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    • 2. 发明授权
    • Process for recovering catalyst components from a mother liquor of liquid phase oxidation
    • 从液相氧化母液中回收催化剂组分的方法
    • US06589492B2
    • 2003-07-08
    • US09874118
    • 2001-06-06
    • Masami MatsumotoHideaki Fujita
    • Masami MatsumotoHideaki Fujita
    • C22B4700
    • C07C51/47B01J27/128B01J27/32B01J38/64B01J38/74Y02P20/584C07C63/00C07C63/26
    • A process for recovering components of a catalyst from a mother liquor of liquid phase oxidation in production of aromatic carboxylic acids by liquid phase oxidation of aromatic hydrocarbons having substituents with a gas containing oxygen in a presence of a catalyst comprising cobalt, manganese and bromine in acetic acid or acetic acid containing water as a solvent, which process comprises adding a compound generating an ion of an alkali metal to the mother liquor of liquid phase oxidation obtained after separating crystals of the aromatic carboxylic acid from a reaction fluid of the liquid phase oxidation, bringing the mother liquor containing the compound into contact with an ion exchange resin so that the components of the catalyst are adsorbed to the ion exchange resin and recovering the components of the catalyst comprising cobalt, manganese and bromine ion by passing an elution liquid through the ion exchange resin. By adding the compound generating an ion of an alkali metal to the mother liquor supplied to an ion exchange resin column, contamination of the recovered components of the catalyst with eluted metal ions such as iron can be suppressed and an increase in the concentration of the eluted metal ions in the mother liquor of the oxidation can be prevented. Therefore, the amount of the recycled mother liquor can be increased and the recovery of the catalyst components can also be increased.
    • 在含有钴,锰和溴在乙酸中的催化剂存在下,用含氧气体取代基的芳香族烃的液相氧化,从芳烃羧酸生产中回收液相氧化母液中回收催化剂组分的方法 酸或乙酸作为溶剂,该方法包括向从液相氧化的反应液中分离出芳族羧酸的晶体后所得到的液相氧化母液中加入产生碱金属离子的化合物, 使含有化合物的母液与离子交换树脂接触,使得催化剂的组分被吸附到离子交换树脂上,并通过使洗脱液通过离子回收包含钴,锰和溴离子的催化剂的组分 通过将产生碱金属离子的化合物加入到t中 供给到离子交换树脂柱的母液,可以抑制用洗脱的金属离子如铁对催化剂的回收成分的污染,并且可以防止氧化母液中洗脱的金属离子的浓度增加 。 因此,可以提高回收母液的量,并且还可以提高催化剂组分的回收率。
    • 3. 发明授权
    • Process for producing aromatic carboxylic acid
    • 芳香族羧酸的制造方法
    • US5880313A
    • 1999-03-09
    • US139677
    • 1998-08-25
    • Fumiya ZaimaHideaki FujitaMasami MatsumotoMasato Inari
    • Fumiya ZaimaHideaki FujitaMasami MatsumotoMasato Inari
    • C07C51/265C07C51/16
    • C07C51/265
    • A process for continuously producing an aromatic carboxylic acid comprising oxidizing an aromatic compound substituted with alkyl groups with molecular oxygen gas in the liquid phase in a solvent containing a lower aliphatic carboxylic acid in the presence of a catalyst comprising heavy metal compounds and a bromine compound, wherein a mother liquor which is obtained after removal of crystals from a reaction liquid of the liquid phase oxidation and contains heavy metal ions and bromine ion as catalyst components is brought into contact with a chelate resin of an anion exchange type to recover the catalyst components.The catalyst components are efficiently recovered, and auxiliary agents in an amount exceeding the equivalent amount and excessive labor are not necessary.
    • 一种连续生产芳族羧酸的方法,包括在含有重金属化合物和溴化合物的催化剂存在下,在含有低级脂肪族羧酸的溶剂中,将在液相中的分子氧气用烷基取代的芳族化合物氧化, 其中将从液相氧化反应液中除去结晶并含有重金属离子和溴离子作为催化剂组分的母液与阴离子交换型螯合树脂接触以回收催化剂组分。 有效地回收催化剂组分,并且不需要超过相当量和过量劳动量的助剂。
    • 4. 发明授权
    • Method of manufacturing a semiconductor device having a single crystal
silicon electrode
    • 制造具有单晶硅电极的半导体器件的方法
    • US6069060A
    • 2000-05-30
    • US976597
    • 1997-11-24
    • Masami MatsumotoJunichi TsuchimotoKiyoshi Mori
    • Masami MatsumotoJunichi TsuchimotoKiyoshi Mori
    • H01L21/28H01L21/768H01L21/822H01L21/8242H01L27/04H01L27/108
    • H01L27/10852
    • It is an object to obtain a semiconductor device free from a necessity of stacking a contact hole and a lower electrode, thus preventing occurrence of an error in stacking and enabling the capacitor to be formed precisely. Amorphous silicon 10b is deposited on a interlayer insulating film 9 including the inside portion of the contact hole 9a, and then a resist 14 is applied to the amorphous silicon 10b. Then, a mask for photolithography which has been used to form the contact hole 9a is used to perform a photolithography process to form the resist 14 to have a required shape. Then, implantation of phosphorus ions is performed such that the resist 14 is used as a mask 14a for preventing implantation of ions. Then, the amorphous silicon 10b is subjected to heat treatment to partially single crystallize the amorphous silicon 10b so that single crystal silicon 10c is grown. The difference in the etching rate between the amorphous silicon 10b and the single crystal silicon 10c is used to selectively remove the amorphous silicon 10b by using dry etching technique so that a storage node 10 is formed.
    • 本发明的目的是获得不需要堆叠接触孔和下电极的半导体器件,从而防止堆叠发生错误,并且能够精确地形成电容器。 非晶硅10b沉积在包括接触孔9a的内部的层间绝缘膜9上,然后将抗蚀剂14施加到非晶硅10b。 然后,使用已经用于形成接触孔9a的用于光刻的掩模来进行光刻工艺以形成具有所需形状的抗蚀剂14。 然后,进行磷离子的注入,使得抗蚀剂14用作防止离子注入的掩模14a。 然后,对非晶硅10b进行热处理,以使非晶硅10b部分单晶结晶,从而生长单晶硅10c。 使用非晶硅10b和单晶硅10c之间的蚀刻速率的差异,通过使用干蚀刻技术来选择性地去除非晶硅10b,从而形成存储节点10。
    • 5. 发明授权
    • Robbery-proof mechanism for vehicle mounted electronic apparatus
    • 车载电子设备防盗机制
    • US5726868A
    • 1998-03-10
    • US575752
    • 1995-12-20
    • Kazuya KoyamaMasayoshi AokiJun MuramatsuTohru MasumotoMasami MatsumotoKiyoshi Hosoi
    • Kazuya KoyamaMasayoshi AokiJun MuramatsuTohru MasumotoMasami MatsumotoKiyoshi Hosoi
    • B60R11/02B60K37/04H02B1/01H05K5/02
    • H02B1/01B60R11/02
    • A robbery-proof mechanism for a vehicle mounted electronic apparatus wherein a cover for covering the electronic apparatus is accommodated in the upper space of the electronic apparatus and can be driven by a small scale drive mechanism without moving the electronic apparatus. The robbery-proof mechanism includes: a frame mounted on the front of the vehicle mounted electronic apparatus, being rotative between a horizontal position and a vertical position; a cover capable of being inserted into a groove formed in the frame; a drive mechanism for driving the cover in the horizontal direction between a position in the groove of the frame and a position retracted from the frame; and a drive mechanism for driving an operation panel in the horizontal direction, wherein the frame is rotated to the horizontal position, the cover is then moved into the groove of the frame and the operation panel is moved backward, and the frame together with the cover is rotated to the vertical position to cover the operation panel with the cover.
    • 一种用于车载电子设备的抢劫机构,其中用于覆盖电子设备的盖子容纳在电子设备的上部空间中,并且可以由小型驱动机构驱动而不移动电子设备。 防盗机构包括:安装在车载电子设备的前部的框架,在水平位置和垂直位置之间旋转; 能够插入到形成在框架中的凹槽中的盖子; 驱动机构,用于在所述框架的所述槽的位置和从所述框架缩回的位置之间沿水平方向驱动所述盖; 以及用于在水平方向上驱动操作面板的驱动机构,其中框架旋转到水平位置,然后将盖移动到框架的凹槽中,并且操作面板向后移动,并且框架与盖 旋转到垂直位置以覆盖操作面板。
    • 8. 发明授权
    • Method for producing ditrimethylolpropane
    • 二羟甲基丙烷生产方法
    • US09169184B2
    • 2015-10-27
    • US13820586
    • 2011-09-05
    • Masami MatsumotoHiroaki ShigetaNozomi NakagawaIkutaro Kuzuhara
    • Masami MatsumotoHiroaki ShigetaNozomi NakagawaIkutaro Kuzuhara
    • C07C41/42C07C41/01C07C29/38C07C41/40
    • C07C41/42C07C29/38C07C41/01C07C41/40C07C43/132C07C31/22
    • The present invention provides a method for producing ditrimethylolpropane which is characterized by the following (1) and (2): (1) a distillation still residue separated from purified trimethylolpropane is subjected to re-distillation under specific conditions to obtain a ditrimethylolpropane-containing solution having given contents of bis-TMP and tri-TMP; and (2) when subjecting the ditrimethylolpropane-containing solution to crystallization with an organic solvent, the crystallization is initiated under pressure at a temperature exceeding a boiling point of the organic solvent as measured under normal pressures, and the resulting crystallization product solution is cooled at a temperature drop rate of 2° C./min or less. According to the above method, it is possible to produce a high-purity ditrimethylolpropane from a distillation still residue obtained upon production of trimethylolpropane in a simple, industrially useful manner.
    • 本发明提供一种二羟甲基丙烷的制造方法,其特征在于以下(1)和(2):(1)在纯化的三羟甲基丙烷中分离出的蒸馏残余物在特定条件下进行再蒸馏,得到含二羟甲基丙烷的溶液 给出了双TMP和三TMP的内容; 和(2)当使含二羟丙基丙烷的溶液用有机溶剂结晶时,在常压下测量的超过有机溶剂沸点的温度下,在压力下开始结晶,并将所得结晶产物溶液冷却至 降温速度为2℃/分钟以下。 根据上述方法,可以以简单的工业上有用的方式从由三羟甲基丙烷制备得到的蒸馏釜残渣中制备高纯度的二羟甲基丙烷。
    • 9. 发明申请
    • METHOD FOR PRODUCING DITRIMETHYLOLPROPANE
    • 生产二甲基丙烯酸的方法
    • US20130184497A1
    • 2013-07-18
    • US13820586
    • 2011-09-05
    • Masami MatsumotoHiroaki ShigetaNozomi NakagawaIkutaro Kuzuhara
    • Masami MatsumotoHiroaki ShigetaNozomi NakagawaIkutaro Kuzuhara
    • C07C41/42C07C41/01
    • C07C41/42C07C29/38C07C41/01C07C41/40C07C43/132C07C31/22
    • The present invention provides a method for producing ditrimethylolpropane which is characterized by the following (1) and (2): (1) a distillation still residue separated from purified trimethylolpropane is subjected to re-distillation under specific conditions to obtain a ditrimethylolpropane-containing solution having given contents of bis-TMP and tri-TMP; and (2) when subjecting the ditrimethylolpropane-containing solution to crystallization with an organic solvent, the crystallization is initiated under pressure at a temperature exceeding a boiling point of the organic solvent as measured under normal pressures, and the resulting crystallization product solution is cooled at a temperature drop rate of 2° C./min or less. According to the above method, it is possible to produce a high-purity ditrimethylolpropane from a distillation still residue obtained upon production of trimethylolpropane in a simple, industrially useful manner.
    • 本发明提供一种二羟甲基丙烷的制造方法,其特征在于以下(1)和(2):(1)在纯化的三羟甲基丙烷中分离出的蒸馏残余物在特定条件下进行再蒸馏,得到含二羟甲基丙烷的溶液 给出了双TMP和三TMP的内容; 和(2)当使含二羟丙基丙烷的溶液用有机溶剂结晶时,在常压下测量的超过有机溶剂沸点的温度下,在压力下开始结晶,并将所得结晶产物溶液冷却至 降温速度为2℃/分钟以下。 根据上述方法,可以以简单的工业上有用的方式从由三羟甲基丙烷制备得到的蒸馏釜残渣中制备高纯度的二羟甲基丙烷。