Yoshimura , Nobuyuki Takahashi
发明人： Shigeru Mizuno , Kazuhito Watanabe , Takanori Yoshimura , Nobuyuki Takahashi
IPC分类号： H05B3/14 , C23C16/44 , C23C16/455 , C23C16/458 , C23C16/46 , H01L21/205 , H01L21/285 , C23C16/00
CPC分类号： C23C16/45521 , C23C16/4585 , C23C16/46
摘要： A heater is used in a CVD apparatus. In the CVD apparatus, reactive gas is supplied through a reactive gas supply plate to a substrate on a substrate holder to deposit a film on the substrate, and a purge gas supply passage is formed by placing a shield mechanism around the substrate holder, the shield mechanism including a ring plate disposed close to the outer periphery of the substrate. During film deposition, purge gas supplied through the purge gas supply passage is blown off from a clearance between the substrate and the ring plate, thereby preventing a film from being deposited on the rear surface of the substrate or the like. A heating element is arranged in a space in the purge gas supply passage close to but not contacting the substrate holder. The heating element is preferably a ceramic heater.
摘要翻译：在CVD装置中使用加热器。在CVD装置中，反应性气体通过反应性气体供应板供应到衬底保持器上的衬底以在衬底上沉积膜，并且通过将屏蔽机构放置在衬底保持器周围形成吹扫气体供给通道，屏蔽机构包括靠近基板的外周设置的环板。在膜沉积期间，通过吹扫气体供应通道供应的吹扫气体从基板和环板之间的间隙吹出，从而防止膜沉积在基板的后表面等上。加热元件布置在靠近但不接触衬底保持器的吹扫气体供给通道的空间中。加热元件优选为陶瓷加热器。

7. 发明授权

US06386511B1 Gate valve apparatus 有权
标题翻译：闸阀装置
公开(公告)号：US06386511B1
公开(公告)日：2002-05-14
申请号：US09654117
申请日：2000-09-01
申请人： Kazuhito Watanabe , Yoshihiro Katsumata , Nobuyuki Takahashi
发明人： Kazuhito Watanabe , Yoshihiro Katsumata , Nobuyuki Takahashi
IPC分类号： F16K116
CPC分类号： F16K31/52 , F16K1/16
摘要： To be able to reduce the size of a drive part and, as a result, to achieve the reduction in size and the lowering of manufacturing cots of a gate valve. An open/close mechanism is configured from a turning pair only. This open/close mechanism is configured from a first swing link, second swing link and coupling link. The first swing link is driven by a rotation cylinder to perform a swinging motion. The second swing link is connected to a drive shaft and performs a swinging motion with the drive shaft as its axis. The first swing link and second swing link are coupled by the coupling link. When the rotation cylinder is driven, whereby the first swing link is caused to swing, the coupling link is vertically driven whereby the second swing link is caused to swing. As a result, a valve, connected to the second swing link, swings and the opening and closing operation of the flow path port is performed.
摘要翻译：为了能够减小驱动部件的尺寸，因此能够实现闸阀的制造小型化的小型化和降低。开/关机构仅由转弯配置。该开/关机构由第一摆动连杆，第二摆动连杆和联接杆构成。第一摆动连杆由旋转圆筒驱动以进行摆动。第二摆动连杆与驱动轴连接，以驱动轴为轴的方式进行摆动。第一摆动连杆和第二摆动连杆通过联轴节连接。当旋转圆筒被驱动时，第一摆动杆被摆动，联接杆被垂直驱动，从而使第二摆动杆摆动。结果，与第二摆动连杆连接的阀门摆动，进行流路口的开闭动作。

8. 发明授权

US6129046A Substrate processing apparatus 失效
标题翻译：基板加工装置
公开(公告)号：US6129046A
公开(公告)日：2000-10-10
申请号：US795348
申请日：1997-02-04
申请人： Shigeru Mizuno , Masahito Ishihara , Kazuhito Watanabe , Nobuyuki Takahashi
发明人： Shigeru Mizuno , Masahito Ishihara , Kazuhito Watanabe , Nobuyuki Takahashi
IPC分类号： C23C14/50 , C23C16/44 , C23C16/455 , C23C16/458 , C23F4/00 , H01L21/203 , H01L21/205 , H01L21/285 , H01L21/302 , H01L21/3065 , H01L21/324 , C23C16/00
CPC分类号： C23C16/45521 , C23C16/4585 , C23C16/4586
摘要： The present invention provides a substrate processing apparatus having improved temperature distribution on a block heater and improved productivity. The substrate processing apparatus includes a reactor having an exhaust unit to form a vacuum environment therein for processing a surface of a substrate, a support member provided in the reactor, and gas introduction units for introducing reactive gases into the reactor, the substrate support member including a block heater. The block heater has upper, intermediate and lower members, which are placed one over another, the faying surfaces of the respective members being joined by diffusion bonding. A heating member is provided between the intermediate and lower members, and purge gas passages are formed between the intermediate and upper members.
摘要翻译：本发明提供一种具有改进的块加热器温度分布和提高生产率的基板处理装置。基板处理装置包括具有排气单元的反应器，用于在其中形成用于处理基板的表面的真空环境，设置在反应器中的支撑构件和用于将反应气体引入反应器的气体引入单元，所述基板支撑构件包括一个块加热器。块式加热器具有一个上下放置的上部，中间和下部构件，各个构件的接合表面通过扩散接合连接。加热构件设置在中间构件和下构件之间，并且在中间构件和上构件之间形成吹扫气体通道。

9. 发明授权

US08395315B2 Substrate and organic EL light-emitting apparatus 有权
标题翻译：基板和有机EL发光装置
公开(公告)号：US08395315B2
公开(公告)日：2013-03-12
申请号：US13203084
申请日：2010-02-23
申请人： Toshiya Kuroda , Kazuhito Watanabe
发明人： Toshiya Kuroda , Kazuhito Watanabe
IPC分类号： H01J1/62 , H01J63/04
CPC分类号： G02B5/045 , G02B3/0056 , H01L51/0096 , H01L51/5275 , Y02E10/549
摘要： An objective of the present invention is to provide a substrate that can achieve high light extraction efficiency, and to provide an organic EL light-emitting apparatus with high light-emitting efficiency by using such a substrate. The present invention is a substrate (1) comprising a transparent substrate (10) and a light-concentrating structural body layer (30), wherein the light-concentrating structural body layer (30) includes a plurality of structural bodies (25) having a conic shape or a hemispherical shape, with the bottom faces of the plurality of structural bodies (25) having a conic shape or a hemispherical shape being located on the same plane. The structural body (25) is preferably a structural body having a cone shape, a square pyramid shape or a triangular pyramid shape.
摘要翻译：本发明的目的是提供一种能够实现高光提取效率的基板，并且通过使用这种基板来提供具有高发光效率的有机EL发光装置。本发明是一种包括透明基板（10）和聚光结构体层（30）的基板（1），其中聚光结构体层（30）包括多个结构体（25），其具有圆锥形或半球形，多个结构体（25）的底面具有圆锥形或半球形，位于同一平面上。结构体（25）优选为具有圆锥形状，方形金字塔形状或三角锥形状的结构体。

10. 发明申请

US20080063416A1 IMAGE FORMING APPARATUS, CONTROL METHOD THEREFOR, AND PROGRAM 失效
标题翻译：图像形成装置，其控制方法及程序
公开(公告)号：US20080063416A1
公开(公告)日：2008-03-13
申请号：US11849540
申请日：2007-09-04
申请人： Kazuhito Watanabe
发明人： Kazuhito Watanabe
IPC分类号： G03G15/00
CPC分类号： G03G15/5029 , G03G2215/00738
摘要： In an image forming apparatus, a type of paper conveyed through a conveying path is determined based on combination of sensing signals obtained from a plurality of sensing units. Each of the sensing units is movable between an actuating position and a retracting position as a paper is conveyed through a conveying path. Based on the type of paper determined based on combination of sensing signals obtained from the plurality of sensing units, a control unit of the image forming apparatus controls an image forming unit forming an image on the conveyed paper.
摘要翻译：在图像形成装置中，基于从多个感测单元获得的感测信号的组合来确定通过传送路径传送的纸张的类型。当纸张通过传送路径传送时，每个感测单元可在致动位置和缩回位置之间移动。基于根据从多个感测单元获得的感测信号的组合确定的纸张类型，图像形成装置的控制单元控制在所输送的纸张上形成图像的图像形成单元。

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